Patents for C03C 15 - Surface treatment of glass, not in the form of fibres or filaments, by etching (4,356) |
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08/16/2007 | US20070190789 Compositions and methods for CMP of indium tin oxide surfaces |
08/16/2007 | DE10222958B4 Verfahren zur Herstellung eines organischen elektro-optischen Elements und organisches elektro-optisches Element A method of manufacturing an organic electro-optical element and an organic electro-optical element |
08/16/2007 | DE102006035797B3 Method for cleaning quartz glass surfaces used in semiconductor finishing comprises pre-cleaning in an acidic cleaning solution under the action of hydrogen peroxide and post-treating in an alkali cleaning solution |
08/15/2007 | EP1818317A1 Method of manufacturing a glass substrate with a satin appearance |
08/15/2007 | CN1332071C Silica glass crucible |
08/15/2007 | CN101018734A A method for making MEMS switch, and MEM device and its making method |
08/14/2007 | US7255943 Glass substrate for a magnetic disk, magnetic disk, and methods of producing the glass substrate and the magnetic disk |
08/09/2007 | US20070184662 Double-side polishing carrier and fabrication method thereof |
08/09/2007 | US20070184658 Etching Liquid for Controlling Silicon Wafer Surface Shape |
08/09/2007 | US20070184354 Process for etching photomasks |
08/09/2007 | US20070181851 Polishing composition and polishing method |
08/09/2007 | US20070181535 Chemical mechanical polishing of a bimetallic substrate with a mixture of an abrasive and two polishing rate modifiers: 9,10-anthraquinone-1,8-, 1.5- or 2,6-disulfonic acid having a standard reduction potential less than 0.34 and a second agent having a standard reduction potential greater than 0.34 V |
08/09/2007 | US20070181534 Barrier polishing liquid and chemical mechanical polishing method |
08/08/2007 | CN1331198C Use of ammonia for etching organic low-K dielectrics |
08/08/2007 | CN101015041A Etch and deposition control for plasma implantation |
08/07/2007 | US7252774 Selective chemical etch method for MRAM soft layers |
08/02/2007 | US20070178700 Compositions and methods for CMP of phase change alloys |
08/02/2007 | US20070176140 Polishing composition and polishing method |
08/02/2007 | US20070175864 Low Cost High Throughput Processing Platform |
08/02/2007 | US20070175863 Single Wafer Etching Apparatus and Single Wafer Etching Method |
08/02/2007 | US20070175857 Decorative surface treatment for metals |
08/01/2007 | CN1329285C Method for producing a product having a structured surface |
07/31/2007 | US7251082 Photochromic/vitroceramic window assembly |
07/31/2007 | US7250114 Methods of finishing quartz glass surfaces and components made by the methods |
07/26/2007 | US20070170148 Methods for in-situ generation of reactive etch and growth specie in film formation processes |
07/26/2007 | US20070170146 Fin structure formation |
07/26/2007 | DE102006003606A1 Method for structuring a surface layer on a substrate used in micro-structuring comprises guiding a liquid jet directed onto the surface layer over the regions of the layer to be removed |
07/25/2007 | CN2926220Y Circulating-glass bottle automatic montmorillonite production line |
07/25/2007 | CN1328196C Etching solution for forming an embedded resistor |
07/25/2007 | CN101005024A Method of treatment of porous dielectric films to reduce damage during cleaning |
07/24/2007 | US7247250 Method for manufacturing a fast heat rise resistor |
07/24/2007 | US7247249 Method of treating razor blade cutting edges |
07/19/2007 | WO2007081624A2 Notch stop pulsing process for plasma processing system |
07/19/2007 | WO2006091909A3 Etching and cleaning bpsg material using supercritical processing |
07/19/2007 | US20070167015 Polishing method |
07/19/2007 | US20070166520 Glass material for use at high frequencies |
07/19/2007 | US20070163998 Composition for polishing semiconductor layers |
07/19/2007 | US20070163996 Plasma processing apparatus and plasma processing method |
07/19/2007 | US20070163993 Planarization with reduced dishing |
07/19/2007 | US20070163992 Method and device for contacting semiconductor chips |
07/18/2007 | CN1326791C Method for processing micro slot array on borosilicate glass surface |
07/18/2007 | CN100999386A Method of manufacturing glass microractor by etching |
07/17/2007 | US7244311 Heat transfer system for improved semiconductor processing uniformity |
07/12/2007 | WO2006081149A3 Novel polishing slurries and abrasive-free solutions having a multifunctional activator |
07/12/2007 | US20070161247 Etching method of single wafer |
07/12/2007 | US20070158309 Slurry composition for chemical-mechanical polishing capable of compensating nanotopography effect and method for planarizing surface of semiconductor device using the same |
07/12/2007 | US20070158308 Method for manufacturing single-side mirror surface wafer |
07/12/2007 | US20070158306 Method of forming a metal line and method of manufacturing display substrate having the same |
07/12/2007 | US20070158302 Systems and methods for gas assisted resist removal |
07/11/2007 | CN1997771A Methods for the optimization of substrate etching in a plasma processing system |
07/05/2007 | WO2007073664A1 A process for producing hurricane-resistant glass |
07/05/2007 | US20070155181 Method and system for etching high-k dielectric materials |
07/05/2007 | US20070151951 Stopper for chemical mechanical planarization, method for manufacturing same, and chemical mechanical planarization method |
