Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03B - Apparatus or arrangements for taking photographs or for projecting or viewing them; Apparatus or arrangements employing analogous techniques using waves other than optical waves; Accessories therefor › G03B 27 - Photographic printing apparatus
Patents for G03B 27 - Photographic printing apparatus (25,157)
12/2009
12/08/2009US7630056 Exposure apparatus and device manufacturing method
12/08/2009US7630055 Exposure apparatus and method
12/08/2009US7630054 Methods and systems to compensate for a stitching disturbance of a printed pattern
12/08/2009US7630053 Method of manufacturing semiconductor device and liquid immersion lithography system
12/08/2009US7630052 Exposure processing system, exposure processing method and method for manufacturing a semiconductor device
12/08/2009CA2371533C Effects processor for effects module
12/03/2009US20090297990 Liquid holding apparatus, liquid holding method, exposure apparatus, exposing method, and device fabricating method
12/03/2009US20090297989 Method and device for patterning a disk
12/03/2009US20090297958 Exposure mask and exposure method using the same
12/03/2009US20090296090 Method of determining defects in a substrate and apparatus for exposing a substrate in a lithographic process
12/03/2009US20090296069 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
12/03/2009US20090296068 Substrate table, lithographic apparatus and device manufacturing method
12/03/2009US20090296067 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
12/03/2009US20090296066 Illumination system of a microlithographic projection exposure apparatus, and depolarizer
12/03/2009US20090296065 Lithographic apparatus and a method of operating the apparatus
12/03/2009US20090296064 Illumination system for sizing focused spots of a patterning system for maskless lithography
12/03/2009US20090296063 Exposure apparatus
12/03/2009US20090296062 Method of measuring position error of beam of exposure apparatus and exposure apparatus using the same
12/03/2009US20090296061 Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
12/03/2009US20090296060 Lithographic apparatus and device manufacturing method
12/03/2009US20090296059 Measurement apparatus, measurement method, exposure apparatus, and device fabrication method
12/03/2009US20090296058 Lithographic apparatus and device manufacturing method
12/03/2009US20090296057 Automated determination of height and tilt of a substrate surface within a lithography system
12/03/2009US20090296056 Substrate table, lithographic apparatus and device manufacturing method
12/03/2009US20090296055 Lens heating compensation systems and methods
12/03/2009US20090296054 Immersion lithography method
12/03/2009US20090296053 Apparatus and method for providing fluid for immersion lithography
12/03/2009US20090296052 Lithographic apparatus and methods
12/03/2009US20090294635 Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method
12/02/2009CN201355425Y Optical micro motion device of colorful digital developing machine
12/02/2009CN101592854A Multichannel laser antifalsification technology of nanometer material
12/02/2009CN100566368C Image reading device and image reading method
12/02/2009CN100565335C Image forming device
12/01/2009US7626770 Illumination system with zoom objective
12/01/2009US7626739 Imaging using media carriage coupled to a lid
12/01/2009US7626684 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
12/01/2009US7626683 Exposure apparatus and device manufacturing method
12/01/2009US7626682 Reticle stages for lithography systems and lithography methods
12/01/2009US7626681 Lithographic apparatus and method
12/01/2009US7626680 Exposure apparatus and device fabrication method using the same
12/01/2009US7626679 Exposure apparatus, manufacturing system, and device manufacturing method
11/2009
11/26/2009WO2009140925A1 Dual-side enlarger
11/26/2009US20090291399 Coating/developing apparatus and method
11/26/2009US20090291374 Exposure aligning method and exposure apparatus
11/26/2009US20090290140 Deactivating device and method for lithographic plate
11/26/2009US20090290139 Substrate table, sensor and method
11/26/2009US20090290138 Pulse motor, positioning apparatus, exposure apparatus, and device manufacturing method
11/26/2009US20090290137 Support structure, lithographic apparatus and method
11/26/2009US20090290136 Measuring apparatus, exposure apparatus and method, and device manufacturing method
11/26/2009US20090290135 Lithographic apparatus and device manufacturing method
11/26/2009US20090290134 Exposure method
11/26/2009US20090289991 Printer Module With Capping Mechanism
11/25/2009EP1614001B1 Cleanup method for optics in immersion lithography
11/25/2009CN101587288A Laser direct modulation apparatus used for digital developing equipment.
