Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392) |
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05/10/2012 | WO2012061010A2 Polymer etchant and method of using same |
05/10/2012 | US20120112321 Alkaline etching liquid for texturing a silicon wafer surface |
05/10/2012 | US20120112124 Aluminum etchant |
05/10/2012 | US20120112123 Etching composition for an under-bump metallurgy layer |
05/09/2012 | CN102449112A Two component etching |
05/09/2012 | CN102448904A Glass having anti-glare surface and method of making |
05/09/2012 | CN102443395A Compound for wet etching silicon dioxide |
05/08/2012 | US8173039 Method for preparing cerium oxide powder using organic solvent and CMP slurry comprising the same |
05/03/2012 | WO2012057467A2 Copper-containing etchant composition for a metal layer, and etching method using same |
05/03/2012 | WO2012021025A3 Texture-etchant composition for crystalline silicon wafer and method for texture-etching (2) |
05/01/2012 | US8168683 Fluorinated vinylidene cationic surfactant |
05/01/2012 | US8168541 CMP polishing slurry and polishing method |
04/26/2012 | US20120100718 CMP Fluid and Method for Polishing Palladium |
04/26/2012 | US20120100330 Liquid and method for removing csd coated film, ferroelectric thin film and method for producing the same |
04/25/2012 | CN101103089B Polishing slurries and methods for chemical mechanical polishing |
04/19/2012 | WO2012051380A2 Composition for and method of suppressing titanium nitride corrosion |
04/19/2012 | WO2012048899A1 Etchant for controlled etching of ge and ge-rich silicon germanium alloys |
04/19/2012 | US20120094501 Etching composition, in particular for silicon materials, method for characterizing defects on surfaces of such materials and process of treating such surfaces with the etching compostion |
04/19/2012 | US20120094490 Slurry For Chemical Mechanical Polishing |
04/19/2012 | US20120091100 Etchant for controlled etching of ge and ge-rich silicon germanium alloys |
04/17/2012 | US8157877 Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion |
04/12/2012 | US20120085965 Two component etching |
04/12/2012 | US20120085959 Use of unsaturated hydrofluorocarbons |
04/11/2012 | EP2438140A1 Two component etching |
04/10/2012 | US8153095 Adding gaseous or liquified gas hydrogen fluoride to an anhydrous solvent |
04/10/2012 | US8153019 Methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices |
04/05/2012 | US20120083188 Dispersion comprising cerium oxide and silicon dioxide |
04/04/2012 | CN101604615B Method for etching an ultra thin film and etching liquid |
04/03/2012 | US8148191 Combined etching and doping media |
04/03/2012 | US8147712 Polishing composition |
04/03/2012 | US8147711 Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry |
03/29/2012 | US20120077422 Polishing liquid composition |
03/29/2012 | US20120077419 Raspberry-type metal oxide nanostructures coated with ceo2 nanoparticles for chemical mechanical planarization (cmp) |
03/29/2012 | US20120077307 Etching paste having a doping function and method of forming a selective emitter of a solar cell using the same |
03/28/2012 | CN1576339B 抛光组合物 The polishing composition |
03/28/2012 | CN102395708A Etchant composition and method |
03/28/2012 | CN101450577B Method for forming multi-color cladding coat |
03/27/2012 | US8142714 Aqueous solution containing surfactants; alkaline pH; destroying prions |
03/22/2012 | WO2012003082A3 Composition for advanced node front - and back-end of line chemical mechanical polishing |
03/22/2012 | US20120070998 Composition for Wet Etching of Silicon Dioxide |
03/22/2012 | US20120070990 Slurry Composition Having Tunable Dielectric Polishing Selectivity And Method Of Polishing A Substrate |
03/22/2012 | US20120070989 Stabilized, Concentratable Chemical Mechanical Polishing Composition And Method Of Polishing A Substrate |
03/21/2012 | CN102382657A Etching liquid for transparent conducting film and preparation method thereof |
03/20/2012 | US8137580 CMP slurry composition for forming metal wiring line |
03/15/2012 | US20120064722 Etching solution and trench isolation structure-formation process empolying the same |
03/14/2012 | CN202164195U 微蚀液循环再生系统 Micro-etching solution recycling system |
03/08/2012 | WO2012029000A1 Aqueous acidic solution and etching solution and method for texturizing surface of single crystal and polycrystal silicon substrates |
03/08/2012 | US20120058643 Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a cmp process |
03/08/2012 | US20120058642 Silicon polishing compositions with high rate and low defectivity |
03/08/2012 | US20120058641 Aqueous polishing agent comprising solid polymer particles and two complexing agents and its use in a process for polishing patterned and unstructured metal surfaces |
03/08/2012 | US20120056126 Fine-processing agent and fine-processing method |
