| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 12/25/2013 | CN103476964A Evaporation system with measurement unit |
| 12/25/2013 | CN103476963A Press forming die, and method of manufacturing press forming die protection film |
| 12/25/2013 | CN103476962A Deposition particle emitting device, deposition particle emission method, and deposition device |
| 12/25/2013 | CN103476581A Gas barrier laminate film, and method for producing same |
| 12/25/2013 | CN103476580A Gas barrier laminate film, and method for producing same |
| 12/25/2013 | CN103474511A Preparation method of copper indium gallium selenide light absorption layer and copper indium gallium selenide film solar cell |
| 12/25/2013 | CN103474447A Thin film deposition apparatus, method of manufacturing organic light-emitting display device, and display device |
| 12/25/2013 | CN103474392A Method for preparing ruthenium thin film |
| 12/25/2013 | CN103474319A Ion implanter reducing grape-shaped defects of wafers |
| 12/25/2013 | CN103469206A Preparation method of front suede electrode based on porous alumina template |
| 12/25/2013 | CN103469203A Base material for coating two-dimensional atomic crystals, and continuous production line and method thereof |
| 12/25/2013 | CN103469202A Method for manufacturing gas-sensitive composite nanometer film |
| 12/25/2013 | CN103469172A Control method of coating thickness of quartz crystal and coating device of quartz crystal |
| 12/25/2013 | CN103469171A Anti-coating observation window of vacuum coating chamber |
| 12/25/2013 | CN103469170A Sputtering target used for thin film solar cell |
| 12/25/2013 | CN103469169A Preparation method of Cr-B-C nanocomposite thin film |
| 12/25/2013 | CN103469168A Method for preparing wettability-controllable, high-smoothness and high-hardness TiN (titanium nitride) film |
| 12/25/2013 | CN103469167A Sputtering target, transparent conductive film, transparent electrode and electrode substrate and manufacturing method thereof |
| 12/25/2013 | CN103469166A Integrated cathode arc target |
| 12/25/2013 | CN103469165A Rectangular plane cathode electric arc target based on distributed electromagnets |
| 12/25/2013 | CN103469164A Device and method for realizing plasma activation electron beam physical vapor deposition |
| 12/25/2013 | CN103469163A Vacuum coating machine |
| 12/25/2013 | CN103469162A Novel latent fingerprint displaying method |
| 12/25/2013 | CN103469161A 蒸发源 Evaporation source |
| 12/25/2013 | CN103469160A Special production equipment for far infrared energy heating tube |
| 12/25/2013 | CN103469159A Special production equipment for far infrared energy heating panel |
| 12/25/2013 | CN103469158A Horizontal multi-arc coating chamber |
| 12/25/2013 | CN103469157A Amorphous-based B-C-Mg ternary film and preparation method thereof |
| 12/25/2013 | CN103469156A Method for carrying out stressing engineering on thicker ferroelectric film for material modification |
| 12/25/2013 | CN103469155A Method for preparing high-purity high-density WO3/S core-shell structure nano-particles |
| 12/25/2013 | CN103469154A TiAlN composite coating and preparation method of cutter provided with same |
| 12/25/2013 | CN103469153A Preparation method of multicomponent combined membrane |
| 12/25/2013 | CN103469152A Mask plate cleaning system |
| 12/25/2013 | CN103464351A Film-coating dyeing process |
| 12/25/2013 | CN102816995B Preparation method applied to doped sensitive film of gas sensor by in-situ reduction method |
| 12/25/2013 | CN102677003B Low-temperature deposition process of multi-arc ion plated nanometer multielement composite film |
| 12/25/2013 | CN102653856B Method for improving first wall fuel recycling of full-superconducting tokomak by using lithium metal coating layer |
| 12/25/2013 | CN102520561B Preparation method of large thickness period polarization ferroelectric crystal material |
| 12/25/2013 | CN102423270B Method for sputtering protective film on surface of denture stent |
| 12/25/2013 | CN102409298B Continuous rapid laser coating method of superconducting layer in second-generation high-temperature superconducting strip |
| 12/25/2013 | CN102362002B Cu-Ga alloy sputtering target and manufacturing method thereof |
| 12/25/2013 | CN102337568B Vacuum metalizing method for metal parts embedded with decorations |
| 12/25/2013 | CN102225640B Film for raising abrasion resistance of compressor slide plate and preparation method thereof |
| 12/25/2013 | CN101786351B Coated polycarbonate |
| 12/24/2013 | US8613983 Method of laser surface treating pre-prepared zirconia surfaces |
| 12/24/2013 | US8613824 Multi-layer, substantially polyvinyl chloride- and polyolefin-free composite film |
| 12/24/2013 | DE102012222927A1 Gerät zur Abscheidung organischer Schichten, Verfahren zum Fertigen von Geräten mit organischer lichtemittierender Anzeige unter Verwendung desselben und unter Verwendung des Verfahrens gefertigte Geräte mit organischer lichtemittierender Anzeige Apparatus for deposition of organic layers, methods of fabricating devices with organic light-emitting display using the same and fabricated using the method of devices with organic light-emitting display |
| 12/24/2013 | DE102012110043A1 Depositing a layer by reactive sputtering, comprises controlling operating point of the reactive magnetron discharge which is operated by the operating frequency, and controlling the frequency of the magnetron |