11/25/2009CN101587287A Single/double columns paper conveying apparatus with double paper rollers capable of moving in two directions and locking buffering automatically
11/25/2009CN100562800C Printing accepting device and printing accepting method
11/24/2009US7623220 Source optimization for image fidelity and throughput
11/24/2009US7623219 Exposure apparatus, exposure method, device manufacturing method
11/24/2009US7623218 Method of manufacturing a miniaturized device
11/24/2009CA2371536C Method and apparatus for image conversion
11/19/2009US20090286172 Surface shape measurement apparatus and exposure apparatus
11/19/2009US20090284793 Method of and system for receiving orders for prints, and computer program for use in the method and system
11/19/2009US20090284730 Substrate Handler, Lithographic Apparatus and Device Manufacturing Method
11/19/2009US20090284729 Illumination optical apparatus and projection exposure apparatus
11/19/2009US20090284728 Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor
11/19/2009US20090284727 Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
11/19/2009US20090284726 Stray Light Feedback for Dose Control in Semiconductor Lithography Systems
11/19/2009US20090284725 Lithographic apparatus
11/19/2009US20090284724 Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
11/19/2009US20090284723 Stage device, pattern formation apparatus, exposure apparatus, stage drive method, exposure method, and device manufacturing method
11/19/2009US20090284722 Method for monitoring focus on an integrated wafer
11/19/2009US20090284721 providing a reticle system and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by grouping and pairing each of the image pattern onto the reticle system according to a multi-layer reticle grouping/pairing flow
11/19/2009US20090284720 Lithographic Apparatus and Device Manufacturing Method
11/19/2009US20090284719 Alignment method and apparatus of mask pattern
11/19/2009US20090284718 Liquid Immersion Optical Tool, Method for Cleaning Liquid Immersion Optical Tool, Liquid Immersion Exposure Method and Method for Manufacturing Semiconductor Device
11/19/2009US20090284717 Exposure apparatus, exposure method, and device manufacturing method
11/19/2009US20090284716 Exposure apparatus, exposure method, and device manufacturing method
11/19/2009US20090284715 Lithographic apparatus and a method of operating the apparatus
11/18/2009EP1741055B1 Film fingerprinting
11/18/2009CN101581873A Single-roller bidirectional flat belt tangential exposure paper feeding device
11/18/2009CN101581434A Lighting apparatus and image reading apparatus
11/17/2009US7619718 Method and system for active purging of pellicle volumes
11/17/2009US7619717 Method for performing a focus test and a device manufacturing method
11/17/2009US7619716 Exposure method
11/17/2009US7619715 Coupling apparatus, exposure apparatus, and device fabricating method
11/17/2009US7619714 Immersion exposure technique
11/17/2009US7618755 performing an exposure process for substrates in lithography tools using an automated focus adjustment process on the basis of focus tilt parameter; using a fault detection module; determining a current focus fault status on the basis of current value and a statistical value; wafers; cost efficiency
11/12/2009US20090280441 Exposure method, exposure device, and micro device manufacturing method
11/12/2009US20090280439 Exposure apparatus, exposure method, and device manufacturing method
11/12/2009US20090280418 Exposure apparatus, correction method, and device manufacturing method
11/12/2009US20090279068 Device and process for increasing the light transmission of optical elements for light having a wavelength close to the absorption edge
11/12/2009US20090279067 Stage System and Lithographic Apparatus Comprising Such Stage System
11/12/2009US20090279066 Lithographic apparatus and method
11/12/2009US20090279065 Measurement apparatus and exposure apparatus
11/12/2009US20090279064 Lithographic apparatus and device manufacturing method
11/12/2009US20090279063 Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method
11/12/2009US20090279062 Fluid handling structure, lithographic apparatus and device manufacturing method
11/12/2009US20090279061 Lithographic apparatus and method
11/12/2009US20090279060 Fluid handling structure, lithographic apparatus and device manufacturing method
11/12/2009US20090279059 Exposure apparatus adjusting method, exposure apparatus, and device fabricating method
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