Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
02/2009
02/24/2009US7494851 Thin film transistor array substrate and method for manufacturing the same
02/24/2009US7494850 Ultra-thin logic and backgated ultra-thin SRAM
02/24/2009US7494848 Flip-chip packaging of a photo-sensor die on a transparent substrate
02/24/2009US7494839 Method for manufacturing a membrane sensor
02/24/2009US7494834 Method of manufacturing a transparent element including transparent electrodes
02/24/2009US7494831 Process for making stacks of islands made of one semiconducting material encapsulated in another semiconducting material
02/24/2009US7494695 forming a first pattern having a predetermined shape in a first printing roll, rotating the printing roll on a substrate to transfer the first pattern, forming a second pattern having a predetermined shape in a second printing roll, and rotating the second printing roll on the substrate
02/19/2009WO2009023502A1 Vertical junction field effect transistor with mesa termination and method of making the same
02/19/2009WO2009023148A2 Nanowire electronic devices and method for producing the same
02/19/2009WO2009023081A1 Mos transistors for thin soi integration and methods for fabricating the same
02/19/2009WO2009022741A1 Nonvolatile semiconductor memory device
02/19/2009WO2009022677A1 Semiconductor device
02/19/2009WO2009022592A1 Soft recovery diode
02/19/2009WO2009022578A1 Device structure and method for manufacturing the same
02/19/2009WO2009022573A1 Method for thin film formation
02/19/2009WO2009022509A1 Mos transistor and semiconductor integrated circuit device using the same
02/19/2009WO2008152026A3 Vertical current controlled silicon on insulator (soi) device and method of forming same
02/19/2009WO2006031981A3 Nanotube transistor and rectifying devices
02/19/2009WO2006001942A3 Electronic isolation device
02/19/2009US20090047799 Gate oxide leakage reduction
02/19/2009US20090047776 Method of Forming a Thin Film Transistor
02/19/2009US20090047770 Method of forming isolation regions for integrated circuits
02/19/2009US20090047750 Thin film transistor array substrate and fabrication method thereof
02/19/2009US20090046502 Metal Magnetic Memory Cell
02/19/2009US20090045522 Semiconductor device having via connecting between interconnects
02/19/2009US20090045486 Method of manufacturing nitride semiconductor device
02/19/2009US20090045484 Methods and systems involving electrically reprogrammable fuses
02/19/2009US20090045482 Shallow Trench Isolation with Improved Structure and Method of Forming
02/19/2009US20090045475 Double sided integrated processing and sensing chip
02/19/2009US20090045473 Devices having horizontally-disposed nanofabric articles and methods of making the same
02/19/2009US20090045472 Methodology for Reducing Post Burn-In Vmin Drift
02/19/2009US20090045470 Semiconductor device and manufacturing method of the same
02/19/2009US20090045467 Bipolar transistor finfet technology
02/19/2009US20090045466 Semiconductor device
02/19/2009US20090045465 Semiconductor device and method for fabricating the same
02/19/2009US20090045460 mosfet for high voltage applications and a method of fabricating same
02/19/2009US20090045459 Semiconductor device and method of manufacturing semiconductor device
02/19/2009US20090045458 Mos transistors for thin soi integration and methods for fabricating the same
02/19/2009US20090045457 Optimized configurations to integrate steering diodes in low capacitance transient voltage suppressor (TVS)
02/19/2009US20090045456 Semiconductor device and method of fabricating the same
02/19/2009US20090045455 Nonvolatile memory device and method of fabricating the same
02/19/2009US20090045454 Semiconductor non-volatile memory cell, method of producing the same, semiconductor non-volatile memory having the semiconductor non-volatile memory cell, and method of producing the same
02/19/2009US20090045453 Nonvolatile memory devices including gate conductive layers having perovskite structure and methods of fabricating the same
02/19/2009US20090045450 Non-volatile memory device and method of fabricating the same
02/19/2009US20090045449 Finned memory cells
02/19/2009US20090045448 Non-volatile memory device and methods of forming the same
02/19/2009US20090045447 Complex oxide nanodots
02/19/2009US20090045446 Power semiconductor device
02/19/2009US20090045440 Method of forming an mos transistor and structure therefor
02/19/2009US20090045439 Heterojunction field effect transistor and manufacturing method thereof
02/19/2009US20090045438 Field effect transistor, and multilayered epitaxial film for use in preparation of field effect transistor
02/19/2009US20090045436 Localized trigger esd protection device
02/19/2009US20090045429 Diode structure and memory device including the same
02/19/2009US20090045414 Silicon carbide semiconductor element, method of manufacturing the same, and silicon carbide device
