C09K 13 - Etching, surface-brightening or pickling compositions

Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392)
07/2011
07/07/2011	US20110165777 Method and Slurry for Tuning Low-K Versus Copper Removal Rates During Chemical Mechanical Polishing
07/07/2011	US20110163262 Colloidal silica containing silica secondary particles having bent structure and/or branched structure, and method for producing same
07/06/2011	CN101397499B TaN material corrosive solution and TaN material corrosion method
06/2011
06/30/2011	WO2011078446A1 Polysilazane treating solvent and method for treating polysilazane using the same
06/30/2011	US20110159636 Edge deletion of thin-layer solar modules by etching
06/30/2011	US20110155949 Process for production of aluminum wheel
06/30/2011	US20110155689 Morphology design of transparent conductive metal oxide films
06/28/2011	US7968000 Etchant composition, and method of fabricating metal pattern and thin film transistor array panel using the same
06/23/2011	US20110147341 Etching solution for titanium-based metal, tungsten-based metal, titanium/tungsten-based metal or their nitrides
06/16/2011	US20110140035 Chromium-free pickle for plastic surfaces
06/15/2011	CN1679147B Etching pastes for silicon surfaces and layers
06/09/2011	US20110136345 Process for the Manufacture of Etched Items
06/09/2011	US20110136344 Composition and method for polishing polysilicon
06/09/2011	US20110132868 Polishing composition for polishing silver and alumina, and polishing method using the same
06/09/2011	DE102009050283A1 Agent useful for removing metallic, semimetallic or ceramic deposit, preferably of silicon nitride, from surface on which it is disposed, comprises composition comprising nitric acid, ammonium fluoride, acetic acid, and/or propane-1,2-diol
06/08/2011	EP1535318B1 Etching pastes for silicon surfaces and layers
06/07/2011	US7955521 a mixture of ammonium acetic acid, waterand metal hydroxide compound as stabilizer agents used for etching
06/07/2011	US7955520 Copper-passivating CMP compositions and methods
06/07/2011	US7955519 Composition and method for planarizing surfaces
06/03/2011	WO2011019209A3 Etchant composition for forming metal interconnects
06/03/2011	WO2011010877A3 Etchant composition for the formation of a metal line
06/02/2011	US20110126897 Composition for extruding fibers
05/2011
05/26/2011	US20110124195 Chemical Mechanical Polishing Composition Containing Polysilicon Polish Finisher
05/26/2011	US20110121224 Polishing composition
05/24/2011	US7947195 Polishing slurry
05/19/2011	US20110117821 Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method using the same, and method of recycling chemical mechanical polishing aqueous dispersion
05/19/2011	US20110117751 Non-selective oxide etch wet clean composition and method of use
05/19/2011	US20110117750 Novel wet etching agent for ii-vi semiconductors and method
05/19/2011	US20110117720 Method for preparing cerium oxide, cerium oxide prepared therefrom and cmp slurry comprising the same
05/19/2011	US20110117696 CdTe SURFACE TREATMENT FOR STABLE BACK CONTACTS
05/19/2011	US20110114872 Process For Polishing A Silicon Surface By Means Of A Cerium Oxide-Containing Dispersion
05/18/2011	CN1958717B Release agent of bonding agent in epoxies, and preparation method
05/17/2011	US7943516 Manufacturing method for semiconductor device
05/17/2011	US7942945 CMP slurry for polymeric interlayer dielectric planarization
05/12/2011	WO2011055915A2 Etchant composition
05/12/2011	US20110111595 Chemical mechanical polishing composition and methods relating thereto
05/11/2011	CN102051179A Chemical corrosion liquid for selectively corroding cap layer of gallium arsenide solar cell
05/11/2011	CN101490310B Process for metallization of plastic surfaces
05/10/2011	US7938985 Anticaking agent for iron and steel slag
05/10/2011	US7938982 Silicon wafer etching compositions
05/05/2011	WO2011052989A2 Etching solution composition
05/05/2011	WO2011052987A2 Etching solution composition
05/05/2011	WO2011052941A2 Etching composition for texturing crystalline silicon-based wafer
05/05/2011	WO2011052909A2 Etchant composition
05/05/2011	US20110104992 Polishing solution for metal films and polishing method using the same
05/05/2011	US20110104905 Etching composition, in particular for strained or stressed silicon materials, method for characterizing defects on surfaces of such materials and process of treating such surfaces with the etching composition
05/05/2011	US20110104850 Solar cell contact formation process using a patterned etchant material
05/05/2011	US20110104840 Etchant Solutions And Additives Therefor
05/05/2011	US20110100956 Metal-passivating cmp compositions and methods
05/04/2011	CN102044420A Polycrystalline silicon ion implantation technology
