Patents for C25F 3 - Electrolytic etching or polishing (4,256)
07/2002
07/11/2002US20020090884 Electrolytic polishing apparatus, electrolytic polishing method and wafer subject to polishing
07/11/2002US20020088709 Method and apparatus for forming interconnects, and polishing liquid and polishing method
07/10/2002EP1220729A1 Method and tool for electrochemical machining
07/10/2002CN1358240A Bath composition for electropolishing of titanium and method for using same
07/09/2002US6416650 Uses the centrifugal force of rotational tool electrode to discharge electrolytic byproducts, making electrochemical polishing more effective
07/04/2002US20020086240 Method of etching, as well as frame element, mask and prefabricated substrate element for use in such etching
07/03/2002EP1220307A1 Method and apparatus for radiation-assisted electrochemical etching, and etched product
07/02/2002US6413408 Method for the production of a porous layer
07/02/2002US6413407 Cathode tool sealed at one end to prevent electrolyte from flowing into finished bore; internal cooling; superalloy long tubes; petroleum industry
06/2002
06/27/2002WO2002026381A3 Ionic liquids and their use
06/25/2002US6410178 Separator of fuel cell and method for producing same
06/20/2002US20020074239 A method for the production of a porous layer
06/19/2002CN1354400A Adornment
06/19/2002CN1354285A Electrochemical corrosion of high-tin solder ridge
06/13/2002WO2002019391A3 Apparatus and method for floe of process gas in an ultra-clean environment
06/13/2002US20020070126 Polishing method, polishing apparatus, plating method, and plating apparatus
06/13/2002US20020070121 Family of discretely sized slicon nanoparticles and method for producing the same
06/11/2002US6402908 Pipe electropolishing apparatus using an electrolyte heater and cooler
06/11/2002US6402592 Electrochemical methods for polishing copper films on semiconductor substrates
06/06/2002WO2002043793A1 Process of manufacturing drug delivery sprayheads
06/06/2002US20020068507 System and method for electropolishing nonuniform pipes
06/06/2002US20020066675 System and method for reversing electrolyte flow during an electropolishing operation
06/06/2002CA2364460A1 System and method for electropolishing nonuniform pipes
06/04/2002US6398943 Process for producing a porous layer by an electrochemical etching process
06/04/2002US6398942 Effected by a carbon cathode reacting against the anode, both being beneath the surface of a pottasium hydroxide electrolyte under a controlled current density to have a uniform diameter throughout its entire length
05/2002
05/30/2002WO2002042030A2 Fluted electrochemical machining
05/30/2002US20020063066 To manufacture it into a tip for a scanning probe microscope; can manufacture the tip while controlling its curvature radius and aspect ratio and reducing the amount of oxide on its surface
05/29/2002EP0946890B1 Layer with a porous layer area, an interference filter containing such a layer and a method for the production thereof
05/29/2002CN1351197A Metal fine machining apparatus and method
05/28/2002US6395163 Process for the electrolytic processing especially of flat items and arrangement for implementing the process
05/28/2002US6395152 Methods and apparatus for electropolishing metal interconnections on semiconductor devices
05/23/2002WO2002041369A2 Electropolishing and chemical mechanical planarization
05/23/2002US20020061714 Semiconductor processing methods of removing conductive material
05/23/2002DE10055712A1 Production of trench capacitors in a p-doped silicon layer used for DRAMs and ferroelectric semiconductor storage devices comprises using electrodes and a capacitor dielectric
05/22/2002CN2492564Y Electrochemical etching flattening device for indium-tin oxide electrode on organic electroluminescent display panel
05/21/2002US6391187 Method for treating a metal product
05/16/2002WO2002039492A1 Method for producing trench capacitors for large-scale integrated semiconductor memories
05/14/2002US6386959 Feeding system for electro-chemically polishing contact tips
05/02/2002US20020050458 Production of gas separators for use in fuel cells and equipment used therefor
04/2002
04/30/2002US6379986 Anodizing a bulk aluminum material and then forming a tunnel oxidation film by irradiating oxygen
04/25/2002US20020047537 Method for producing electrodes as well as electrodes produced by the method
04/25/2002DE10047664A1 Production of porous silicon used in the production of an optoelectronic component comprises chemically etching a silicon sample in an anodic oxidation process with localized etching
04/23/2002US6375826 Electro-polishing fixture and electrolyte solution for polishing stents and method
04/18/2002WO2002031231A1 Semiconductor production device and production method for semiconductor device
04/11/2002WO2001091163A3 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
04/11/2002US20020042198 Method in etching of a substrate
04/11/2002US20020040854 Carbon cathode rod activated with negative voltage
04/10/2002EP1194617A1 Bath composition for electropolishing of titanium and method for using same
04/10/2002EP1021597B1 A procedure for electrochemical polishing of an aluminium substrate to obtain a specular surface thereof
04/09/2002US6368493 Chemical removal or oxidation of material using ultrapure water; nonwoven, ion exchanging fabric catalyzes dissociation and provides high concentration of hydroxide ions; little waste
04/04/2002WO2002026701A2 Ionic liquids and their use as solvents
04/04/2002WO2002026381A2 Ionic liquids and their use
04/04/2002US20020039693 Variation in diameter of apertures is prevented by dispersing 2000 or more of precipitates and inclusions from 0.01 mu m to 5 mu m in diameter on the surface of said material per mm2.
