Patents for C03C 15 - Surface treatment of glass, not in the form of fibres or filaments, by etching (4,356)
11/2006
11/02/2006DE10225925B4 Ätzverfahren unter Verwendung einer Photolack-Ätzbarriere Etching processes using a photoresist etch
11/02/2006CA2599401A1 Composition and method for polishing a sapphire surface
10/2006
10/31/2006US7129028 Method of forming holographic grating
10/26/2006WO2006082751A3 Process for polishing glass substrate
10/26/2006US20060240672 Polishing liquid composition
10/24/2006US7125496 Etching method using photoresist etch barrier
10/19/2006WO2006110294A1 Anti-reflective surface
10/19/2006US20060234509 Cerium oxide abrasives for chemical mechanical polishing
10/18/2006CN1280221C Method for fabricating organic electroluminescent display and back cover made from glass
10/17/2006US7122126 Wet processing using a fluid meniscus, apparatus and method
10/17/2006US7122124 Method of fabricating film carrier
10/12/2006US20060228890 Cleaning solution and method of forming a metal pattern for a semiconductor device using the same
10/12/2006US20060226126 Polymeric inhibitors for enhanced planarization
10/12/2006US20060226124 Substrate and a method for polishing a substrate
10/12/2006US20060226123 Profile control using selective heating
10/11/2006CN1844003A Method for preventing fluorine diffusion in manufacturing process of fluorine-silicon glass
10/11/2006CN1843996A Method of plating on a glass base plate and a method of manufacturing a perpendicular magnetic recording medium
10/11/2006CN1278968C Method for manufacturing solid prefab
10/05/2006WO2006105150A2 Metal cmp process on one or more polishing stations using slurries with oxidizers
10/05/2006US20060223319 Chemical mechanical polishing method for manufacturing semiconductor device
10/05/2006US20060219663 Metal CMP process on one or more polishing stations using slurries with oxidizers
10/05/2006US20060219662 Fabrication process of semiconductor device and polishing method
10/05/2006US20060219660 Etching method
10/04/2006CN1840497A Self-cleaning nano glass and its production process
10/04/2006CN1277775C Method of producing glass substrate, glass substrate and organic electroluminescence element having the glass substrate
09/2006
09/28/2006US20060213870 Ink jet printing of etchants and modifiers
09/28/2006US20060213869 Method for controlling a CMP process and polishing cloth
09/28/2006US20060213868 Low-dishing composition and method for chemical-mechanical planarization with branched-alkylphenol-substituted benzotriazole
09/27/2006CN1277142C Chemical polishing method and device for liquid crystal glass base plate
09/21/2006WO2005091974A3 Methods for the optimization of substrate etching in a plasma processing system
09/21/2006US20060207973 Apparatus adapted to engrave a label and related method
09/21/2006DE19810810B4 Verfahren zum Nassätzen eines LCD-Glassubstrats sowie Ätzvorrichtung zur Durchführung des Verfahrens A method of wet etching of an LCD glass substrate, and etching apparatus for performing the method
09/14/2006US20060201914 Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion
09/14/2006US20060201910 Methods for removing extraneous amounts of molding material from a substrate
09/14/2006US20060201200 Process for producing high silicate glass and high silicate glass
09/13/2006EP1700406A2 Integrated glass ceramic systems
09/12/2006US7105454 Use of ammonia for etching organic low-k dielectrics
09/12/2006US7105103 System and method for the manufacture of surgical blades
09/08/2006WO2006092107A1 Bifacial decorated coloured glass plate and method of its production
09/07/2006US20060199082 Mask repair
09/07/2006US20060196849 Composition and method for polishing a sapphire surface
09/07/2006US20060196848 Use of a chemical-mechanical polishing system comprising an inorganic abrasive, a polishing additive such as aniline, and a liquid carrier, pH of 4 to 6; polishing silicon dioxide; Shallow Trench Isolation (STI); does not contain significant amounts of crosslinked polymer abrasives
09/07/2006US20060196527 Method of surface processing substrate, method of cleaning substrate, and programs for implementing the methods
09/06/2006CN1827541A Process for the production of precision press-molding preform and process for the production of optical element
09/05/2006US7101724 Method of fabricating semiconductor devices employing at least one modulation doped quantum well structure and one or more etch stop layers for accurate contact formation
08/2006
08/31/2006WO2006091235A1 Composite, nanostructured, super-hydrophobic material
08/31/2006US20060191872 Polishing a wafer having a first silicon dioxide region and a second silicon nitride region by moving the wafer and a fixed abrasive article in an aqueous solution containing 1.5 to 4 % by weight of a polymethacrylic acid and/or a polysulfonic acid having a pH of 6 to 8
08/31/2006US20060191871 Cmp slurry delivery system and method of mixing slurry thereof
08/31/2006US20060191870 Extended kalman filter incorporating offline metrology
08/29/2006US7097948 Method for repair of photomasks
08/29/2006US7097784 Etching method and apparatus for semiconductor wafers
08/29/2006US7097783 Method for inspecting a titanium-based component
08/24/2006WO2006087320A1 Process for the selective etching of a glass article surface
08/24/2006US20060189138 Method of processing substrate, post-chemical mechanical polishing cleaning method, and method of and program for manufacturing electronic device
08/24/2006US20060186089 Chemical mechanical polishing method
