Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03B - Apparatus or arrangements for taking photographs or for projecting or viewing them; Apparatus or arrangements employing analogous techniques using waves other than optical waves; Accessories therefor › G03B 27 - Photographic printing apparatus
Patents for G03B 27 - Photographic printing apparatus (25,157)
10/2009
10/15/2009US20090257033 Exposure method, exposure apparatus, and method for producing device
10/15/2009US20090257032 Optical element and method
10/14/2009EP2108998A1 Delivery system
10/14/2009CN101556424A Projecting apparatus
10/14/2009CN100549814C Method for defining optimum gain response in space frequence response correction of projection system
10/13/2009US7603288 Photo laboratory management system
10/13/2009US7602476 Substrate-holding technique
10/13/2009US7602475 System and method for providing modified illumination intensity
10/13/2009US7602474 Exposure apparatus
10/13/2009US7602473 Exposure apparatus and device manufacturing method using the same
10/13/2009US7602472 Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device
10/13/2009US7602471 Apparatus and method for particle monitoring in immersion lithography
10/13/2009US7602470 Lithographic apparatus and device manufacturing method
10/13/2009US7601471 the transferred patterns of respective evaluation patterns transferred using the test photo mask are calculated on the basis of the relationship with the opening ratio of the flare generation patterns; enables performing accurate pattern-dimension corrections against local flares
10/08/2009US20090253083 Exposure Apparatus, Exposure Method, and Method for Producing Device
10/08/2009US20090253078 Double exposure lithography using low temperature oxide and uv cure process
10/08/2009US20090251679 Exposure method and exposure apparatus, stage unit, and device manufacturing method having two substrate stages with one stage temporarily positioned below the other stage
10/08/2009US20090251678 Stage unit, exposure apparatus, and device manufacturing method
10/08/2009US20090251677 Illuminating optical unit and projection exposure apparatus for microlithography
10/08/2009US20090251676 Exposure apparatus and exposure method
10/08/2009US20090251675 Exposure device
10/08/2009US20090251674 Lithographic apparatus and device manufacturing method
10/08/2009US20090251673 Transmitting optical element with low foreign-element contamination
10/08/2009US20090251672 Exposure apparatus, device production method, cleaning apparatus, cleaning method, and exposure method
10/07/2009EP1150488B1 Linear light source and image reading device provided with this
10/07/2009CN201322843Y Cutter device for three-dimensional enlarging-printing
10/07/2009CN201322842Y Stereo digital piecing-together imaging lens mobile device
10/07/2009CN101553750A Seamless exposure with projection system comprises array of micromirrors with predefined reflectivity variations
10/06/2009US7599043 Position measurement system and lithographic apparatus
10/06/2009US7599042 Coating and developing apparatus, substrate processing method and computer-readable recording medium
10/06/2009US7598507 Adjustable lithography blocking device and method
10/06/2009US7597492 Coating and developing system, coating and developing method and storage medium
10/01/2009US20090248539 Photograph printing system
10/01/2009US20090248195 Photograph printing system
10/01/2009US20090248192 Substrate processing system and substrate conveyance method
10/01/2009US20090246703 Lithographic Apparatus and Device Manufacturing Method
10/01/2009US20090244538 Lithographic Apparatus and Device Manufacturing Method Using Overlay Measurement
10/01/2009US20090244531 Optical apparatus, photomask inspecting apparatus, and exposure apparatus
10/01/2009US20090244513 Position detection apparatus, position detection method, exposure apparatus, and device fabrication method
10/01/2009US20090244512 Lithography process window analyzing method and analyzing program
10/01/2009US20090244511 Electroactive polymers for lithography
10/01/2009US20090244510 Process and apparatus for the production of collimated uv rays for photolithographic transfer
10/01/2009US20090244509 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
10/01/2009US20090244508 Method and device for connecting an optical element to a frame
10/01/2009US20090244507 Optical member, light routing unit, and exposure apparatus
10/01/2009US20090244506 SLM Calibration
10/01/2009US20090244505 Positioning unit of optical element, optical system, exposure apparatus, adjustment method of optical system
10/01/2009US20090244504 Projection exposure method
10/01/2009US20090244503 Exposure apparatus, device manufacturing method, maintenance method, and exposure method
