Patents for G03B 27 - Photographic printing apparatus (25,157)
11/2010
11/04/2010US20100277709 Substrate table, immersion lithographic apparatus and device manufacturing method
11/04/2010US20100277708 Illumination system of a microlothographic projection exposure apparatus
11/04/2010US20100277707 Illumination optics for a microlithographic projection exposure apparatus
11/04/2010US20100277706 Method of Measurement, an Inspection Apparatus and a Lithographic Apparatus
11/04/2010DE202010007753U1 Berührungssteuer-Vorrichtung zum Aufnehmen und Umwandeln von Bildern Touch control device for receiving and converting images
11/03/2010CN101876784A Exposing machine and exposing method thereof
11/02/2010US7826038 Method for adjusting lithographic mask flatness using thermally induced pellicle stress
11/02/2010US7826037 Radiation beam pulse trimming
11/02/2010US7826036 Scanning exposure apparatus and method of manufacturing device
11/02/2010US7826035 Lithographic apparatus and device manufacturing method
11/02/2010US7826033 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect
11/02/2010US7826032 Circulation system for high refractive index liquid in pattern forming apparatus
11/02/2010US7826031 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
11/02/2010US7826030 Lithographic apparatus and device manufacturing method
11/02/2010US7825390 Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
10/2010
10/28/2010US20100273115 Particle inspection apparatus, exposure apparatus, and device manufacturing method
10/28/2010US20100273114 Device manufacturing apparatus and method of manufacturing device
10/28/2010US20100273108 Method for producing regenerated porous sheet
10/28/2010US20100273099 Flood exposure process for dual tone development in lithographic applications
10/28/2010US20100271613 Bearing device, stage device, and exposure apparatus
10/28/2010US20100271612 Method and pellicle mounting apparatus for reducing pellicle induced distortion
10/28/2010US20100271611 Lithographic apparatus having a substrate support with open cell plastic foam parts
10/28/2010US20100271610 Lithographic radiation source, collector, apparatus and method
10/28/2010US20100271609 Mark position detection device and mark position detection method, exposure apparatus using same, and device manufacturing method
10/28/2010US20100271608 System and method for imaging apparatus calibration
10/28/2010US20100271607 Optical assembly
10/28/2010US20100271606 Lithographic apparatus and a method of operating the apparatus
10/28/2010US20100271605 Side Seal for Wet Lens Elements
10/28/2010US20100271604 System and method to increase surface tension and contact angle in immersion lithography
10/28/2010US20100271603 Stage for substrate temperature control apparatus
10/28/2010US20100271602 Protective apparatus, mask, mask forming apparatus, mask forming method, exposure apparatus, device fabricating method, and foreign matter detecting apparatus
10/27/2010CN201615986U 基于彩扩机的照片曝光双面翻纸机构 Exposure sided turning paper-based photo agency Minilab
10/26/2010US7821617 Exposure apparatus and device manufacturing method
10/26/2010US7821616 Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof
10/26/2010US7821614 Monitoring apparatus and method particularly useful in photolithographically processing substrates
10/26/2010US7819521 Modular printer system and print media dispenser
10/21/2010US20100266969 Resist applying and developing method, resist film processing unit, and resist applying and developing apparatus comprising
10/21/2010US20100266968 Exposure apparatus, device manufacturing system, and method of manufacturing device
10/21/2010US20100266961 Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
10/21/2010US20100266960 Method of manufacturing semiconductor device and exposure device
10/21/2010US20100265488 Method of Placing a Substrate, Method of Transferring a Substrate, Support System and Lithographic Projection Apparatus
10/21/2010US20100265487 Lithographic apparatus, positioning system, and positioning method
10/21/2010US20100265486 Method of clamping a substrate and clamp preparation unit
10/21/2010US20100265485 Flexibly Deformable Holding Element For Substrates
10/21/2010US20100265484 Lithographic apparatus, method for levelling an object, and lithographic projection method
10/21/2010US20100265483 Exposure apparatus, exposure method, and method of manufactruing device
10/21/2010US20100265482 Illumination system for illuminating a mask in a microlithographic exposure apparatus
10/21/2010US20100265481 Imaging optical system and projection exposure installation
10/21/2010US20100265480 Mirror for the euv wavelength range, projection objective for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