02/19/2009US20090045413 Silicon Carbide Bipolar Semiconductor Device
02/19/2009US20090045412 Method for production of silicon carbide layer, gallium nitride semiconductor device and silicon substrate
02/19/2009US20090045411 Forming Embedded Dielectric Layers Adjacent to Sidewalls of Shallow Trench Isolation Regions
02/19/2009US20090045410 GaN SUBSTRATE AND SEMICONDUCTOR DEVICE PREPARED BY USING METHOD AND APPARATUS OF POLISHING GaN SUBSTRATE
02/19/2009US20090045409 Display device
02/19/2009US20090045408 Display device
02/19/2009US20090045406 Semiconductor device and display device
02/19/2009US20090045404 Semiconductor device and display device
02/19/2009US20090045403 Contact structure and semiconductor device
02/19/2009US20090045402 TFT array substrate and manufacturing method the same
02/19/2009US20090045401 Semiconductor device and manufacturing method thereof
02/19/2009US20090045399 Field effect transistor with gate insulation layer formed by using amorphous oxide film
02/19/2009US20090045398 MANUFACTURE METHOD FOR ZnO BASED COMPOUND SEMICONDUCTOR CRYSTAL AND ZnO BASED COMPOUND SEMICONDUCTOR SUBSTRATE
02/19/2009US20090045397 Field effect transistor using amorphous oxide film as channel layer, manufacturing method of field effect transistor using amorphous oxide film as channel layer, and manufacturing method of amorphous oxide film
02/19/2009US20090045391 Switch Device and Method of Fabricating the Same
02/19/2009DE102007038917A1 Single-layer semiconductor or multi-layer semiconductor, has three-value PNP or NPN layers and are designed in form of negative temperature coefficient thermistor and positive temperature coefficient thermistor
02/19/2009DE102007037858A1 Halbleiterbauelement mit verbessertem dynamischen Verhalten A semiconductor device having an improved dynamic behavior
02/19/2009DE102007030755B3 Halbleiterbauelement mit einem einen Graben aufweisenden Randabschluss und Verfahren zur Herstellung eines Randabschlusses A semiconductor device having a trench having a peripheral termination and method for producing a junction termination
02/19/2009DE102006025218B4 Leistungshalbleiterbauelement mit Ladungskompensationsstruktur und Verfahren zur Herstellung desselben Power semiconductor component thereof having charge compensation structure and method for producing
02/19/2009CA2733710A1 Vertical junction field effect transistor with mesa termination and method of making the same
02/18/2009EP2026384A2 Charge trapping memory cell with high speed erase
02/18/2009EP2026378A2 Non-volatile FinFET memory device and method of fabricating the same
02/18/2009EP2026077A1 Acceleration sensor
02/18/2009EP2025004A1 Semiconductor device including an oxide semiconductor thin film layer of zinc oxide and manufacturing method thereof
02/18/2009EP2025003A2 Multi-post structures
02/18/2009EP1476894A4 High voltage power mosfet having a voltage sustaining region that includes doped columns formed by trench etching and diffusion from regions of oppositely doped polysilicon
02/18/2009EP1335878B1 Microstructure component
02/18/2009EP1019968B1 Method for manufacturing a diode device having a low threshold voltage
02/18/2009CN101371364A Sensor for detecting organic liquids
02/18/2009CN101371363A Semiconductor device including a front side strained superlattice layer and a back side stress layer and associated methods
02/18/2009CN101371362A Edge termination structures for silicon carbide devices and methods of fabricating silicon carbide devices incorporating same
02/18/2009CN101371345A Semiconductor device for high frequency
02/18/2009CN101371344A 场效应晶体管 FET
02/18/2009CN101371337A Trench schottky barrier diode with differential oxide thickness
02/18/2009CN101371335A Method for producing semiconductor chip, and field effect transistor and method for manufacturing same
02/18/2009CN101370972A Method for manufacturing aluminum nitride crystal, aluminum nitride crystal, aluminum nitride crystal substrate and semiconductor device
02/18/2009CN101369607A Flash memory unit structure and preparation thereof
02/18/2009CN101369606A Thin-film transistor panel having structure that suppresses characteristic shifts and method for manufacturing the same
02/18/2009CN101369605A Display device
02/18/2009CN101369604A Semiconductor device and manufacturing method thereof
02/18/2009CN101369603A 电介质隔离型半导体装置 Dielectric isolation type semiconductor device
02/18/2009CN101369602A Dielectric isolation type semiconductor device and manufacturing method therefor
02/18/2009CN101369601A Heterostructure field effect transistor and manufature method thereof
02/18/2009CN101369600A P type silicon carbide device and preparation thereof
02/18/2009CN101369599A Ohm contact of gallium nitride base device and preparation method thereof
02/18/2009CN101369598A Semiconductor structure