Patents for C03C 15 - Surface treatment of glass, not in the form of fibres or filaments, by etching (4,356)
05/2007
05/31/2007US20070119816 Systems and methods for reclaiming process fluids in a processing environment
05/31/2007US20070119815 Process for laser processing and apparatus for use in the same
05/31/2007US20070119812 Process and equipment for bonding by molecular adhesion
05/24/2007WO2007058954A1 Method of enhancing biocompatibility of elastomeric materials by microtexturing using microdroplet patterning
05/24/2007US20070117393 Hardened porous polymer chemical mechanical polishing (CMP) pad
05/24/2007US20070113587 Photochromic ocular devices
05/23/2007EP1290711A4 Method for forming barrier structures on a substrate and the resulting article
05/23/2007CN1317738C Etching method, a substrate with a plurality of concave portions, a microlens substrate, a transmission screen and a rear projection
05/22/2007US7220690 Glass ceramic having a low thermal expansion
05/22/2007US7220446 Management technique of friction coefficient based on surface roughness, substrate for information recording medium, information recording medium and manufacture method thereof
05/18/2007WO2005112092A3 CARBON-DOPED-Si OXIDE ETCH USING H2 ADDITIVE IN FLUOROCARBON ETCH CHEMISTRY
05/17/2007US20070111110 In-situ plasma treatment of advanced resists in fine pattern definition
05/17/2007US20070108664 Process for chemical etching of parts fabricated by stereolithography
05/17/2007US20070108161 Chamber components with polymer coatings and methods of manufacture
05/17/2007US20070107467 Metal glass body, process for producing the same and apparatus therefor
05/16/2007CN1962507A Production method of acid pickled glass with mandarin duck pattern effect
05/10/2007US20070104954 Antistatic glass substrate production method and antistatic glass substrate produced by the method
05/10/2007US20070102664 polish the polycrystalline silicon surface with a slurry comprising a non-ionic perfluoroalkyl sulfonyl surfactant; planarization of integrated circuit in semiconductor manufacturing processes; prevent the problem of dishing and improve the within-wafer-non-uniformity
05/03/2007WO2007049545A1 Process for producing glass bar
05/03/2007WO2006118809A3 Process and apparatus for scoring a brittle material incorporating moving optical assembly
05/03/2007US20070099423 Method of removing a metal silicide layer on a gate electrode in a semiconductor manufacturing process and etching method
05/03/2007US20070095791 Substrate processing apparatus and substrate processing method
05/02/2007EP1778412A1 Composite, nanostructured, super-hydrophobic material
05/02/2007CN1955132A Etching device of glass substrate
05/01/2007CA2373546C A method of producing a planar waveguide device having a core and cladding with grooves having a direct interface with the core, and the waveguide thereof
04/2007
04/26/2007US20070093064 Polishing method of Cu film and method for manufacturing semiconductor device
04/26/2007US20070093061 Solvent removal of photoresist mask and gold impregnated residue and process
04/26/2007US20070090094 Polishing with a composition of an abrasive, hydrogen peroxide, an organic acid, a heterocyclic compound, a phosphonic acid, and water
04/26/2007US20070090092 Method and device for removing layers in some areas of glass plates
04/26/2007US20070090090 Dry etching method
04/24/2007CA2198132C Method for making surface relief profilers
04/19/2007US20070087568 Apparatus for etching wafer by single-wafer process and single wafer type method for etching wafer
04/19/2007US20070084829 System for processing a workpiece
04/19/2007US20070084828 Polishing composition for a semiconductor substrate
04/19/2007US20070084827 Semiconductor processing
04/18/2007EP1775752A2 Etching process for manufacturing an electron exit window
04/18/2007CN1950338A Polymer ionic electrolytes
04/12/2007US20070080142 Method and apparatus for forming a planarizing pad having a film and texture elements for planarization of microelectronic substrates
04/12/2007US20070079632 Thin silicon layer and method of manufacturing thereof
04/11/2007CN1947225A Pattern transfer method
04/11/2007CN1944307A Normal temperature polishing and renovating process for glass surface
04/10/2007US7202169 Method and system for etching high-k dielectric materials
04/10/2007US7201954 Method for forming barrier structures on a substrate and the resulting article
04/10/2007US7201853 Applying photoresist polymer to substrate; curing; etching; forming projections
04/10/2007US7201852 Method for removing defects from silicon bodies by a selective etching process
04/10/2007US7201851 Vacuum processing apparatus and substrate transfer method
04/05/2007US20070077767 Method of plasma etching of high-k dielectric materials
04/05/2007US20070077368 Ion beam method for removing an organic light emitting material
04/05/2007US20070075291 CMP Slurry, Preparation Method Thereof and Method of Polishing Substrate Using the Same
04/05/2007US20070075042 Stabilizer-Fenton's reaction metal-vinyl pyridine polymer-surface-modified chemical mechanical planarization composition and associated method
04/05/2007US20070075040 Composition and method for planarizing surfaces
