Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2010
08/03/2010US7767377 A terpolymer based three monomers of (alpha-lower alkyl) acrylic esters; one having acid-dissociable, dissolution-inhibiting groups, another having lactone-containing monocyclic or polycyclic groups, one having polycyclic and alicyclic hydrocarbon groups which contain polar groups; dry etching re
08/03/2010US7767367 A transparent substrate having a light-shielding film of a metal dry-etchable by fluorine and an etching mask film deposited on the light-shielding film of another resistant to fluorine dry etching; pattern size variation arising from density dependency reduced so high accuracy; microstructure
08/03/2010US7767364 Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device
08/03/2010US7767307 Crack free monocrystalline thick films; having intermediate layer with lattice parameter smaller than outer layers; simple, low cost, reproducible production
08/03/2010US7767261 Methods for forming passivated semiconductor nanoparticles
08/03/2010US7767252 discharging droplets of a first silver conductive nanoparticles to form a pattern, then depositing a photo-curable material to form a first and second insulating material, curing to make the surface of lyophilic; forming conductive posts by filling silver particles in the via holes
08/03/2010US7767104 Method for repairing errors of patterns embodied in thin layers
08/03/2010US7767100 Patterning method and field effect transistors
08/03/2010US7767099 Sub-lithographic interconnect patterning using self-assembling polymers
08/03/2010US7767056 High-frequency plasma processing apparatus
08/03/2010US7767055 Capacitive coupling plasma processing apparatus
08/03/2010US7767053 Substrate processing apparatus and substrate processing method
08/03/2010US7767041 Ag-Bi-base alloy sputtering target, and method for producing the same
08/03/2010US7767024 Method for front end of line fabrication
08/03/2010US7767023 Device for containing catastrophic failure of a turbomolecular pump
08/03/2010US7767006 Ozone processing apparatus and ozone processing method
08/03/2010US7765682 Apparatus for attaching substrates
08/03/2010US7765669 Method of forming shadow mask pattern
08/03/2010CA2466183C Method of producing sintered silicon carbide jig used for producing semiconductor and sintered silicon carbide jig obtained by the same production method
08/03/2010CA2381643C Multilayer microstructures and laser based method for precision and reduced damage patterning of such structures
07/2010
07/29/2010WO2010085757A1 Methods for fabricating mos devices having epitaxially grown stress-inducing source and drain regions
07/29/2010WO2010085754A1 Semiconductor devices having dopant diffusion barriers
07/29/2010WO2010085685A2 Diffusion barrier layers
07/29/2010WO2010085679A2 Systems and methods for detecting defects on a wafer
07/29/2010WO2010085657A2 Memory device power managers and methods
07/29/2010WO2010085480A1 Light emitting devices with phosphor wavelength conversion and methods of manufacture thereof
07/29/2010WO2010085466A1 Conductive seal ring electrostatic chuck
07/29/2010WO2010085459A1 Silicon based opto-electric circuits
07/29/2010WO2010085458A1 Electrical contacts for cmos devices and iii-v devices formed on a silicon substrate
07/29/2010WO2010085439A2 Self-aligned selective emitter formed by counterdoping
07/29/2010WO2010085417A1 Support structure for multiple workpiece support rollers
07/29/2010WO2010085350A1 Non-condensing thermos chuck
07/29/2010WO2010085324A1 Compositons comprising silane modified metal oxides
07/29/2010WO2010085304A2 Methods of enhancing performance of field-effect transistors and field-effect transistors made thereby
07/29/2010WO2010085293A1 Reducing photoresist layer degradation in plasma immersion ion implantation
07/29/2010WO2010085241A1 Multilayer memristive devices
07/29/2010WO2010085226A1 Using alloy electrodes to dope memristors
07/29/2010WO2010085225A1 Controlled placement of dopants in memristor active regions
07/29/2010WO2010085109A2 Antenna for inductively coupled plasma generation, inductively coupled plasma generator, and method of driving the same
07/29/2010WO2010084960A1 Aromatic compound and method for producing same
07/29/2010WO2010084918A1 Application of benzocyclobutene resin to imprinting technique, and method for forming pattern using the technique
07/29/2010WO2010084909A1 Method for cleaning magnetic film processing chamber, method for manufacturing magnetic element, and substrate processing apparatus
07/29/2010WO2010084858A1 Surface mounting method for component to be mounted, structure with mounted component obtained by the method, and liquid epoxy resin composition for underfill used in the method
07/29/2010WO2010084844A1 Method for producing semiconductor wiring line
07/29/2010WO2010084826A1 Silicon wafer cleaning agent
07/29/2010WO2010084785A1 Workpiece loading/unloading device and workpiece containing system
