Patents for C03C 15 - Surface treatment of glass, not in the form of fibres or filaments, by etching (4,356)
07/2006
07/13/2006US20060154151 Method for quartz photomask plasma etching
07/13/2006US20060151436 Lapping slider for a hard disk drive to remove portions of metal and ceramic; nanogrinding with a substrate having embedded abrasive and a nonabrasive chemical solution; selectively dissolving additional portion of ceramic in nonabrasive solution; near-zero pole tip recession
07/13/2006US20060151435 Surface processing method
07/13/2006US20060151112 Substrate treating system, substrate treating device, program, and recording medium
07/13/2006DE10100828B4 Verfahren zur Herstellung einer Oberflächenstruktur und glasähnliche Wand mit einer Oberflächenstruktur A process for producing a surface structure and glass-like wall with a surface structure
07/12/2006EP1679532A1 Optical element having antireflection structure, and method for producing optical element having antireflection structure
07/12/2006CN1800065A Substrate-correcting means
07/06/2006US20060144825 Dual reduced agents for barrier removal in chemical mechanical polishing
07/06/2006US20060144824 Method of polishing a silicon-containing dielectric
07/06/2006US20060144823 Etching solution for D-defect evaluation in silicon wafer and evaluation method using the same
07/06/2006US20060144819 Remote chamber methods for removing surface deposits
07/06/2006US20060144816 Method for separating a useful layer and component obtained by said method
07/06/2006US20060144814 Imprint lithography
07/06/2006US20060144520 Viewing window cleaning apparatus
07/06/2006DE102004061632A1 Innenbeschichtung von Entladungsgefäßen Internal coating of discharge vessels
07/05/2006CN1796323A Difluoride composition, method of preparation, and use for frosting glass
07/05/2006CN1262500C Method for preparing microcrystalline glass/glass carrier material having nano holes in high density
07/04/2006US7070703 Process for producing glass disk substrates for magnetically recordable data storage disks
07/04/2006US7070702 selectively etching substrate, for example lithium niobate, by applying etchant such as hydrofluoric acid and nitric acid at surface of substrate and illuminating an area of the surface with light from a light source, whereby etching is partially inhibited in illuminated area of substrate
06/2006
06/29/2006WO2006068958A2 Non-contact discrete removal of substrate surface contaminants/coatings, and method, apparatus, and system for implementing the same
06/29/2006WO2006068869A2 Method of making a glass envelope
06/29/2006US20060138087 Copper containing abrasive particles to modify reactivity and performance of copper CMP slurries
06/29/2006US20060138086 Planarizing the silica with an aqueous mixture of a carboxy polymer, abrasive, polyvinylpyrrolidone, and optionally a cationic compound, phthalic acid or salts, and a zwitterionic compound; followed by cleaning with a aqueous quaternary ammonium compound, phthalic acid, carboxy polymer and abrasive
06/29/2006US20060137712 Cleaning apparatus and method for electronic device
06/28/2006EP1086389A4 Ultra-thin glass polarizers and method of making same
06/22/2006US20060134548 (Mercaptoalkyl)alkoxysilane-endcapped addition polymer (polyacrylamide, polyvinylacetamide) crosslinked with an alkoxide of Si, Ti, Zr or Al; improved resistance to stains during printing; can be scan-exposed on the basis of digital signals and processed into a printing plate by aqueous development
06/22/2006US20060131276 Uniformity in batch spray processing using independent cassette rotation
06/22/2006US20060131268 Non-contact discrete removal of substrate surface contaminants/coatings, and method, apparatus, and system for implementing the same
06/22/2006US20060130523 Method of making a glass envelope
06/20/2006US7063800 Methods of cleaning copper surfaces in the manufacture of printed circuit boards
06/20/2006US7063799 Ink jet recording head, manufacturing method therefor, and substrate for ink jet recording head manufacture
06/15/2006WO2006062386A1 Chemical process for obtaining glass with a total or partial satin/matt finish, comprising immersion in an acid solution, for simultaneous and continuous production
06/15/2006WO2006062385A1 Chemical process for obtaining anti-reflective glass, comprising immersion in an acid solution, for simultaneous and continuous production
06/15/2006US20060129161 Undercutting exposed bone surface beneath a mask by laser etching to provide interconnected recesses of varying depth; providing greater fractal area below the bone surface for cell growth and stabilization of the prosthesis; accurate computercontrol; sharp edges; roughness; surgery; grafting
06/15/2006US20060128159 Method of removing etch residues
06/15/2006US20060127680 Multi-layer hard mask structure for etching deep trench in substrate
06/15/2006US20060127640 Glass substrate with fine hole and method for producing the same
06/15/2006US20060125031 Microelectromechanical device having a common ground plane layer and a set of contact teeth and method for making aspects thereof
06/15/2006US20060124598 Difluoride composition, method of preparation, and use for frosting glass
06/15/2006US20060124597 Polishing medium for chemical-mechanical polishing, and method of polishing substrate member
06/15/2006US20060124595 Method of polishing film to be polished
06/15/2006US20060124591 Cerium oxide, acetylene compound, and water; flattening dielectrics; semiconductors
06/15/2006US20060124590 Using aqueous solution of potassium hydroxide and 0.1-0.5 g/L of diethylenetriamine pentaacetic acid as a scavenger and decontaminant for iron, nickel and copper; an etching method for etching a silicon wafer with a resistivity of no more than1 Omega *cm using the etching liquid; cost efficiency
