Patents for G03B 27 - Photographic printing apparatus (25,157)
09/2009
09/16/2009EP2100192A2 Devices and methods for pattern generation by ink lithography
09/16/2009CN201311541Y Film scanner with movable film holder in two directions and positioning device thereof
09/16/2009CN100541324C Photograph image-processing method and device thereof
09/15/2009US7590284 Pupil color estimating device
09/15/2009US7589870 Dual-mode scanner capable of performing transmissive and reflective scanning with single side lamp
09/15/2009US7589863 Method of determining image correction and image processing apparatus using the method
09/15/2009US7589823 Stage device, exposure apparatus, and method of manufacturing device
09/15/2009US7589822 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
09/15/2009US7589821 Exposure apparatus and device manufacturing method
09/15/2009US7589820 Exposure apparatus and method for producing device
09/15/2009US7589819 Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
09/15/2009US7589818 Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
09/15/2009US7589242 Use of highly purified hydrocarbons in vacuum ultraviolet applications
09/15/2009US7588869 Divided exposure method for making a liquid crystal display
09/15/2009CA2296439C A camera with internal printing system
09/10/2009US20090226849 Exposure apparatus and device manufacturing method
09/10/2009US20090226846 Exposure Apparatus, Exposure Method, and Device Manufacturing Method
09/10/2009US20090226677 Lithographic apparatus and method
09/10/2009US20090225331 Method of Providing Alignment Marks, Device Manufacturing Method and Lithographic Apparatus
09/10/2009US20090225298 Optical element, projection optical system, exposure apparatus, and device fabrication method
09/10/2009US20090225297 Projection exposure apparatus and optical system
09/10/2009US20090225296 Projection objective of a microlithographic projection exposure apparatus
09/10/2009US20090225295 Systems and methods for determining width/space limits for a mask layout
09/10/2009US20090225294 Reticle for projection exposure apparatus and exposure method using the same
09/10/2009US20090225293 Exposure apparatus, exposure method, calculation method, and device fabrication method
09/10/2009US20090225292 Exposure apparatus and device manufacturing method
09/10/2009US20090225291 Exposure apparatus, exposure method, and device manufacturing method
09/10/2009US20090225290 Exposure apparatus and device fabrication method
09/10/2009US20090225289 Lithographic apparatus and methods
09/10/2009US20090225288 Exposure apparatus, exposure method, and device manufacturing method
09/10/2009US20090225287 Reticle pod and method for keeping reticle clean and dry
09/10/2009US20090225286 Exposure apparatus, method for cleaning member thereof , maintenance method for exposure apparatus, maintenance device, and method for producing device
09/10/2009US20090225285 Substrate processing method, computer storage medium and substrate processing system
09/09/2009EP2099066A1 Method for modulating shapes of substrates
09/09/2009EP1969422A4 Projection system with beam homogenizer
09/09/2009EP1761822A4 A dynamic fluid control system for immersion lithography
09/09/2009EP1457036B1 Sheet transport apparatus and image reading apparatus
09/09/2009CN100539627C Optical conduction unit and image reader using the same
09/08/2009US7586632 Method of and system for receiving orders for prints, and computer program for use in the method and system
09/08/2009US7586582 Exposure apparatus
09/08/2009US7586581 Developing method of photoresist and developing device
09/08/2009US7586103 compositions suitable for use as immersion liquids in immersion lithography, and immersion lithography processes and apparatus for using the compositions with uv radiation
09/08/2009US7585600 using computers and/or software for adjustment photomasks during fabrication integrated circuits
09/08/2009US7585067 Modular printer system with pen-shaped structure
09/03/2009US20090220892 Method of manufacturing semiconductor device, and resist coating and developing system
09/03/2009US20090220872 Detecting apparatus, exposure apparatus, and device manufacturing method
09/03/2009US20090220871 Device Manufacturing Method, Lithographic System, Lithographic Apparatus and Design for Manufacturing System
09/03/2009US20090220870 Printing on the substrate a composite mask pattern based on features of dark-field mask and clear-field mask;developing printed patterns, obtaining measurements and determining the flare effect including line shortening; photolithography; semiconductors; transistors
