Patents for C03C 15 - Surface treatment of glass, not in the form of fibres or filaments, by etching (4,356)
04/2008
04/03/2008US20080078742 Method of preparing a sample for transmission electron microscopy
04/02/2008EP1904413A1 Printable etching media for silicon dioxide and silicon nitride layers
04/02/2008EP1904412A1 Process for the selective etching of a glass article surface
04/02/2008EP1366508A4 Apparatus and method for atmospheric pressure reactive atom plasma processing for surface modification
04/02/2008CN101154036A Method for controlling glass etching depth with optical-controlling method
04/01/2008US7352266 Head electrode region for a reliable metal-to-metal contact micro-relay MEMS switch
04/01/2008US7351513 Planographic printing plate precursor, substrate for the same and surface hydrophilic material
04/01/2008US7351349 Method and apparatus for real-time dynamic chemical analysis
03/2008
03/27/2008WO2008035666A1 Method for processing glass disk
03/27/2008US20080074564 Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part
03/26/2008EP1902000A1 Combined etching and doping media for silicon dioxide layers and subjacent silicon
03/26/2008EP1105920B1 Pattern formation method using light-induced suppression of etching
03/26/2008CN101148324A Preparation method for cell cultivation chip based on ITO glass substance and application thereof
03/20/2008US20080071054 Planographic printing plate precursor, substrate for the same and surface hydrophilic material
03/20/2008US20080067145 Wet etching a low-k dielectric constant comprising silicon carbide, carbonitride, oxycarbide, or oxycarbonitride or porous material to remove carbon impurities; oxidation, fluorination
03/19/2008EP1899277A1 Medium for etching oxidic transparent conductive layers
03/13/2008WO2008029854A1 Apparatus and method for dry etching
03/12/2008CN101142148A Process for the selective etching of a glass article surface
03/12/2008CN101142094A Split magnet ring on a magnetron sputter chamber
03/12/2008CN101140374A Etching liquid supply device, etching device and etching method
03/11/2008US7341952 Multi-layer hard mask structure for etching deep trench in substrate
03/06/2008WO2007140173A3 Methods of maintaining and using a high concentration of dissolved copper on the surface of a useful article
03/06/2008US20080057731 Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part
03/06/2008US20080053956 Stripping method
03/05/2008EP1894900A2 Catalyst-aided chemical processing method and apparatus
03/05/2008EP1894898A2 Method for manufacturing base material for optical fiber
03/05/2008CN101134642A Glass frosting machine
03/05/2008CN101134419A Manufacturing method of yarn corrupting carved glass
03/04/2008US7339758 Etching method, a substrate with a plurality of concave portions, a microlens substrate, a transmission screen and a rear projection
03/04/2008US7338699 Island projection-modified part, method for producing the same, and apparatus comprising the same
03/04/2008US7338614 Vapor HF etch process mask and method
03/04/2008US7337540 Method of manufacturing a structure body bonding with a glass substrate and semiconductor substrate
02/2008
02/28/2008US20080047933 Method For Machining A Material With High-Power Density Electromagnetic Radiation
02/28/2008US20080047932 Production process of structure
02/28/2008US20080047931 In-situ oxidized textured surface for prosthetic devices
02/27/2008EP1890978A1 Method of finishing pre-polished glass substrate surface
02/27/2008CN100371278C Multicrystal silicon etching process capable of avoiding forming burr on channel bottom
02/21/2008WO2008020756A2 Panels made of glass
02/21/2008US20080044956 Apparatus for etching substrate and method of fabricating thin-glass substrate
02/21/2008US20080041823 Wet etching solution
02/20/2008CN101126147A Ion beam treating dielectric surface method and device for applying the same
02/19/2008US7332098 Phase shift mask and fabricating method thereof
02/14/2008US20080038543 Sheet of Glass for Application of a Metallic Deposit and Resistant to a Coloration Possibly Induced by Such a Deposit
02/14/2008US20080035460 Manufacturing method of keypad for mobile phone and keypad manufactured thereby
02/13/2008CN101124661A Carbon-doped-Si oxide etch using H2 additive in fluorocarbon etch chemistry
02/12/2008US7329611 Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part
02/12/2008US7329372 Method for producing aspherical structure, and aspherical lens array molding tool and aspherical lens array produced by the same method
02/07/2008US20080032608 Process for Manufacturing Glass Substrate for Magnetic Recording Medium and Glass Substrate for Magnetic Recording Medium Obtained by the Process
02/07/2008US20080030130 Hermetic encapsulation of organic, electro-optical elements
02/07/2008US20080029485 Systems and Methods for Precision Plasma Processing
02/06/2008CN100367457C Island projection-modified part, method for producing same, and appts. comprising same
