Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392)
07/2013
07/04/2013US20130171765 Aqueous acidic solution and etching solution and method for texturizing the surface of single crystal and polycrystal silicon substrates
07/04/2013US20130168348 Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films
07/03/2013EP2609130A1 Fluorinated ethoxylated polyurethanes
07/03/2013CN103189470A Polymer etchant and method of using same
07/02/2013US8475677 Etchant gas
06/2013
06/27/2013WO2013066058A3 Magnetic substance layer and composition for removing residue from a magnetic substance layer
06/26/2013CN103173226A Wiring forming method and etching solution for wiring formation
06/25/2013US8470195 Chemical mechanical polishing aqueous dispersion preparation set, method of preparing chemical mechanical polishing aqueous dispersion, chemical mechanical polishing aqueous dispersion, and chemical mechanical polishing method
06/20/2013WO2013089641A1 Chemical texturing of monocrystalline silicon substrate
06/20/2013WO2013089338A1 Texture etching solution composition of a crystalline silicon wafer and texture etching method
06/20/2013US20130157472 Method and composition for removing resist, etch residue, and copper oxide from substrates having copper, metal hardmask and low-k dielectric material
06/20/2013DE102012222385A1 Ätzzusammensetzung und Verfahren zum Herstellen einer Halbleitereinrichtung, in welcher die Ätzzusammensetzung eingesetzt wird Etching composition and method of manufacturing a semiconductor device in which the etching composition is used
06/19/2013EP2605289A2 Texture-etchant composition for crystalline silicon wafer and method for texture-etching (1)
06/19/2013EP2604724A2 Texture-etchant composition for crystalline silicon wafer and method for texture-etching (2)
06/19/2013CN103160830A Nonadiabatic near field optical induction chemical etching method of optical fiber transmission
06/19/2013CN103160282A Etching composition and method for fabricating semiconductor device using the same
06/13/2013WO2013084083A2 Method, apparatus and composition for wet etching
06/13/2013US20130146805 Etchant for controlled etching of ge and ge-rich silicon germanium alloys
06/13/2013DE102011088052A1 Use of a mixture comprising peroxodisulfate and acid for etching element of iron-platinum group and/or copper group of periodic table, preferably gold, platinum, palladium, rhenium, iridium, osmium or ruthenium
06/11/2013US8461057 Process for the rough-etching of silicon solar cells
06/06/2013WO2013058477A3 Texture etching fluid composition and texture etching method for crystalline silicon wafers
06/06/2013WO2013022673A3 Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions
06/06/2013US20130140485 Method for producing abrasive grains, method for producing slurry, and method for producing polishing liquid
06/06/2013DE102011120328A1 Ätzverfahren für Metall-Mischoxide For etching metal mixed oxides
06/05/2013CN103131421A Impregnation liquid, impregnation method before wafer etching, and silicon dioxide wet etching method
05/2013
05/30/2013WO2013078038A1 Reconditioning glass - forming molds having a surface oxidized titanium -aluminum -nitride glass release coating
05/30/2013US20130137265 Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
05/29/2013EP2596081A1 Cross-linking and multi-phase etch pastes for high resolution feature patterning
05/23/2013US20130130596 Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same
05/22/2013EP2595179A1 Dry etching agent and dry etching method
05/22/2013CN103112872A Preparation method of ultrapure fluorine-ammonium etching solution for micro-electronics
05/16/2013WO2013069873A1 Etchant composition and method for manufacturing thin film transistor using the same
05/16/2013US20130119305 Method and compositions for producing optically clear photocatalytic coatings
05/15/2013EP2592131A2 Aqueous cerium-containing solution having an extended bath lifetime for removing mask material
05/15/2013CN103108992A Texture-etchant composition for crystalline silicon wafer and method for texture-etching (2)
05/15/2013CN103107130A Array substrate for liquid crystal display and manufacturing method thereof, etching liquid composition and method for forming metal routing
05/14/2013US8440098 Conditioning agent for the etching of enamel lesions
05/14/2013US8440097 Stable, concentratable, water soluble cellulose free chemical mechanical polishing composition
05/10/2013WO2013066058A2 Magnetic substance layer and composition for removing residue from a magnetic substance layer
05/09/2013US20130115770 Etching composition, method of forming a metal pattern and method of manufacturing a display substrate
05/09/2013US20130115733 Etchant composition and method for manufacturing thin film transistor using the same
05/09/2013US20130115727 Etching composition and method of manufacturing a display substrate using the system
05/09/2013US20130112914 Slurry Composition For Polishing And Method Of Manufacturing Phase Change Memory Device Using The Same
05/09/2013US20130112908 Fluorophosphate surfactants
05/08/2013CN103098265A A method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries
05/08/2013CN103087718A Etching solution for performing wet etching on lanthanum nickelate film and ferroelectric film/lanthanum nickelate composite film and preparation method thereof
05/02/2013US20130105728 Dry Etching Agent and Dry Etching Method
