Patents for C25F 3 - Electrolytic etching or polishing (4,256)
10/2006
10/04/2006EP1392889A4 Anode assembly and process for supplying electrolyte to a planar substrate surface
10/03/2006US7115341 Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same
10/03/2006US7115207 For an integrated circuit chip interconnect solder bump; simultaneously etching both sides of a very thick molybdenum foil coated on each side by a photoresist using a very low etchant spray pressure, and undercutting said photoresist adjacent to opening to form an unsupported edge
09/2006
09/29/2006CA2502593A1 Method and apparatus for producing a turbine root by edm and electropolishing
09/28/2006WO2006100949A1 Aluminum plate for aluminum electrolytic capacitor electrode, aluminum electrolytic capacitor, and process for producing aluminum electrolytic capacitor
09/28/2006US20060213534 Integrated ashing and implant annealing method using ozone
09/28/2006DE102005037563B3 Process for electrochemical polishing of alloy steels useful for for electropolishing of steel, especially stainless steel involves using chromium-free electrolyte containing phosphoric acid and sulfuric acids
09/27/2006EP1295312A4 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
09/26/2006US7112271 Method and apparatus for making very low roughness copper foil
09/26/2006US7112270 Algorithm for real-time process control of electro-polishing
09/21/2006US20060207890 Electrochemical etching
09/21/2006US20060207889 Etchant solution comprising dilute acid and adsorbate comprising 2-benzimidazole proprionic acid, generating electric field within etchant solution, and anisotropically etching pattern in NiP surface; discrete track recording pattern
09/21/2006US20060207888 Electrochemical etching of circuitry for high density interconnect electronic modules
09/21/2006US20060207887 Monitoring apparatus and method for improving the accuracy and repeatability of electrochemical capacitance voltage (ecv) measurements
09/20/2006EP1542788B1 Method for producing a nanodevice for controlled charged particle flow
09/13/2006EP1699950A2 Method for cleaning and polishing metallic alloys and articles cleaned or polished thereby
09/13/2006EP1625246B1 Electrolyte for electrochemically polishing metallic surfaces
09/13/2006EP1290249A4 Method and apparatus for end-point detection
09/07/2006WO2006071745B1 Electrochemical dissolution of conductive composites
09/07/2006DE102005011298A1 Vorrichtung und Verfahren zum Ätzen von Substraten Apparatus and method for etching substrates
09/06/2006EP1697564A1 Electropolishing apparatus and method for medical implants
09/06/2006CN1273649C Method for producing support for planographic printing plate, support for planographic printing plate, and planographic printing plate precursor
09/05/2006US7101471 Method for planar material removal technique using multi-phase process environment
09/05/2006US7101260 Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants
08/2006
08/30/2006CN1824842A Process and apparatus for continuous electrochemical treatment of pieces
08/29/2006US7097755 Electrochemical mechanical processing with advancible sweeper
08/24/2006US20060188742 Chamber component having grooved surface
08/23/2006EP1691938A2 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon
08/23/2006CN1823403A Electrolytic processing apparatus and electrolytic processing method
08/17/2006WO2006085881A1 Elevator load bearing member having a jacket with at least one traction-enhancing exterior surface
08/17/2006WO2006068660A3 Electrochemical dissolution of conductive composites
08/17/2006WO2006046058A3 Optical microstructures and methods manufacturing the same
08/16/2006EP1690291A2 Electrochemical etching process for the selective removal of contaminant phases on the surface of a sulphide-containing chalcopyrite semiconductor
08/16/2006CN1269996C Selectively removing braze composition from conneted assembly
08/15/2006US7090763 etching a masked sheet in a solution of hydrofluoric acid, a water soluble polymer, and ammonium hydrogen fluoride by superimposing noise on the etching current; permits thicknesses of greater than 50 microns; improved smoothness
08/15/2006US7090751 Apparatus and methods for electrochemical processing of microelectronic workpieces
08/03/2006WO2006081470A1 Method and composition for polishing a substrate
08/03/2006WO2006081446A1 Method and composition for polishing a substrate
08/03/2006US20060169409 Electrochemically polishing conductive films on semiconductor wafers
08/02/2006EP1685281A2 Membrane -mediated electropolishing
08/02/2006CN1267578C Electrochemically roughened aluminium semiconductor processing apparatus surface
07/2006
07/27/2006US20060163205 Substrate processing method and substrate processing apparatus
07/27/2006US20060163074 Biasing via electrodes; electro-chemical mechanical polishing; for semiconductor wafers/integrated circuits
07/26/2006EP1390988B1 Method for producing optically transparent regions in a silicon substrate
07/26/2006CN1807224A Si base membrane nanometer pore canal and its preparation method
07/26/2006CN1266311C Aluminum foil enlarging erosion method using perforating graphite electrode
07/18/2006US7077975 Using mixture of mineral acids
07/13/2006DE10055712B4 Verfahren zur Herstellung von Grabenkondensatoren für hochintegrierte Halbleiterspeicher Process for the preparation of grave capacitors for highly integrated semiconductor memory
07/12/2006CN1802717A Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor,
07/12/2006CN1802716A Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor,
07/11/2006US7074514 Separator of fuel cell and method for producing same