04/04/2002DE10044565A1 Verfahren zum Ätzen mindestens einer Ionenspur zu einer Pore in einer Membrane und elektrolytische Zelle zur Präparierung einer solchen A method of etching at least one ion track to a pore in a membrane and electrolytic cell for the preparation of such
04/03/2002EP1007767B1 Method for producing a filter
04/03/2002CN2484340Y Neutral electrolyte etching machine
03/2002
03/28/2002WO2002024977A1 A method for wet etching
03/21/2002WO2002023616A1 Integrating metal with ultra low-k dielectrics
03/21/2002WO2002022916A1 Method of etching, as well as frame element, mask and prefabricated substrate element for use in such etching
03/21/2002US20020033343 Electrolytic machining method and apparatus
03/21/2002CA2421799A1 Integrating metal with ultra low-k dielectrics
03/20/2002CN1340743A Supporting body for lithographic printing plate and the lithographic printing plate
03/14/2002WO2002020877A1 Method for etching at least one ion track to a pore in a membrane and electrolytic cell for preparing said membrane
03/14/2002WO2001071796A3 Method for electrochemical polishing of a conductive material
03/14/2002US20020032499 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
03/14/2002US20020030779 Liquid crystal display device, manufacturing method thereof, and fabrication apparatus therefor
03/13/2002CN1339819A Lead wire frame and its producing method
03/07/2002WO2002019391A2 Apparatus and method for floe of process gas in an ultra-clean environment
03/06/2002EP1184656A1 Method for structural development of monocrystalline superalloys
02/2002
02/28/2002WO2002016673A1 Electrochemical treating method such as electroplating and electrochemical reaction device therefor
02/27/2002EP1181400A1 Electrochemical etching installation and method for etching a body to be etched
02/27/2002EP1181396A1 Aluminium alloy sheet
02/21/2002US20020020630 Electrochemical machining method and apparatus
02/21/2002US20020020629 Lead frame and method of manufacturing the lead frame
02/20/2002CN1079300C Surface treatment method
02/14/2002WO2002013300A1 Stainless steel substrate treatment
02/14/2002CA2417753A1 Stainless steel substrate treatment
02/06/2002EP1177333A1 Method of producing a filter
02/06/2002EP0914499B1 Method for obtaining a high surface finish on titanium based coatings
01/2002
01/24/2002US20020007750 Process for roughening support material for printing plates
01/24/2002DE10131393A1 Herstellung von Gasseparatoren für Brennstoffzellen und dabei verwendete Apparatur Production of gas separators for fuel cells and apparatus used therein
01/22/2002US6340425 Method of manufacturing cold cathode device having porous emitter
01/17/2002DE10031906A1 Verfahren zur Herstellung von Elektroden sowie damit hergestellte Elektroden A process for the production of electrodes and thus electrodes made
01/16/2002EP0733269B1 Porous semiconductor material
01/16/2002CN2471798Y Electrochemical polishing apparatus for stainless steel workpieces in mass process
01/08/2002CA2230256C Method for producing electrodeposited copper foil and copper foil obtained by same
01/02/2002EP1168388A2 Method for manufacturing electrodes and electrodes manufactured by this method
01/02/2002EP1167585A2 Method and apparatus for forming interconnects, and polishing liquid and polishing method
12/2001
12/27/2001US20010054449 Alloy pipes and methods of making same
12/20/2001US20010053656 Feeding system for electro-chemically polishing contact tips
12/20/2001US20010052469 Silicon layer is given an electric potential, while the gate electrode is given a lower electrical potential than the silicon layer, anodic etching of a portion of the silicon layer renders a porous silicon portion
12/11/2001US6328876 Providing blank of etchable semiconductor material having a first side and a second side, connecting blank to a current source, illuminating with light, immersing holding element and blank in etching solution until only first side is wetted
12/11/2001US6327784 Method of manufacturing a cutting member having an auxiliary layer
12/05/2001CN1075844C Method of raising the accuracy and left of cutter by using electrolysis
12/04/2001US6325912 Apparatus and method for electrolytic treatment
11/2001
11/29/2001WO2001091170A1 Method and apparatus for radiation-assisted electrochemical etching, and etched product
11/29/2001WO2001091163A2 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
11/28/2001EP1157853A2 Process for roughening support material for printing plates
11/27/2001US6322424 Electrolytic integrated polishing method for metal workpieces using special abrasive materials
11/22/2001WO2001088552A1 Silicon nanoparticles microcrystal nonlinear optical devices
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