05/01/2013CN103080273A Aqueous acidic solution and etching solution and method for texturizing surface of single crystal and polycrystal silicon substrates
04/2013
04/25/2013WO2013058477A2 Texture etching fluid composition and texture etching method for crystalline silicon wafers
04/25/2013WO2012174518A3 Compositions and methods for selectively etching silicon nitride
04/25/2013US20130102685 Compositions comprising a fluorosurfactant and a hydrotrope
04/25/2013US20130102158 Method, apparatus and composition for wet etching
04/24/2013EP2582771A1 Etching composition and its use in a method of making a photovoltaic cell
04/24/2013CN101501162B Solution for forming polishing slurry, polishing slurry and related methods
04/23/2013US8425797 Compositions for polishing aluminum/copper and titanium in damascene structures
04/18/2013WO2013055290A1 Alkaline solution for texturing monocrystalline silicon substrate
04/18/2013US20130092872 Compositions for etching and methods of forming a semiconductor device using the same
04/18/2013US20130092871 Composition for polishing silicon carbide substrate and method for polishing silicon carbide substrate
04/18/2013US20130092657 Cross-linking and multi-phase etch pastes for high resolution feature patterning
04/18/2013US20130092651 Slurry for chemical-mechanical polishing of copper and use thereof
04/17/2013EP2580303A1 Aqueous alkaline etching and cleaning composition and method for treating the surface of silicon substrates
04/17/2013CN103052907A Method for preparing array substrate for liquid crystal display device
04/16/2013US8420539 Additive for polishing composition
04/11/2013WO2013002502A3 Texture etchant composition for crystalline silicon wafer and texture etching method thereof
04/10/2013CN103038311A Aqueous alkaline etching and cleaning composition and method for treating the surface of silicon substrates
04/03/2013CN103026293A Method for producing an array substrate for a liquid crystal display device
04/03/2013CN103013523A Etching agent as well as preparation method and application thereof
04/02/2013US8409467 Polishing liquid for semiconductor integrated circuit
03/2013
03/28/2013US20130078811 Slurry for chemical-mechanical polishing of metals and use thereof
03/28/2013US20130078784 Cmp slurry and method for manufacturing semiconductor device
03/28/2013US20130078756 Aqueous alkaline etching and cleaning composition and method for treating the surface of silicon substrates
03/28/2013US20130075651 Method for producing purified active silicic acid solution and silica sol
03/27/2013CN103003925A 干蚀刻剂以及干蚀刻方法 Dry etchant and a dry etching method
03/27/2013CN103000509A Method for manufacturing display device and etching solution composition
03/26/2013US8404626 Post-deposition cleaning methods and formulations for substrates with cap layers
03/26/2013US8404146 Polishing liquid and polishing method
03/26/2013US8404145 Method for forming an indium cap layer
03/26/2013US8404143 Highly dilutable polishing concentrates and slurries
03/21/2013US20130072411 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
03/21/2013US20130072021 Composition and method for polishing aluminum semiconductor substrates
03/21/2013US20130068995 Silica having metal ions absorbed thereon and fabricating method thereof
03/21/2013US20130067998 Homogeneous Blending
03/21/2013DE102007004060B4 Verwendung einer Ätzlösung aufweisend Wasser, Salpetersäure und Schwefelsäure und Ätzverfahren Using an etching solution comprising water, nitric acid and sulfuric acid and etching
03/20/2013CN102977889A Etching solution composition for metal oxide layer containing gallium
03/13/2013CN102965114A Hydrofluoric acid-containing process liquid regeneration method and regeneration device
03/12/2013US8394289 Composition for etching treatment of resin molded article
03/07/2013US20130056438 Composition and method for micro etching of copper and copper alloys
03/06/2013CN102134491B Gallium nitride surface corrosion liquid and corrosion method
03/05/2013US8388710 Abrasives produced by calcination of cerium carbonate having hexagonal crystal structure; improving chemical mechanical polishing selectivity of silicon oxide layer to silicon nitride layer
02/2013
02/28/2013WO2012177017A3 Metal wire etchant liquid and method for manufacturing a liquid crystal display using the etchant
02/20/2013CN102939356A Cross-linking etch paste for high resolution feature patterning
02/14/2013US20130037515 Sapphire polishing slurry and sapphire polishing method
02/13/2013EP2556551A2 A method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries
02/13/2013CN102933690A Etching composition and its use in a method of making a photovoltaic cell
02/12/2013US8372305 Chemical-mechanical polishing composition comprising metal-organic framework materials
02/12/2013US8372304 Polishing slurry
02/12/2013US8372303 Cerium oxide powder, method for preparing the same, and CMP slurry comprising the same
02/07/2013WO2013002502A9 Texture etchant composition for crystalline silicon wafer and texture etching method thereof
02/07/2013US20130034923 Etching composition, method of forming a metal pattern using the etching composition, and method of manufacturing a display substrate
02/07/2013US20130032572 Slurry for polishing phase-change materials and method for producing a phase-change device using same
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