10/01/2009US20090244502 Methods of Compensating Lens Heating, Lithographic Projection System and Photo Mask
10/01/2009US20090244501 Apparatus for real-time contamination, environmental, or physical monitoring of a photomask
09/2009
09/30/2009EP2105877A2 Photograph printing system
09/30/2009EP2105876A2 Photograph printing system
09/30/2009CN101547279A Print order system
09/30/2009CN101546411A Photograph printing system
09/30/2009CN101546410A Photograph printing system
09/30/2009CN100545744C Exposure station for film webs
09/29/2009US7595918 Transparent original reading apparatus and illuminating apparatus for reading apparatus
09/29/2009US7595863 Lithographic apparatus, excimer laser and device manufacturing method
09/29/2009US7595862 Exposure apparatus and method of manufacturing device
09/29/2009US7595861 Exposure apparatus and method of manufacturing device
09/24/2009US20090240466 Method and system for evaluating an object that has a repetitive pattern
09/24/2009US20090239178 Optical attenuator plate, exposure apparatus, exposure method, and device manufacturing method
09/24/2009US20090237638 Exposure apparatus and device manufacturing method
09/24/2009US20090237637 Method for coarse wafer alignment in a lithographic apparatus
09/24/2009US20090237636 Projection exposure method and projection exposure system therefor
09/24/2009US20090237635 Lithographic apparatus and method
09/24/2009US20090237634 Encoder-type measurement system, lithographic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system
09/24/2009US20090237633 Exposure apparatus and device manufacturing method
09/24/2009US20090237632 Immersion lithographic apparatus and device manufacturing method
09/24/2009US20090237631 Apparatus and methods for recovering fluid in immersion lithography
09/23/2009EP2102707A1 Film printing system and method utilizing a digital light processing imager or organic light emitting diode
09/23/2009CN201315006Y Digital stereo image magnified-print lens moving device
09/23/2009CN201315005Y Digital stereo enlarging print lens two-way mobile device
09/23/2009CN201315004Y Digital stereo enlarging print image display mobile device
09/23/2009CN101539718A Color image printer and gradation correcting method therefor
09/23/2009CN101539717A Test print, color image printer using the test print and method for adjusting the color image printer using the test print
09/22/2009US7593128 Printer control apparatus and method of controlling the same, printer and method of controlling the same, reader and method of controlling the same, and image forming system
09/22/2009US7593096 Lithographic apparatus and device manufacturing method
09/22/2009US7593095 System for reducing the coherence of laser radiation
09/22/2009US7593093 Lithographic apparatus and device manufacturing method
09/22/2009US7593092 Lithographic apparatus and device manufacturing method
09/22/2009US7593091 Imaging or exposure device, in particular for making an electronic microcircuit
09/22/2009US7591601 Coater/developer, coating/developing method, and storage medium
09/17/2009WO2009114058A1 Plate pallet alignment system
09/17/2009US20090233234 Holding apparatus, position detection apparatus and exposure apparatus, moving method, position detection method, exposure method, adjustment method of detection system and device manufacturing method
09/17/2009US20090233233 Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same
09/17/2009US20090233189 Device and method for obtaining exposure correction information, and manufacturing method of semiconductor device
09/17/2009US20090231569 Exposure method, exposure apparatus, and method of manufacturing device
09/17/2009US20090231568 Method of measuring wavefront error, method of correcting wavefront error, and method of fabricating semiconductor device
09/17/2009US20090231567 Lithographic apparatus having a chuck with a visco-elastic damping layer
09/17/2009US20090231566 Lithographic Apparatus, Stage System and Stage Control Method
09/17/2009US20090231565 Optical system and method of use
09/17/2009US20090231564 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
09/17/2009US20090231563 Method and Lithographic Apparatus for Measuring and Acquiring Height Data Relating to a Substrate Surface
09/17/2009US20090231562 Effective light source shape database generation method, optical image calculation method, recording medium, exposure method, and device fabrication method
09/17/2009US20090231561 Measuring method, stage apparatus, and exposure apparatus
09/17/2009US20090231560 Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
09/17/2009US20090231559 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
09/17/2009US20090231557 Light source device
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