| Patents for C03C 15 - Surface treatment of glass, not in the form of fibres or filaments, by etching (4,356) |
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| 08/26/2008 | US7416680 a mixture of carrier fluids, colloidal particles, etchants and surfactants comprising sodium octyl sulfate, used for cleaning or polishing glass or ceramic disks used in data storage devices |
| 08/26/2008 | US7416677 Exhaust assembly for plasma processing system and method |
| 08/26/2008 | US7416676 Plasma etching method and apparatus, control program for performing the etching method, and storage medium storing the control program |
| 08/26/2008 | US7416674 Method for fabricating micro optical elements using CMP |
| 08/20/2008 | EP1957207A1 Method of enhancing biocompatibility of elastomeric materials by microtexturing using microdroplet patterning |
| 08/20/2008 | EP1572833B1 Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal |
| 08/14/2008 | US20080190892 Plasma etching method, plasma etching apparatus, control program and computer-readable storage medium |
| 08/13/2008 | EP1954642A1 Internal treatment process and device for the internal treatment of glass containers |
| 08/13/2008 | CN101239786A Multi-layer multi-effect stereo pattern technique glass and producing method thereof |
| 08/13/2008 | CN101239785A Large screen thin film transistor die set thinning liquid and producing method thereof |
| 08/13/2008 | CN100410357C Cleaning composition for semiconductor components and process for manufacturing semiconductor device |
| 08/06/2008 | CN101234853A Attenuation method and device for flat glass substrate |
| 07/31/2008 | US20080179294 Oxides of boron, nitrogen, aluminum, phosphorus, sulfur, titanium, ger;manium, arsenic, selenium, circonium, niobum, molybdenum, ruthenium, rhodium, tin, antimony, tellurium, tantallum, tungsten, rhenium, iridium, platinum, mercury, lead, bismuth, yttrium, and lutetium; reactive ion etching |
| 07/29/2008 | US7404910 Etching solution, etched article and method for etched article |
| 07/23/2008 | CN101228097A Etching media for oxidic, transparent, conductive layers |
| 07/23/2008 | CN100404450C Methods of finishing quartz glass surfaces and components made by the methods |
| 07/22/2008 | US7402259 Chemical-mechanical polishing methods |
| 07/22/2008 | US7402258 Methods of removing metal contaminants from a component for a plasma processing apparatus |
| 07/17/2008 | US20080171209 Method for cutting glass laminate |
| 07/16/2008 | CN101223116A Printable etching media for silicon dioxide and silicon nitride layers |
| 07/10/2008 | WO2008083329A2 Precision oscillator having linbus capabilities |
| 07/10/2008 | DE10222609B4 Verfahren zur Herstellung strukturierter Schichten auf Substraten und verfahrensgemäß beschichtetes Substrat A process for the production of structured layers on substrates and methods according coated substrate |
| 07/09/2008 | CN101218184A Combined etching and doping media for silicon dioxide layers and subjacent silicon |
| 07/09/2008 | CN101215101A Flat glass substrate attenuation clamp |
| 07/09/2008 | CN101215100A Flat glass substrate attenuation etching groove |
| 07/09/2008 | CN101215099A Flat glass substrate attenuation etching liquid |
| 07/09/2008 | CN101215098A Method for producing silk glass |
| 07/09/2008 | CN101215097A Formulation of anti-dazzle glass product etching liquid and etching technique |
| 07/09/2008 | CN101215096A Plasma display barrier wall slurry |
| 07/09/2008 | CN101215095A Method for preparing plasma display barrier wall slurry |
| 07/08/2008 | US7396741 Method for connecting substrate and composite element |
| 07/03/2008 | WO2008052528A3 Method and device for patterning components using a material based on silicon oxide |
| 07/02/2008 | CN101209902A Glass thinning method |
| 07/01/2008 | US7393461 Roughening a copper or copper alloy surface to provide improved adhesion for solder mask applications by contacting with a cupric ion source, a pyridine derivative, a polyethylenamine, and an acid |
| 07/01/2008 | US7393431 Bubble plate for etching and etching apparatus using the same |
| 06/25/2008 | EP1935520A1 Aqueous solution and method for separation of conductive sintered ceramic material |
| 06/25/2008 | EP1935519A1 Aqueous solution and method for separation of dark sintered ceramic material |
| 06/25/2008 | CN101208277A Medium for etching oxidic transparent conductive layers |
| 06/25/2008 | CN100397593C Method for the production of structured layers on substrates |
| 06/24/2008 | US7390423 applying slurries comprising carrier fluids, particles, etchants and surfactants, to the surfaces of glass, ceramic, metal or alloy substrates use in data storage, then rubbing with pads |
| 06/19/2008 | US20080142481 In-situ particle collector |
| 06/19/2008 | US20080142480 Method of finishing pre-polished glass substrate surface |
| 06/19/2008 | US20080142477 Process for the Selective Etching of a Glass Article Surface |
| 06/19/2008 | DE102006048997B3 Process to apply a coating of hydrophilic or hydrophobic agent to a surface roughened glass tumbler |
| 06/18/2008 | EP1932813A1 Transparent illuminated panel |
| 06/18/2008 | CN101201490A Method for thinning display panel device |
| 06/17/2008 | US7387741 Power module member manufactured by wet treatment, and wet treatment method and wet treatment equipment thereof |
| 06/12/2008 | WO2008068962A1 Surface-treated glass and process for producing the same |
| 06/12/2008 | WO2008046877A3 Matt glass sheet |
