Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
---|
12/27/1990 | EP0404049A2 Process for etching polyimide resin |
12/27/1990 | EP0404026A2 Circuit to reduce the sensibility to latch-up in a CMOS circuit |
12/27/1990 | EP0404008A2 Substrate bias generation circuit used in semiconductor integrated circuit |
12/27/1990 | EP0403992A2 Chip carrier package and method of manufacture |
12/27/1990 | EP0403986A1 Method for manufacturing substrates for depositing diamond thin films |
12/27/1990 | EP0403826A2 Minimizing the interconnection cost of electronically linked objects |
12/27/1990 | EP0403817A2 Dielectric structures with material resistant to etching and method of fabrication thereof |
12/27/1990 | EP0403783A2 High strength low stress encapsulation of interconnected semiconductor devices |
12/27/1990 | EP0403580A1 Light-sensitive novolac resins. |
12/27/1990 | EP0403571A1 Method of forming a semi-custom integrated circuit |
12/27/1990 | EP0211002B1 Method and apparatus for spot shaping and blanking a focused beam |
12/27/1990 | CA1278392C Apparatus for and method of positioning and synchronizing a writing laser beam |
12/27/1990 | CA1278391C Enhanced density modified isoplanar process |
12/27/1990 | CA1278273C Forming polycide structure comprised of polysilicon, silicon, and metal silicide lavers |
12/26/1990 | CN1011003B Process for mfg. power transistor with long service life |
12/26/1990 | CN1011002B Single-temp.-zone open tube diffusion technology of gallium for producing thyristors |
12/26/1990 | CA2019826A1 Transistor device drive circuit |
12/25/1990 | US4980890 Semiconductor integrated circuit |
12/25/1990 | US4980859 NOVRAM cell using two differential decouplable nonvolatile memory elements |
12/25/1990 | US4980799 Electrostatic capacity device in semiconductor memory device, and apparatus for and method of driving sense amplifier using electrostatic capacity device |
12/25/1990 | US4980792 BiCMOS power transition circuit |
12/25/1990 | US4980753 Low-cost high-performance semiconductor chip package |
12/25/1990 | US4980752 Transition metal clad interconnect for integrated circuits |
12/25/1990 | US4980750 Semiconductor crystal |
12/25/1990 | US4980748 Semiconductor device made with a trenching process |
12/25/1990 | US4980747 Deep trench isolation with surface contact to substrate |
12/25/1990 | US4980745 Substrate potential detecting circuit |
12/25/1990 | US4980744 Semiconductor integrated circuit device and a method for manufacturing the same |
12/25/1990 | US4980740 MOS-pilot structure for an insulated gate transistor |
12/25/1990 | US4980739 Self-aligned bipolar transistor using selective polysilicon growth |
12/25/1990 | US4980733 Semiconductor storage device |
12/25/1990 | US4980732 Semiconductor device having an improved thin film transistor |
12/25/1990 | US4980731 Atomic planar-doped field-effect transistor |
12/25/1990 | US4980718 Registration method in photolithography and equipment for carrying out this method |
12/25/1990 | US4980637 Test probe for testing a test device |
12/25/1990 | US4980635 Integrated circuit package carrier |
12/25/1990 | US4980586 Digital integrated circuit propagation delay regulator |
12/25/1990 | US4980563 For performing deep UV projection lithography |
12/25/1990 | US4980562 Method and apparatus for high efficiency scanning in an ion implanter |
12/25/1990 | US4980536 Removal of particles from solid-state surfaces by laser bombardment |
12/25/1990 | US4980317 Forming maskign pattern; etching |
12/25/1990 | US4980316 Method for producing a resist structure on a semiconductor |
12/25/1990 | US4980315 Compensating for the curvature of junction ino wafer with a diffusion front that curves in oppsite direction |
12/25/1990 | US4980314 Vapor processing of a substrate |
12/25/1990 | US4980312 Method of manufacturing a semiconductor device having a mesa structure |
12/25/1990 | US4980311 Trench isolation technique to produce narrow and wide regions; |
12/25/1990 | US4980310 Method of making a trench dram cell |
12/25/1990 | US4980308 Method of making a thin film transistor |
12/25/1990 | US4980307 Formed by heating silicon dioxide film in a plasma nitriding atmosphere |
12/25/1990 | US4980306 Method of making a CMOS device with trench isolation device |
12/25/1990 | US4980305 Base regions and collector portions are surrounded by a trench; each trench surrounded by a common lead out; reduced collector resistance |
