| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/11/2012 | CN102315179A Metal-coated ceramic baseplate and manufacturing method thereof |
| 01/11/2012 | CN102315177A High pressure resistant passivation protection diode chip and processing method thereof |
| 01/11/2012 | CN102315175A Method of forming a semiconductor device |
| 01/11/2012 | CN102315174A SONOS (Silicon Oxide Nitride Oxide Semiconductor) flash memory containing separate-grid structure as well as manufacturing method and operating method thereof |
| 01/11/2012 | CN102315173A Method for preparing three-dimensional multivalue nonvolatile memory |
| 01/11/2012 | CN102315172A Method for realization of crossbar array of crossed conductive or semi-conductive access lines |
| 01/11/2012 | CN102315171A Integrated circuit device and method of manufacturing same |
| 01/11/2012 | CN102315170A Method for manufacturing silicon nanowire FET (field effect transistor) based on wet etching |
| 01/11/2012 | CN102315169A Light device wafer cutting method |
| 01/11/2012 | CN102315168A Method for cutting integrated circuit wafer |
| 01/11/2012 | CN102315167A Wide visual angle LCD array substrate manufacturing method |
| 01/11/2012 | CN102315166A Thin film transistor substrate having low resistance bus line structure and method for manufaturing the same |
| 01/11/2012 | CN102315165A Edge electric field type liquid crystal display array substrate and manufacturing method thereof |
| 01/11/2012 | CN102315164A Method for improving performance of RF-LDMOS (Radio Frequency-Laterally Diffused Metal Oxide Semiconductor) device and integrated circuit thereof |
| 01/11/2012 | CN102315163A Manufacturing method of ultralow-dielectric-constant film copper-interconnecting layer |
| 01/11/2012 | CN102315162A Semiconductor device with side-junction and method for fabricating the same |
| 01/11/2012 | CN102315161A Method for fabricating semiconductor device with side junction |
| 01/11/2012 | CN102315160A Semiconductor device with one-side contact and fabrication method thereof |
| 01/11/2012 | CN102315159A Method of forming conductive lines of semiconductor memory device |
| 01/11/2012 | CN102315158A Method for forming contact hole of semiconductor device |
| 01/11/2012 | CN102315157A Method for forming and correcting TSV (through silicon via) |
| 01/11/2012 | CN102315156A Method for manufacturing semiconductor device |
| 01/11/2012 | CN102315155A Shallow-trench isolation structure and forming method thereof as well as semiconductor structure and forming method thereof |
| 01/11/2012 | CN102315154A Silicon-on-insulator structure and manufacturing method thereof as well as semiconductor device |
| 01/11/2012 | CN102315153A Method for manufacturing shallow-channel isolation structure of semiconductor device |
| 01/11/2012 | CN102315152A Isolation area, semiconductor device and forming method thereof |
| 01/11/2012 | CN102315151A Substrate stage, substrate processing apparatus and substrate processing system |
| 01/11/2012 | CN102315150A Movable ground ring for a plasma processing chamber |
| 01/11/2012 | CN102315149A Bonding method by molecular bonding with radial misalignment compensation |
| 01/11/2012 | CN102315148A Substrate conveying device and substrate conveying method for coating purpose |
| 01/11/2012 | CN102315147A Treatment device |
| 01/11/2012 | CN102315146A Bar-shearing tubing structure |
| 01/11/2012 | CN102315145A Reaction-chamber cover plate and reaction chamber provided with same |
| 01/11/2012 | CN102315144A Chip-installing machine for small fan radiator |
| 01/11/2012 | CN102315143A Substrate processing apparatus |
| 01/11/2012 | CN102315142A Flow path switching apparatus, processing apparatus, flow path switching method, and processing method |
| 01/11/2012 | CN102315141A Photoetching registration mark protective device and metal sputtering technological method |
| 01/11/2012 | CN102315140A Slurry mixing system as well as drainage pipe and cleaning method applied to same |
| 01/11/2012 | CN102315139A Technology of paste printing for manufacturing micron-sized salient point on wafer |
| 01/11/2012 | CN102315138A Method for low-temperature pressure sintering connection of two connection mating members and system manufactured using same |
| 01/11/2012 | CN102315137A Chip fanning out method and chip-on-film device |
| 01/11/2012 | CN102315136A Package structure and manufacturing method thereof |
| 01/11/2012 | CN102315135A Chip package and manufacturing process thereof |
| 01/11/2012 | CN102315134A Method for flipping chip by quickly raising and reducing temperature |
| 01/11/2012 | CN102315133A Conveying system for integrated circuit chip loader framework |
| 01/11/2012 | CN102315132A High-voltage transistor and manufacturing method thereof |
| 01/11/2012 | CN102315131A Manufacturing method of transistor |
