Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2012
11/01/2012WO2012148869A2 Contact metal for hybridization and related methods
11/01/2012WO2012148862A2 Eddy current monitoring of metal residue or metal pillars
11/01/2012WO2012148859A2 Selection of polishing parameters to generate removal profile
11/01/2012WO2012148827A2 Pre and post cleaning of mask, wafer, optical surfaces for prevention of contamination prior to and after inspection
11/01/2012WO2012148826A2 High sensitivity eddy current monitoring system
11/01/2012WO2012148802A2 Chemical delivery system
11/01/2012WO2012148801A2 Semiconductor substrate processing system
11/01/2012WO2012148716A2 Varying coefficients and functions for polishing control
11/01/2012WO2012148641A2 Uv assisted silylation for recovery and pore sealing of damaged low k films
11/01/2012WO2012148621A2 Apparatus and methods for microwave processing of semiconductor substrates
11/01/2012WO2012148606A2 Method and system for forming non-manhattan patterns using variable shaped beam lithography
11/01/2012WO2012148568A1 Method and apparatus for substrate transfer and radical confinement
11/01/2012WO2012148353A2 Substrate comprising si-base and inas-layer
11/01/2012WO2012148237A2 Holder for supporting a substrate, and substrate-processing apparatus using same
11/01/2012WO2012148228A2 Ultra small led and method for manufacturing same
11/01/2012WO2012148085A2 Antimony amino alkoxide compound and method for preparing same, and method for forming a thin film containing antimony using the antimony amino alkoxide compound and an atomic layer deposition technique
11/01/2012WO2012147958A1 Fluid pressure imprinting device and pressurization device
11/01/2012WO2012147931A1 Electrostatic chuck device
11/01/2012WO2012147874A1 Resin composition for electronic component and electronic component device
11/01/2012WO2012147828A1 Curable composition for imprinting, pattern formation method, and pattern
11/01/2012WO2012147728A1 Method for cleaning mold with mold-releasing layer and method for producing mold with mold-releasing layer
11/01/2012WO2012147725A1 Pickup apparatus for semiconductor chips
11/01/2012WO2012147716A1 Water-repellent protective film-forming chemical solution and wafer cleaning method using same
11/01/2012WO2012147704A1 Tft substrate and method for correcting wiring fault on tft substrate
11/01/2012WO2012147680A1 Film forming method
11/01/2012WO2012147658A1 Substrate processing device
11/01/2012WO2012147611A1 Method and apparatus for manufacturing optical device
11/01/2012WO2012147605A1 Method for polishing non-oxide single crystal substrate
11/01/2012WO2012147600A1 Substrate holding device
11/01/2012WO2012147480A1 Method for producing electronic component module and electronic component module
11/01/2012WO2012147472A1 Compound semiconductor single crystal substrate and method for manufacturing same
11/01/2012WO2012147458A1 Method for fabricating connection structure
11/01/2012WO2012147456A1 Semiconductor device
11/01/2012WO2012147343A1 Substrate bonding device, substrate holding device, substrate bonding method, substrate holding method, multilayered semiconductor device, and overlapped substrate
11/01/2012WO2012147287A1 Semiconductor device and method for manufacturing semiconductor device
11/01/2012WO2012147285A1 Wiring method for semiconductor integrated circuit and wiring device
11/01/2012WO2012147279A1 Semiconductor wafer and method for manufacturing same
11/01/2012WO2012147251A1 Material vaporization supply device
11/01/2012WO2012147210A1 Composition for forming resist underlayer film and pattern formation method
11/01/2012WO2012147147A1 Tank and method for producing polishing pad using tank
11/01/2012WO2012147139A1 Semiconductor integrated circuit system; and electronic device, electronic product, and moving body provided with same
11/01/2012WO2012146715A1 Substrate treatment installation
11/01/2012WO2012146634A1 Method and device for applying a printing substance
11/01/2012WO2012146397A1 Method for forming a layer on a substrate
11/01/2012WO2012146396A1 Method for solid phase crystallization of an amorphous or polycrystalline layer
11/01/2012WO2012146395A1 Methods of inspecting and manufacturing semiconductor wafers
11/01/2012WO2012146044A1 Asymmetrical-gate mos device and fabricating method thereof
11/01/2012WO2012146019A1 Preparation method of nano mos device and nano mos device
11/01/2012WO2012146018A1 Preparation method of nano mos device and nano mos device
11/01/2012WO2012145977A1 Semiconductor device and method of programming the same
11/01/2012WO2012145976A1 Embedded source/drain mos transistor and manufacturing method thereof
11/01/2012WO2012145966A1 Wafer inspection method and wafer inspection apparatus