10/21/2010US20100265479 Device manufacturing method and lithographic apparatus
10/21/2010US20100265478 Projection lens system of a microlithographic projection exposure installation
10/21/2010US20100265477 Semiconductor manufacturing apparatus and pattern formation method
10/21/2010US20100265476 Lithographic apparatus and device manufacturing method
10/20/2010EP2240815A1 Device and method for exposing a photo material
10/20/2010CN101866105A Method for improving imaging resolution of transmission-type liquid crystal board exposure system
10/19/2010US7817262 Device for measuring positions of structures on a substrate
10/19/2010US7817252 Holder for carrying a photolithography mask in a flattened condition
10/19/2010US7817251 Supporting apparatus, exposure apparatus, and device manufacturing method
10/19/2010US7817250 Microlithographic projection exposure apparatus
10/19/2010US7817249 Exposure method and apparatus, and device producing method using two light beams to correct non-rotationally symmetric aberration
10/19/2010US7817248 Optical imaging arrangement
10/19/2010US7817247 Lithographic apparatus, excimer laser and device manufacturing method
10/19/2010US7817246 Optical apparatus
10/19/2010US7817245 Lithographic apparatus and device manufacturing method
10/19/2010US7817244 Exposure apparatus and method for producing device
10/19/2010US7817243 Vibration isolation system
10/19/2010US7817242 Exposure method and device manufacturing method, exposure apparatus, and program
10/19/2010US7817241 Lithographic apparatus and device manufacturing method
10/19/2010US7817175 Laser induced thermal imaging apparatus and fabricating method of organic light emitting diode using the same
10/19/2010US7816276 Substrate treatment system, substrate treatment method, and computer readable storage medium
10/14/2010US20100261120 Mirror for guiding a radiation bundle
10/14/2010US20100261118 Intensity Selective Exposure Method And Apparatus
10/14/2010US20100261106 Measurement apparatus, exposure apparatus, and device fabrication method
10/14/2010US20100261105 Method of Exposing Substrate, Apparatus for Performing the Same, and Method of Manufacturing Display Substrate Using the Same
10/14/2010US20100259745 Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
10/14/2010US20100259744 Spectral filter, lithographic apparatus including such a spectral filter, device manufacturing method, and device manufactured thereby
10/14/2010US20100259743 Optical System for Increasing Illumination Efficiency of a Patterning Device
10/14/2010US20100259742 Oblique mirror-type normal-incidence collector system for light sources, particularly euv plasma discharge sources
10/14/2010US20100259741 Exposure apparatus, exposure method, and device manufacturing method
10/14/2010US20100259740 Exposure method, exposure apparatus, and device manufacturing method
10/14/2010US20100259739 Exposure device and image forming device
10/14/2010US20100259738 Lithographic systems and methods with extended depth of focus
10/14/2010US20100259737 Exposure apparatus preventing gas from moving from exposure region to measurement region
10/14/2010US20100259736 Plotting state adjusting method and device
10/14/2010US20100259735 Fluid handling device, an immersion lithographic apparatus and a device manufacturing method
10/14/2010US20100259734 Cooling Device, Cooling Arrangement and Lithographic Apparatus Comprising a Cooling Arrangement
10/14/2010US20100259733 Apparatus comprising a rotating contaminant trap
10/14/2010US20100258758 Hdd pattern apparatus using laser, e-beam, or focused ion beam
10/14/2010DE102010002047A1 Bildabtastvorrichtung und Verfahren zum Bestimmen der Größe eines Originaldokuments An image sensing apparatus and method for determining the size of an original document
10/13/2010CN1726429B Chucking system and method for modulating shapes of substrates
10/13/2010CN101387822B Stitching structure of stitching machine and producing process thereof
10/13/2010CN101093366B Conveyer
10/12/2010US7813022 Light irradiation apparatus, light irradiation method, crystallization apparatus, crystallization method, device, and light modulation element
10/12/2010US7812975 Prescanning in image printing/reading apparatus
10/12/2010US7812930 Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume
10/12/2010US7812928 Exposure apparatus
10/12/2010US7812927 Scanning exposure technique
10/12/2010US7812926 Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice
10/12/2010US7812925 Exposure apparatus, and device manufacturing method
10/12/2010US7812924 Lithographic apparatus and device manufacturing method
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