| 01/11/2012 | CN102315130A Thin film transistor (TFT) and manufacturing method thereof |
| 01/11/2012 | CN102315129A Preparation method of vertical silicon nanowire field effect transistor |
| 01/11/2012 | CN102315128A Chemical sensitive field-effect transistor manufacturing method |
| 01/11/2012 | CN102315127A Manufacture method for semiconductor device and semiconductor element |
| 01/11/2012 | CN102315126A Semiconductor device and manufacturing method thereof |
| 01/11/2012 | CN102315125A Semiconductor device and formation method thereof |
| 01/11/2012 | CN102315124A Manufacturing method for nitride high electron mobility transistor with dual-cavity field plate structure |
| 01/11/2012 | CN102315123A Method for improving etching repeatability of gallium nitride (GaN) high electron mobility transistor (HEMT) grid trench |
| 01/11/2012 | CN102315122A Process for manufacturing bipolar-type device by adopting two-time stibium buried-layer extending technology |
| 01/11/2012 | CN102315121A High-frequency transistor manufacture method |
| 01/11/2012 | CN102315120A Method for reducing leakage current of semiconductor chip |
| 01/11/2012 | CN102315119A Method for forming masking layer by using ion implantation and semiconductor device fabricated by using the same |
| 01/11/2012 | CN102315118A Method of forming patterns of a semiconductor device |
| 01/11/2012 | CN102315117A Etching method for Mo base/TaN metal grid lamination structure |
| 01/11/2012 | CN102315116A Method for depositing fluorine-doped silicon oxide thin film on wafer |
| 01/11/2012 | CN102315115A Dry-process etching method for HfSiAlON high-K dielectric |
| 01/11/2012 | CN102315114A Structure and method for preventing selective extension hard mask layer undercut feature |
| 01/11/2012 | CN102315113A Solar-battery monocrystalline-silicon floss-making fluid with low volatility and application thereof |
| 01/11/2012 | CN102315112A Etching method for stacked metal gate |
| 01/11/2012 | CN102315111A Manufacturing method of double step structure gate electrode and corresponding thin film transistor |
| 01/11/2012 | CN102315110A Groove-type semiconductor power-device grid-electrode leading-out designing and manufacturing method |
| 01/11/2012 | CN102315109A Semiconductor device and method for manufacturing the same |
| 01/11/2012 | CN102315108A Laser annealing method used for complex structure semiconductor device |
| 01/11/2012 | CN102315107A Method of manufacturing a semiconductor device |
| 01/11/2012 | CN102315106A Laser thermal annealing method |
| 01/11/2012 | CN102315105A Method for manufacturing semiconductor device |
| 01/11/2012 | CN102315104A Manufacturing method for realizing selective-emitter crystalline silicon solar cell through neutron transmutation doping |
| 01/11/2012 | CN102315103A Fabrication method and fabrication apparatus of group III nitride crystal substance |
| 01/11/2012 | CN102315102A Substrate processing apparatus and heating equipment |
| 01/11/2012 | CN102315101A Integrated Gearbox And Rotary Feedthrough System For A Vacuum Chamber Structure |
| 01/11/2012 | CN102315100A Method for graphical film |
| 01/11/2012 | CN102315099A Method of Forming Fine Patterns |
| 01/11/2012 | CN102315098A Methods for cleaning semiconductor base and forming gate-medium layer |
| 01/11/2012 | CN102315097A Method for preparing graphical substrate by using nanorods |
| 01/11/2012 | CN102315096A Preparation method of multilayer semiconductor substrate |
| 01/11/2012 | CN102315095A Plasma processing method and manufacturing method of semiconductor device |
| 01/11/2012 | CN102315094A Optimized jettlayout design layer thickness |
| 01/11/2012 | CN102315093A Process method for flattening filled trench |
| 01/11/2012 | CN102315092A Wet etching apparatus and method thereof |
| 01/11/2012 | CN102315091A Coating and developing apparatus and method |
| 01/11/2012 | CN102315090A Coating and developing apparatus |
| 01/11/2012 | CN102315089A Rotary cleaning device |
| 01/11/2012 | CN102315088A Dyeing method for flip chip package product |
| 01/11/2012 | CN102315087A Surface treatment device and method thereof |
| 01/11/2012 | CN102315086A Device for improving movement accuracy of mechanical arm and use method thereof |
| 01/11/2012 | CN102315085A Uniform ring inclination warning device for reaction cavity of plasma body etching machine |
| 01/11/2012 | CN102314102A Treatment of synthetic quartz glass substrate |
| 01/11/2012 | CN102314101A Cleaning composition for removing polyimide |
| 01/11/2012 | CN102314081A Coating and developing apparatus and method |
| 01/11/2012 | CN102314078A Photoetching method |
| 01/11/2012 | CN102314077A Method for performing planarization photoetching process on gate poly |
| 01/11/2012 | CN102314076A Composite mask and manufacturing method thereof |
| 01/11/2012 | CN102314075A Composite mask and manufacturing method thereof |