Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2013
10/22/2013US8562799 Flat end-block for carrying a rotatable sputtering target
10/22/2013US8562798 Physical vapor deposition plasma reactor with RF source power applied to the target and having a magnetron
10/22/2013US8562794 Process for producing reflective mask blank for EUV lithography and process for producing substrate with functional film for the mask blank
10/22/2013US8562741 Evaporation source for evaporating an organic electroluminescent layer
10/22/2013CA2597774C Method for steel strip coating and a steel strip provided with said coating
10/17/2013WO2013154118A1 Li-CONTAINING PHOSPHORIC-ACID COMPOUND SINTERED BODY AND SPUTTERING TARGET, AND METHOD FOR MANUFACTURING SAID LI-CONTAINING PHOSPHORIC-ACID COMPOUND SINTERED BODY
10/17/2013WO2013153923A1 Solar reflector
10/17/2013WO2013153865A1 Plasma generation device, vapor deposition device, and plasma generation method
10/17/2013WO2013153864A1 Plasma generation device, vapor deposition device, and vapor deposition method
10/17/2013WO2013153832A1 Metal material for electronic component
10/17/2013WO2013153604A1 Electron gun device
10/17/2013WO2013079803A3 Cooling element and method for manufacturing a cooling element
10/17/2013US20130273346 Gallium nitride sintered body or gallium nitride molded article, and method for producing same
10/17/2013US20130270454 System and method of ion beam source for semiconductor ion implantation
10/17/2013US20130270111 Sputtering device
10/17/2013US20130270110 High density microwave plasma generation apparatus, and magnetron sputtering deposition system using the same
10/17/2013US20130270108 Indium Sputtering Target And Method For Manufacturing Same
10/17/2013US20130270107 Off-angled heating of the underside of a substrate using a lamp assembly
10/17/2013US20130270106 Production of Nanoparticles
10/17/2013US20130270105 Electrochromic devices
10/17/2013US20130270104 Combinatorial processing using mosaic sputtering targets
10/17/2013US20130269611 Guided non-line of sight coating
10/17/2013DE112008001882B4 Kaltumformwerkzeug sowie Verfahren zum Bilden eines Hartbeschichtungsfilms Kaltumformwerkzeug and method for forming a hard coating film
10/17/2013DE112004000219B4 Fluidausstoßvorrichtung The fluid ejection device
10/17/2013DE102012103254A1 Method for transferring substrate e.g. glass pane into vacuum treatment plant, involves transporting substrate composite into transfer chamber and reducing spacing within substrate composite in transport direction of substrates
10/17/2013DE102010040839B4 Verfahren zum Herstellen eines elektronsichen Bauelements und elektronisches Bauelement A process for producing an electrophotographic Sichen component and electronic component
10/17/2013DE10165035B3 Verfahren und System zur präzisen Steuerung des Vakuumdrucks im Inneren einer Prozesskammer A method and system for precise control of the vacuum pressure inside a process chamber
10/16/2013EP2650408A1 Perovskite manganese oxide thin film and production method for same
10/16/2013EP2650271A1 Zinc oxide sintered compact, sputtering target, and zinc oxide thin film
10/16/2013EP2650225A1 Decorative glass container and method for manufacturing decorative glass container
10/16/2013EP2650135A1 Intaglio printing plate coating apparatus
10/16/2013EP2650121A1 Gas-barrier film, method for producing gas-barrier film, and electronic device
10/16/2013EP2649218A1 Apparatus and method for depositing a layer onto a substrate
10/16/2013EP2649215A1 Hard and low friction nitride coatings
10/16/2013CN203238350U 基片加热炉 Substrate furnace
10/16/2013CN203238325U Pressure control device in gas reactor
10/16/2013CN203238324U Baffle plate and coating machine
10/16/2013CN203238323U AZO plane target
10/16/2013CN203238322U Vacuum gate valve for vacuum coating machine
10/16/2013CN203235718U Air knife and substrate coating equipment
10/16/2013CN103354844A Sputtering apparatus
10/16/2013CN103354843A Two-layered copper-clad laminate material, and method for producing same
10/16/2013CN103354699A Multi-ceramic-layer printed circuit board
10/16/2013CN103354246A CIGS (Copper Indium Gallium Selenium) solar cell back-electrode Mo film and preparation technology thereof
10/16/2013CN103352222A Preparation method of carbon-based tungsten coating for tokamak device
10/16/2013CN103352200A Preparation method for diamond particles deposited with WC/W (wolfram carbide/wolfram) composite coating on surfaces
10/16/2013CN103350532A Solar energy selective absorption film system and preparation method thereof
10/16/2013CN103350490A PVD (physical vapour deposition) composite ceramic coating screw and manufacturing method thereof
10/16/2013CN103350108A Methods and apparatus for controlling texture of plates and sheets by tilt rolling
10/16/2013CN103349491A Titanium or titanium alloy composite pot and preparation technology
10/16/2013CN102644058B Substrate overturning device for vacuum coating equipment
10/16/2013CN102586736B Doped ZnO-based sputtering target material and preparation method thereof