03/08/2012 | US20120055865 Cleaning method and system |
03/07/2012 | CN102369258A Agent for removing conductive film and method for removing conductive film |
03/01/2012 | US20120053252 Fluorinated ethoxylated polyurethanes |
03/01/2012 | US20120052682 Polishing slurry and method of manufacturing semiconductor device using the same |
03/01/2012 | US20120049107 Slurry composition for chemical mechanical polishing process and method of forming phase change memory device using the same |
02/28/2012 | US8123976 Alkaline aqueous solution composition used for washing or etching substrates |
02/23/2012 | WO2012022476A1 Chemical solutions for texturing microcrystalline silicon wafers for solar cell manufacturing |
02/23/2012 | US20120042575 Cmp slurry recycling system and methods |
02/22/2012 | CN102358837A Etching paste and preparation method thereof |
02/16/2012 | WO2012021025A2 Texture-etchant composition for crystalline silicon wafer and method for texture-etching (2) |
02/16/2012 | US20120037843 AZEOTROPE-LIKE COMPOSITION OF 2-CHLORO-1,1,1,2-TETRAFLUOROPROPANE (HCFC-244bb) AND HYDROGEN FLUORIDE (HF) |
02/09/2012 | US20120034725 Method for texturing silicon wafers, treatment liquid therefor, and use |
02/09/2012 | US20120032108 Printable etching media for silicon dioxide and silicon nitride layers |
02/09/2012 | US20120031872 Conductive film removal agent and conductive film removal method |
02/08/2012 | EP2415849A1 Agent for removing conductive film and method for removing conductive film |
02/08/2012 | EP2414299A1 Glass having anti-glare surface and method of making |
02/02/2012 | WO2012015089A1 Method for preparing array substrate for liquid crystal display device |
02/02/2012 | WO2012015088A1 Method for producing an array substrate for a liquid crystal display device |
02/02/2012 | US20120028467 Polishing fluid and polishing method |
02/02/2012 | US20120024818 Polishing agent for copper polishing and polishing method using same |
02/01/2012 | CN101434894B 用于清洗半导体基质上无机残渣含有铜特效腐蚀抑制剂的含水清洗组合物 The aqueous cleaning composition for cleaning a semiconductor substrate of the inorganic residue containing copper corrosion inhibitor effects |
01/26/2012 | DE102006008689B4 Poliermittel und dessen Verwendung Polishing agents and its use |
01/24/2012 | US8101013 Film-forming material and method of forming pattern |
01/19/2012 | WO2012008282A1 Dry etching agent and dry etching method |
01/19/2012 | WO2011124893A3 A method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
01/12/2012 | US20120007019 Wet etching solution |
01/12/2012 | US20120007018 Slurry compositions for selectively polishing silicon nitride relative to silicon oxide, methods of polishing a silicon nitride layer and methods of manufacturing a semiconductor device using the same |
01/10/2012 | US8092707 Compositions and methods for modifying a surface suited for semiconductor fabrication |
01/05/2012 | WO2012001616A2 Methods and systems for time sensitive networks |
01/05/2012 | US20120003901 Composition for advanced node front-and back-end of line chemical mechanical polishing |
01/05/2012 | US20120001264 Etchants and methods of fabricating semiconductor devices using the same |
01/05/2012 | US20120001118 Polishing slurry for chalcogenide alloy |
12/29/2011 | WO2011162278A1 Gas for plasma reactions and uses thereof |
12/29/2011 | WO2010127844A3 Solar cell and method for the production thereof |
12/29/2011 | US20110318994 Method of preparing an edge-strengthened article |
12/29/2011 | US20110318929 Cmp polishing solution and polishing method |
12/29/2011 | US20110318928 Polymeric Barrier Removal Polishing Slurry |
12/29/2011 | US20110318870 Liquid additive for etching silicon nitride and silicon oxide layers, metal ink containing the same, and method of manufacturing silicon solar cell electrodes |
12/29/2011 | US20110315658 Aluminum oxide film remover and method for surface treatment of aluminum or aluminum alloy |
12/28/2011 | EP1435116B1 Combined etching and doping substances |
12/22/2011 | WO2011159749A1 Etching composition and its use in a method of making a photovoltaic cell |
12/22/2011 | WO2011157335A1 Cross-linking and multi-phase etch pastes for high resolution feature patterning |
12/22/2011 | US20110312181 Method for chemical mechanical planarization of a copper-containing substrate |
12/22/2011 | US20110308614 Etching composition and its use in a method of making a photovoltaic cell |
12/21/2011 | EP1950019B1 Interlayer film separation method |
12/21/2011 | CN102286288A 一种醋酸系ito蚀刻液和制备工艺 A series ito etching solution and preparation of acetic acid |
12/15/2011 | WO2011154875A1 Aqueous alkaline etching and cleaning composition and method for treating the surface of silicon substrates |
12/15/2011 | US20110306211 Stabilized Chemical Mechanical Polishing Composition And Method Of Polishing A Substrate |
12/13/2011 | US8075800 Polishing slurry and polishing method |