07/29/2010WO2010084779A1 Plasma processing apparatus
07/29/2010WO2010084778A1 Plasma processing apparatus
07/29/2010WO2010084777A1 Plasma processing apparatus
07/29/2010WO2010084759A1 Surface treatment for a fluorocarbon film
07/29/2010WO2010084746A1 Semiconductor device and method for manufacturing same
07/29/2010WO2010084742A1 Semiconductor device and method of manufacturing same
07/29/2010WO2010084728A1 Apparatus for adhering adhesive tape, and pressure bonding apparatus
07/29/2010WO2010084727A1 Field effect transistor and method for manufacturing same
07/29/2010WO2010084725A1 Semiconductor device, method for manufacturing same, and display device
07/29/2010WO2010084697A1 Nitride-semiconductor luminescent element, epitaxial substrate, and method of producing nitride-semiconductor luminescent element
07/29/2010WO2010084657A1 Semiconductor device, method for manufacturing semiconductor device, and liquid crystal device
07/29/2010WO2010084655A1 Plasma processing apparatus
07/29/2010WO2010084650A1 Substrate support stage of plasma processing apparatus
07/29/2010WO2010084542A1 Automated warehouse
07/29/2010WO2010084538A1 Semiconductor device and method for manufacturing same
07/29/2010WO2010084535A1 Semiconductor device and method for manufacturing same
07/29/2010WO2010084534A1 Thin film diode and method for manufacturing same
07/29/2010WO2010084533A1 Power supply wiring structure of semiconductor integrated circuit
07/29/2010WO2010084372A1 A photoresist image-forming process using double patterning
07/29/2010WO2010083995A2 Method of enhancing the strength of semiconductor wafers or chips
07/29/2010WO2010083933A1 Process to dissolve the oxide layer in the peripheral ring of a structure of semiconductor-on-insulator type
07/29/2010WO2010083922A1 Semiconductor component having interlayer connection and method for the production thereof
07/29/2010WO2010083912A1 3d chip-stack with fuse-type through silicon via
07/29/2010WO2010083711A1 Digital image scaling method and integrated system thereof
07/29/2010WO2010065334A3 Semiconductor devices with current shifting regions and related methods
07/29/2010WO2010062670A3 X-y adjustable optical mount
07/29/2010WO2010062661A3 Monolithic linear polishing sheet
07/29/2010WO2010062066A3 Non-contact conveying plate capable of spurting small amount of air with high pressure
07/29/2010WO2010059434A3 Methods for forming a conductive material, methods for selectively forming a conductive material, methods for forming platinum, and methods for forming conductive structures
07/29/2010WO2010058912A3 Probe card and fabrication method thereof
07/29/2010WO2010057016A3 Semiconductor device support for bonding
07/29/2010WO2010056679A3 Semi-quantitative thickness determination
07/29/2010WO2010054292A3 Exhaust condensate removal apparatus for abatement system
07/29/2010WO2010054291A3 Abatement system
07/29/2010WO2010054112A3 Plasma resistant coatings for plasma chamber components
07/29/2010WO2010054076A3 Rapid thermal processing chamber with micro-positioning system
07/29/2010WO2010051286A3 Photolithographic reticles with electrostatic discharge protection structures
07/29/2010WO2010051284A3 Self cleaning and adjustable slurry delivery arm
07/29/2010WO2010051266A3 Improving the conformal doping in p3i chamber
07/29/2010WO2010050716A3 Gas scrubbing apparatus and gas scrubbing method
07/29/2010WO2010048236A3 Non-volatile memory having silicon nitride charge trap layer
07/29/2010WO2010048084A3 Electrode and power coupling scheme for uniform process in a large-area pecvd chamber
07/29/2010WO2010045153A3 Method for depositing conformal amorphous carbon film by plasma-enhanced chemical vapor deposition (pecvd)
07/29/2010WO2010044558A3 Method for manufacturing a silicon thin film using energy beam irradiation
07/29/2010WO2010043517A3 Bonding device, ultrasonic transducer, and bonding method
07/29/2010WO2010038963A3 Apparatus for manufacturing a stratified structure
07/29/2010WO2010025696A3 Method for producing an organic radiation-emitting component and organic radiation-emitting component
07/29/2010WO2010002515A3 Low-cost substrates having high-resistivity properties and methods for their manufacture
07/29/2010WO2009155117A3 Method and apparatus for detecting the substrate temperature in a laser anneal system
07/29/2010WO2009152108A8 GeSbTe MATERIAL INCLUDING SUPERFLOW LAYER(S), AND USE OF Ge TO PREVENT INTERACTION OF Te FROM SbXTeY AND GeXTeY RESULTING IN HIGH Te CONTENT AND FILM CRISTALLINITY
07/29/2010WO2009082516A3 Adhesive applications using alkali silicate glass for electronics
07/29/2010WO2009033067A3 Combinatorial process system
07/29/2010US20100191357 Pattern layout creation method, program product, and semiconductor device manufacturing method
07/29/2010US20100190464 Simple radio frequency integrated circuit (rfic) packages with integrated antennas
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