08/24/2006US20060185792 Substrate processing apparatus of and substrate processing method for treating substrate with predetermined processing by supplying processing liquid to rim portion of rotating substrate
08/23/2006CN1270993C Surface treating fluid for fine processing of multi-component glass substrate
08/22/2006US7093465 Method for heat treating synthetic quartz glass for optical use
08/17/2006WO2006085881A1 Elevator load bearing member having a jacket with at least one traction-enhancing exterior surface
08/17/2006WO2006031250A3 Selective high dielectric constant material etchant
08/17/2006US20060183329 Apparatus and method for reducing impurities in a semiconductor material
08/17/2006US20060180788 an aqueous fluid comprising an oxidizer that produces oxygen-containing free radicals when contacted with an activator comprising oxides of iron or copper coated with tin, and abrasive particles comprising alumina or alumina-coated silica, used for chemical mechanical polishing (cmp)
08/17/2006US20060180574 Thin film support substrate for use in hydrogen production filter and production method of hydrogen production filter
08/17/2006US20060180573 Placing substrate having an open metal surface thereon into a high pressure processing chamber and onto a platen configured to support substrate; introducing supercritical carbon dioxide fluid to high pressure processing chamber; introducing fluorosilicic acid and butyrolactone
08/17/2006US20060180572 Removal of post etch residue for a substrate with open metal surfaces
08/17/2006DE102005005196A1 Verfahren zur Herstellung eines Bauteils aus Quarzglas für den Einsatz in der Halbleiterfertigung und nach dem Verfahren erhaltenes Bauteil A method for producing a component of quartz glass for use in semiconductor manufacturing and component obtained by the process
08/16/2006CN1269760C PH adjustment of a melt for use in microetching glass substrates
08/10/2006WO2006081940A1 Process for producing a quartz glass component for use in semiconductor manufacture and component produced by this process
08/10/2006US20060177963 Process for producing copy protection for an electronic circuit
08/10/2006US20060175296 Method of manufacturing semiconductor device
08/10/2006US20060175294 Chemical mechanical polishing method and apparatus
08/10/2006US20060175293 Semiconductor device and method for manufacturing multilayered substrate for semiconductor device
08/10/2006US20060175290 Photo resist stripping and de-charge method for metal post etching to prevent metal corrosion
08/10/2006US20060175289 Method of fabricating semiconductor device
08/03/2006WO2006081149A2 Novel polishing slurries and abrasive-free solutions having a multifunctional activator
08/03/2006US20060169672 Film pattern forming method, film pattern, resist film, insulation film, circuit board, semiconductor device, surface elastic wave device, surface elastic wave oscillation device, electro-optic device, and electronic device
08/03/2006US20060169669 Etchant treatment processes for substrate surfaces and chamber surfaces
08/02/2006EP1686595A1 Transparent base with transparent conductive film, method for producing same, and photoelectric converter comprising such base
08/01/2006US7082789 Silica glass member for semiconductor and production method thereof
07/2006
07/27/2006WO2005079476B1 Method of dry plasma etching semiconductor materials
07/27/2006US20060166107 Method for plasma etching a chromium layer suitable for photomask fabrication
07/27/2006US20060166106 Including a film stack having a chromium layer and a patterned photoresist; depositing a conforming polymethylene protective layer on the patterned photoresist; etching the polymer to expose chromium and etching the chromium layer; patterns with small features; improves trenches
07/27/2006US20060163530 an acidic mixtures of oxidizers, complexing agents, water soluble ammonium salts of acrylic polymers, abrasives and water, used for chemical mechanical polishing barrier metals of integrated circuits
07/27/2006US20060163208 Photoresist stripping composition and methods of fabricating semiconductor device using the same
07/27/2006US20060163207 Substrate treating apparatus and substrate treating method using the same
07/27/2006US20060163206 Novel polishing slurries and abrasive-free solutions having a multifunctional activator
07/27/2006US20060163202 Plasma etching method
07/26/2006CN1809513A Methods of finishing quartz glass surfaces and components made by the methods
07/26/2006CN1807317A Tempering glass lid with ornament pattern
07/26/2006CN1807316A Production process of etching luminous glass with craft pattern
07/26/2006CN1266491C Method for manufacturing microlens array
07/26/2006CN1266065C Glass etching method using repeatedly-usable shielding
07/25/2006US7081415 Method of dry plasma etching semiconductor materials
07/20/2006WO2006075609A1 Grooved glass substrate, micro chemical chip and process for producing them
07/20/2006WO2006074791A1 Printable medium for the etching of silicon dioxide and silicon nitride layers
07/20/2006US20060157450 Method for improving hss cmp performance
07/20/2006DE102005007743A1 Druckfähiges Medium zur Ätzung von Siliziumdioxid- und Siliziumnitridschichten Printable medium for etching silicon dioxide and silicon nitride layers
07/19/2006CN1806310A Method and device for removing layers in some areas of glass plates
07/18/2006US7078350 Methods for the optimization of substrate etching in a plasma processing system
07/18/2006US7077975 Using mixture of mineral acids
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