Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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11/15/1990 | WO1990013917A1 Floating-gate charge-balance ccd |
11/15/1990 | WO1990013916A1 Method of fabricating semiconductor devices |
11/15/1990 | WO1990013913A1 Method of making a hermetic seal in a solid-state device |
11/15/1990 | WO1990013912A1 Silicon oxide film and semiconductor device having the same |
11/15/1990 | WO1990013911A1 Method of forming oxide film |
11/15/1990 | WO1990013910A1 Method and apparatus for processing materials |
11/15/1990 | WO1990013909A1 Reactive ion etching apparatus |
11/15/1990 | WO1990013908A1 Electrochemical planarization |
11/15/1990 | WO1990013790A1 Positioning table |
11/15/1990 | WO1990013687A2 Apparatus and method for treating flat substrates under reduced pressure |
11/15/1990 | WO1990013443A1 Etchant solution for photoresist-patterned metal layers |
11/15/1990 | DE4014723A1 Semiconductor memory with redundancy circuit - has memory cell field divided into blocks and redundancy circuit spares |
11/15/1990 | DE3943482A1 Workpiece table for handling semiconductor wafers |
11/15/1990 | DE3943478A1 Workpiece table for handling semiconductor wafers |
11/15/1990 | DE3915650A1 Layer structuring - involving mask layer etching under photolacquer layer to obtain reduced structure width |
11/15/1990 | DE3915337A1 Low-ohmic planar contact metallisation prodn. - without spiking or diffusion problems |
11/14/1990 | EP0397530A2 Alignment apparatus |
11/14/1990 | EP0397462A2 Contact structure for semiconductor integrated circuits |
11/14/1990 | EP0397426A2 IC packaging structure and packaging method |
11/14/1990 | EP0397408A1 Reference voltage generator |
11/14/1990 | EP0397320A2 Encapsulated integrated circuit with lead frame |
11/14/1990 | EP0397315A2 Method and apparatus for heating and cooling semiconductor wafers in semiconductor wafer processing equipment |
11/14/1990 | EP0397194A2 Semiconductor memory device having two types of memory cell |
11/14/1990 | EP0397185A1 Permanently antistatic polymeric rigid containers |
11/14/1990 | EP0397161A2 Methods for device transplantation |
11/14/1990 | EP0397148A2 Heterostructure device and production method thereof |
11/14/1990 | EP0397131A2 Method of manufacturing a contact in semiconductor devices |
11/14/1990 | EP0397051A1 Evacuation apparatus and evacuation method |
11/14/1990 | EP0397034A1 SRAM device using an ultra thin polycristalline Si film, and its manufacturing method |
11/14/1990 | EP0397029A2 Carrier for disc shaped workpieces, and vacuum process chamber |
11/14/1990 | EP0397014A2 Aluminium/Boron P-Well |
11/14/1990 | EP0397010A1 High purity epoxy formlations for use as die attach adhesives |
11/14/1990 | EP0396951A1 Supporting and transporting device for a wafer |
11/14/1990 | EP0396948A1 Bi-cmos integrated circuit |
11/14/1990 | EP0396923A1 Elevating platform and conveyance method |
11/14/1990 | EP0396919A2 Plasma Reactor and method for semiconductor processing |
11/14/1990 | EP0396806A1 Glass-ceramic structure and method for making same |
11/14/1990 | EP0396802A1 Method of making an integrated circuit structure having a lateral bipolar transistor |
11/14/1990 | EP0396768A1 Pattern correction method |
11/14/1990 | EP0396707A1 A latch up free, high voltage, cmos process for sub-half-micron devices. |
11/14/1990 | EP0396704A1 Semiconductor light-emitting devices |
11/14/1990 | EP0396663A1 Charge-coupled device. |
11/14/1990 | EP0283481B1 Trimming passive components buried in multilayer structures |
11/14/1990 | CN1010448B Process for mfg. copper thick-film conductor by infrared stove |
11/13/1990 | US4970724 Redundancy and testing techniques for IC wafers |
11/13/1990 | US4970689 Charge amplifying trench memory cell |
11/13/1990 | US4970580 Semiconductor memory device having protruding cell configuration |
11/13/1990 | US4970578 Selective backside plating of GaAs monolithic microwave integrated circuits |
11/13/1990 | US4970577 Semiconductor chip module |
11/13/1990 | US4970574 Gold, tungsten, tungsten-titanium alloy |
11/13/1990 | US4970572 Semiconductor integrated circuit device of multilayer interconnection structure |
11/13/1990 | US4970571 Bump and method of manufacturing the same |