12/25/1990 | US4980304 Process for fabricating a bipolar transistor with a self-aligned contact |
12/25/1990 | US4980303 Manufacturing method of a Bi-MIS semiconductor device |
12/25/1990 | US4980302 Method of manufacturing bipolar transistor having a reduced parasitic capacitance |
12/25/1990 | US4980301 Method for reducing mobile ion contamination in semiconductor integrated circuits |
12/25/1990 | US4980300 Surface treatment with gas, water bath and ultrasonic waves |
12/25/1990 | US4980264 Photoresist compositions of controlled dissolution rate in alkaline developers |
12/25/1990 | US4980240 Surface etched shadow mask |
12/25/1990 | US4980219 Sprocket holes at predetermined intervals in side edge areas |
12/25/1990 | US4980034 Alternating dielectric and metal |
12/25/1990 | US4980022 Method of removing a layer of organic matter |
12/25/1990 | US4980020 Local interconnect etch technique |
12/25/1990 | US4980018 Using three different mixtures of sulfur fluoride, oxygen, helium and chlorine |
12/25/1990 | US4980017 Method for recirculating high-temperature etching solution |
12/25/1990 | US4980002 Positioning uncured adhesive between chips; curing |
12/25/1990 | US4979663 Outer lead tape automated bonding system |
12/25/1990 | US4979466 Controlled heating; vapor deposition |
12/25/1990 | US4979464 Apparatus for treating wafers in the manufacture of semiconductor elements |
12/25/1990 | US4979289 Low cost high throughput |
12/23/1990 | CA2019666A1 Photoresists formed by polymerization of di-unsaturated monomers |
12/21/1990 | CA2019413A1 Low temperature glass composition, paste and method of use |
12/20/1990 | DE4013662A1 Active semiconductor structure esp. FET prodn. |
12/20/1990 | DE3051199C2 Wafer load lock and transfer system for vacuum chamber |
12/19/1990 | EP0403449A2 Mixed technology intergrated device comprising complementary LDMOS power transistors, CMOS and vertical PNP integrated structures having an enhanced ability to withstand a relatively high supply voltage |
12/19/1990 | EP0403418A2 High density plasma deposition and etching apparatus |
12/19/1990 | EP0403368A1 Method of fabricating an integrated circuit with a double implanted field-effect transistor |
12/19/1990 | EP0403293A2 Method of manufacturing III-V group compound semiconductor device |
12/19/1990 | EP0403287A2 Method of polishing semiconductor wafer |
12/19/1990 | EP0403279A1 High voltage thin film transistor with second gate |
12/19/1990 | EP0403274A1 Semi-custom integrated circuit device |
12/19/1990 | EP0403267A2 Semiconductor device |
12/19/1990 | EP0403220A1 Producing exposure masks |
12/19/1990 | EP0403153A2 A method for forming a heteroepitaxial structure |
12/19/1990 | EP0403113A2 Field effect semiconductor devices and methods of fabrication thereof |
12/19/1990 | EP0403110A1 Method of growing p-type group II-VI material |
12/19/1990 | EP0403086A2 Method for improving deposit of photoresist on wafers |
12/19/1990 | EP0403080A2 Bonding devices |
12/19/1990 | EP0403050A2 Fabricating electrical contacts in semiconductor devices |
12/19/1990 | EP0403016A2 Semiconductor device comprising a control circuit and a power stage with vertical current flow, integrated in monolithic form in the same chip, and related manufacturing process |
12/19/1990 | EP0403009A1 A method of manufacturing a semiconductor device |
12/19/1990 | EP0402936A2 Electrode structure for III-V compound semiconductor element and method of manufacturing the same |
12/19/1990 | EP0402900A2 Holding device for manipulating objects in a disc form, such as semiconductor wafers, and use of the holding device. |
12/19/1990 | EP0402897A2 Method of manufacturing semiconductor device having elements isolated by trench |
12/19/1990 | EP0402894A2 Photoresist |
12/19/1990 | EP0402851A2 Semiconductor device including inversion preventing layers having a plurality of impurity concentration peaks in direction of depth and method of manufacturing the same |
12/19/1990 | EP0402784A2 Method of manufacturing a CMOS semiconductor device |
12/19/1990 | EP0402756A2 Process of forming bump on electrode of semiconductor chip and apparatus used therefor |
12/19/1990 | EP0402632A2 Aromatic polyimide silanol compounds, precursors and polymers thereof |
12/19/1990 | EP0402617A1 Method of forming an insulating film |
12/19/1990 | EP0402592A2 Master slice semiconductor device and method of forming it |