Patents for C03C 15 - Surface treatment of glass, not in the form of fibres or filaments, by etching (4,356)
08/2009
08/25/2009US7578946 Plasma processing system and plasma processing method
08/25/2009US7578236 Apparatus and method for demetallizing a metallized film
08/19/2009EP2091053A2 Transparent substrate with transparent conductive film, method of manufacturing the same, and photoelectric conversion element including the substrate
08/19/2009CN101512735A Apparatus and method for dry etching
08/18/2009US7575694 Method of selectively stripping a metallic coating
08/13/2009DE202009007468U1 Vorrichtung zur Bearbeitung der Innenoberfläche eines Rohres An apparatus for processing the inner surface of a pipe
08/11/2009US7573645 Method for manufacturing optical element of refractive index distribution type
08/11/2009US7572386 Method of treating a mask layer prior to performing an etching process
08/05/2009CN100524626C Etch and deposition control for plasma implantation
08/04/2009US7569152 Method for separating a useful layer and component obtained by said method
08/04/2009US7568445 System and method for the holographic deposition of material
07/2009
07/29/2009CN101492251A Support pin
07/28/2009US7566404 Peracetic acid; stabilizer; organic acid of acetic, citric, oxalic, and/or tartaric acid; inorganic acid of sulfuric, nitric, hydrochloric, and/or phosphoric acid; salt and water; thin film transistor liquid crystal displays; one step; damage prevention; eliminates Galvanic effect
07/21/2009US7563383 CMP composition with a polymer additive for polishing noble metals
07/15/2009CN201272743Y Quartz wafer etching machine
07/15/2009CN101481217A An apparatus for etching a glass wafer, and a glass sheet manufactured by the same
07/15/2009CN101481216A Acid polishing process for artistic glass
07/15/2009CN101481215A Etchant composition for glass of flat panel display
07/15/2009CN100513340C Glass panel surface etching method and apparatus, glass panel and flat display
07/14/2009US7560040 Etching method and article etched molded by that method
07/09/2009WO2009084296A1 Optical member for euvl and surface treatment method thereof
07/08/2009EP2076353A1 Indirect pulsed laser machining method of transparent materials by bringing an absorbing layer on the backside of the material to be machined
07/08/2009CN101479207A Methods of maintaining and using a high concentration of dissolved copper on the surface of a useful article
07/08/2009CN101477846A Method for producing a transparent base with transparent conductive film
07/02/2009US20090166317 Method of processing substrate by imprinting
07/01/2009EP2074072A2 Matt glass sheet
07/01/2009CN201264965Y Etching apparatus for material layer and etching apparatus for polaroid
06/2009
06/30/2009US7553428 Method of fabricating spacers and method of installing spacers in flat panel device
06/25/2009WO2009078406A1 Cover glass for portable terminal, method for manufacturing cover glass for portable terminal, and portable terminal apparatus
06/25/2009WO2009019376A3 Method for texturing the surface of a substrate having a glass function, and glass product comprising a textured surface
06/24/2009CN101462830A Capillary etching conducting method
06/18/2009WO2007032961A3 Chemically strengthened lithium aluminosilicate glass
06/18/2009DE102007060913A1 Device for treating molded plastic parts with treatment gas e.g. fluorine or chlorine, comprises treatment unit comprising treatment chamber filled with the treatment gas, and conveyor for moving the molded parts to the treatment unit
06/18/2009DE102004061632B4 Innenbeschichtung von Entladungsgefäßen, Entladungsgefäße aus Quarzglas und deren Verwendung Internal coating of discharge tubes, discharge vessels made of quartz glass and their use
06/16/2009US7547399 Implant surface preparation
06/16/2009US7547398 Self-aligned process for fabricating imprint templates containing variously etched features
06/10/2009EP1586007A4 Electron beam processing for mask repair
06/09/2009US7545234 Microelectromechanical device having a common ground plane layer and a set of contact teeth and method for making aspects thereof
06/04/2009WO2009040794A4 Etching compositions, methods and printing components
06/03/2009CN101445329A Recovery processing system for glass
06/03/2009CN101445328A Waterfall laminar flow etching cutting method
06/03/2009CN101445327A Superficial treatment system for glass
06/03/2009CN100495588C Method for producing transparent base with transparent conductive fil
06/02/2009US7541094 Etching; photolithography
06/02/2009US7540970 Methods of fabricating a semiconductor device
05/2009
05/28/2009WO2009066624A1 Method for etching glass substrate
05/28/2009US20090136762 Chemical Process For Obtaining Glass With A Total Or Partial Satin/Matte Finish Comprising Immersion In An Acid Solution, For Simultaneous and Continuous Production
05/27/2009EP2063462A1 Apparatus and method for dry etching
05/27/2009CN101443858A Glass substrate provided with transparent electrodes and process for its production
05/20/2009EP2059487A2 Panels made of glass
05/20/2009CN100489579C Production method of ionic exchange glass light waveguide device
05/19/2009US7534365 Ultra-violet assisted anisotropic etching of PET
05/19/2009US7534364 Methods for a multilayer retaining ring
05/19/2009US7534362 Uniform etching system and process for large rectangular substrates