| 06/12/2008 | US20080135520 Chemical composition for chemical mechanical planarization |
| 06/11/2008 | CN100394554C Wet processing tank and fluid supply system for liquid crystal display production equipment |
| 06/11/2008 | CN100393648C Method of cutting glass substrate material |
| 06/10/2008 | US7384570 Anodizing a web on both sides; sealing the anodic layer; and etching the first side but not the second side with sodium hydroxide to provide a web that with both a decorative side and a side with superior bonding capabilities. |
| 06/10/2008 | US7384568 Method of forming a darkfield etch mask |
| 06/05/2008 | WO2008065973A1 Method for finishing surface of preliminary polished glass substrate |
| 06/05/2008 | US20080128391 Chemical etching composition for the preparation of 3-D nano-structures |
| 06/04/2008 | CN101191940A Glass substrate repeated usage method |
| 06/03/2008 | US7380320 Piezoelectric device and method of manufacturing the device |
| 05/29/2008 | WO2008062657A1 Method for producing glass substrate for information recording medium, glass substrate for information recording medium, and information recording medium |
| 05/29/2008 | US20080121622 Ammonium bifluoride, acetic acid, hydrochloric acid, and solvent (dimethylformamide); high density plasma silicon oxide layer and borophosphosilicate glass layer; etch resistance; electrical resistance |
| 05/29/2008 | US20080121621 Printable Medium for the Etching of Silicon Dioxide and Silicon Nitride Layers |
| 05/28/2008 | CN101189192A Process for producing glass bar |
| 05/28/2008 | CN101189134A Selective surface texturing through the use of random application of thixotropic etching agents |
| 05/27/2008 | US7378353 High selectivity BPSG to TEOS etchant |
| 05/27/2008 | US7378031 Liquid phase etching method and liquid phase etching apparatus |
| 05/22/2008 | US20080116172 Method For One-To-One Polishing Of Silicon Nitride And Silicon Oxide |
| 05/22/2008 | US20080116171 Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide |
| 05/15/2008 | US20080111445 Drive module comprising an mems micromotor, process for the production of this module and timepiece fitted with this module |
| 05/14/2008 | CN100387749C Method for forming housings for electronic components and electronic components that are hermetically encapsulated thereby |
| 05/13/2008 | US7371485 Multi-step process for etching photomasks |
| 05/13/2008 | US7371331 Method of creating a patterned monolayer on a surface |
| 05/08/2008 | WO2008055174A2 Peak-based endpointing for chemical mechanical polishing |
| 05/08/2008 | WO2008054954A2 High density lithographic process |
| 05/08/2008 | US20080105651 Polishing Slurry for Cmp |
| 05/08/2008 | DE102006051550A1 Verfahren und Vorrichtung zum Strukturieren von Bauteilen unter Verwendung eines Werkstoffs auf der Basis von Siliziumoxid Method and apparatus for patterning of components using a material based on silica |
| 05/07/2008 | EP1918261A1 Chemical etching composition for the preparation of 3-d nanostructures |
| 05/07/2008 | CN101174553A Island-projection-decorated component, its manufacturing method, and apparatus using it |
| 05/01/2008 | US20080102380 High density lithographic process |
| 05/01/2008 | US20080099443 Peak-based endpointing for chemical mechanical polishing |
| 05/01/2008 | US20080099441 Apparatus and method for reactive atom plasma processing for material deposition |
| 04/30/2008 | EP1495154B1 Method for forming housings for electronic components and electronic components that are hermetically encapsulated thereby |
| 04/29/2008 | US7364665 Selective etching processes of SiO2 , Ti and In2 O3 thin films for FeRAM device applications |
| 04/24/2008 | WO2008046877A2 Matt glass sheet |
| 04/24/2008 | US20080092594 Automatic machine and automatic method for grinding the edges of glass panes |
| 04/23/2008 | CN101164945A Glass substrate homogenizing and thinning device |
| 04/22/2008 | US7361610 Method of etching a glass substrate |
| 04/22/2008 | US7361285 Method for fabricating cliche and method for forming pattern using the same |
| 04/17/2008 | WO2008020756A3 Panels made of glass |
| 04/17/2008 | US20080087640 Laser processing apparatus |
| 04/17/2008 | US20080087638 Selective-redeposition sources for calibrating a plasma process |
| 04/17/2008 | US20080087045 Method of manufacturing glass substrate for use in information recording medium, and method of manufacturing information recording medium |
| 04/16/2008 | EP1910240A1 Etching media for oxidic, transparent, conductive layers |
| 04/16/2008 | EP1551936A4 Composition and process for wet stripping removal of sacrificial anti-reflective material |
| 04/16/2008 | CN101164121A Plasma oxidation and removal of oxidized material |
| 04/15/2008 | US7357879 Cupric chloride solution and triazole compound; capable of forming an etching-inhibiting coating; nonuniform irregularities formed on the side wall of the circuit pattern by the etching improves the adhesion between the circuit pattern and an insulating resin layer covering the circuit pattern |
| 04/09/2008 | EP1908736A2 Frosted glass |
| 04/09/2008 | EP1363859A4 Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces |
| 04/09/2008 | CN101157520A Construction method for composite pattern having both micron and nano structures |
| 04/09/2008 | CN100379837C Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal |
| 04/08/2008 | US7354526 Processing method for glass substrate, processed glass product and stress applying apparatus |