07/05/2007 | US20070151948 Method of selectively stripping a metallic coating |
07/05/2007 | US20070151947 Method for setting plasma chamber having an adaptive plasma source, plasma etching method using the same and manufacturing method for adaptive plasma source |
07/05/2007 | US20070151944 providing an acidic mixed solution includes nitric acid and ammonium fluoride, free of hydrofluoric acid; and a mixture of phosphoric acid, sulfuric acid and acetic acid; immersing the silicon wafer in the acidic mixed solution; and etching; stable, controllable and less hazardous for environment |
07/04/2007 | CN1993298A Process for manufacturing glass substrate for magnetic recording medium and glass substrate for magnetic recording medium obtained by the process |
07/04/2007 | CN1990402A Hurricane-proof glass manufacturing technique |
06/28/2007 | US20070148978 Slurry compositions, methods of polishing polysilicon layers using the slurry compositions and methods of manufacturing semiconductor devices using the slurry compositions |
06/28/2007 | US20070145014 Polishing composition for glass substrate |
06/28/2007 | US20070145013 Method for polishing workpiece, polishing apparatus and method for manufacturing semiconductor device |
06/28/2007 | US20070145012 Slurry and method for chemical-mechanical polishing |
06/28/2007 | US20070145011 Chemical mechanical polishing system and process |
06/28/2007 | US20070145010 Removal rate estimating method of a chemical mechanical polishing process under mixed products or mixed layers |
06/28/2007 | US20070145008 Techniques Of Anisotropic Wet Etch Micromachining For Comb Drive Transducers And Resonance Frequency Reduction |
06/28/2007 | US20070145002 Multi-printed etch mask process to pattern features |
06/26/2007 | US7235137 Conductor treating single-wafer type treating device and method for semi-conductor treating |
06/21/2007 | WO2007070353A2 Methods and apparatus for processing a substrate |
06/21/2007 | US20070141850 Wet Treatment of Hafnium Containing Materials |
06/21/2007 | US20070141847 Notch stop pulsing process for plasma processing system |
06/21/2007 | US20070141845 Apparatus and method for supplying chemicals |
06/21/2007 | US20070141349 Alkaline glasses with modified glass surfaces and process for the production thereof |
06/21/2007 | US20070138141 Method of polishing a semiconductor-on-insulator structure |
06/21/2007 | US20070138140 Method for controlling polishing process |
06/21/2007 | US20070138139 Method of manufacturing semiconductor device, acid etching resistance material and copolymer |
06/21/2007 | US20070138138 formed by dipping, picking; high silicon content, high strength; free from bald spots; conversion coatings with improved adhesion, corrosion resistance; for automobile chassis parts |
06/21/2007 | US20070138137 Method for patterning low dielectric layer of semiconductor device |
06/21/2007 | US20070138131 Method of forming a patterned layer on a substrate |
06/21/2007 | US20070138130 Method for manaufacturing glass substrate having uneven surface |
06/21/2007 | US20070138129 Method for manufacturing field emission cathode |
06/21/2007 | US20070138126 Methods of forming a conductive structure |
06/14/2007 | US20070134923 Method to form topography in a deposited layer above a substrate |
06/14/2007 | US20070131654 Methods and apparatus for processing a substrate |
06/14/2007 | US20070131653 Methods and apparatus for processing a substrate |
06/14/2007 | DE102005058713A1 Verfahren zur trockenchemischen Behandlung von Substraten, sowie dessen Verwendung A process for the dry-chemical treatment of substrates, and the use thereof |
06/07/2007 | WO2007062694A1 Internal treatment process and device for the internal treatment of glass containers |
06/07/2007 | US20070128873 Aqueous dispersion for cmp, polishing method and method for manufacturing semiconductor device |
06/07/2007 | US20070125751 Stripping device and stripping apparatus |
06/07/2007 | US20070125747 Process for polishing glass substrate |
06/07/2007 | CA2631346A1 Inner treatment method and device for the inner treatment of glass containers |
06/06/2007 | EP1791794A2 Composite, ordered material having sharp surface features |
06/06/2007 | CN1976880A Method for producing a hydrophobic coating, device for implementing said method and support provided with a hydrophobic coating |
06/06/2007 | CN1974458A Corrosion deactivating process of treating surface microcrack in glass medium as laser work matter |
05/31/2007 | WO2007061579A2 Chamber components with polymer coatings and methods of manufacture |
05/31/2007 | WO2007061018A1 Method of glass substrate working and glass part |
05/31/2007 | US20070123052 Process sequence for photoresist stripping and cleaning of photomasks for integrated circuit manufacturing |
05/31/2007 | US20070123049 Semiconductor process and method for removing condensed gaseous etchant residues on wafer |
05/31/2007 | US20070123047 Polishing machine, workpiece supporting table pad, polishing method and manufacturing method of semiconductor device |
05/31/2007 | US20070122745 Surface formed by a hydrophilic addition polymer such as polyacrylamide having alkoxysilylalkylthio- end groups crosslinked with a Si, Al, Ti or Zr alkoxide or aryl oxide; improved resistance to stains during printing |
05/31/2007 | US20070119817 Manufacturing method of silicon wafer |