Patents for G03B 27 - Photographic printing apparatus (25,157)
03/2010
03/04/2010US20100053582 Device Manufacturing Method, Control System, Computer Program and Computer-Readable Medium
03/04/2010US20100053581 Radiation source and lithographic apparatus
03/04/2010US20100053580 Computer readable medium and exposure method
03/04/2010US20100053579 A method for manufacturing a surface having a multiplicity of slightly different patterns comprising the steps of writing a surface with a set of characters for forming the patterns on the surface and reducing shot count or total write time by use of a character varying techniques; stencil masks
03/04/2010US20100053578 Apparatus for imprint lithography using an electric field
03/04/2010US20100053577 Roll-to-roll type apparatus for forming thin film pattern
03/04/2010US20100053576 Radiation source, lithographic apparatus and device manufacturing method
03/04/2010US20100053575 Thermal Control For EUV Lithography
03/04/2010US20100053574 Liquid Immersion Lithography System Comprising a Tilted Showerhead Relative to a Substrate
03/03/2010CN201417361Y Automatic focusing and angle adjusting mechanism for lens of CTP
03/03/2010CN201417360Y Plate copying apparatus of seamless flexible printing sleeve plate
03/03/2010CN201417359Y Central shaft of plate copying apparatus of seamless flexible plate
03/02/2010US7672026 Sheet presser and image scanner
03/02/2010US7671970 Stage apparatus with two patterning devices, lithographic apparatus and device manufacturing method skipping an exposure field pitch
03/02/2010US7671969 Semiconductor wafer flatness correction apparatus and method
03/02/2010US7671968 Lithographic apparatus having masking parts and device manufacturing method
03/02/2010US7671967 Exposure apparatus and exposure method
03/02/2010US7671966 Computer architecture for and method of high-resolution imaging using a low-resolution image transducer
03/02/2010US7671965 Lithographic projection apparatus, device manufacturing method and device manufactured thereby
03/02/2010US7671964 Exposure apparatus, and device manufacturing method
03/02/2010US7671963 Lithographic apparatus and device manufacturing method
03/02/2010US7671543 Light exposure control device and apparatus
03/02/2010US7670754 Exposure apparatus having a processing chamber, a vacuum chamber and first and second load lock chambers
03/02/2010US7670729 Measurement method and apparatus, exposure apparatus, and device fabrication method
03/02/2010US7670727 Illumination compensator for curved surface lithography
02/2010
02/25/2010US20100047702 Resist pattern forming method
02/25/2010US20100045960 Magnetic levitation wafer stage, and method of using the stage in an exposure apparatus
02/25/2010US20100045959 Photolithography apparatus with leveling element and method for leveling a wafer
02/25/2010US20100045958 Lithography system
02/25/2010US20100045957 Polarization-modulating optical element
02/25/2010US20100045956 Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor Thereof
02/25/2010US20100045955 Particle Detection on an Object Surface
02/25/2010US20100045954 Controllable radiation lithographic apparatus and method
02/25/2010US20100045953 Laser irradiation device and method of manufacturing organic light emitting diode display device using the same
02/25/2010US20100045952 Microlithographic projection exposure apparatus
02/25/2010US20100045951 Lithographic apparatus and device manufacturing method
02/25/2010US20100045950 Lithographic apparatus, drying device, metrology apparatus and device manufacturing method
02/25/2010US20100045949 Exposure apparatus, maintaining method and device fabricating method
02/25/2010US20100045948 Euv lithography apparatus and method for determining the contamination status of an euv-reflective optical surface
02/25/2010US20100045803 Camera Module Outputting Images In Device Independent Color Space
02/25/2010US20100043837 Method of controlling contamination of a surface
02/23/2010US7667822 Lithographic apparatus and stage apparatus
02/23/2010US7667821 Multi-focus scanning with a tilted mask or wafer
02/23/2010US7667820 Method for chemical reduction of an oxidized contamination material, or reducing oxidation of a contamination material and a conditioning system for doing the same
02/23/2010US7667819 System and method for contrast enhanced zone plate array lithography
02/23/2010US7665918 Developing apparatus, developing method and storage medium
02/18/2010US20100041239 Diffractive Optical Element, Lithographic Apparatus and Semiconductor Device Manufacturing Method
02/18/2010US20100040987 Method for Exposing an Area on a Substrate to a Beam and Photolithographic System
