C03C 15 - Surface treatment of glass, not in the form of fibres or filaments, by etching

Patents for C03C 15 - Surface treatment of glass, not in the form of fibres or filaments, by etching (4,356)
12/2007
12/06/2007	US20070278177 Processing method using atomic force microscope microfabrication device
12/06/2007	CA2652809A1 Methods of maintaining and using a high concentration of dissolved copper on the surface of a useful article
12/04/2007	US7303690 Microlens forming method
11/2007
11/29/2007	WO2007135874A1 Glass substrate provided with transparent electrode and method for manufacturing such glass substrate
11/29/2007	WO2007070353A3 Methods and apparatus for processing a substrate
11/29/2007	US20070275245 Activation Of A Glass Surface
11/27/2007	US7300597 Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material
11/22/2007	US20070269721 partially etching a carbon layer through a pattern in a photoresist silicon layer in an oxygen plasma, the oxygen ions in the plasma react with silicon in the photoresist to form a surface layer of silica on the photoresist and etching the remaining carbon layer in a hydrogen ion plasma; process control
11/22/2007	US20070267387 Processing Method of Silicon Wafer
11/22/2007	US20070266733 Method for manufacturing a lens of synthetic quartz glass with increased h2 content
11/20/2007	US7297892 Systems and methods for laser-assisted plasma processing
11/15/2007	WO2006113443A3 Etching technique for the fabrication of thin (ai, in, ga)n layers
11/15/2007	US20070264829 Slurry and method for chemical mechanical polishing
11/15/2007	US20070264591 Imprint lithography
11/15/2007	US20070262048 Highly Selective Doped Oxide Etchant
11/14/2007	CN100349309C Method for producing plane type gas sensor substrate by semiconductor technology
11/13/2007	US7294279 Method for releasing a micromechanical structure
11/08/2007	WO2007127872A2 Method and system to measure flow velocity and volume
11/08/2007	WO2007126461A2 Method for removing damaged dielectric material
11/08/2007	US20070257011 Advanced process control for low variation treatment in immersion processing
11/07/2007	EP1851286A2 Novel polishing slurries and abrasive-free solutions having a multifunctional activator
11/07/2007	EP1851071A1 Elevator load bearing member having a jacket with at least one traction-enhancing exterior surface
11/07/2007	CN100347757C Method of dry etching, method of manufacturing magnetic recording medium, and magnetic recording medium
11/06/2007	US7291284 Using a nanoscopic or atomic force microscope tip to apply a patterning chemical etching resist compound to a substrate (especially a semiconductor), and chemically etching the substrate
11/01/2007	US20070251922 Automatic gain control
11/01/2007	US20070251921 Method and System to Measure Flow Velocity and Volume
10/2007
10/31/2007	CN200967788Y Etching device for optical element surface restoring
10/31/2007	CN101062838A Method for manufacturing grinding glass substrate
10/31/2007	CN101062837A Etching apparatus for glass plate and method of glass etching using the same
10/30/2007	US7288208 Method of manufacturing ZnO substrate from ZnO crystal formed by hydrothermal synthesis method
10/25/2007	WO2007119860A1 Processing method of glass substrate, and highly flat and highly smooth glass substrate
10/25/2007	WO2007118491A1 Dosing procedure and dosing apparatus to heat treat glass containers internally
10/25/2007	US20070246442 Chemical oxide removal of plasma damaged sicoh low k dielectrics
10/24/2007	CN101058485A Method of producing glass with color-bottom and three-dimensional pattern
10/24/2007	CN101058482A Method of producing frosting-coating composite pattern glass
10/18/2007	US20070243714 Method of controlling silicon-containing polymer build up during etching by using a periodic cleaning step
10/18/2007	US20070240630 One hundred millimeter single crystal silicon carbide water
10/17/2007	EP1843985A2 Process for polishing glass substrate
10/17/2007	EP1843984A1 Process for producing a quartz glass component for use in semiconductor manufacture and component produced by this process
10/17/2007	EP1843903A2 Processes for forming electronic devices and electronic devices formed by such processes
10/17/2007	CN200961148Y 蚀刻机 Etching
10/17/2007	CN101055839A Electrophoresis method glass passivation technology of the silicon rectifier
10/17/2007	CN101054265A Glass etching liquid for flat panel display
10/17/2007	CN100343708C Production of buried glass light waveguide device
10/17/2007	CN100343189C Etching pastes for inorganic surfaces
10/16/2007	US7282157 Method of manufacturing light-propagating probe for near-field microscope
10/16/2007	US7281394 Method of manufacturing glass substrate and method of manufacturing information recording medium
10/11/2007	US20070235411 Method for removing damaged dielectric material
10/10/2007	CN200958075Y Distributing-gear structure of glass sand coating machinery
10/10/2007	CN101051604A Method and device of panel etching process
10/10/2007	CN101051603A Method and device for panel etching process
10/10/2007	CN101051602A Method and its device for panel etching process
10/09/2007	US7279116 Method for the wet treatment of disk-like objects
