Patents for G03C 1 - Photosensitive materials (26,817)
11/2005
11/03/2005US20050244760 Fog-density development in exposed areas of the image is imagewise inhibited by the presence of a density-inhibiting agent, especially a mercapto-functional compound
11/03/2005US20050244748 Photoresist polymer and photoresist composition containing the same
11/03/2005US20050244747 Positive-tone radiation-sensitive resin composition
11/03/2005US20050244745 Photoresist compositions with si-component
11/03/2005US20050244744 Method for forming temporary image
11/03/2005US20050244743 When the temporary image is exposed to indoor ambient conditions of darkness and/or indoor light, the contrast changes to the absence of contrast to erase the image; capable of undergoing multiple cycles of temporary image formation and temporary image erasure
11/03/2005US20050244742 Photochromic material capable of reversibly converting among a number of different forms, one of which has an absorption spectrum that overlaps with a predetermined wavelength scope; and a light absorbing material with a light absorption band that overlaps with the absorption spectrum of the one form
11/03/2005US20050244741 Compositions, systems, and methods for imaging
11/03/2005US20050244740 Slightly alkali-soluble or alkali-insoluble novolak or polyhydroxystyrenic resin ; bisvinyloxyalkylene or polyvinyl ether curing agent; photoacid generator; organic solvent; high sensitivity, heat resistance and resolution; undulation suppression
11/03/2005US20050244598 Color photo film package
11/03/2005US20050243289 Projection system
11/03/2005US20050241177 Coating process and apparatus
11/03/2005DE102004016923A1 Vorhangbeschichter und Vorhangbeschichtungsverfahren Curtain and curtain coating method
11/02/2005EP1591831A2 Reimageable medium with light absorbing material
11/02/2005EP1591830A2 Reimageable medium
11/02/2005EP1591829A1 Method for forming temporary image
11/02/2005EP1591267A2 Compositions, systems, and methods for imaging
11/02/2005CN1692314A Chemical-amplification positive-working photoresist composition
11/02/2005CN1690864A Automatic developing apparatus and process for forming image using the same
11/02/2005CN1690853A Photosensitive resin composition and photosensitive dry film containing the same
11/02/2005CN1690099A Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
11/02/2005CN1225677C Silver halide light sensitive emulsion and silver halide light sensitive material using said emulsion
11/01/2005US6960426 Silver halide material for optical memory devices with luminescent reading and methods for the treatment thereof
11/01/2005US6960419 Antihalation dye for negative-working printing plates
10/2005
10/27/2005WO2005101118A1 Photothermographic materials with improved natural age keeping
10/27/2005WO2005101117A2 Method of manufacture of integrated optical devices
10/27/2005US20050239277 Interconnect and a method of manufacture therefor
10/27/2005US20050238998 Photosensitive resin composition and photosensitive dry film containing the same
10/27/2005US20050238997 Curable undercoat of copolymers of acrylic esters, amides, and hydroxy substituted aromatic olefins, a phenolic crosslinker, a thermal acid generator and a solvent; bilayer relief image; integrated circuits
10/27/2005US20050238994 Coating of infrared absorber, first layer of hydrophobic thermoplastic polymer particles dispersed in phenolic resin binder; second layer between first layer and hydrophilic support comprising polymer with a sulfonamide group; imagewise exposing to heat and/or infrared light; water insolubility
10/27/2005US20050238993 Nitrogen-containing organic compound, chemically amplified resist composition and patterning process
10/27/2005US20050238991 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
10/27/2005US20050238990 Photoresist resin and photoresist resin composition
10/27/2005US20050238834 High modulus label with compliant carrier sheet
10/27/2005US20050238351 Automatic developing apparatus and process for forming image using the same
10/27/2005DE19902404B4 Kaskadengießer Slide hopper
10/26/2005EP1589375A1 Resist composition
10/26/2005EP1589374A2 Polymerizable composition, photopolymerizing method and process for producing lithographic printing plate using the polymerizable composition
10/26/2005EP1589372A1 Silver halide emulsion, silver halide photographic sensitive material, and method of image formation
10/26/2005CN1689268A Encrypted data reception device and decryption key updating method
10/26/2005CN1224656C Process for producing chain propagation water soluble gelatine, gelatine produced with the same method and silver halide photographic sensitive material containing the same gelatine
10/26/2005CN1224466C Applying method and device for thermal developing sensitive material
10/25/2005US6958209 Photothermographic material and image forming method
10/20/2005WO2005098536A1 Preparation of high bromide cubical grain emulsion
10/20/2005WO2005097876A1 Method of coloring a coating composition
10/20/2005WO2005097352A1 Curtain coating device and curtain coating method
10/20/2005US20050235103 Methods and systems for overwrite protected storage media
10/20/2005US20050233271 Photothermographic material
10/20/2005US20050233270 Photothermographic materials with improved natural age keeping
10/20/2005US20050233269 material comprising a support having a photosensitive silver halide, a non-photosensitive source of reducible silver ions, a reducing agent and an X-radiation-sensitive phosphor that is a rare earth phosphate, a yttrium phosphate, a strontium phosphate or a strontium fluoroborate
10/20/2005US20050233268 a layered material; a support, a polymer binder, a reducing agent and a silver salt of nitrogen containing heterocyclic compound containing an imino group; photothermographic material for medical x-ray