04/05/2007US20070075038 Vertical profile fixing
04/05/2007US20070074814 Apparatus and method for treating a substrate with plasma, and facility for manufacturing semiconductor devices
04/04/2007CN1939857A Self-cleaning glass and its production
04/03/2007US7197897 Chemical strengthening process for disks used in disk drive data storage devices
03/2007
03/29/2007US20070072427 Method for fabricating semiconductor device and polishing method
03/29/2007US20070072426 Chemical mechanical polishing process and apparatus therefor
03/29/2007US20070068902 Polishing composition and polishing method
03/29/2007US20070068901 Composition and method for enhancing pot life of hydrogen peroxide-containing CMP slurries
03/29/2007DE112005000991T5 Aktivierung einer Glasoberfläche Activation of a glass surface
03/27/2007US7195715 Forming a first resist layer on one surface of a quartz substrate, exposing first resist layer to light of a first amount of exposure to form a patterned first masking layer, forming a second resist layer on the other surface of quartz substrate, exposing second resist layer, etching
03/22/2007WO2007032961A2 Chemically strengthened lithium aluminosilicate glass
03/22/2007WO2007032503A1 Aqueous solution and method for separation of conductive sintered ceramic material
03/22/2007WO2007032502A1 Aqueous solution and method for separation of dark sintered ceramic material
03/22/2007WO2007003255A8 Medium for etching oxidic transparent conductive layers
03/22/2007US20070062910 Complex CMP process and fabricating methods of STI structure and interconnect structure
03/22/2007US20070062909 cleaning with a detergent, then deionized water, then treating with a nitric acid solution; useful for gas distribution in semiconductor processing equipment; leakproof
03/21/2007EP1051363B1 Quartz glass jig having large irregularities on the surface
03/20/2007US7192529 Plurality of protrusions of different heights; protrusions of larger height having a stack structure formed of layers of at least two types of materials, allowing transfer of a number of patterns at the same time.
03/15/2007US20070060465 Chemically strengthened lithium aluminosilicate glass having high strength effective to resist fracture upon flexing from impact of high velocity projectiles
03/15/2007US20070059936 Electronic sensing circuit
03/14/2007EP1761471A1 Process for polishing glass substrate
03/14/2007EP1700406A4 Integrated glass ceramic systems
03/13/2007US7189783 Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof
03/13/2007US7189335 Conformal coverings for electronic devices
03/13/2007US7189305 Gas-assist systems for applying and moving ozonated resist stripper to resist-bearing surfaces of substrates
03/08/2007US20070051699 Methods of removing metal contaminants from a component for a plasma processing apparatus
03/07/2007EP1758830A1 Method for producing a hydrophobic coating, device for implementing said method and support provided with a hydrophobic coating
03/06/2007US7186480 Subjecting the chrome-containing layer of a photomask to a wet etch process using deionized water and ozone; length of exposure is directly proportional to the degree of adjustment desired
03/06/2007US7186350 Providing a substrate with an alignment mark;forming a color resist layer over the substrate and the alignment mark;injecting a solvent to contact the color resist over the alignment mark and dissolve the color resist; removal of the dissolved color resist by vacuum suction to expose alignment mark
03/01/2007US20070045234 Compositions and methods for chemical mechanical polishing silicon dioxide and silicon nitride
03/01/2007US20070045233 Polishing liquid composition
03/01/2007US20070045229 System and method for the manufacture of surgical blades
03/01/2007US20070045226 Technique for reducing silicide defects by reducing deleterious effects of particle bombardment prior to silicidation
03/01/2007US20070044913 Grooved Retaining Ring
03/01/2007US20070044514 Glass member and production process thereof
02/2007
02/22/2007US20070042605 Method of etching a substrate and method of forming a feature on a substrate
02/22/2007US20070042132 Method of forming plasma and method of forming a layer using the same
02/22/2007US20070039927 CMP wafer contamination reduced by insitu clean
02/22/2007US20070039926 Abrasive-free polishing system
02/22/2007US20070039925 Spectra based endpointing for chemical mechanical polishing
02/22/2007US20070039919 Polymide thin film self-assembly process
02/22/2007US20070039353 Chemical strengthening treatment method of magnetic disk glass substrate
02/15/2007US20070034601 Surface treating method and surface-treating apparatus
02/08/2007US20070032086 Mehtod of manufacturing an electronic device
02/08/2007US20070029686 Photoresists; photomasks
02/08/2007US20070029519 Surface treating solution for fine processing of glass base plate having a plurality of components
02/08/2007US20070029285 Polishing method
02/08/2007US20070029284 Dry etching method, fabrication method for semiconductor device, and dry etching apparatus
02/08/2007US20070029283 Etching processes and methods of forming semiconductor constructions
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