Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392)
05/2012
05/10/2012WO2012061010A2 Polymer etchant and method of using same
05/10/2012US20120112321 Alkaline etching liquid for texturing a silicon wafer surface
05/10/2012US20120112124 Aluminum etchant
05/10/2012US20120112123 Etching composition for an under-bump metallurgy layer
05/09/2012CN102449112A Two component etching
05/09/2012CN102448904A Glass having anti-glare surface and method of making
05/09/2012CN102443395A Compound for wet etching silicon dioxide
05/08/2012US8173039 Method for preparing cerium oxide powder using organic solvent and CMP slurry comprising the same
05/03/2012WO2012057467A2 Copper-containing etchant composition for a metal layer, and etching method using same
05/03/2012WO2012021025A3 Texture-etchant composition for crystalline silicon wafer and method for texture-etching (2)
05/01/2012US8168683 Fluorinated vinylidene cationic surfactant
05/01/2012US8168541 CMP polishing slurry and polishing method
04/2012
04/26/2012US20120100718 CMP Fluid and Method for Polishing Palladium
04/26/2012US20120100330 Liquid and method for removing csd coated film, ferroelectric thin film and method for producing the same
04/25/2012CN101103089B Polishing slurries and methods for chemical mechanical polishing
04/19/2012WO2012051380A2 Composition for and method of suppressing titanium nitride corrosion
04/19/2012WO2012048899A1 Etchant for controlled etching of ge and ge-rich silicon germanium alloys
04/19/2012US20120094501 Etching composition, in particular for silicon materials, method for characterizing defects on surfaces of such materials and process of treating such surfaces with the etching compostion
04/19/2012US20120094490 Slurry For Chemical Mechanical Polishing
04/19/2012US20120091100 Etchant for controlled etching of ge and ge-rich silicon germanium alloys
04/17/2012US8157877 Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion
04/12/2012US20120085965 Two component etching
04/12/2012US20120085959 Use of unsaturated hydrofluorocarbons
04/11/2012EP2438140A1 Two component etching
04/10/2012US8153095 Adding gaseous or liquified gas hydrogen fluoride to an anhydrous solvent
04/10/2012US8153019 Methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices
04/05/2012US20120083188 Dispersion comprising cerium oxide and silicon dioxide
04/04/2012CN101604615B Method for etching an ultra thin film and etching liquid
04/03/2012US8148191 Combined etching and doping media
04/03/2012US8147712 Polishing composition
04/03/2012US8147711 Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry
03/2012
03/29/2012US20120077422 Polishing liquid composition
03/29/2012US20120077419 Raspberry-type metal oxide nanostructures coated with ceo2 nanoparticles for chemical mechanical planarization (cmp)
03/29/2012US20120077307 Etching paste having a doping function and method of forming a selective emitter of a solar cell using the same
03/28/2012CN1576339B 抛光组合物 The polishing composition
03/28/2012CN102395708A Etchant composition and method
03/28/2012CN101450577B Method for forming multi-color cladding coat
03/27/2012US8142714 Aqueous solution containing surfactants; alkaline pH; destroying prions
03/22/2012WO2012003082A3 Composition for advanced node front - and back-end of line chemical mechanical polishing
03/22/2012US20120070998 Composition for Wet Etching of Silicon Dioxide
03/22/2012US20120070990 Slurry Composition Having Tunable Dielectric Polishing Selectivity And Method Of Polishing A Substrate
03/22/2012US20120070989 Stabilized, Concentratable Chemical Mechanical Polishing Composition And Method Of Polishing A Substrate
03/21/2012CN102382657A Etching liquid for transparent conducting film and preparation method thereof
03/20/2012US8137580 CMP slurry composition for forming metal wiring line
03/15/2012US20120064722 Etching solution and trench isolation structure-formation process empolying the same
03/14/2012CN202164195U 微蚀液循环再生系统 Micro-etching solution recycling system
03/08/2012WO2012029000A1 Aqueous acidic solution and etching solution and method for texturizing surface of single crystal and polycrystal silicon substrates
03/08/2012US20120058643 Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a cmp process
03/08/2012US20120058642 Silicon polishing compositions with high rate and low defectivity
03/08/2012US20120058641 Aqueous polishing agent comprising solid polymer particles and two complexing agents and its use in a process for polishing patterned and unstructured metal surfaces
03/08/2012US20120056126 Fine-processing agent and fine-processing method
03/08/2012US20120055865 Cleaning method and system