05/04/2011	CN101546706B Process for forming phase-change films
05/03/2011	US7935665 Non-corrosive cleaning compositions for removing etch residues
04/2011
04/28/2011	US20110094536 Troika Acid Semiconductor Cleaning Compositions and Methods of Use
04/27/2011	CN101230272B Etching solution for etching BST film and preparation method thereof
04/21/2011	WO2010056051A8 Etching solution for a transparent conductive film
04/21/2011	US20110092074 Texturing and cleaning agent for the surface treatment of wafers and use thereof
04/21/2011	US20110091408 Methods of using fluoroalkyl phosphate compositions
04/21/2011	US20110089143 Highly dilutable polishing concentrates and slurries
04/20/2011	CN1749354B Etchant composition for indium oxide layer and etching method using the same
04/13/2011	CN101134930B Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
04/07/2011	US20110081780 Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method
04/07/2011	US20110081742 Texturing semiconductor substrates
04/07/2011	US20110079578 Nickel-Chromium Alloy Stripper for Flexible Wiring Boards
04/06/2011	CN102007196A Non-selective oxide etch wet clean composition and method of use
04/06/2011	CN101497684B Vegetable oil based polyurethane acrylic ester, preparing process and use thereof
03/2011
03/31/2011	US20110073801 Composition for etching silicon oxide and method of forming a contact hole using the same
03/31/2011	US20110073800 Abrasive-free chemical mechanical polishing compositions
03/24/2011	WO2011032880A1 Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates
03/24/2011	WO2011032629A1 Ink jet printable etching inks and associated process
03/24/2011	US20110070744 Silicon Texturing Formulations for Solar Applications
03/24/2011	US20110070737 Method for preparing of cerium oxide powder for chemical mechanical polishing and method for preparing of chemical mechanical polishing slurry using the same
03/24/2011	US20110070736 Method for polishing through-silicon via (TSV) wafers and a polishing composition used in the method
03/24/2011	US20110070735 Method and Composition for Chemical Mechanical Planarization of a Metal-Containing Substrate
03/24/2011	CA2774442A1 Ink jet printable etching inks and associated process
03/17/2011	US20110062376 Composition and method for polishing bulk silicon
03/17/2011	US20110062375 Silicon wafer reclamation process
03/17/2011	US20110062374 CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device
03/15/2011	US7906038 Aqueous polishing liquid and chemical mechanical polishing method
03/10/2011	WO2011028037A2 Etchant for thin film transistor-liquid crystal display
03/10/2011	US20110059680 Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method
03/10/2011	US20110059619 Silicon etching liquid and etching method
03/10/2011	US20110059570 Process For The Rough-Etching of Silicon Solar Cells
03/10/2011	US20110056914 Process for the stripping of workpieces and stripping solution
03/03/2011	US20110053462 Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method
03/03/2011	US20110049411 Elastic inorganic-organic hybrid foam
03/03/2011	US20110049104 Etchant for copper or copper alloy, liquid for etching pretreatment, and etching method
03/03/2011	DE102009039777A1 Verfahren zur Herstellung und Strukturierung einer Zinkoxidschicht und Zinkoxidschicht Process for the preparation and patterning of a layer of zinc oxide and zinc oxide
03/01/2011	US7897061 Compositions and methods for CMP of phase change alloys
02/2011
02/24/2011	WO2011020632A1 Method for etching of silicon surfaces
02/24/2011	US20110045745 Doped Ceria Abrasives with Controlled Morphology and Preparation Thereof
02/24/2011	US20110045741 Auto-Stopping Abrasive Composition for Polishing High Step Height Oxide Layer
02/24/2011	US20110045671 Composition for polishing surfaces of silicon dioxide
02/17/2011	WO2011019222A9 Etchant composition for forming copper interconnects
02/17/2011	WO2011019222A2 Etchant composition for forming copper interconnects
02/17/2011	WO2011019209A2 Etchant composition for forming metal interconnects
02/17/2011	US20110039412 Chemical mechanical polishing slurry composition including non-ionized, heat activated nano-catalyst and polishing method using the same
02/15/2011	US7887715 comprising nano-catalyst which is able to release electrons and holes by thermal energy generated by friction between the substrate and the polishing pad, an abrasive, and an oxidizing agent, wherein the non-ionized, heat-activated nano-catalyst and the abrasive are different from each other
02/15/2011	US7887714 Cerium oxide sol and abrasive
02/03/2011	US20110028073 Cmp polishing slurry and polishing method
02/01/2011	US7879255 Method and composition for electrochemically polishing a conductive material on a substrate

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