10/20/2005US20050233267 Multilayer; silver halide emulsion and protective colloid on radiation transparent support
10/20/2005US20050233266 iridium coordination complex dopant is selected from [IrCl5(5-chloro thiazole)]2-; [IrCl5(5-bromo thiazole)]2-; [IrCl4(5-bromo thiazole)2]1-; and [IrBr5(5-bromo thiazole)]2-
10/20/2005US20050233265 Photosensitive thermal development recording material, its case, and developing method and production process of photosensitive thermal recording material
10/20/2005US20050233248 Planographic printing plate material and planographic printing plate preparing process
10/20/2005US20050233245 2,4,6-Triisopropylbenzenesulfonate compound capable of generating an acid upon exposure to radiation or electron beams, polymer which changes solubility in alkaline developer under action of acid, and basic compound having high sensitivity, contrast, resolution, storage stability
10/20/2005US20050233242 Photosensitive composition and pattern forming method using the same
10/20/2005US20050233082 Method for conveying substrate, coating apparatus, and optical film
10/20/2005US20050230596 Radiation monitoring system
10/19/2005EP1587065A2 Methods and systems for overwrite protected storage media
10/19/2005EP1586944A1 Cyanoadamantyl compounds and polymers
10/19/2005CN1685008A Synergistic UV absorber combination
10/19/2005CN1683997A Cyanoadamantyl compounds and polymers and photoresists comprising same
10/19/2005CN1223897C Photosensitive silver halide material for photographing
10/19/2005CN1223635C Flame-retardant resin composition
10/18/2005US6956097 Siloxane polymer and an organic absorbing compound that strongly absorbs light at given wavelength, such as 9-anthracene carboxy-methyl triethoxysilane; for deep ultraviolet photolithography
10/18/2005US6955871 Lightsensitive material package
10/13/2005WO2005096097A1 Display medium and displaying method
10/13/2005WO2005073802A3 Direct thermographic materials with improved protective layers
10/13/2005US20050228910 Method for providing an area optimized binary orthogonality checker
10/13/2005US20050227188 Silver halide photosensitive material and method of forming image
10/13/2005US20050227175 Method of manufacture of integrated optical devices
10/13/2005US20050227174 Positive resist compositions and patterning process
10/13/2005US20050227173 Positive resist compositions and patterning process
10/13/2005US20050227172 Process for producing photoresist composition, filtration device, application device, and photoresist composition
10/13/2005US20050227171 Silicone base resin {polysilsesquioxanes containing hydroxyphenylalkyltrioxy units and phenylsilanetrioxy units some of which are substituted with an acid dissociable dissolution inhibiting group connected by an ether oxygen to the phenyl ring (1-ethoxyethyl)}; acid generator
10/13/2005US20050227169 Mixture containing acid generator, crosslinking agent and dye; reproduction, photostability, heat resistance
10/13/2005US20050227168 Irradiating a protective layer containing a 2 hydroxylarylbenzotriazole or a 2-hydroxybenzophenone photostabilizer and a polymer of an acrylic acid ester of branched alkyl, 1-alkoxyalkyll or 1-alkoxyalkylphenyl(alkyl) alcohol through a photomask, heating, developing, irradiating, heating, applying paste
10/13/2005US20050227167 comprises a radiation sensitive acid generator, a first polymer containing an alkoxymethyl amido group and a hydroxy-containing second polymer
10/12/2005EP1584978A1 Photothermographic material and image forming method
10/12/2005EP1584634A1 Polymeric compound for photoresist and resin composition for photoresist
10/12/2005EP1270608B1 Polyvinyl acetal resin for heat-developable photosensitive material and heat-developable photosensitive material
10/12/2005EP0954522B1 Novel substituted naphthopyrans
10/12/2005CN1680872A 母料 Masterbatch
10/12/2005CN1222828C Silver halides colour photographic sensitive material
10/12/2005CN1222827C Colour photography element comprising compound for increasing light sensitivity
10/12/2005CN1222826C Silver halide colour photographic light-sensitive material
10/06/2005WO2005092995A1 Reversible piezochromic systems
10/06/2005US20050221241 Photothermographic material and image forming method
10/06/2005US20050221240 Process for the preparation of high bromide cubical grain emulsions
10/06/2005US20050221239 Silver halide photographic material
10/06/2005US20050221237 Image forming method using photothermographic material
10/06/2005US20050221222 Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method
10/06/2005US20050221221 Sensitive to high-energy radiation, resolution, and etching resistance
10/06/2005US20050221220 flexibility in acid strength and polarity through changes in chemical structure; strong and large superacid
10/06/2005US20050221219 Polyhydroxystyrene modified by alicyclic dissolution inhibitors; defect inhibition, increased yields; microelectromechanical systems
10/06/2005US20050221218 bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam reflection from a substrate by including in the anti-reflective material an additive to alter the radiation beam path of the reflected light
10/06/2005US20050221217 Hydroxy- or mercaptoalicyclic (meth)acrylate homopolymers with attached dissolution inhibitors; defect inhibition, increased yields; microelectromechanical systems
10/06/2005US20050221216 Silver halide color photographic sensitive material and it image forming method
10/06/2005US20050221018 Charging a particle formation vessel with a compressed fluid; introducing feed stream comprising a solvent and the desired substance dissolved and a second feed stream, exhausting compressed fluid, solvent and the desired substance, exposing a receiver surface to the exhausted flow of particles
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