Patents for C03C 15 - Surface treatment of glass, not in the form of fibres or filaments, by etching (4,356)
01/2003
01/02/2003US20030000251 Method for fabricating thallium-doped GRIN lens
12/2002
12/27/2002WO2002036511A3 Method of depositing dlc inclusive coating system on substrate including step of heating substrate during ion beam deposition of dlc inclusive coating system
12/26/2002US20020195423 Method for vapor phase etching of silicon
12/26/2002US20020195200 Gas assisted method for applying resist stripper and gas-resist stripper combinations
12/25/2002CN1387500A High aspect ratio pattering of glass film
12/25/2002CN1097035C Method of post-etching mechanically treated substrate
12/19/2002US20020192942 Composition compatible with aluminum planarization and methods therefore
12/18/2002EP1266767A2 Planographic printing plate precursor, substrate for the same and surface hydrophilic material
12/18/2002CN1385387A Method for producing concave convered glass
12/17/2002US6495480 Oxides of at least silicon, magnesium, calcium, zinc, aluminum and titanium; information storage medium capable of coping with high speed drives, high density recording; excellent adhesion to nickel phosphorous plating
12/12/2002WO2002098811A1 Combined finishing and uv laser conditioning process for producing damage resistant optics
12/12/2002US20020187642 Composition compatible with aluminum planarization and methods therefore
12/12/2002US20020185611 Combined advanced finishing and UV laser conditioning process for producing damage resistant optics
12/12/2002US20020185151 Plasma process for removing polymer and residues from substrates
12/10/2002US6491572 Method of processing surface of glass substrate for magnetic disk and suspension with abrasive particles therefor
12/05/2002US20020179576 Glass substrate and leveling thereof
12/04/2002EP1261761A1 Quartz member for semiconductor manufacturing equipment and method for metal analysis in quartz member
12/04/2002EP1261556A1 A method for etching the surface of a bioactive glass
11/2002
11/28/2002US20020177262 Gas assisted method for applying resist stripper and gas-resist stripper combinations
11/28/2002US20020174686 Method for producing microchannels having circular cross-sections in glass
11/20/2002CN1380572A Chemical polishing method and device for liquid crystal glass base plate
11/19/2002US6482747 Plasma treatment method and plasma treatment apparatus
11/14/2002WO2002090036A1 Method and apparatus for laser ablative modification of dielectric surfaces
11/07/2002WO2002088787A2 Formation of an optical component having smooth sidewalls
11/07/2002US20020164882 Process for the structuring of a substrate
11/07/2002US20020162578 Wet dip method for photoresist and polymer stripping without buffer treatment step
11/05/2002US6475573 Bonding strength
10/2002
10/31/2002US20020158047 Formation of an optical component having smooth sidewalls
10/31/2002US20020158046 Formation of an optical component
10/31/2002US20020158045 Formation of an optical component having smooth sidewalls
10/30/2002EP1253117A1 Glass substrate for photomasks and preparation method
10/29/2002US6471880 Process for chemical roughening of glass comprising rinsing with salt solution and article obtained thereby
10/24/2002US20020155715 Gas assisted method for applying resist stripper and gas-resist stripper combinations
10/24/2002US20020155361 Having patterned light shielding film; calibrating variations; plasma etching
10/23/2002EP1251108A1 Glass substrate and leveling thereof
10/23/2002CN1375403A Dust-free blackboard and its making process
10/22/2002US6468438 Method of fabricating a substrate
10/17/2002US20020151185 Gas assisted method for applying resist stripper and gas-resist stripper combinations
10/17/2002US20020148810 Method for surface treatment of silicon based substrate
10/17/2002US20020148560 Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces
10/16/2002EP1248938A1 Foil bridge initiator and method of production of same by photolithography
10/16/2002CN1374932A Method for forming a grating in an optical waveguide
10/10/2002US20020146047 Method and apparatus for waveguide optics and devices
10/10/2002US20020144972 Immersing a surface layer of said substrate in a solution that is able to remove the surface layer, and forming bubbles in solution on the surface of the layer, removing the solution; semiconductors
10/10/2002DE10124076C1 Production of hydrophobic to hydrophilic surfaces comprises selecting structural elements for the surfaces via computer determination, and forming the structural elements according to the size and distance to the surface in the known manner
10/08/2002US6461470 Porous panel with jet holes a in first bath, the panel to jet etchant against the glass, a container for storing etchant, and a pump supplying etchant to panel, connected to the container and panel; for liquid crystal displays (lcd)
10/03/2002WO2002076902A1 Composition for texturing process