06/15/2006US20060124245 High selective ratio and high and uniform plasma processing method and system
06/15/2006CA2590280A1 Chemical process for obtaining glass with a total or partial satin/matt finish, comprising immersion in an acid solution, for simultaneous and continuous production
06/15/2006CA2590173A1 Chemical process for obtaining anti-reflective glass, comprising immersion in an acid solution, for simultaneous and continuous production
06/14/2006EP1669430A1 Bifluorinated composition , method of preparation and use for roughening glass
06/14/2006DE102004059123A1 Substrate e.g. glass substrate, thinning device, has determining unit finding thinning period value based on sensor unit`s output value, thickness target value and auxiliary value specified based on difference in output and target values
06/13/2006US7060933 Method and laser system for production of laser-induced images inside and on the surface of transparent material
06/10/2006CA2528507A1 Difluoride composition, method of preparation and use for frosting glass
06/08/2006US20060121632 Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies
06/08/2006US20060118759 Etching pastes for titanium oxide surfaces
06/08/2006US20060118525 Apparatus and method for reducing removal forces for CMP pads
06/08/2006US20060118523 Planarization with reduced dishing
06/08/2006US20060118513 Method of fabricating an epitaxially grown layer
06/08/2006US20060118510 Process for producing light-emitting diode element emitting white light
06/07/2006EP0836653B1 Adhering metal to glass
06/06/2006US7057810 Microstructured screen with light absorbing material and method of manufacturing
06/06/2006US7056624 Single side engraving type which comprises a shifter part and a non- shifter part on a substrate; shading layer pattern formed with a shading film which covers continuously including the sidewall part of the recess
06/06/2006US7056447 Semiconductor processing methods
06/01/2006WO2006014785A3 Interactive wagering contest method and system
06/01/2006WO2005079476A3 Method of dry plasma etching semiconductor materials
06/01/2006US20060113037 Plasma processing apparatus and method for controlling the same
05/2006
05/31/2006CN1778748A Method for machining glass microchannel
05/30/2006US7052622 Method for measuring etch rates during a release process
05/25/2006US20060108326 Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios
05/25/2006US20060108321 Etching apparatus
05/25/2006US20060107696 Method for producing polarizing glass
05/24/2006DE10215044B4 Verfahren zum Ätzen und Trocknen von Substraten A method for etching and drying substrates
05/24/2006DE102004056045A1 Production of a reflection-reducing section within a section of a glass of a household appliance comprises masking the reflection-reducing section and mechanically and/or chemically liberating from a layer acting as a mirror
05/24/2006CN1777691A Method and apparatus for reducing substrate backside deposition during processing
05/23/2006US7050470 Optical waveguides on glass substrates and lasers formed therefrom
05/23/2006US7048870 Metallic implant and process for treating a metallic implant
05/23/2006US7048869 Etching silicon oxide with fluorohydrocarbon or fluorine; controlling temperature
05/18/2006US20060102586 High selectivity BPSG to TEOS etchant
05/17/2006EP1261761B1 Quartz member for semiconductor manufacturing equipment and method for metal analysis in quartz member
05/17/2006CN2780758Y Protective plate with protection function in glass acid etching process
05/16/2006US7045073 Pre-etch implantation damage for the removal of thin film layers
05/16/2006US7045072 Cleaning process and apparatus for silicate materials
05/11/2006US20060096945 Method for making a surface acoustic wave device package
05/10/2006EP0914676B1 Quartz glass component used in the production of semiconductors
05/10/2006CN1255842C Method for forming barrier structures on substrate and its resulting article
05/09/2006US7041231 Method of refurbishing a transition duct for a gas turbine system
05/09/2006US7041230 Method for selectively etching organosilicate glass with respect to a doped silicon carbide
05/09/2006US7041224 Method for vapor phase etching of silicon
05/04/2006DE102004008824B4 Glaskeramik mit geringer Wärmeausdehnung sowie deren Verwendung Glass ceramics with low thermal expansion, and their use
04/2006
04/27/2006WO2006044690A2 Low-k dielectric functional imprinting materials
04/27/2006WO2006044198A2 Heat transfer system for improved semiconductor processing uniformity
04/27/2006US20060089005 Photoresist conditioning with hydrogen ramping
04/27/2006US20060088774 Photomask blank, photomask and fabrication method thereof
04/20/2006US20060084275 Etch stop structure and method of manufacture, and semiconductor device and method of manufacture
04/20/2006US20060081559 Plasma processing apparatus and plasma processing method
04/20/2006US20060081557 Low-k dielectric functional imprinting materials
04/20/2006US20060081338 Spinning apparatus
04/20/2006US20060081335 Semiconductor substrate processing apparatus and semiconductor device fabrication method
04/20/2006US20060081008 Method for manufacturing synthetic silica glass substrate for photomask and synthetic silica glass substrate for photomask manufactured thereby
04/20/2006DE102004049233A1 Verfahren zur Mikrostrukturierung von Substraten aus Flachglas A process for micro-structuring of substrates made of plate glass
04/19/2006EP1647535A1 Method for microstructuring flat glass substrates
04/18/2006US7031428 Substrate material for X-ray optical components
04/18/2006US7029753 Multi-layer hard mask structure for etching deep trench in substrate
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