Patents for G03B 27 - Photographic printing apparatus (25,157)
02/2010
02/03/2010CN100587601C Large viewing field projection optical system with aberration correctability for flat panel displays
02/03/2010CN100587590C Sticker printer and camera
02/02/2010US7656507 Processing unit, exposure apparatus having the processing unit, and protection unit
02/02/2010US7656506 Lithographic apparatus and device manufacturing method utilizing a substrate handler
02/02/2010US7656505 Apparatus to easily measure reticle blind positioning with an exposure apparatus
02/02/2010US7656504 Projection exposure apparatus with luminous flux distribution
02/02/2010US7656503 Exposure apparatus and image plane detecting method
02/02/2010US7656502 Lithographic apparatus and device manufacturing method
02/02/2010US7656501 Lithographic apparatus
01/2010
01/28/2010US20100020525 Cable Connection, Control System, and Method to Decrease the Passing on of Vibrations from a First Object to a Second Object
01/28/2010US20100020304 Spectral Purity Filters for Use in a Lithographic Apparatus
01/28/2010US20100020303 Device, method, and system for measuring image profiles produced by an optical lithography system
01/28/2010US20100020302 Projection exposure tool for microlithography with a measuring apparatus and method for measuring an irradiation strength distribution
01/28/2010US20100020301 Exposure Device and Method for Producing the Same
01/28/2010US20100020300 Measurement apparatus and method
01/28/2010US20100020299 Instrumentation and method for maskless photolithography
01/28/2010US20100020298 Lithography apparatus with an optical fiber module
01/28/2010US20100020297 Method for improving surface roughness of processed film of substrate and apparatus for processing substrate
01/28/2010US20100020296 Lithographic apparatus and device manufacturing method
01/28/2010US20100020195 Method Of Operating Camera Timing Module
01/27/2010EP1307782B1 Apparatus for adjusting position of mirror in projector
01/27/2010CN101634804A Double-sided enlarging print device
01/26/2010US7652758 Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems
01/26/2010US7652751 Lithographic apparatus and device manufacturing method
01/26/2010US7652750 Lithography exposure device having a plurality of radiation sources
01/26/2010US7652749 Software upgrades in a lithographic apparatus
01/26/2010US7652748 Exposure apparatus and device manufacturing method
01/26/2010US7652747 Immersion exposure method and immersion exposure apparatus which transfer image of pattern formed on mask onto substrate through immersion medium
01/26/2010US7652746 Lithographic apparatus and device manufacturing method
01/26/2010US7652416 Lamp having good maintenance behavior of brightness and color coordinations
01/26/2010US7651285 Edge exposure apparatus, coating and developing apparatus, edge exposure method and coating and developing method, and storage medium
01/21/2010US20100014065 Method for improving imaging properties of an optical system, and such an optical system
01/21/2010US20100014064 Optical printers
01/21/2010US20100014063 Image exposure apparatus
01/21/2010US20100014062 Lens array plate of erecting unit magnification system, image reading apparatus and image writing apparatus using the lens array plate, as well as method for manufacturing the lens array plate
01/21/2010US20100014061 Lithographic apparatus and device manufacturing method
01/21/2010US20100014060 Lithographic apparatus, a metrology apparatus and a method of using the apparatus
01/21/2010US20100014059 Lithographic Apparatus and Device Manufacturing Method
01/21/2010US20100013892 Printer module logically and physically connectable to further modules
01/21/2010US20100012352 Photoimaging method and apparatus
01/20/2010CN100582944C Lithographic apparatus and device manufacturing method
01/20/2010CN100582930C Print processing system
01/20/2010CN100582929C Print processing system and print processing program
01/19/2010US7649625 Optical apparatus, photomask inspecting apparatus, and exposure apparatus
01/19/2010US7649615 Advanced exposure techniques for programmable lithography
01/19/2010US7649614 Method of characterization, method of characterizing a process operation, and device manufacturing method
01/19/2010US7649613 Lithographic apparatus, method of controlling a component of a lithographic apparatus and device manufacturing method
01/19/2010US7649612 Phase shifting photolithography system
01/19/2010US7649611 Lithographic apparatus and device manufacturing method
01/14/2010US20100009274 Substrate processing method and substrate processing system