10/03/2002US20020142191 Glass substrate for magnetic recording medium, magnetic recording medium, and method of manufacturing the same
10/03/2002US20020139475 Apparatus and method for etching glass panels
10/01/2002US6458445 Quartz glass jig having large irregularities on the surface and method for producing the same
10/01/2002US6458284 Method of etching and etch mask
09/2002
09/19/2002WO2002060828A3 Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces
09/12/2002WO2002023588A3 Capacitively coupled plasma reactor
09/12/2002US20020127432 Process for producing glass substrate for magnetic recording medium and glass substrate for magnetic recording medium obtained by the same
09/12/2002US20020125213 Dry etching apparatus, etching method, and method of forming a wiring
09/12/2002US20020125210 Method for forming a concave microrelief in a substrate and use of said method for producing optical components
09/11/2002EP1237823A1 Method of forming a grating in an optical waveguide
09/06/2002WO2002068712A2 Removal of etchant residues
09/05/2002US20020123007 For planar optical devices
09/05/2002US20020121502 Method for achieving improved selectivity in an etching process
09/05/2002US20020121500 Method of etching with NH3 and fluorine chemistries
09/05/2002US20020121497 Flexible stent and method of manufacture
09/05/2002US20020121109 Glass substrate processing method
08/2002
08/29/2002US20020117472 Cleaning of multicompositional etchant residues
08/28/2002EP1233933A1 High aspect ratio patterning of glass film
08/28/2002CN1366511A Method and device for producing quartz glass body
08/27/2002US6440871 Layer of ozonated water on the photoresist; directing at least one gas other than ozone toward the semiconductor device so as to move said layer of ozonated water across the photoresist; nitrogen, air, and gaseous hydrochloric acid
08/27/2002US6440531 Hydrofluoric acid etched substrate for information recording medium
08/22/2002WO2002065528A2 Use of ammonia for etching organic low-k dielectrics
08/22/2002WO2002036514A3 Method of ion beam milling a glass substrate prior to depositing a coating system thereon, and corresponding system for carrying out the same
08/22/2002US20020113038 Replacing a polysilicon, amorphous silicon or tantalum silicide layer in metallization
08/15/2002US20020110706 Heating the glass substrate after precisely polishing before surface treating with hydrosilicofluoric acid (hexafluorosilicic acid); low glide height of magnetic head
08/15/2002US20020108929 Use of ammonia for etching organic low-k dielectrics
08/15/2002US20020108710 Processing method for substrate
08/13/2002US6432806 Method of forming bumps and template used for forming bumps
08/13/2002US6432328 Method for forming planar microlens and planar microlens obtained thereby
08/08/2002WO2002062111A2 Apparatus and method for atmospheric pressure reactive atom plasma processing for surface modification
08/08/2002WO2002060828A2 Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces
08/08/2002US20020104821 Reactive ion etching of silica structures
08/08/2002US20020104332 Method and device for producing a quartz glass body
08/06/2002US6430349 Variation in refractive index; masking
08/06/2002US6429133 Composition compatible with aluminum planarization and methods therefore
08/06/2002US6428864 Glass bottle for high-frequency heat sealing
08/01/2002WO2002059953A1 Conductor treating single-wafer type treating device and method for semi-conductor treating
08/01/2002US20020100751 Apparatus and method for atmospheric pressure reactive atom plasma processing for surface modification
07/2002
07/25/2002WO2002057704A1 Foil bridge initiator and method of production of same by photolithography
07/25/2002US20020097139 Method of making an air bag
07/25/2002US20020097138 Method for making a resistor using resistive foil
07/25/2002US20020097137 Fast heat rise resistor using resistive foil
07/18/2002US20020094686 Semiconductor processing article
07/11/2002WO2002053508A1 Method for preparing decorative glass using glass etching composition
07/09/2002US6416816 Diamond-like carbon; antireflectivity
07/04/2002US20020086246 Method of fabricating barrier ribs in plasma display panel
07/04/2002US20020084251 Method of making a 3-D structure using an erodable mask formed from a film having a composition that varies in its direction of thickness
07/04/2002US20020084031 Apparatus for etching glass substrate in fabrication of LCD
07/04/2002DE10143239A1 Verfahren zur Herstellung einer Membranmaske A method for producing a membrane mask
07/03/2002EP1220308A2 Etching method for ZnSe polycrystalline substrate
07/03/2002EP1220265A2 Method of fabricating barrier ribs in plasma display panel
07/03/2002EP1219575A1 Silica glass substrates and their selection
07/02/2002US6413871 Nitriding the surface of fluorine-doped silicon glass (fsg); the nitrogen acts as a gettering agent for both hydrogen and free fluorine, suppressing the formation of hydrofluoric acid
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