Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2014
10/28/2014US8872229 Thin film transistor
10/28/2014US8872228 Strained-channel semiconductor device fabrication
10/28/2014US8872225 Defect transferred and lattice mismatched epitaxial film
10/28/2014US8872223 Programmable SCR for ESD protection
10/28/2014US8872222 Semiconductor structure and method for forming the same
10/28/2014US8872220 Integrated circuits with aligned (100) NMOS and (110) PMOS FinFET sidewall channels
10/28/2014US8872192 Rectifier circuit
10/28/2014US8872191 Electronic circuit device
10/28/2014US8872189 Substrate, semiconductor device, and method of manufacturing the same
10/28/2014US8872188 Silicon carbide semiconductor device and method of manufacturing thereof
10/28/2014US8872183 Three-dimensional semiconductor devices
10/28/2014US8872181 Thin film transistor array substrate and method of manufacturing the same
10/28/2014US8872177 Electric charge flow circuit for a time measurement
10/28/2014US8872156 Group III nitride semiconductor light emitting device and method of fabricating group III nitride semiconductor light emitting device
10/28/2014US8872149 RRAM structure and process using composite spacer
10/28/2014US8872059 Etching system and method of controlling etching process condition
10/28/2014US8872021 Photoelectric conversion device and manufacturing method thereof
10/28/2014US8871860 Methods for coating a substrate with an amphiphilic compound
10/28/2014US8871670 Defect engineering in metal oxides via surfaces
10/28/2014US8871656 Flowable films using alternative silicon precursors
10/28/2014US8871655 Method of forming silicon oxycarbonitride film
10/28/2014US8871654 Film deposition apparatus, and method of depositing a film
10/28/2014US8871653 Etching agent, etching method and liquid for preparing etching agent
10/28/2014US8871652 Method of manufacturing a semiconductor template
10/28/2014US8871651 Mask formation processing
10/28/2014US8871650 Post etch treatment (PET) of a low-K dielectric film
10/28/2014US8871649 Methods of forming trench/hole type features in a layer of material of an integrated circuit product
10/28/2014US8871648 Method for forming high density patterns
10/28/2014US8871647 Group III nitride substrate, semiconductor device comprising the same, and method for producing surface-treated group III nitride substrate
10/28/2014US8871646 Methods of forming a masking pattern for integrated circuits
10/28/2014US8871645 Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof
10/28/2014US8871644 Method of manufacturing semiconductor device
10/28/2014US8871643 Lateral semiconductor device and manufacturing method for the same
10/28/2014US8871642 Method of forming pattern and developer for use in the method
10/28/2014US8871641 Low resistance through-wafer via
10/28/2014US8871640 Method of manufacturing semiconductor chip
10/28/2014US8871639 Semiconductor devices and methods of manufacture thereof
10/28/2014US8871638 Semiconductor device and method for fabricating the same
10/28/2014US8871637 Semiconductor structure with insulated through silicon via
10/28/2014US8871636 Fluorine depleted adhesion layer for metal interconnect structure
10/28/2014US8871635 Integrated circuits and processes for forming integrated circuits having an embedded electrical interconnect within a substrate
10/28/2014US8871634 Chip package incorporating interfacial adhesion through conductor sputtering
10/28/2014US8871633 Semiconductor device and manufacturing method of the same
10/28/2014US8871632 Reduction of pore fill material dewetting
10/28/2014US8871631 Method to form solder deposits on substrates
10/28/2014US8871630 Manufacturing electronic device having contact elements with a specified cross section
10/28/2014US8871629 Methods of and semiconductor devices with ball strength improvement
10/28/2014US8871628 Electrode structure, device comprising the same and method for forming electrode structure
10/28/2014US8871627 Semiconductor device having low dielectric insulating film and manufacturing method of the same
10/28/2014US8871626 FinFET with vertical silicide structure
10/28/2014US8871625 Spacer structure of a field effect transistor with an oxygen-containing layer between two oxygen-sealing layers
10/28/2014US8871624 Sealed air gap for semiconductor chip
10/28/2014US8871623 Methods and devices for forming nanostructure monolayers and devices including such monolayers
