C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
12/2013
12/04/2013	CN103429783A Film forming apparatus, film forming method, method for manufacturing organic light emitting element, and organic light emitting element
12/04/2013	CN103429554A Sintered oxide and sputtering target
12/04/2013	CN103426974A Substrate with p-type amorphous silicon and transparent conductive oxide film and preparation method
12/04/2013	CN103422170A Disc-shaped MgF2 crystal filming material and production method thereof
12/04/2013	CN103422067A Sputtering target having increased life and sputtering uniformity
12/04/2013	CN103422066A 溅射方法 Sputtering method
12/04/2013	CN103422065A Magnetron sputtering device and magnetron control method
12/04/2013	CN103422064A Conductive thin film, and preparation method and application thereof
12/04/2013	CN103422063A Method for manufacturing target with flange
12/04/2013	CN103422062A Vacuum sputtering coating equipment with forward and reverse rotation inner glass tube clamp
12/04/2013	CN103422061A Plating process and device suitable for large-size and ultrathin glass
12/04/2013	CN103422060A Film-forming apparatus
12/04/2013	CN103422059A Device simultaneously realizing glass substrate single-surface and double-surface plating
12/04/2013	CN103422058A Boron-doped Si-rich silicon oxide film and preparation method and application thereof
12/04/2013	CN103422057A Conductive thin film, and preparation method and application thereof
12/04/2013	CN103422056A Conductive thin film, and preparation method and application thereof
12/04/2013	CN103422055A Conductive thin film, and preparation method and application thereof
12/04/2013	CN103422054A Conductive thin film, and preparation method and application thereof
12/04/2013	CN103422053A Conductive film, and preparation method and applications thereof
12/04/2013	CN103422052A Equipment for substrate surface treatment
12/04/2013	CN103421976A Cu-Ga alloy powder with low oxygen content, Cu-Ga alloy target material with low oxygen content and manufacturing method of the target material
12/04/2013	CN103421490A Cerium doped alkaline earth lithium borate salt luminescent thin film and preparation thereof
12/04/2013	CN103420165A Substrate conveying device
12/04/2013	CN102732889B Method and apparatus for removing metal on wafer clamp
12/04/2013	CN102443770B Method for preventing metal target from breakdown during physical vapor deposition sputtering process
12/04/2013	CN102312212B Scanning coating device and scan coating assembly
12/04/2013	CN102084025B Film-forming method and oil repellent base
12/04/2013	CN101468538B Coating material and preparation method thereof
12/03/2013	US8598783 Deposition mask, method for manufacturing display unit using it, and display unit
12/03/2013	US8597797 Chromium nitride ion-plating coating and its production method, as well as piston ring used for internal combustion engine
12/03/2013	US8597776 Ceramic material, laminate, member for use in semiconductor manufacturing equipment, and sputtering target member
12/03/2013	US8597738 Fabrication of single-crystalline graphene arrays
12/03/2013	US8597722 Method for manufacture and structure of multiple electrochemistries and energy gathering components within a unified structure
12/03/2013	US8597479 Sputtering system
12/03/2013	US8597478 Method for manufacturing a sputtering target structure
12/03/2013	US8597475 Transparent conductive laminate and process of producing the same
12/03/2013	US8597474 Substrates coated with mixtures of titanium and aluminum materials, methods for making the substrates, and cathode targets of titanium and aluminum metal
12/03/2013	US8597473 Reactive physical vapor deposition with sequential reactive gas injection
12/02/2013	DE202013104902U1 Bandsubstratbehandlungsanlage Tape substrate treatment plant
11/2013
11/28/2013	WO2013176443A1 Sublimation purification apparatus and method
11/28/2013	WO2013176390A1 Highly functional composite nanoparticles and method for producing same
11/28/2013	WO2013175884A1 Fe-Pt-Ag-C-BASED SPUTTERING TARGET HAVING C PARTICLES DISPERSED THEREIN, AND METHOD FOR PRODUCING SAME
11/28/2013	WO2013175052A1 Coating and material method
11/28/2013	WO2013174824A1 Production of transparent conductive titanium dioxide layers, said layers themselves, and use of said layers
11/28/2013	WO2013174579A1 Method for producing an optoelectronic semiconductor chip, and optoelectronic semiconductor chip
11/28/2013	WO2013141756A3 Method for manufacturing articles from composite materials and device for implementing same
11/28/2013	WO2012143091A8 Method for supplying sequential power impulses
11/28/2013	US20130313549 Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistor
11/28/2013	US20130313110 Oxide sintered body and sputtering target
11/28/2013	US20130313108 Magnetron sputtering device, method for controlling magnetron sputtering device, and film forming method
11/28/2013	US20130313107 Prediction and compensation of erosion in a magnetron sputtering target
11/28/2013	DE102012208492A1 Dehnmessstreifenanordnung Dehnmessstreifenanordnung