07/11/2006US7074317 Method for fabricating trench capacitors for large scale integrated semiconductor memories
07/06/2006WO2006071745A1 Electrochemical dissolution of conductive composites
07/06/2006US20060144820 Remote chamber methods for removing surface deposits
07/06/2006DE19929716B4 Verfahren zur Vorbereitung eines Aluminiumsubstrats für eine lithographische Druckplatte sowie für die Herstellung einer vorsensibilisierten lithographischen Druckplatte A method of preparing an aluminum substrate for a lithographic printing plate and for the production of a presensitized lithographic printing plate
07/05/2006CN1263099C Chemically machinery polishing serum
06/2006
06/29/2006WO2006068660A2 Electrochemical dissolution of conductive composites
06/29/2006WO2006068300A1 Aluminum material for electrolytic capacitor electrode, production method of electrode material for electrolytic capacitor, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor
06/29/2006WO2006068283A1 Flattening method and flattening apparatus
06/29/2006US20060137993 Dispensing an electrolyte through an opening that is at least as long as the wafer and effecting relative movement between the opening and the wafer; wafer can be moved linearly across the opening and can also be rotated
06/29/2006DE102004060507A1 Verfahren zur elektrochemischen Abtragung von Refraktärmetallen oder -legierungen und Lösung zur Durchführung dieses Verfahrens Method for the electrochemical removal of refractory metals and alloys and solution for implementing this method
06/21/2006EP1672102A1 Ferroelectric thin-film production method, voltage-application etching apparatus, ferroelectric crystal thin-film substrate, and ferroelectric crystal wafer
06/21/2006EP1672101A1 Process for the electrochemical removal of refractory metals or their alloys and use of a solution for this process
06/21/2006EP1051545B1 Method for treating a metal product
06/20/2006US7064057 Method and apparatus for localized material removal by electrochemical polishing
06/20/2006US7063780 Method for indirect-electrification-type continuous electrolytic etching of metal strip and apparatus for indirect-electrification-type continuous electrolytic etching
06/20/2006US7063601 Internal magnetic-force polishing system
06/15/2006US20060124590 Using aqueous solution of potassium hydroxide and 0.1-0.5 g/L of diethylenetriamine pentaacetic acid as a scavenger and decontaminant for iron, nickel and copper; an etching method for etching a silicon wafer with a resistivity of no more than1 Omega *cm using the etching liquid; cost efficiency
06/15/2006US20060124474 Method and apparatus for local polishing control
06/14/2006DE102004058445A1 Verfahren zur Herstellung von Zahnrädern Process for the preparation of gear wheels
06/08/2006US20060118523 Planarization with reduced dishing
06/07/2006EP1664392A2 Oxidation resistant ferritic stainless steels
06/07/2006EP1664391A1 Electropolishing method
06/07/2006EP0870320B1 Carrier matrix for integrated microanalysis systems, method for the production thereof and use of the same
06/07/2006CN1783390A Device and method of anodic formation
06/06/2006US7056194 Semiconductor processing methods of removing conductive material
06/06/2006US7055532 Method to remove fluorine residue from bond pads
05/2006
05/31/2006CN1778998A Feedback controlling system for producing nanometer gap electrode
05/31/2006CN1258003C Cathode reduction process for treating surface of porous silicon
05/30/2006US7052996 Electrochemically polishing conductive films on semiconductor wafers
05/25/2006US20060108234 Electrochemical process and apparatus
05/24/2006DE10031906B4 Verfahren zur Herstellung von Elektroden sowie damit hergestellte Elektroden A process for the production of electrodes and thus electrodes made
05/23/2006US7048870 Metallic implant and process for treating a metallic implant
05/16/2006US7045052 Method of manufacturing a spectral filter for green and longer wavelengths
05/16/2006US7045040 Process and system for eliminating gas bubbles during electrochemical processing
05/11/2006WO2005090648A3 Electrolytic processing apparatus and electrolytic processing method
05/10/2006CN1771355A Method and apparatus for local polishing control
05/04/2006WO2006046058A2 Optical microstructures and methods manufacturing the same
05/04/2006DE10234547B4 Verfahren zur Bildung einer Ausnehmung in der Oberfläche eines Werkstücks, insbesondere zur Herstellung von Mikroformen A method of forming a recess in the surface of a workpiece, in particular for the production of microform
05/04/2006DE102004053135A1 Process for removing a coating containing a chromium and/or chromium oxide compound from a component comprises placing the component in a bath containing an alkanol-amine compound as inhibitor and removing after a treatment time
05/03/2006CN2776991Y Semidipping type electrolytic copper foil surface treatment machine
05/03/2006CN1766177A Electrochemical polish process for nickel-base strip for preparing coating superconductor
04/2006
04/27/2006WO2006042985A1 Device for etching a conductive layer and etching method
04/27/2006DE19936569B4 Herstellung von porösem Silicium Preparation of porous silicon
04/26/2006EP1649084A1 Portable electrolytic marking unit
04/26/2006CN1253900C Process for etching 63 WV-100WV anode foils with high-specific capacity
04/25/2006US7033466 Electrochemical stripping using single loop control
04/25/2006CA2264908C Method for anisotropic etching of structures in conducting materials
04/20/2006DE10318995B4 Verfahren zur Herstellung von durchgängigen Membranen A process for producing continuous membranes
04/19/2006CN1761774A Method for reducing degradation of reactive compounds during transport
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