| Patents for G03B 27 - Photographic printing apparatus (25,157) |
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| 08/10/2010 | US7773197 Illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 08/10/2010 | US7773196 Projection-optical systems and exposure apparatus comprising same |
| 08/10/2010 | US7773195 System and method to increase surface tension and contact angle in immersion lithography |
| 08/10/2010 | US7773124 Modular, multimedia pen having a camera module and a printer module |
| 08/10/2010 | US7771898 Extreme Ultraviolet; stress compensation layer between substrate and reflection layer; for fine semiconductor device photolithography; precision; molybdenum and silicon films; silicon wafers |
| 08/05/2010 | US20100196832 Exposure apparatus, exposing method, liquid immersion member and device fabricating method |
| 08/05/2010 | US20100195175 Security Holograms |
| 08/05/2010 | US20100195085 Positioning apparatus, exposure apparatus, and device manufacturing method |
| 08/05/2010 | US20100195084 Substrate holding platen with high speed vacuum |
| 08/05/2010 | US20100195083 Automatic substrate transport system |
| 08/05/2010 | US20100195082 Device, System, And Method For Multidirectional Ultraviolet Lithography |
| 08/05/2010 | US20100195081 Reticle Support that Reduces Reticle Slippage |
| 08/05/2010 | US20100195080 Clamping Device And Object Loading Method |
| 08/05/2010 | US20100195079 Exposure device and image forming apparatus |
| 08/05/2010 | US20100195078 Projection exposure apparatus and projection exposure method |
| 08/05/2010 | US20100195077 Illumination system for a microlithography projection exposure installation |
| 08/05/2010 | US20100195076 Optical membrane element |
| 08/05/2010 | US20100195075 Projection objective having mirror elements with reflective coatings |
| 08/05/2010 | US20100195074 Thermal regulation of vibration-sensitive objects |
| 08/05/2010 | US20100195073 Scanned writing of an exposure pattern on a substrate |
| 08/05/2010 | US20100195072 Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method |
| 08/05/2010 | US20100195071 Image Sensor, Method for Image Detection and Computer Program Product |
| 08/05/2010 | US20100195070 Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate |
| 08/05/2010 | US20100195069 Exposure method and exposure system |
| 08/05/2010 | US20100195068 Cleaning member, cleaning method, and device manufacturing method |
| 08/05/2010 | US20100195067 Exposure apparatus, exposure method, and method for producing device |
| 08/05/2010 | US20100195066 System and method for treating substrate |
| 08/05/2010 | US20100195065 Exposure apparatuses |
| 08/04/2010 | CN201540448U Photographic paper flat folding and turning device of digital chromatic printer |
| 08/04/2010 | CN101794067A Platen, high speed vacuum platen system and high speed vacuum forming method |
| 08/04/2010 | CN101587288B Laser direct modulation apparatus used for digital developing equipment |
| 08/03/2010 | US7768648 Method for aberration evaluation in a projection system |
| 08/03/2010 | US7768628 Contact lithography apparatus and method |
| 08/03/2010 | US7768627 Illumination of a patterning device based on interference for use in a maskless lithography system |
| 08/03/2010 | US7768626 Exposure apparatus |
| 08/03/2010 | US7768625 Photo detector unit and exposure apparatus having the same |
| 08/03/2010 | US7766640 Contact lithography apparatus, system and method |
| 07/29/2010 | WO2010084679A1 Lighting device, image reader, and image forming device |
| 07/29/2010 | US20100190115 Measurement apparatus, exposure apparatus having the same, and device manufacturing method |
| 07/29/2010 | US20100190113 Optical element, exposure apparatus using this, and device manufacturing method |
| 07/29/2010 | US20100188647 Control systems and methods applying iterative feedback tuning for feed-forward and synchronization control of microlithography stages and the like |
| 07/29/2010 | US20100188646 Drawing method and drawing apparatus |
| 07/29/2010 | US20100186942 Reticle error reduction by cooling |
| 07/27/2010 | US7764357 Exposure apparatus and device manufacturing method |
| 07/27/2010 | US7764356 Lithographic apparatus and device manufacturing method |
| 07/27/2010 | US7764355 Substrate stage and heat treatment apparatus |
| 07/27/2010 | US7763949 MEMS device with controlled gas space chemistry |
| 07/27/2010 | US7763395 pre-baked pellicle is purged with an inert gas; purged pellicle is radiated by a radiation at a wavelength; improved mechanical integrity, stability, and durability |
| 07/27/2010 | US7763394 protective means are contrived to keep the interfering particles at a distance from the patterns which is greater than or equal to the two values taken by the depth of focus of the device and the height of pattern/interfering particle; patterned masked used in optical lithography |
