| Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392) |
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| 05/20/2009 | CN101434894A Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 05/14/2009 | WO2009061487A1 Tetrafluoroborate compounds, compositions and related methods of use |
| 05/14/2009 | US20090124172 Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, kit for chemical mechanical polishing, and kit for preparing aqueous dispersion for chemical mechanical polishing |
| 05/14/2009 | US20090124091 Etching solution composition for metal films |
| 05/14/2009 | US20090121178 Polishing Slurry |
| 05/14/2009 | US20090120999 High tin solder etching solution |
| 05/14/2009 | CA2705052A1 Tetrafluoroborate compounds, compositions and related methods of use |
| 05/13/2009 | CN101432390A Selective removal chemistries for semiconductor applications, methods of production and uses thereof |
| 05/12/2009 | US7531105 Chemical-mechanical polishing mixture of a cationic abrasive, a cationic acrylamide-diallyldimethylammonium chloride copolymer and water; pH of 6 or less |
| 05/07/2009 | US20090117829 Polishing slurry for metal, and polishing method |
| 05/06/2009 | EP2054487A1 Solution for forming polishing slurry, polishing slurry and related methods |
| 05/06/2009 | CN101423761A Silicon wafer reclamation process |
| 04/30/2009 | US20090111269 Silicon wafer reclamation process |
| 04/30/2009 | US20090108231 Surface preparation compound |
| 04/29/2009 | EP2052049A1 Rate-enhanced cmp compositions for dielectric films |
| 04/28/2009 | US7524801 Process for removing contaminant from a surface and composition useful therefor |
| 04/23/2009 | US20090104778 Polishing Composition for CMP and device wafer producing method using the same |
| 04/23/2009 | US20090101864 Chemical Mechanical Polishing Paste for Tantalum Barrier Layer |
| 04/22/2009 | CN101413128A Solution and method for removing chromium carbide film |
| 04/16/2009 | WO2009047203A1 ETCHANT COMPOSITIONS AND ETCHING METHOD FOR METALS Cu/Mo |
| 04/16/2009 | WO2006110224A3 Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
| 04/16/2009 | US20090095939 Slurry Composition for Chemical Mechanical Polishing of Metal and Polishing Method Using the Same |
| 04/16/2009 | DE102004050358B4 Ätzzusammensetzung, Verfahren zu ihrer Herstellung und Verwendung derselben Etching composition, process for their preparation and use thereof |
| 04/15/2009 | CN101410481A Composition for etching a metal hard mask material in semiconductor processing |
| 04/09/2009 | US20090092757 Composition for etching treatment of resin molded article |
| 04/09/2009 | US20090090889 Method and agent for chemical conversion treatment and chemically conversion-Treated members |
| 04/08/2009 | EP1014433B1 Dry etching gas |
| 04/02/2009 | WO2009040794A1 Etching compositions, methods and printing components |
| 04/02/2009 | WO2006115581A3 Composition and method for polishing a sapphire surface |
| 04/02/2009 | US20090087989 Polishing liquid and polishing method using the same |
| 04/02/2009 | US20090087988 Polishing liquid and polishing method |
| 04/02/2009 | US20090087967 Precursors and processes for low temperature selective epitaxial growth |
| 04/02/2009 | DE112007000643T5 Zusammensetzung zum Ätzen eines Metallhartmaskenmaterials in der Halbleiterbearbeitung Composition for etching a metal hard mask material in the semiconductor processing |
| 04/01/2009 | CN101397499A TaN material corrosive solution and TaN material corrosion method |
| 03/26/2009 | US20090081927 Polishing composition and method utilizing abrasive particles treated with an aminosilane |
| 03/26/2009 | US20090078982 Alpha hydroxy carboxylic acid etchants for silicon microstructures |
| 03/26/2009 | US20090078908 Polishing liquid |
| 03/26/2009 | US20090078679 Etching solution and method for regenerating waste liquid thereof, and method for recovering valuable metals from waste liquid |
| 03/24/2009 | US7507350 For radiation transparent indium tin oxide films; aqueous solution of oxalic acid, acetylene-free ethylene oxide-propylene oxide copolymer, a sulfonate type anionic surfactant, and a lower alkanol; suppressed foaming and residue formation |
| 03/19/2009 | US20090075093 Method and compositions for producing optically clear photocatalytic coatings |
| 03/19/2009 | US20090072190 Cleaning solution formulations for substrates |
| 03/19/2009 | US20090071540 Combined etching and doping media |
| 03/17/2009 | US7504044 Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios |
| 03/12/2009 | WO2009032065A1 Copper cmp composition containing ionic polyelectrolyte and method |
| 03/12/2009 | US20090068844 Etching Process |
| 03/12/2009 | US20090065735 Cleaning solution formulations for substrates |
| 03/11/2009 | CN100467566C Chemical method for etching insulating-film for flexible printed circuit, and etching solution |
| 03/10/2009 | US7501072 Etching solution comprising hydrofluoric acid |
| 03/05/2009 | WO2008144501A3 New antioxidants for post-cmp cleaning formulations |
