Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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08/05/2010 | WO2010088059A1 Photovoltaic device with improved crystal orientation |
08/05/2010 | WO2010088039A2 Dual high-k oxides with sige channel |
08/05/2010 | WO2010088015A2 Plasma-enhanced atomic layer deposition of conductive material over dielectric layers |
08/05/2010 | WO2010087976A2 Anti-cancer protein-platinum conjugates |
08/05/2010 | WO2010087884A1 Boosting transistor performance with non-rectangular channels |
08/05/2010 | WO2010087878A1 Techniques for improving transistor-to-transistor stress uniformity |
08/05/2010 | WO2010087856A1 Integrated-circuit attachment structure with solder balls and pins |
08/05/2010 | WO2010087854A1 Memristive transistor memory |
08/05/2010 | WO2010087835A1 Electrically actuated devices |
08/05/2010 | WO2010087833A1 Self-repairing memristor and method |
08/05/2010 | WO2010087668A2 Probe structure and a probe card having the same |
08/05/2010 | WO2010087638A2 Batch-type substrate-processing apparatus |
08/05/2010 | WO2010087579A1 Reel device and film loading device using the same |
08/05/2010 | WO2010087518A1 Epitaxial silicon carbide single crystal substrate and mehtod for producing same |
08/05/2010 | WO2010087484A1 Process for producing compound semiconductor thin film, solar cell, and coating agent for use in production of compound semiconductor thin film |
08/05/2010 | WO2010087444A1 Adhesive for electronic components |
08/05/2010 | WO2010087435A1 Substrate processing apparatus |
08/05/2010 | WO2010087428A1 Cvd apparatus |
08/05/2010 | WO2010087424A1 Substrate breaking apparatus |
08/05/2010 | WO2010087392A1 Substrate comprising alloy film of metal element having barrier function and metal element having catalytic power |
08/05/2010 | WO2010087389A1 Magnetic memory element and magnetic memory |
08/05/2010 | WO2010087385A1 Film deposition device and gas ejection member |
08/05/2010 | WO2010087362A1 Film formation method, and plasma film formation apparatus |
08/05/2010 | WO2010087345A1 Method of manufacturing reflective mask blanks for euv lithography |
08/05/2010 | WO2010087336A1 Method of mounting semiconductor chips, semiconductor device obtained using the method, method of connecting semiconductor chips, and three-dimensional structure, on the surface of which wiring is provided and fabrication method thereof |
08/05/2010 | WO2010087318A1 Curable composition for transfer material and urea compound containing (meth)acryloyl group |
08/05/2010 | WO2010087314A1 Coating applicator |
08/05/2010 | WO2010087299A1 Method and apparatus for laser-annealing semiconductor film |
08/05/2010 | WO2010087269A1 Non-volatile logic circuit |
08/05/2010 | WO2010087265A1 Nonvolatile semiconductor storage device and method for manufacturing same |
08/05/2010 | WO2010087249A1 Method for cutting substrate and method for manufacturing electronic element |
08/05/2010 | WO2010087233A1 Silicon-containing film, resin composition, and pattern formation method |
08/05/2010 | WO2010087232A1 Negative-type photosensitive insulating resin composition, and method for forming pattern using same |
08/05/2010 | WO2010087228A1 Method for firmly fixing particles, and method for producing structure having firmly fixed particles |
08/05/2010 | WO2010087226A1 Method for manufacturing composite substrate |
08/05/2010 | WO2010087218A1 Position controller for flexible substrate |
08/05/2010 | WO2010087217A1 Cyclooctatetraenetricarbonylruthenium complex, process for producing same, and process for producing film using the complex as raw material |
08/05/2010 | WO2010087213A1 Correction position detecting apparatus, correction position detecting method and bonding apparatus |
08/05/2010 | WO2010087195A1 Positive-type photosensitive insulating resin composition, and method for forming pattern using same |
08/05/2010 | WO2010087151A1 Method for manufacturing semiconductor substrate, and semiconductor substrate |
08/05/2010 | WO2010087102A1 Method for producing diamond-like carbon membrane |
08/05/2010 | WO2010087099A1 Cordierite-based sintered body |
08/05/2010 | WO2010087087A1 Semiconductor device and method for manufacturing same |
08/05/2010 | WO2010087061A1 Light-emitting element and method for manufacturing same |
08/05/2010 | WO2010087053A1 Bonding wire |
08/05/2010 | WO2010087021A1 Transfer device |
08/05/2010 | WO2010086983A1 Transfer device |
08/05/2010 | WO2010086952A1 Semiconductor device and method for manufacturing same |
08/05/2010 | WO2010086950A1 Microwave plasma processing apparatus, dielectric board provided with slot board for microwave plasma processing apparatus, and method for manufacturing dielectric board |
08/05/2010 | WO2010086939A1 Method for evaluating superimposition of pattern |
08/05/2010 | WO2010086936A1 Semiconductor device, electronic apparatus using semiconductor device and method for manufacturing semiconductor device |