01/14/2010US20100007923 Printer control apparatus and method of controlling the same, printer and method of controlling the same, reader and method of controlling the same, and image forming system
01/14/2010US20100007869 Reticle Handler
01/14/2010US20100007868 Substrate Support System Having a Plurality of Contact Lands
01/14/2010US20100007867 Lithographic Apparatus and Calibration Method
01/14/2010US20100007866 Method for producing facet mirrors and projection exposure apparatus
01/14/2010US20100007865 Coupling apparatus, exposure apparatus, and device fabricating method
01/14/2010US20100007864 Scanning exposure apparatus and method of manufacturing device
01/14/2010US20100007863 Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method
01/14/2010US20100007862 Exposure apparatus and device manufacturing method
01/14/2010US20100005854 Gas Analyzing System, Lithographic Apparatus and Method of Improving a Sensitivity of a Gas Analyzing System
01/14/2010US20100005820 Cooling Device for Printing Machines
01/14/2010DE10308174B4 Anordnung zur Debrisreduktion bei einer Strahlungsquelle auf Basis eines Plasmas Arrangement for Debrisreduktion at a radiation source based on a plasma
01/13/2010CN201383068Y Exposure device for flexible version printing
01/13/2010CN100580546C Original manuscript pressing plate opening and closing device
01/13/2010CN100580545C High resolution, dynamic positioning mechanism for specimen inspection and processing
01/12/2010US7646472 Off-axis illumination apparatus, exposure apparatus and off-axis illumination method
01/12/2010US7646471 Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby
01/12/2010US7646470 Immersion lithographic process using a variable scan speed
01/12/2010US7646469 Immersion optical lithography system having protective optical coating
01/12/2010US7646468 Lithographic processing cell and device manufacturing method
01/12/2010US7645081 Coating and developing apparatus, coating and developing method, and storage medium
01/07/2010US20100004869 Vibration Isolation Device, Arithmetic Apparatus, Exposure Apparatus, and Device Manufacturing Method
01/07/2010US20100003619 Systems and methods for fabricating three-dimensional objects
01/07/2010US20100002221 Systems and Methods for Minimizing Scattered Light in Multi-SLM Maskless Lithography
01/07/2010US20100002220 Light shielding unit, variable slit apparatus, and exposure apparatus
01/07/2010US20100002219 Illuminant distribution evaluation method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure method
01/07/2010US20100002218 Exposure apparatus and method for manufacturing device
01/07/2010US20100002217 Illumination system of a microlithographic projection exposure apparatus
01/07/2010US20100002216 Optical Element, Lithographic Apparatus Including Such an Optical Element, Device Manufacturing Method, and Device Manufactured Thereby
01/07/2010US20100002215 Imaging optical system, exposure apparatus, and device manufacturing method
01/07/2010US20100002214 In-die focus monitoring with binary mask
01/07/2010US20100002213 Photolithography system using an optical microscope
01/07/2010US20100002212 Scanning exposure apparatus, exposure method, and device manufacturing method
01/07/2010US20100002211 Lithographic apparatus
01/07/2010US20100002210 Integrated interference-assisted lithography
01/07/2010US20100002209 Exposure apparatus and method of manufacturing device
01/07/2010US20100002208 Exposure method, exposure apparatus, and device manufacturing method
01/07/2010US20100002207 Lithographic apparatus and device manufacturing method
01/07/2010US20100002206 Exposure condition determination method, exposure method, exposure apparatus, and device manufacturing method
01/06/2010CN101620382A Substrate treatment apparatus and treatment method
01/06/2010CN100578824C LED chip mounting structure and image reader with same
01/05/2010US7643130 Position measuring apparatus and positional deviation measuring method
01/05/2010US7643129 Exposure apparatus, exposure method, method for manufacturing device
01/05/2010US7643128 Large field of view projection optical system with aberration correctability
01/05/2010US7643127 Prewetting of substrate before immersion exposure
01/05/2010US7643126 Method of setting focus condition at time of exposure, apparatus for setting focus condition at time of exposure, program, and computer readable recording medium
01/05/2010US7643125 Exposure apparatus and device manufacturing method
01/05/2010US7641406 Bevel inspection apparatus for substrate processing
01/05/2010US7641405 Substrate processing apparatus with integrated top and edge cleaning unit
01/05/2010US7641404 Substrate processing apparatus
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