02/18/2010US20100040964 Exposure apparatus, exposure method and method of manufacturing display panel substrate
02/18/2010US20100039636 Illumination optics for a microlithographic projection exposure apparatus
02/18/2010US20100039635 Filter Device Disposed in Reticle Library of Lithography System
02/18/2010US20100039634 Exposure apparatus for display and exposing method using the same
02/18/2010US20100039633 Source optimization for image fidelity and throughput
02/18/2010US20100039632 Radiation source, lithographic apparatus and device manufacturing method
02/18/2010US20100039631 Radiation sources and methods of generating radiation
02/18/2010US20100039630 Optimization of focused spots for maskless lithography
02/18/2010US20100039629 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
02/18/2010US20100039628 Cleaning tool, cleaning method, and device fabricating method
02/17/2010EP1650747B1 Audio playback program, audio playback method, and audio playback device
02/17/2010CN101650519A Printing apparatus
02/17/2010CN101650518A printing apparatus
02/16/2010US7663741 Lithographic apparatus, device manufacturing method, calibration method and computer program product
02/16/2010US7663735 Microlithographic projection exposure apparatus with immersion projection lens
02/16/2010US7663734 Pattern writing system and pattern writing method
02/16/2010US7663733 Method of illuminating at least two illumination points
02/16/2010US7663732 Exposure apparatus, exposure method and device manufacturing method for compensating position measuring system using temperature
02/16/2010US7663127 EUV debris mitigation filter and method for fabricating semiconductor dies using same
02/16/2010US7661894 Coating and developing apparatus, and coating and developing method
02/11/2010US20100035431 Reticle Stages for Lithography Systems and Lithography Methods
02/11/2010US20100035061 Cutomized lithographic particles
02/11/2010US20100033706 Substrate position detection apparatus, and method of adjusting a position of an imaging component of the same
02/11/2010US20100033705 Multi Nozzle Proximity Sensor Employing Common Sensing and Nozzle Shaping
02/11/2010US20100033704 Deformable mirror, mirror apparatus, and exposure apparatus
02/11/2010US20100033703 Mixed polarization state monitoring
02/11/2010US20100033702 Coated mirrors and their fabrication
02/11/2010US20100033701 Superlens and lithography systems and methods using same
02/11/2010US20100033700 Optical element, optical element holding device, exposure apparatus, and device manufacturing method
02/11/2010US20100033699 Illumination optical system, exposure apparatus, and exposure method
02/11/2010US20100033698 Full Wafer Width Scanning Using Steps and Scan System
02/11/2010US20100033697 Optical position sensor, a position sensitive detector, a lithographic apparatus and a method for determining an absolute position of a movable object to be used in a relative position measurement system
02/11/2010US20100033696 Method and apparatus for producing an element having at least one freeform surface having a high accuracy of form and a low surface roughness
02/11/2010US20100033695 Lithography apparatus and manufacturing method using the same
02/11/2010US20100033694 Exposure method, exposure apparatus and device manufacturing method
02/10/2010EP2151121A2 Image reading system
02/10/2010CN100589029C Recording medium supply unit
02/10/2010CN100589028C Image forming device
02/09/2010US7660646 System and method providing control of reticle stocking and sorting
02/09/2010US7659966 Container and method of transporting substrate using the same
02/09/2010US7659965 High throughput wafer stage design for optical lithography exposure apparatus
02/09/2010US7659964 Level adjustment systems and adjustable pin chuck thereof
02/09/2010US7658560 Substrate processing apparatus
02/04/2010US20100028814 Manufacturing cross-structures of nanostructures
02/04/2010US20100028790 Method and system for reducing overlay errors in semiconductor volume production using a mixed tool scenario
02/04/2010US20100026980 Processing apparatus and device manufacturing method
02/04/2010US20100026978 Projection objective of a microlithographic projection exposure apparatus
02/04/2010US20100026977 Method for measuring wavefront aberration
02/04/2010US20100026976 Actuator System Using Multiple Piezoelectric Actuators
02/04/2010US20100026975 Exposure apparatus and device manufacturing method
02/04/2010US20100026974 Cooling of Actuator Coils
02/03/2010CN101641641A Imaging apparatus with media pickup
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