08/05/2010 | WO2010086930A1 Method for manufacturing semiconductor device |
08/05/2010 | WO2010086893A1 Cleaning agent for copper-wired semiconductor |
08/05/2010 | WO2010086796A2 Pin lifting system |
08/05/2010 | WO2010086745A1 Method of etching lanthanum-containing oxide layers |
08/05/2010 | WO2010086718A1 Ohmic electrode and method of forming the same |
08/05/2010 | WO2010086504A1 Structures comprising high aspect ratio molecular structures and methods of fabrication |
08/05/2010 | WO2010086378A1 Method for forming nanowires and associated method for manufacturing an optical component |
08/05/2010 | WO2010086154A1 In situ formed drain and source regions including a strain inducing alloy and a graded dopant profile |
08/05/2010 | WO2010086153A1 Graded well implantation for asymmetric transistors having reduced gate electrode pitches |
08/05/2010 | WO2010086152A1 Reduction of thickness variations of a threshold adjusting semiconductor alloy by reducing patterning non-uniformities prior to depositing the semiconductor alloy |
08/05/2010 | WO2010086067A1 Memory transistor with a non-planar floating gate and manufacturing method thereof |
08/05/2010 | WO2010086059A1 Etching system and method for forming multiple porous semiconductor regions with different optical and structural properties on a single semiconductor wafer |
08/05/2010 | WO2010085949A2 Substrate carrier for mounting substrates |
08/05/2010 | WO2010085928A1 Etching mixture for producing a structured surface on silicon substrates |
08/05/2010 | WO2010067974A3 Apparatus for treating multiple substrates |
08/05/2010 | WO2010066795A3 A method for forming a nanostructure penetrating a layer |
08/05/2010 | WO2010065353A3 Mechanical decoupling of a probe card assembly to improve thermal response |
08/05/2010 | WO2010064814A3 Rapid heat treatment apparatus that enables extended pyrometer life |
08/05/2010 | WO2010062497A3 Goodness of fit in spectrographic monitoring of a substrate during processing |
08/05/2010 | WO2010059790A3 Integration sequences with top profile modification |
08/05/2010 | WO2010059367A3 Methods and apparatus for producing semiconductor on insulator structures using directed exfoliation |
08/05/2010 | WO2010053280A3 Apparatus and method for wet-processing object, and fluid diffusion plate and barrel used therein |
08/05/2010 | WO2010053277A3 Method for manufacturing micro structure using x-ray exposure |
08/05/2010 | WO2010051184A3 Removal of a sheet from a production apparatus |
08/05/2010 | WO2010048364A3 Methods for reducing damage to substrate layers during deposition processes |
08/05/2010 | WO2009154953A4 Sample inspection methods, systems and components |
08/05/2010 | US20100198386 Method of optimizing process recipe of substrate processing system |
08/05/2010 | US20100197207 Chemical mechanical polishing apparatus |
08/05/2010 | US20100197197 Polishing pad thickness measuring method and polishing pad thickness measuring device |
08/05/2010 | US20100197147 Single-shot semiconductor processing system and method having various irradiation patterns |
08/05/2010 | US20100197146 Method of heat treating silicon wafer |
08/05/2010 | US20100197145 Silicon nitride passivation for a solar cell |
08/05/2010 | US20100197144 Methods for damage etch and texturing of silicon single crystal substrates |
08/05/2010 | US20100197143 Dry etching method for silicon nitride film |
08/05/2010 | US20100197142 High selectivity, low damage electron-beam delineation etch |
08/05/2010 | US20100197141 Novel self-aligned static random access memory (sram) on metal gate |
08/05/2010 | US20100197140 Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask |
08/05/2010 | US20100197139 Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same |
08/05/2010 | US20100197138 Method and apparatus for etching |
08/05/2010 | US20100197137 Plasma processing apparatus and plasma processing method |
08/05/2010 | US20100197136 Composition for cleaning and rust prevention and process for producing semiconductor element or display element |
08/05/2010 | US20100197135 Method for manufacturing a semiconductor device with metal-containing cap layers |
08/05/2010 | US20100197134 Coaxial through chip connection |
08/05/2010 | US20100197133 Method of forming a metallization system of a semiconductor device by using a hard mask for defining the via size |
08/05/2010 | US20100197132 Barrier-Metal-Free Copper Damascene Technology Using Atomic Hydrogen Enhanced Reflow |
08/05/2010 | US20100197131 Thickened sidewall dielectric for memory cell |
08/05/2010 | US20100197130 Semiconductor memory device and method of manufacturing the same |
08/05/2010 | US20100197129 Method for manufacturing semiconductor device |
08/05/2010 | US20100197128 CMOS Integration with Metal Gate and Doped High-K Oxides |