11/01/2012WO2012145961A1 Vehicle conveyance system for glass substrates
11/01/2012WO2012145952A1 Method of depositing gate dielectric, method of fabricating mis capacitor, and mis capacitor
11/01/2012WO2012145951A1 Method of fabricating graphene based field effect transistor
11/01/2012WO2012145879A1 Mold for pre-plastic-sealing lead frames, process for pre-plastic-sealing and packaging structure
11/01/2012WO2012145872A1 Thermal oxidation system and method for preventing liquid water accumulation
11/01/2012WO2012145871A1 Heating method for maintaining heat budget stability
11/01/2012WO2012122131A3 Measurement of insulation resistance of configurable photovoltaic panels in a photovoltaic array
11/01/2012WO2012110465A3 System for magnetic shielding
11/01/2012WO2012106210A3 Methods for reducing the metal content in the device layer of soi structures and soi structures produced by such methods
11/01/2012WO2012102997A3 Pulse method of oxidizing sidewall dielectrics for high capacitance applications
11/01/2012WO2012093146A3 Method for producing a semiconductor component comprising a lateral resistance region
11/01/2012WO2012087986A3 Magnetic phase change logic
11/01/2012WO2012087780A3 Photocurable dicing die bonding tape
11/01/2012WO2012087622A3 Multilayer dielectric memory device
11/01/2012WO2012082860A3 Closed-loop silicon etching control method and system
11/01/2012WO2012071192A3 Sidewall image transfer pitch doubling and inline critical dimension slimming
11/01/2012WO2012052251A3 Starter material for a sintering compound and method for producing said sintering compound
11/01/2012WO2012009520A9 Conductive sidewall for microbumps
11/01/2012US20120276754 Methods and systems for thermal-based laser processing a multi-material device
11/01/2012US20120276753 Coating treatment apparatus, coating and developing treatment system, coating treatment method, and non-transitory recording medium having program recorded thereon for executing coating treatment method
11/01/2012US20120276752 Hardmask materials
11/01/2012US20120276751 Substrate processing apparatus and method for manufacturing semiconductor device
11/01/2012US20120276750 Method and system for binding halide-based contaminants
11/01/2012US20120276749 Method and Device for Treating Silicon Substrates
11/01/2012US20120276748 Methods for etching doped oxides in the manufacture of microfeature devices
11/01/2012US20120276747 Prevention of line bending and tilting for etch with tri-layer mask
11/01/2012US20120276746 Manufacturing method of semiconductor device and apparatus for manufacturing semiconductor device
11/01/2012US20120276745 Method for fabricating hole pattern in semiconductor device
11/01/2012US20120276744 Patterning Method for High Density Pillar Structures
11/01/2012US20120276743 Methods of forming a carbon type hard mask layer using induced coupled plasma and methods of forming patterns using the same
11/01/2012US20120276742 Chemical Mechanical Polishing Composition and Method For Polishing Germanium-Antimony-Tellurium Alloys
11/01/2012US20120276741 Benign, liquid chemical system-based back end of line (beol) cleaning
11/01/2012US20120276740 Methods for precleaning a substrate prior to metal silicide fabrication process
11/01/2012US20120276739 Differentially recessed contacts for multi-gate transistor of sram cell
11/01/2012US20120276738 Method for forming through silicon via structure
11/01/2012US20120276737 Post-etching treatment process for copper interconnecting wires
11/01/2012US20120276736 Method for manufacturing semiconductor device
11/01/2012US20120276735 Method of forming a semiconductor device
11/01/2012US20120276734 Method of manufacturing an opto-electric device
11/01/2012US20120276733 Method for manufacturing semiconductor device
11/01/2012US20120276732 Protection layer for preventing laser damage on semiconductor devices
11/01/2012US20120276731 Method for fabricating a gate dielectric layer and for fabricating a gate structure
11/01/2012US20120276730 Methods for fabricating a gate dielectric layer and for fabricating a gate structure
11/01/2012US20120276729 Non-volatile memory devices including shared bit lines and methods of fabricating the same
11/01/2012US20120276728 Trench type semiconductor device and fabrication method for the same
11/01/2012US20120276727 Method of forming gate pattern and semiconductor device
11/01/2012US20120276726 Method for fabricating semiconductor power device
11/01/2012US20120276725 Methods of selectively forming metal-doped chalcogenide materials, methods of selectively doping chalcogenide materials, and methods of forming semiconductor device structures including same
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