02/05/2008US7326446 Method for coating metal surfaces and substrate having a coated metal surface
02/05/2008US7326359 Lacquer of metal dissolving etchant locally reacts with metallic layer and dissolved metal remains within multilayer structure, dissolution of the metal allows creation of window in metallic layer without washing, partial demetallization is suitable to be carried out on gravure or flexo printing presses
01/2008
01/31/2008WO2006073896A3 Selective surface texturing through the use of random application of thixotropic etching agents
01/31/2008US20080025899 Plasma surface treatment method, quartz member, plasma processing apparatus and plasma processing method
01/31/2008US20080022721 Method of making glass including surface treatment with aluminum chloride at or just prior to annealing lehr
01/30/2008CN101115691A Process for producing a quartz glass component for use in semiconductor manufacture and component produced by this process
01/30/2008CN101115690A Chemical process for obtaining anti-reflective glass, comprising immersion in an acid solution, for simultaneous and continuous production
01/30/2008CN101115689A Chemical process for obtaining glass with a total or partial satin/matt finish, comprising immersion in an acid solution, for simultaneous and continuous production
01/30/2008CN101115631A Elevator load bearing member having a jacket with at least one traction-enhancing exterior surface
01/30/2008CN100364910C Surface treating solution for fine processing of glass base plate having a plurality of components
01/29/2008US7322368 Plasma cleaning gas and plasma cleaning method
01/24/2008US20080017611 Etching apparatus and method
01/24/2008US20080017610 Process for producing glass substrate for magnetic disk
01/17/2008US20080014754 Methods of finishing quartz glass surfaces and components made by the methods
01/17/2008US20080014470 Method for fabricating a glass substrate, method for fabricating a magnetic disk, and magnetic disk
01/17/2008US20080011713 Substrate processing apparatus, substrate processing method and substrate manufacturing method
01/16/2008CN201006858Y Etching groove structure of TFT LCD glass substrates
01/09/2008EP1874702A2 Process and apparatus for scoring a brittle material incorporating moving optical assembly
01/09/2008CN101102909A Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatuses
01/08/2008US7316761 Apparatus for uniformly etching a dielectric layer
01/08/2008CA2364745C Etching method for znse polycrystalline substrate
01/03/2008WO2008001431A1 Large pellicle forming substrate
01/03/2008US20080004491 Method for fabricating optical fiber
01/03/2008US20080003829 Chemical mechanical polishing slurry
01/02/2008CN101098833A Printable medium for the etching of silicon dioxide and silicon nitride layers
01/02/2008CN101096292A Glass erosion liquid and preparation method thereof
01/02/2008CN100359653C Method for connecting substrates and composite element
01/02/2008CN100358820C Substrate-correcting means
12/2007
12/27/2007US20070298612 Compositions and methods for polishing silicon nitride materials
12/26/2007CN101092285A Method for producing computer mouse pad from glass
12/25/2007US7311851 Apparatus and method for reactive atom plasma processing for material deposition
12/21/2007WO2006098888A3 Plasma oxidation and removal of oxidized material
12/20/2007US20070293049 Slurry for CMP of Cu film, polishing method and method for manufacturing semiconductor device
12/20/2007US20070291370 Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part
12/20/2007US20070289947 Method for polishing lithium aluminum oxide crystal
12/20/2007US20070289946 Method for polishing a substrate surface
12/19/2007CN101088948A Method of etching notched mark on the surface of glass container and the product
12/19/2007CN101088781A Process of making glass etching and silver plating ornament picture
12/18/2007US7309448 Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material
12/13/2007WO2007109356A3 Device and method for etching flash memory gate stacks comprising high-k dielectric
12/13/2007WO2006113808A3 Methods of making and modifying porous devices for biomedical applications
12/13/2007US20070284338 Chemical mechanical polishing method
12/13/2007US20070284336 Manufacturing method of optical semiconductor device
12/11/2007US7306850 Planographic printing plate precursor, substrate for the same and surface hydrophilic material
12/11/2007US7306748 Methods for machining ceramics
12/06/2007WO2007138370A1 Indirect pulsed laser machining method of transparent materials by bringing a absorbing layer on the backside of the material to be machined
12/06/2007US20070278185 Etching composition and etching process
12/06/2007US20070278184 Cyanide-free chemical-mechanical polishing (CMP); useful for polishing a gold-containing surface of a substrate; abrasive, a gold-oxidizing agent, gold-solubilizing agent, and an aqueous carrier
12/06/2007US20070278183 Wet etch suitable for creating square cuts in si and resulting structures
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