11/28/2013	DE102012110334B3 Planar magnetron, used in vacuum coating system for coating glass plate or planar substrate, comprises magnet assembly comprising backing plate including holders for mounting fixtures and grooves for fixing target, and cooling channel
11/28/2013	DE102012106325A1 Apparatus for heating and cooling of substrate in substrate processing system, has thermal insulating unit that is provided to perform controllable heat transfer from heat source to heat sink
11/28/2013	DE102012010315A1 Back contact useful for a chalcopyrite thin-film solar cell, comprises chromium nitride, where chromium nitride layer is deposited directly on the substrate and has an under-stoichiometric composition
11/28/2013	DE102012010151A1 Holder, used to hold electrostatic substrate, includes identical layered structure that includes support and electrode and cover layers, where geometric ratio of support surface to thickness of layered structure has specified value
11/28/2013	DE102010008518B4 Wärmebehandelbares Infrarotstrahlung reflektierendes Schichtsystem und Verfahren zu dessen Herstellung Thermoprocessable infrared reflecting layer system and method for its preparation
11/27/2013	EP2666884A1 Cu-ga target and method for manufacturing same, as well as light-absorbing layer formed from cu-ga alloy film, and cigs solar cell using light-absorbing layer
11/27/2013	EP2666877A1 Method for producing high-purity lanthanum, high-purity lanthanum, sputtering target formed from high-purity lanthanum, and metal gate film having high-purity lanthanum as main component
11/27/2013	CN203307431U Vacuum valve for vacuum coating equipment
11/27/2013	CN203307430U Trolley position detection device of vacuum film coating machine
11/27/2013	CN203307429U Automatic vacuum coating control device
11/27/2013	CN203307428U Vacuum chamber rotary conveying mechanism of vacuum film coating machine
11/27/2013	CN203307427U Artificial porous titanium dioxide composite structure
11/27/2013	CN203307426U Continuous vertical-type two-side film coating production line
11/27/2013	CN203307425U Target material replacing mechanism used for cavity of vacuum chamber
11/27/2013	CN203307424U Water cooling device of electronic gun crucible
11/27/2013	CN203307423U Crucible interchanging device for electronic gun
11/27/2013	CN203307422U Cooling device of electron gun crucible
11/27/2013	CN203307421U Automatic evaporation transfer device
11/27/2013	CN203307420U Hinge mechanism for vacuum coating equipment
11/27/2013	CN103415646A Method and device for coating substrates
11/27/2013	CN103415645A Vapor deposition particle emitting device, vapor deposition apparatus, vapor deposition method
11/27/2013	CN103415488A Oxide sintered compact and sputtering target
11/27/2013	CN103412350A Multi-band enhancement type metal reflection film and preparing method thereof
11/27/2013	CN103411335A Selective absorbing film set of radiation absorbing layer based on mixture
11/27/2013	CN103409848A Preparation method for metallic oxide composite nano fiber with core/casing idiosyncratic structure
11/27/2013	CN103409727A Device for improving flexible substrate material film layer quality online
11/27/2013	CN103409726A Composite TiO2 nano fibrous texture and preparation method thereof
11/27/2013	CN103409725A Rotary alien target cathode mechanism and magnetron sputtering coating device
11/27/2013	CN103409724A Preparation technology of Cu-In-Ga-Se alloy
11/27/2013	CN103409723A Thin film deposition preparation method and preparation method of nano-fiber structure flexible buffer layer
11/27/2013	CN103409722A Method for preparing anti-erosion coating on surface of aero engine air compressor blade
11/27/2013	CN103409721A High-density nano film coating hardening technique
11/27/2013	CN103409720A Crucible for film plating machine
11/27/2013	CN103409719A Alloy steel textile clippers with composite ceramic coating and manufacturing method thereof
11/27/2013	CN103407226A Preparation method of ceramic film on surface of metal structural part
11/27/2013	CN102816993B Mobile phone and manufacturing method for vacuum coating
11/27/2013	CN102796998B Method for operating and controlling position of nano-grating deposition substrate in vacuum vessel and device therefor
11/27/2013	CN102660733B Silver nanoparticle film with mixed valent state, preparation method thereof and application thereof
11/27/2013	CN102605333B Preparation method for tantalum oxide film with high laser damage threshold under high-temperature environment
11/27/2013	CN102534493B V-Al-N hard coating with nano composite structure and preparation method thereof
11/27/2013	CN102443769B Method for recovering physical vapor deposition (PVD) false sheets
11/27/2013	CN102428208B Gliding Element
11/27/2013	CN102392246B Metal surface treatment process
11/27/2013	CN102296274B Shielding device for cathode arc metal ion source
11/26/2013	US8591711 Method and chamber for inductively coupled plasma processing for cylinderical material with three-dimensional surface
11/26/2013	US8591710 Method and apparatus for formation of oriented magnetic films for magnetic recording media
11/26/2013	US8591709 Sputter deposition shield assembly to reduce cathode shorting
11/26/2013	US8591706 Sputtering system and method for depositing thin film

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