10/16/2013CN102534511B Film vapor deposition device and application method thereof
10/16/2013CN102409307B Cutting tool with Ti-Mo-N multi-element surface film
10/16/2013CN102400098B Method for preparing selenide film with adjustable forbidden band width
10/16/2013CN102400088B Glow large-beam low-voltage plasma activation process for flexible metal substrate
10/16/2013CN102386326B Preparation method of copper nitride resistive material for high-density resistive random access memory
10/16/2013CN102383102B Magnetic nano anti-dot array film and preparation method thereof
10/16/2013CN102362003B In-Ga-Zn type oxide sputtering target
10/16/2013CN102341524B Highly ordered arrays of nanoholes in metallic films and methods for producing the same
10/16/2013CN102296275B Method for uniformly injecting ions into substrate
10/16/2013CN101834293B Tungsten nitride cathode material for lithium ion battery and preparation method thereof
10/16/2013CN101802248B Radio-wave-transmitting decorative member
10/16/2013CN101743338B Vacuum treatment unit and vacuum treatment process
10/15/2013US8558453 Active matrix display device
10/15/2013US8558324 Composite dielectric thin film, capacitor and field effect transistor using the same, and each fabrication method thereof
10/15/2013US8557405 Coated member
10/15/2013US8557352 Method of making a metal oxide film, laminates and electronic devices
10/15/2013US8557326 Method for manufacturing polycarbonate solar cells
10/15/2013US8557094 Sputtering chamber having auxiliary backside magnet to improve etch uniformity and magnetron producing sustained self sputtering of ruthenium and tantalum
10/15/2013US8557093 Deposition system with electrically isolated pallet and anode assemblies
10/15/2013US8557092 Sputtering deposition apparatus and backing plate for use in sputtering deposition apparatus
10/15/2013US8557088 Physical vapor deposition with phase shift
10/15/2013CA2554835C Coated article with zinc oxide over ir reflecting layer and corresponding method
10/10/2013WO2013151984A2 Heatable lens for luminaires, and/or methods of making the same
10/10/2013WO2013151971A1 Continuous plasma and rf bias to regulate damage in a substrate processing system
10/10/2013WO2013151763A1 Systems and methods for high and ultra-high vacuum physical vapor deposition with in-situ magnetic field
10/10/2013WO2013151091A1 Optical film
10/10/2013WO2013150831A1 Sputtering target, sputtering target manufacturing method, barium titanate thin film manufacturing method, and thin film capacitor manufacturing method
10/10/2013WO2013150699A1 Mask adjustment unit, mask device, and device and method for manufacturing mask
10/10/2013WO2013149692A1 Target adapted to an indirect cooling device
10/10/2013WO2013149572A1 Equipment for large-scale continuous preparation of two-dimensional nanometer thin film
10/10/2013US20130266820 Metal alloy compositions and applications thereof
10/10/2013US20130266739 Process for forming carbon film or inorganic material film on substrate by physical vapor deposition
10/10/2013US20130266738 Method for making strip shaped graphene layer
10/10/2013US20130266616 Method of manufacturing bone graft materials and bone graft materials manufactured thereby
10/10/2013US20130264308 Plasma process, film deposition method and system using rotary chuck
10/10/2013US20130264200 Planar or tubular sputtering target and method for the production thereof
10/10/2013US20130264199 Cylindrical magnetron sputtering target assembly
10/10/2013US20130264191 Shield mesh for sputtering of a thin film on a substrate
10/10/2013US20130264169 Holder For Boring Head Coating
10/10/2013DE202013102034U1 Steuerungseinrichtung für einen Thermoaufdampfungsverlauf Control device for a Thermoaufdampfungsverlauf
10/10/2013DE112011104624T5 Verfahren und Vorrichtung zum Herstellen einer Halbleitervorrichtung Method and apparatus for manufacturing a semiconductor device
10/10/2013DE102012205615A1 Coating for producing an optical element having a substrate, whose surface has optically active coating, comprises e.g. placing substrate in substrate plane, generating ions, and deflecting ions moving toward substrate by an electric field
10/10/2013DE102012006717A1 An eine indirekte Kühlvorrichtung angepasstes Target An indirect cooling device adapted target
10/10/2013DE102011089501B4 Vorrichtung und Verfahren zum Verdampfen von Material aus einer Metallschmelze Apparatus and method for evaporating material from a metal melt
10/10/2013DE102009013310B4 Verfahren und Vorrichtung zur Vakuumbedampfung unter Kontrolle der Beschichtungsrate und Messeinrichtung dafür Method and apparatus for vacuum vapor deposition under control of the deposition rate and measuring device for
10/09/2013EP2647737A1 Planar or tubular sputter target and method for producing the same
10/09/2013EP2646599A1 Reactive metallic systems and methods for producing reactive metallic systems
10/09/2013EP2646597A1 Sliding element, in particular a piston ring, having a coating
1 ... 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 ... 674