10/04/2007	US20070228012 Method for making a satin finish surface
10/04/2007	US20070228011 Novel chemical composition to reduce defects
10/03/2007	EP1838639A1 Printable medium for the etching of silicon dioxide and silicon nitride layers
10/02/2007	US7276449 Gas assisted method for applying resist stripper and gas-resist stripper combinations
10/02/2007	US7276181 Method for preparing decorative glass using glass etching composition
10/02/2007	US7276174 Etching plastic surface with sulfuric acid and chromic anhydride in solution comprising oxidation catalyst; metallized coatings; decorations
09/2007
09/27/2007	US20070224822 Halide anions for metal removal rate control
09/27/2007	US20070222342 Method for manufacturing piezoelectric resonator element
09/27/2007	US20070221615 Liquid supply method, liquid supply apparatus, substrate polishing apparatus, and method of measuring supply flow rate of liquid
09/27/2007	US20070221614 Method to reduce stacking fault nucleation sites and reduce vf drift in bipolar devices
09/27/2007	US20070221613 Structure for stopping mechanical cracks in a substrate wafer, use of the structure and a method for producing the structure
09/26/2007	CN101041556A Production method of colorful-substrate emulsifying glass capable of changing patterns along with visual angles
09/26/2007	CN101041555A Ornamental glass having etching pattern and multicolor pattern and and method for manufacturing same
09/25/2007	US7273691 Planographic printing plate precursor, substrate for the same and surface hydrophilic material
09/20/2007	US20070218692 Copper-based metal polishing compositions and polishing processes
09/20/2007	US20070215835 Surface treating fluid for fine processing of multi-component glass substrate
09/20/2007	US20070215280 Semiconductor surface processing
09/19/2007	EP1834932A1 Chemical process for obtaining glass with a total or partial satin/matt finish, comprising immersion in an acid solution, for simultaneous and continuous production
09/19/2007	EP1833684A2 Selective surface texturing through the use of random application of thixotropic etching agents
09/19/2007	CN101037301A Production method of deep etching glass capable of changing patterns along with visual angles
09/19/2007	CN101037300A Production method of color-based glass with solid pattern
09/19/2007	CN101037185A Method for making nano-groove on quartz glass
09/19/2007	CN100338739C Manufacturing method of structural body, droplet discharging head and droplet discharging device
09/18/2007	US7270764 Applying caustic solution then nitric acid; without damage to base metal from used turbine engine blade having a metal-based substrate and an aluminide coating
09/13/2007	US20070212882 Substrate polishing method and method of manufacturing semiconductor device
09/13/2007	US20070210029 Process for Producing Microfluidic Arrangements from a Plate-Shaped Composite Structure
09/13/2007	US20070209394 Image display device and manufacturing method of the same
09/12/2007	CN101033116A Apparatus of thinning a glass substrate
09/11/2007	US7268486 Hermetic encapsulation of organic, electro-optical elements
09/07/2007	WO2006101772A3 Split magnet ring on a magnetron sputter chamber
09/06/2007	US20070207622 Highly selective doped oxide etchant
09/05/2007	EP1829834A1 Chemical process for obtaining anti-reflective glass, comprising immersion in an acid solution, for simultaneous and continuous production
09/05/2007	CN101031520A Activation of a glass surface
09/05/2007	CN100335969C Method of treatment of porous dielectric films to reduce damage during cleaning
09/04/2007	US7265070 Synthetic silica glass optical material having high resistance to optically induced index change
08/2007
08/30/2007	WO2007096958A1 Glass processing method using laser and processing device
08/30/2007	US20070202702 forming film on wafer having at least one trench structure thereon, polishing surface of film by providing a polishing composition to provide a first polished surface, rinsing surface, and polishing with second polishing composition; provides surface free of residual silicon nitride in diffusion areas
08/30/2007	US20070199923 Polishing device and polishing method
08/29/2007	EP1824795A1 Semi-transparent material with differential screening according to the light intensity on the two sides thereof
08/28/2007	US7261832 Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies
08/23/2007	US20070197035 Wafer and method of producing the same
08/23/2007	US20070193973 Infinitely selective photoresist mask etch
08/23/2007	DE10147648B4 Verfahren zur Ausbildung von Durchbrüchen in einer Glasscheibe. A method for forming openings in a glass sheet.
08/22/2007	EP1448490B1 Transparent substrate comprising an electrode
08/21/2007	US7258834 Methods and devices for modifying a substrate surface
08/21/2007	US7258810 In-situ oxidized textured surfaces for prosthetic devices and method of making same
08/21/2007	US7258809 Including selectively etching an exposed portion of the top magnetic layer, and underlying portions of the tunnel barrier and the pinned bottom magnetic film layer using an etchant solution containing an arylsulfonic acid and an aliphatic or alicyclic amine.

1 ... 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 ... 44