09/03/2009US20090219505 Projector
09/03/2009US20090219504 Substrate conveyor apparatus, substrate conveyance method and exposure apparatus
09/03/2009US20090219503 Precise positioning system for dual stage switching exposure
09/03/2009US20090219502 Exposure apparatus and method of manufacturing device
09/03/2009US20090219501 Optical unit using optical attenuator and printing apparatus provided therewith
09/03/2009US20090219500 Lithographic Apparatus and Device Manufacturing Method with Radiation Beam Inspection
09/03/2009US20090219497 Optical device with stiff housing
09/03/2009US20090219496 Methods of Double Patterning, Photo Sensitive Layer Stack for Double Patterning and System for Double Patterning
09/03/2009US20090219495 Duplex scanning apparatus
09/03/2009US20090219494 Evaluation method, evaluation apparatus, and exposure apparatus
09/03/2009US20090218743 Substrate holding apparatus, exposure apparatus, exposing method, device fabricating method, plate member, and wall
09/03/2009US20090218653 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
09/02/2009EP1646912B1 High resolution, dynamic positioning mechanism
09/02/2009EP1405120A4 Compact imaging head and high speed multi-head laser imaging assembly and method
09/02/2009CN100535743C Image forming device
09/01/2009US7583864 Image reader
09/01/2009US7583362 Stray light feedback for dose control in semiconductor lithography systems
09/01/2009US7583361 System for controlling a dual mover assembly for an exposure apparatus
09/01/2009US7583360 Method for photolithography using multiple illuminations and a single fine feature mask
09/01/2009US7583359 Reduction of fit error due to non-uniform sample distribution
09/01/2009US7583358 Systems and methods for retrieving residual liquid during immersion lens photolithography
09/01/2009US7583357 Lithographic apparatus and device manufacturing method
09/01/2009US7583356 Exposure apparatus and device manufacturing method
09/01/2009US7582414 exposing thin film to a radiation source in a liquid immersion lithography, rotating the substrate and remove fluids; baking; development; transferring pattern
09/01/2009US7581831 Printer module incorporating a quartet of co-operating rollers
09/01/2009US7581826 Ink reservoir
08/2009
08/27/2009US20090214986 Lithographic apparatus and device manufacturing method
08/27/2009US20090214962 Exposure apparatus
08/27/2009US20090213357 Exposure apparatus and device manufacturing method
08/27/2009US20090213356 Illumination system for a microlithography projection exposure apparatus
08/27/2009US20090213355 Illumination optical system, exposure apparatus using the same and device manufacturing method
08/27/2009US20090213354 Method and apparatus for projection printing
08/27/2009US20090213353 Lithographic Apparatus and Device Manufacturing Method
08/27/2009US20090213352 Method for improving the imaging properties of an optical system, and such an optical system
08/27/2009US20090213351 Lithographic Method to Apply a Pattern to a Substrate and Lithographic Apparatus
08/27/2009US20090213350 Coherence-reduction devices and methods for pulsed lasers
08/27/2009US20090213349 System and method for an adjusting optical proximity effect for an exposure apparatus
08/27/2009US20090213348 Exposure apparatus
08/27/2009US20090213347 Article Loading/Unloading Method and Article Loading/Unloading Device, Exposure Method and Exposure Apparatus, and Method of Manufacturing Device
08/27/2009US20090213346 Immersion lithography using hafnium-based nanoparticles
08/27/2009US20090213345 Microlithography exposure apparatus using polarized light and microlithography projection system having concave primary and secondary mirrors
08/27/2009US20090213344 Lithographic Apparatus with Temperature Sensor and Device Manufacturing Method
08/27/2009US20090213343 Re-flow and buffer system for immersion lithography
08/27/2009US20090213342 Projection exposure apparatus for microlithography
08/26/2009CN100533267C Original manuscript pressing plate opening and closing device
08/26/2009CN100533266C Image forming device
08/25/2009US7580116 Exposure apparatus and device fabrication method
08/25/2009US7580115 Exposure apparatus and method, and device manufacturing method
08/25/2009US7580114 Exposure apparatus and method for manufacturing device
08/25/2009US7580113 Method of reducing a wave front aberration, and computer program product
08/25/2009US7580112 Containment system for immersion fluid in an immersion lithography apparatus
08/25/2009US7580111 Liquid for immersion exposure and immersion exposure method
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