03/07/2012CN102369258A Agent for removing conductive film and method for removing conductive film
03/01/2012US20120053252 Fluorinated ethoxylated polyurethanes
03/01/2012US20120052682 Polishing slurry and method of manufacturing semiconductor device using the same
03/01/2012US20120049107 Slurry composition for chemical mechanical polishing process and method of forming phase change memory device using the same
02/2012
02/28/2012US8123976 Alkaline aqueous solution composition used for washing or etching substrates
02/23/2012WO2012022476A1 Chemical solutions for texturing microcrystalline silicon wafers for solar cell manufacturing
02/23/2012US20120042575 Cmp slurry recycling system and methods
02/22/2012CN102358837A Etching paste and preparation method thereof
02/16/2012WO2012021025A2 Texture-etchant composition for crystalline silicon wafer and method for texture-etching (2)
02/16/2012US20120037843 AZEOTROPE-LIKE COMPOSITION OF 2-CHLORO-1,1,1,2-TETRAFLUOROPROPANE (HCFC-244bb) AND HYDROGEN FLUORIDE (HF)
02/09/2012US20120034725 Method for texturing silicon wafers, treatment liquid therefor, and use
02/09/2012US20120032108 Printable etching media for silicon dioxide and silicon nitride layers
02/09/2012US20120031872 Conductive film removal agent and conductive film removal method
02/08/2012EP2415849A1 Agent for removing conductive film and method for removing conductive film
02/08/2012EP2414299A1 Glass having anti-glare surface and method of making
02/02/2012WO2012015089A1 Method for preparing array substrate for liquid crystal display device
02/02/2012WO2012015088A1 Method for producing an array substrate for a liquid crystal display device
02/02/2012US20120028467 Polishing fluid and polishing method
02/02/2012US20120024818 Polishing agent for copper polishing and polishing method using same
02/01/2012CN101434894B 用于清洗半导体基质上无机残渣含有铜特效腐蚀抑制剂的含水清洗组合物 The aqueous cleaning composition for cleaning a semiconductor substrate of the inorganic residue containing copper corrosion inhibitor effects
01/2012
01/26/2012DE102006008689B4 Poliermittel und dessen Verwendung Polishing agents and its use
01/24/2012US8101013 Film-forming material and method of forming pattern
01/19/2012WO2012008282A1 Dry etching agent and dry etching method
01/19/2012WO2011124893A3 A method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries
01/12/2012US20120007019 Wet etching solution
01/12/2012US20120007018 Slurry compositions for selectively polishing silicon nitride relative to silicon oxide, methods of polishing a silicon nitride layer and methods of manufacturing a semiconductor device using the same
01/10/2012US8092707 Compositions and methods for modifying a surface suited for semiconductor fabrication
01/05/2012WO2012001616A2 Methods and systems for time sensitive networks
01/05/2012US20120003901 Composition for advanced node front-and back-end of line chemical mechanical polishing
01/05/2012US20120001264 Etchants and methods of fabricating semiconductor devices using the same
01/05/2012US20120001118 Polishing slurry for chalcogenide alloy
12/2011
12/29/2011WO2011162278A1 Gas for plasma reactions and uses thereof
12/29/2011WO2010127844A3 Solar cell and method for the production thereof
12/29/2011US20110318994 Method of preparing an edge-strengthened article
12/29/2011US20110318929 Cmp polishing solution and polishing method
12/29/2011US20110318928 Polymeric Barrier Removal Polishing Slurry
12/29/2011US20110318870 Liquid additive for etching silicon nitride and silicon oxide layers, metal ink containing the same, and method of manufacturing silicon solar cell electrodes
12/29/2011US20110315658 Aluminum oxide film remover and method for surface treatment of aluminum or aluminum alloy
12/28/2011EP1435116B1 Combined etching and doping substances
12/22/2011WO2011159749A1 Etching composition and its use in a method of making a photovoltaic cell
12/22/2011WO2011157335A1 Cross-linking and multi-phase etch pastes for high resolution feature patterning
12/22/2011US20110312181 Method for chemical mechanical planarization of a copper-containing substrate
12/22/2011US20110308614 Etching composition and its use in a method of making a photovoltaic cell
12/21/2011EP1950019B1 Interlayer film separation method
12/21/2011CN102286288A 一种醋酸系ito蚀刻液和制备工艺 A series ito etching solution and preparation of acetic acid
12/15/2011WO2011154875A1 Aqueous alkaline etching and cleaning composition and method for treating the surface of silicon substrates
12/15/2011US20110306211 Stabilized Chemical Mechanical Polishing Composition And Method Of Polishing A Substrate
12/13/2011US8075800 Polishing slurry and polishing method
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