| 03/05/2009 | US20090061576 Manufacturing method for compound semiconductor device and etching solution |
| 03/04/2009 | EP2031088A2 Wet clean process for recovery of chamber parts |
| 03/03/2009 | US7497967 Compositions and methods for polishing copper |
| 03/03/2009 | US7497966 Chemical mechanical polishing slurry composition for shallow trench isolation process of semiconductor |
| 02/26/2009 | US20090053896 Copper polishing slurry |
| 02/19/2009 | WO2009023628A2 Chromium-free pickle for plastic surfaces |
| 02/19/2009 | WO2009023073A1 Microetching composition and method of using the same |
| 02/19/2009 | US20090047790 Selective Wet Etching of Hafnium Aluminum Oxide Films |
| 02/19/2009 | US20090047787 Slurry containing multi-oxidizer and nano-abrasives for tungsten CMP |
| 02/19/2009 | US20090045169 Mirror etching composition |
| 02/18/2009 | EP2025708A1 Chromium-free etchant for plastic surfaces |
| 02/18/2009 | CN100462403C High temperature resisting dipping glue and application thereof |
| 02/18/2009 | CN100462384C Preparation method of vacuum pressurized impregnating epoxy resin |
| 02/12/2009 | WO2009021005A1 Compositions and methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices |
| 02/12/2009 | WO2008145098A3 Method for the wet-chemical etching of tio2 thin-films and tio2 particles and etching reagent |
| 02/12/2009 | US20090042997 For lowering surface tension; improve surfactant or surface treating agent performance and to increase the fluorine efficiency; lower proportion of the expensive fluorine component is required to achieve desired levels of performance |
| 02/12/2009 | US20090042996 reduced fluorine content increases cost efficiency |
| 02/12/2009 | US20090042401 Compositions and methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices |
| 02/12/2009 | US20090042390 Etchant for silicon wafer surface shape control and method for manufacturing silicon wafers using the same |
| 02/12/2009 | US20090039312 Etching Of Solar Cell Materials |
| 02/12/2009 | US20090039311 Difluoride composition, method of preparation, and use for frosting glass |
| 02/11/2009 | CN100461486C Oriented polymer used for organic TFT |
| 02/11/2009 | CN100460478C Polishing composition for magnetic disk |
| 02/05/2009 | US20090032766 Composition and method for selectively etching gate spacer oxide material |
| 02/05/2009 | US20090032765 Selective barrier polishing slurry |
| 02/05/2009 | US20090032497 System and method for controlling the application of acid etchers or cleaners by means of color-changing dye |
| 02/05/2009 | US20090031636 Polymeric barrier removal polishing slurry |
| 02/04/2009 | CN100457660C Etching agent of motor-driven vehicle glass |
| 01/29/2009 | US20090029553 Free radical-forming activator attached to solid and used to enhance CMP formulations |
| 01/29/2009 | US20090029551 Pad and method for chemical mechanical polishing |
| 01/28/2009 | EP2019420A1 Device for texturising surfaces of silicon discs and uses of this device |
| 01/28/2009 | CN100456429C Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 01/27/2009 | US7481949 Polishing composition and rinsing composition |
| 01/22/2009 | US20090023265 Etching solution for removal of oxide film, method for preparing the same, and method of fabricating semiconductor device |
| 01/20/2009 | US7479474 post-etch resist residue removal using H2SiF6 or HBF4; N-methyl-2-pyrroldione an organic solvent; an amine e.g. ethanolamine, nitrilotris(methylene phosphonic acid) a corrosion inhibitor and water; pH less than 7; environmental friendly |
| 01/20/2009 | US7479462 Thin films and methods for the preparation thereof |
| 01/15/2009 | US20090017636 Titanium nitride-stripping liquid, and method for stripping titanium nitride coating film |
| 01/15/2009 | US20090017626 Semiconductor wet etchant and method of forming interconnection structure using the same |
| 01/15/2009 | US20090014683 Selective polish for fabricating electronic devices |
| 01/15/2009 | US20090013609 Polymeric Microgels for Chemical Mechanical Planarization (CMP) Processing |
| 01/14/2009 | EP1255797A4 Method for roughening copper surfaces for bonding to substrates |
| 01/08/2009 | WO2008133767A3 Polysilicon planarization solution for planarizing low temperature polysilicon thin film panels |
| 01/08/2009 | US20090008601 Potassium monopersulfate solutions |
| 01/08/2009 | US20090008600 Method and composition for polishing a substrate |
| 01/08/2009 | US20090008366 Etching composition and method for etching a substrate |
| 01/08/2009 | US20090008365 Microtextured Implants and Methods of Making Same |
| 01/08/2009 | US20090008361 Oxidant and passivant composition and method for use in treating a microelectronic structure |
| 01/07/2009 | EP2010695A2 Recyclable etching solution |
| 01/06/2009 | US7473380 Etching liquid |
| 01/01/2009 | US20090004863 Polishing liquid and polishing method using the same |
| 01/01/2009 | US20090001340 Chemical Mechanical Polishing Slurry Composition for Polishing Phase-Change Memory Device and Method for Polishing Phase-Change Memory Device Using the Same |