05/13/2009CN101432148A Processes for forming electronic devices and electronic devices formed by such processes
05/12/2009US7531232 Component for vacuum apparatus, production method thereof and apparatus using the same
05/12/2009US7531101 Method for eliminating punctual defects comprised in an electrochemical device
05/12/2009US7531043 Between the steps of washing and polishing, wetting the surface of the glass substrate with water and a carboxylic acid (oxalic acid, citric acid, tartaric acid, malic acid), and dipping the wetted substrate into a washing solution while the surface is still wet; reduced number of surface defects
05/12/2009CA2575197C Composite, nanostructured, super-hydrophobic material
05/06/2009CN101423333A Method for producing stereoscopic pattern technological glass
05/05/2009US7527743 Apparatus and method for etching insulating film
05/05/2009US7527742 Contacting a single or quasi-single crystal aluminum oxide laminate with a Na3AlF6 or KBF4 etchant; blanketing the etchant and thelaminate with a sublimation inhibiting or decomposition material prior to or concurrent with the contacting; and etching the substrate
05/05/2009US7527741 Microreactor including magnetic barrier
04/2009
04/30/2009WO2007025039A3 Pulsed etching cooling
04/30/2009US20090107954 Method for controlling adi-aei cd difference ratio of openings having different sizes
04/30/2009US20090107844 Glass electrophoresis microchip and method of manufacturing the same by mems fabrication
04/29/2009CN101417862A Waterfall type lamellar flow etching apparatus
04/28/2009US7525732 Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part
04/28/2009US7524783 Glass for laser processing
04/28/2009US7524780 Low loss optical fiber and method for making same
04/28/2009US7524736 Process for manufacturing wafers usable in the semiconductor industry
04/28/2009US7524427 Electrochemical fabrication methods incorporating dielectric materials and/or using dielectric substrates
04/23/2009DE102005005196B4 Verfahren zur Herstellung eines Bauteils aus Quarzglas für den Einsatz in der Halbleiterfertigung und nach dem Verfahren erhaltenes Bauteil A method for producing a component of quartz glass for use in semiconductor manufacturing and component obtained by the process
04/22/2009CN101412587A Substrate thinning device, method and component
04/21/2009US7521000 Positioning substrate having metal layer disposed on an optically transparent material; introducing a processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas; generating plasma and etching; photolithography
04/16/2009WO2006093845A3 A micro-fluidic fluid separation device and method
04/16/2009US20090098370 Black synthetic quartz glass with a transparent layer
04/15/2009EP2048119A1 Method for cutting glass laminate and flat panel display
04/15/2009CN100478293C Method for manufacturing a transparent element with invisible electrodes
04/14/2009US7517808 Method for forming and removing a patterned silicone film
04/14/2009US7517467 Method for forming high-resolution pattern having desired thickness or high aspect ratio using deep ablation
04/14/2009US7517462 Electrochemical fabrication methods incorporating dielectric materials and/or using dielectric substrates
04/09/2009WO2007092019A3 A method for advanced time-multiplexed etching
04/08/2009CN101403802A Method for producing ommateum structure
04/02/2009WO2009040794A1 Etching compositions, methods and printing components
04/02/2009DE102005058713B4 Verfahren zur Reinigung des Volumens von Substraten, Substrat sowie Verwendung des Verfahrens A process for the purification of the volume of substrates, as well as substrate using the method
04/01/2009EP1954642B1 Internal treatment process and device for the internal treatment of glass containers
04/01/2009CN100474402C Electroless plating method, and magnetic recording medium and magnetic recording device
03/2009
03/31/2009US7510664 Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces
03/26/2009DE102008040160A1 Treating optical elements by plasma, which is ignited to exist on surface of optical element to be treated and is present in cavity, for microlithography system, comprises forming a side from the cavity through the surface to be treated
03/25/2009CN100472239C Anti-dizzy optical film
03/25/2009CN100471806C Method for cutting glass
03/19/2009US20090076576 Medical device having a glass coating and method therefor
03/19/2009US20090075486 Surface treatment solution for the fine surface processing of a glass substrate containing multiple ingredients
03/18/2009CN101387445A High-efficiency vacuum glass thermal-collecting tube and fabrication technology thereof
03/17/2009US7504041 Rotating at least the outer radio frequency source power applicator about a radial tilt axis to a position at which the spatial distribution of a plasma process parameter, such as etch rate, has at least a nearly minimal non-symmetry relative to the common axis of symmetry; semiconductor fabrication
03/12/2009US20090065478 Measuring etching rates using low coherence interferometry
03/10/2009US7501073 Methods for producing metallic implants having roughened surfaces
03/05/2009WO2009026648A1 Abrasion-etch texturing of glass
03/05/2009WO2009011834A3 Microalignment using laser-softened glass bumps
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