10/28/2014US8871621 Method of forming an asymmetric MIMCAP or a schottky device as a selector element for a cross-bar memory array
10/28/2014US8871619 Application specific implant system and method for use in solar cell fabrications
10/28/2014US8871618 In-situ fabrication method for silicon solar cell
10/28/2014US8871617 Deposition and reduction of mixed metal oxide thin films
10/28/2014US8871616 Methods of fabricating thin film transistor and organic light emitting diode display device having the same
10/28/2014US8871615 Method of manufacturing semiconductor device
10/28/2014US8871614 Semiconductor die with protective layer and related method of processing a semiconductor wafer
10/28/2014US8871613 Semiconductor die singulation method
10/28/2014US8871612 Method for forming a cleaved facet of semiconductor device
10/28/2014US8871611 Method for molecular adhesion bonding at low pressure
10/28/2014US8871610 Method for manufacturing SOI substrate
10/28/2014US8871609 Thin wafer handling structure and method
10/28/2014US8871607 Method for producing hybrid components
10/28/2014US8871605 Methods for fabricating and orienting semiconductor wafers
10/28/2014US8871604 Methods of manufacturing semiconductor devices that include forming a capacitor using a cap layer
10/28/2014US8871603 Semiconductor device and method for low resistive thin film resistor interconnect
10/28/2014US8871602 Method for manufacturing molecular memory device
10/28/2014US8871601 Diffusion barriers
10/28/2014US8871600 Schottky barrier diodes with a guard ring formed by selective epitaxy
10/28/2014US8871599 Method of manufacturing IC comprising a bipolar transistor and IC
10/28/2014US8871598 Non-volatile memory (NVM) and high-k and metal gate integration using gate-first methodology
10/28/2014US8871597 High gate density devices and methods
10/28/2014US8871596 Method of multiple patterning to form semiconductor devices
10/28/2014US8871595 Integration of non-volatile charge trap memory devices and logic CMOS devices
10/28/2014US8871594 Process for manufacturing power integrated devices having surface corrugations, and power integrated device having surface corrugations
10/28/2014US8871593 Semiconductor device with buried gate electrode and gate contacts
10/28/2014US8871592 Method of manufacturing a semiconductor device including concave portion
10/28/2014US8871591 Methods of manufacturing a vertical type semiconductor device
10/28/2014US8871590 Thin film transistor array substrate, liquid crystal display device including the same and fabricating methods thereof
10/28/2014US8871588 Reverse construction integrated circuit
10/28/2014US8871587 Complementary stress memorization technique layer method
10/28/2014US8871586 Methods of reducing material loss in isolation structures by introducing inert atoms into oxide hard mask layer used in growing channel semiconductor material
10/28/2014US8871585 Manufacturing method of semiconductor device and semiconductor device
10/28/2014US8871584 Replacement source/drain finFET fabrication
10/28/2014US8871583 Semiconductor device and manufacturing method thereof
10/28/2014US8871582 Methods of forming a semiconductor device with a protected gate cap layer and the resulting device
10/28/2014US8871581 Enhancement mode III-nitride FET
10/28/2014US8871579 Semiconductor transistor manufacturing method, driving circuit utilizing a semiconductor transistor manufactured according to the semiconductor transistor manufacturing method, pixel circuit including the driving circuit and a display element, display panel having the pixel circuits disposed in a matrix, display apparatus provided with the display panel
10/28/2014US8871578 Method for manufacturing thin film transistor
10/28/2014US8871577 Thin film transistor and manufacturing method thereof
10/28/2014US8871575 Method of fabricating field effect transistor with fin structure
10/28/2014US8871574 Memory cells, memory cell constructions, and memory cell programming methods
10/28/2014US8871573 Method for forming a semiconductor device
10/28/2014US8871572 Lead frame having a perimeter recess within periphery of component terminal
10/28/2014US8871570 Method of fabricating integrated optoelectronic interconnects with side mounted transducer
10/28/2014US8871569 Semiconductor package and method of manufacturing the same
10/28/2014US8871568 Packages and method of forming the same