11/13/1990 | US4970570 Use of tapered head pin design to improve the stress distribution in the braze joint |
11/13/1990 | US4970568 Semiconductor device and a process for producing a semiconductor device |
11/13/1990 | US4970565 Sealed charge storage structure |
11/13/1990 | US4970564 Semiconductor memory device having stacked capacitor cells |
11/13/1990 | US4970546 Exposure control device |
11/13/1990 | US4970409 Voltage multiplier for nonvolatile semiconductor memory |
11/13/1990 | US4970369 Electronic device manufacturing methods |
11/13/1990 | US4970368 Laser scribing method |
11/13/1990 | US4970366 Laser patterning apparatus and method |
11/13/1990 | US4970196 Method and apparatus for the thin film deposition of materials with a high power pulsed laser |
11/13/1990 | US4970177 Corrosion resistant wiring |
11/13/1990 | US4970176 Low and higher temperature, melt flow |
11/13/1990 | US4970175 Method of manufacturing a semiconductor device using SEG and a transitory substrate |
11/13/1990 | US4970174 Method for making a BiCMOS semiconductor device |
11/13/1990 | US4970173 Method of making high voltage vertical field effect transistor with improved safe operating area |
11/13/1990 | US4970107 Composite article comprising a copper element and a process for producing it |
11/13/1990 | US4970106 Thin film multilayer laminate interconnection board |
11/13/1990 | US4970099 Perfluoropolymer coated pellicles |
11/13/1990 | US4969828 Electrical socket for TAB IC's |
11/13/1990 | US4969823 Doping |
11/13/1990 | US4969790 Apparatus on the carousel principle for the coating of substrates |
11/13/1990 | US4969748 Apparatus and method for compensating for errors in temperature measurement of semiconductor wafers during rapid thermal processing |
11/13/1990 | US4969556 Vacuum container |
11/13/1990 | US4969415 PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides |
11/13/1990 | CA1276318C Large cross-sectional area molecular beam source for semiconductor processing |
11/13/1990 | CA1276317C Low deflection force sensitive pick |
11/13/1990 | CA1276316C Method for making a doped well in a semiconductor substrate |
11/13/1990 | CA1276315C Self aligned mesfet made using substitutional gate |
11/13/1990 | CA1276314C Silicon ion implanted semiconductor device |
11/13/1990 | CA1276276C Semiconductor devices employing ti-doped group iii-v epitaxial layer |
11/13/1990 | CA1276088C Enhanced adhesion between metals and polymers |
11/12/1990 | WO1990013921A1 Semiconductor device |
11/12/1990 | CA2008537A1 Permanently antistatic polymeric rigid containers |
11/08/1990 | DE4013944A1 Polycrystalline semiconductor film deposition in insulated substrates - using microwave plasma and biasing substrate via HF voltage allows deposition at lower temp. using inexpensive substrates |
11/08/1990 | DE4013929A1 Formation of diffused layers of controllable profile of dopants - using doped glass diffusion sources and selecting of gas-ambient to influence diffusion rate of impurities through glass |
11/08/1990 | DE3923630A1 Stromquellen-spannungsnachfuehrschaltkreis zur stabilisierung von bitleitungen Current source spannungsnachfuehrschaltkreis for stabilization of bit lines |
11/08/1990 | DE3914602A1 Tapering via prodn. esp. in multilevel circuits - by etching insulation layers with different etch rates |
11/08/1990 | DE3913066A1 Hermetically sealed housing for electronic circuits - has edge sealed by soldered layer that bonds cover to surface of circuit board with screen printed coating |
11/07/1990 | EP0396521A2 Apparatus and method for loading electronic component carrier tubes |
11/07/1990 | EP0396508A2 Process for fabricating an EPROM cell array |
11/07/1990 | EP0396398A1 Plasma etching apparatus with surface magnetic fields |
11/07/1990 | EP0396369A2 Semiconductor with filled-by-flow trench isolation |
11/07/1990 | EP0396357A1 Process for forming CMOS field effect transistors |
11/07/1990 | EP0396326A1 Method of processing substrate for semiconductor device |
11/07/1990 | EP0396307A2 Fabrication of semiconductor devices using phosphosilicate glasses |
11/07/1990 | EP0396299A1 Heating coil for use in growth of single crystal |
11/07/1990 | EP0396276A2 Method of manufacturing semiconductor device |
11/07/1990 | EP0396272A2 IC device including test circuit |