| 07/22/2010 | US20100183987 Exposure apparatus |
| 07/22/2010 | US20100183984 Multiplexing of pulsed sources |
| 07/22/2010 | US20100183962 Method for examining a wafer with regard to a contamination limit and euv projection exposure system |
| 07/22/2010 | US20100183956 Computer generated hologram, exposure apparatus and device fabrication method |
| 07/22/2010 | US20100183335 Optical scanning device and image forming apparatus provided with the same |
| 07/22/2010 | US20100182586 Lithography apparatus, and method of manufacturing device using same |
| 07/22/2010 | US20100182585 Control system, lithographic apparatus and a method to control a position quantity of a control location of a movable object |
| 07/22/2010 | US20100182584 Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| 07/22/2010 | US20100182583 Exposure apparatus and device manufacturing method |
| 07/22/2010 | US20100182582 Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool |
| 07/22/2010 | US20100182581 Lens, exposure apparatus, and device manufacturing method |
| 07/22/2010 | US20100182580 Photolithography systems with local exposure correction and associated methods |
| 07/22/2010 | US20100182579 Laser device |
| 07/22/2010 | US20100182578 Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing |
| 07/22/2010 | US20100182577 Projection optical system, exposure apparatus and device manufacturing method |
| 07/22/2010 | US20100182576 Lithographic apparatus and device manufacturing method |
| 07/20/2010 | US7760360 Monitoring a photolithographic process using a scatterometry target |
| 07/20/2010 | US7760331 Decoupled, multiple stage positioning system |
| 07/20/2010 | US7760330 Illumination optical system and exposure apparatus |
| 07/20/2010 | US7760329 Optimized optical lithography illumination source for use during the manufacture of a semiconductor device |
| 07/20/2010 | US7760328 Exposure apparatus and exposing method and method of manufacturing a printed wiring board |
| 07/20/2010 | US7760327 Reflecting optical element with eccentric optical passageway |
| 07/20/2010 | US7760326 Exposure apparatus and aberration correction method |
| 07/20/2010 | US7760325 Exposure system and method for manufacturing device |
| 07/20/2010 | US7760324 Lithographic apparatus and device manufacturing method |
| 07/20/2010 | US7760323 Exposure apparatus and method of manufacturing device |
| 07/20/2010 | CA2371535C Method and apparatus for dithering |
| 07/15/2010 | WO2010079725A1 Image reader device and method for driving same |
| 07/15/2010 | US20100178612 Lithographic apparatus and device manufacturing method |
| 07/15/2010 | US20100177295 Exposure method and exposure apparatus, stage unit, and device manufacturing method having two substrate stages with one stage temporarily positioned below other stage |
| 07/15/2010 | US20100177294 Method for in-situ aberration measurement of optical imaging system in lithographic tools |
| 07/15/2010 | US20100177293 Polarization-modulating optical element |
| 07/15/2010 | US20100177292 Lithographic apparatus and device manufacturing method |
| 07/15/2010 | US20100177291 Film printing system and method utilizing a digital light processing imager or organic light emitting diode |
| 07/15/2010 | US20100177290 Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method |
| 07/15/2010 | US20100177289 Immersion Fluid for Immersion Lithography, and Method of Performing Immersion Lithography |
| 07/14/2010 | EP2207061A2 A system to vary dimensions of a template |
| 07/13/2010 | US7755839 Microlithography projection objective with crystal lens |
| 07/13/2010 | US7755742 Lithographic apparatus with mounted sensor |
| 07/13/2010 | US7755741 Substrate exposure apparatus and illumination apparatus |
| 07/13/2010 | US7755740 Exposure apparatus |
| 07/08/2010 | WO2010077206A1 Apparatus for archiving digital content and method therefor |
| 07/08/2010 | US20100173502 LOW k1 HOLE PRINTING USING TWO INTERSECTING FEATURES |
| 07/08/2010 | US20100173250 Method for a multiple exposure, microlithography projection exposure installation and a projection system |
| 07/08/2010 | US20100173238 Gas contamination sensor, lithographic apparatus, method of determining a level of contaminant gas and device manufacturing method |
| 07/08/2010 | US20100173236 Exposure apparatus, and method of manufacturing device using same |
| 07/08/2010 | US20100171942 Method for wafer alignment |
| 07/08/2010 | US20100171941 Stage apparatus and exposure apparatus |
| 07/08/2010 | US20100171940 Projection exposure apparatus, projection exposure method, and method for producing device |
| 07/08/2010 | US20100171939 Lithographic apparatus and device manufacturing method |
| 07/08/2010 | US20100171199 Production method of semiconductor device, semiconductor device, and exposure apparatus |