Patents for C23F 1 - Etching metallic material by chemical means (16,062)
10/1998
10/28/1998EP0874251A2 Process for fabricating a device having a hole at an extremity
10/20/1998US5824631 Organonitro compound for oxidation of soft metal, a carboxylic acid for salt formation and a solvent for removal of compound
10/20/1998US5824454 Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material
10/15/1998WO1998045506A1 Method for manufacturing a stent
10/15/1998WO1998045504A1 Article, method, and apparatus for electrochemical fabrication
10/15/1998CA2572786A1 Method for electrochemical fabrication including etching to remove flash
10/15/1998CA2572503A1 Method for electrochemical fabrication including enhanced data manipulation
10/15/1998CA2572499A1 Method for electrochemical fabrication including use of multiple structural and/or sacrificial materials
10/13/1998US5820688 Method for the treatment of semiconductor material
10/07/1998EP0868543A1 Improved polishing slurries and methods for their use
10/07/1998EP0640120B1 Etching compositions
09/1998
09/24/1998WO1998041672A1 Method and device for operating milling baths
09/23/1998CN1194020A Low lead release plumbing components made of copper basedalloys containing lead, and method for obtaining the same
09/22/1998US5810939 Method at treatment of metals
09/17/1998DE19710563A1 Verfahren zum Betreiben von Fräsbädern A method of operating Fräsbädern
09/16/1998EP0864533A2 Method of purifying alkaline solution and method of etching semiconductor wafers
09/16/1998CN1039855C Process for producing molded bodies from precursors of oxidic high temp. superconductors
09/15/1998US5807493 Microetching method for copper or copper alloy
09/09/1998CN1192789A Treatment of cemented carbide substrate to receive CVD diamond film
09/09/1998CN1192486A Method for treating copper etchant
09/08/1998US5805971 Method of producing three-dimensional forms
09/08/1998US5802714 Forming a protective film of copper chloride on atleast one portion of exposed copper film, soft-etching with a solution selected from sodium/potassium/lithium/rhodium or cesium chloride
09/02/1998EP0861919A2 Method for removal of surface layers of metallic coatings (stripping)
09/02/1998CN1192265A Passive gas substrate thermal conditioning apparatus and method
09/01/1998US5800859 Surface treatment with hydrogen peroxide, inorganic acid, corrosion inhibitor, surfactant
09/01/1998US5800726 Selective chemical etching in microelectronics fabrication
09/01/1998US5800723 Process for fabricating flex circuits and product thereby
08/1998
08/26/1998EP0860867A1 Surface treatment for micromachining
08/26/1998EP0860865A1 Method for cleaning a semiconductor surface
08/26/1998EP0860864A2 Method of cleaning semiconductor wafers after lapping
08/26/1998EP0859873A1 Process for removing tin
08/12/1998CN1190062A Method for forming etched pattern on stainless steel pipe
08/11/1998US5792590 Pattern formation method
08/11/1998US5792520 Sequentially layering a copper film and resin film on skin material; laser irradiation; removal; masking; etching; patterning
08/11/1998US5792180 High bend strength surgical needles and surgical incision members and methods of producing same by double sided photoetching
08/06/1998WO1998033951A1 Composition and method for priming substrate materials
08/06/1998DE19703348A1 Crystallising out aluminium from alkaline pickling solutions
08/06/1998CA2278580A1 Composition and method for priming substrate materials
08/05/1998EP0680351B1 Flexible tubular device for use in medical applications
08/04/1998US5788871 Dipping material to be etched into bath; measuring weight variations
08/04/1998US5788830 Applying carbon or palladium compound; preferential microetching using aqueous solution of sulfuric acid, hydrogen peroxide, phosphonic group-containing amine
07/1998
07/30/1998WO1998032893A2 Wafer support system
07/30/1998WO1998032546A1 Method for passivation of a metallization layer
07/29/1998EP0855454A1 Microetching composition for copper or copper alloy
07/29/1998CN1188817A Control of SiO2 etch rate using dilute chemical etchants in presence of megasonic field
07/28/1998US5785877 Additive gas with oxygen or water vapor prevents reaction with container walls
07/28/1998US5785840 Process for producing a surface structure for a cylinder of a printing machine
07/23/1998WO1998031845A1 Vapor deposition components and corresponding methods
07/23/1998WO1998031768A1 A composition for cleaning and etching electronic display and substrate
07/23/1998WO1998031475A1 Fluid delivery apparatus and method