| 12/24/2013 | DE102012110041A1 Verfahren zur Einstellung des Arbeitspunktes beim Hochenergiesputtern A method for setting the operating point at high energy sputtering |
| 12/24/2013 | DE102012110040A1 Depositing layer by reactive high-energy sputtering process by spraying part of layer by sputtering process on substrate, and depositing layer on substrate, where sputtering process is performed by magnetron operated by pulse pattern |
| 12/24/2013 | DE102011083139B4 Substratbehandlungsverfahren und Substratbehandlungsanlage The substrate processing method and substrate processing system |
| 12/24/2013 | DE102007053194B4 Verfahren zur Schichtabscheidung Method for layer deposition |
| 12/24/2013 | CA2576935C Method of making vapour deposited oxygen-scavenging particles |
| 12/19/2013 | WO2013187486A1 Thin-film transistor, method for producing a thin-film transistor, and semiconductor device |
| 12/19/2013 | WO2013186879A1 Device for measuring film thickness and device for forming film |
| 12/19/2013 | WO2013186260A1 Method for producing a microsystem having a thin film made of lead zirconate titanate |
| 12/19/2013 | WO2013186058A1 Transport and handing-over arrangement for disc-shaped substrates, vacuum treatment installation and method for manufacture treated substrates |
| 12/19/2013 | WO2013185506A1 Method for preparing copper indium gallium diselenide thin-film solar cell |
| 12/19/2013 | US20130337602 Sputtering Target Including a Feature to Reduce Chalcogen Build Up and Arcing on a Backing Tube |
| 12/19/2013 | US20130337193 Modular coater separation |
| 12/19/2013 | US20130337159 Methods of rejuvenating sputtering targets |
| 12/19/2013 | US20130336831 Method for manufacturing a molybdenum sputtering target for back electrode of cigs solar cell |
| 12/19/2013 | US20130335822 Method for manufacturing touch-sensitive element on polarizer and polarization device |
| 12/19/2013 | US20130335190 Tunable resistance coatings |
| 12/19/2013 | US20130334581 Device with MOS Device Including a Secondary Metal and PVD Tool with Target for Making Same |
| 12/19/2013 | US20130334469 Al-sb-te phase change material used for phase change memory and fabrication method thereof |
| 12/19/2013 | US20130334039 Oxide sintered body and sputtering target |
| 12/19/2013 | US20130334038 Wafer processing deposition shielding components |
| 12/19/2013 | US20130334033 Method for manufacturing razor blade edge and razor blade for razor |
| 12/19/2013 | US20130334032 Compliant implantable medical devices and methods of making same |
| 12/19/2013 | DE112012001257T5 Vakuumdepositionsvorrichtung Vacuum deposition apparatus |
| 12/19/2013 | DE102012210003A1 Collecting device, used to sputter material during ion beam etching under vacuum, comprises ion beam sources arranged on each side of substrate to be etched, and surface areas, which reflect beam generated by ion source towards substrate |
| 12/19/2013 | DE102012017503A1 Verfahren zur Nanostrukturierung von anorganischen und organischen Materialien durch kontinuierliche Bestrahlung mit einem Teilchenstrahl Process for nanostructuring of inorganic and organic materials by continuous irradiation with a particle beam |
| 12/18/2013 | EP2674514A1 Structure and method for coating a nozzle for a fuel injection valve |
| 12/18/2013 | EP2674511A1 Titanium target for sputtering |
| 12/18/2013 | EP2674510A1 Channel marker and related methods |
| 12/18/2013 | EP2674509A1 Two-layered copper-clad laminate material, and method for producing same |
| 12/18/2013 | EP2674508A1 Two-layered copper-clad laminate material, and method for producing same |
| 12/18/2013 | EP2673798A1 Methodology for forming pnictide compositions suitable for use in microelectronic devices |
| 12/18/2013 | EP2673391A1 Device and method for ion beam sputtering |
| 12/18/2013 | EP2673390A1 Direct liquid vaporization for oleophobic coatings |
| 12/18/2013 | EP2305405B1 Coated member |
| 12/18/2013 | EP2186927B1 Coated article with black color |
| 12/18/2013 | CN203351668U Organic layer deposition equipment and organic light-emitting display device |
| 12/18/2013 | CN203349788U Optical film thickness monitoring system |
| 12/18/2013 | CN203346476U Single cavity coating equipment |
| 12/18/2013 | CN203346469U Partition plate for film plating cavity |
| 12/18/2013 | CN203346468U Novel tip coating device for tip-enhanced Raman measurement |
| 12/18/2013 | CN203346467U Alloy steel textile clippers with composite ceramic plated layer |
| 12/18/2013 | CN203346466U Device for performing quantitative doping on Cu3N film |
| 12/18/2013 | CN103460351A Cu alloy film, and display device and electronic device each equipped with same |
| 12/18/2013 | CN103460340A Methodology for forming pnictide compositions suitable for use in microelectronic devices |
| 12/18/2013 | CN103459671A Laminate, and method for producing laminate |
| 12/18/2013 | CN103459661A Plasma CVD apparatus, plasma CVD method, reactive sputtering apparatus, and reactive sputtering method |
| 12/18/2013 | CN103459658A Nanoparticle deposition systems |
| 12/18/2013 | CN103459657A High purity Ni sputtering target and method for manufacturing same |
| 12/18/2013 | CN103459656A Sputtering target for magnetic recording film |
| 12/18/2013 | CN103459655A Sintered material, and process for producing same |
| 12/18/2013 | CN103459654A Copper-titanium alloy sputtering target, semiconductor wiring line formed by the sputtering target, and semiconductor element and device each equipped with semiconductor wiring line |
| 12/18/2013 | CN103459653A Cathode unit |