07/23/1998CA2275330A1 Fluid delivery apparatus and method
07/21/1998US5783099 Etch-ending point measuring method for vapor etch process
07/21/1998US5782986 Process for metals removal using beta-diketone or beta-ketoimine ligand forming compounds
07/16/1998WO1998030734A1 Process for regenerating corrosive liquids, specially corrosive liquid for printed circuit boards, and device therefor
07/16/1998WO1998030733A1 Process for treating brass components to reduce leachable lead
07/16/1998WO1998030656A1 Method of removing reactive metal from a metal-coated reactor system
07/16/1998WO1998030652A1 Acid deoxidizing/etching composition and process suitable for vertical aluminum surfaces
07/16/1998WO1998030510A1 Process for treating brass components to reduce leachable lead
07/16/1998DE19700470A1 Verfahren zum Regenerieren von Ätzflüssigkeiten, insbesondere Leiterplattenätzflüssigkeiten, und Vorrichtung hierfür A process for the regeneration of etchants, especially Leiterplattenätzflüssigkeiten, and apparatus therefor
07/16/1998CA2248568A1 Acid deoxidizing/etching composition and process suitable for vertical aluminum surfaces
07/15/1998EP0853141A2 Method for surface treatment, an ornament and a device
07/15/1998EP0852615A1 Chemical mechanical polishing composition and process
07/14/1998US5778968 For stabilizing the temperature of semiconductor wafers
07/09/1998WO1998029515A1 Composition for oxide cmp
07/08/1998CN1187021A Method for removing membrance coated on bulb for use of cathode ray tube
07/08/1998CN1186874A Method for manufacturing engraved rolling rool and apparatus for manufacturing the same
07/01/1998EP0851477A2 Method of controlling the accuracy of multiple-step etching
07/01/1998EP0515577B1 Making and testing an integrated circuit using high density probe points
07/01/1998CN1038950C Method for treating etchant
06/1998
06/30/1998US5773087 Coated article and method for producing same
06/30/1998US5772903 Tapered capillary optics
06/25/1998WO1998027579A1 Etchants
06/25/1998WO1998027020A1 Method of post-etching a mechanically treated substrate
06/24/1998CN1185761A Method and apparatus for circuit board treatment
06/23/1998US5770096 Forming a plating film on a substrate, a photosensitive film covering the plating film, patternig the resists film by exposure of the film to light using a pattern of photo mask, developing, patterning plating film, etching the substrate
06/23/1998US5770095 Preferentially abrading and etching protrusions of excess metal at high rate while preventing loss of desired metal filled into pattern recesses by chelation with chemical agent in polish mixture
06/17/1998CN1185016A Method for preparing strip like transparent electrode
06/16/1998US5766685 Treatment method and apparatus for printed circuit boards and the like
06/16/1998US5766438 Periodically inverting polarity of electrodes at short intervals
06/16/1998US5766238 Expandable stents and method for making same
06/09/1998US5763123 Method for producing thin-film substrate
06/09/1998US5762811 One-sided photoetching process for needle fabrication
06/09/1998US5762082 Precision fluid head transport
06/03/1998EP0845680A1 Making and testing an integrated circuit using high density probe points
06/03/1998CN1038625C Solution preventing from adhesion of impurity in liquid and method for corrosion by use of same
06/02/1998US5759917 Composition for oxide CMP
06/02/1998US5759437 Etching of Ti-W for C4 rework
06/02/1998US5759427 Method and apparatus for polishing metal surfaces
06/02/1998US5759416 Ablation using lasers
05/1998
05/27/1998EP0844650A2 Method of etching SiO2 and process of cleaning silicon wafers using dilute chemical etchants and a megasonic field
05/27/1998EP0844646A2 Holder for disc-like substrates
05/27/1998EP0843747A1 Treatment of cemented carbide substrate to receive cvd diamond film
05/26/1998US5756403 Immersing semiconductor portion to be etched in mixture of solvent, etchant, and complexing agents
05/26/1998US5755950 Process for removing plating materials from copper-based substrates
05/20/1998EP0842332A1 Low lead release plumbing components made of copper based alloys containing lead, and a method for obtaining the same
05/14/1998DE19646945A1 Regenerating aqueous etching baths containing metal ions
05/14/1998DE19646841A1 Directly determining metal removal rate in etching and pickling solutions
05/12/1998US5750956 Methods of manufacturing perforated foils
05/06/1998EP0633822B1 Methods of manufacturing perforated foils
04/1998
04/22/1998EP0805722A4 Roughening of metal surfaces