| Patents for C25F 3 - Electrolytic etching or polishing (4,256) |
|---|
| 02/04/2009 | CN101360849A Method for forming multi-layer structure |
| 02/04/2009 | CN101359536A Method of preparing anode foil of capacitor |
| 02/04/2009 | CN100457934C Method for preparing porous blocks of metallic glass by electrochemical eroding metal fibers |
| 01/29/2009 | US20090025634 Heating element |
| 01/28/2009 | CN101353810A Electropolishing and/or electroplating apparatus and methods |
| 01/27/2009 | US7481230 Plasma processing method and apparatus |
| 01/22/2009 | US20090020437 Method and system for controlled material removal by electrochemical polishing |
| 01/21/2009 | CN100453154C Metal bearing membranes |
| 01/14/2009 | CN201180166Y Electrolytic polishing apparatus for semiconductor material |
| 01/14/2009 | CN101345137A Anode foil corrosion technology of electrolytic capacitor |
| 01/13/2009 | US7476303 Electrolytic processing apparatus and electrolytic processing method |
| 01/08/2009 | US20090011572 Wafer Working Method |
| 01/08/2009 | US20090011149 Substrate processing method |
| 01/08/2009 | US20090010796 Long fatigue life nitinol |
| 01/08/2009 | US20090008600 Method and composition for polishing a substrate |
| 01/07/2009 | EP0993513B1 Impedance-assisted electrochemical technique and electrochemistry for removing material, particularly excess emitter material in electron-emitting device |
| 01/06/2009 | US7473344 Segmented counterelectrode for an electrolytic treatment system |
| 12/31/2008 | WO2009000774A1 Method for producing surfaces for metal articles |
| 12/31/2008 | CN201172699Y Electric elution polishing unit |
| 12/25/2008 | US20080314763 Method and device for regenerating ion exchanger, and electrolytic processing apparatus |
| 12/25/2008 | US20080314760 Use of an Anode For Elimination or Reduction of Microbial Impurities in Liquids. |
| 12/24/2008 | WO2008154926A1 A microporous coating or structure and a process for producing it |
| 12/18/2008 | DE102007026635A1 Vorrichtung und Verfahren zum nasschemischen Behandeln von Ware sowie Verfahren zum Einbauen eines Strömungsorgans in die Vorrichtung Apparatus and method for wet chemical treatment of goods and method of installing a draft member in the device |
| 12/17/2008 | CN101324785A Pure tungsten material micro-nano probe preparation control system for scanning tunnel microscope |
| 12/11/2008 | WO2008149937A1 Pad and method for polishing device wafer |
| 12/11/2008 | WO2007127865A3 Cleaning of semiconductor processing systems |
| 12/10/2008 | EP1999302A1 Method for electrochemically structuring a conductuve or semiconductor material, and device for implementing it |
| 12/10/2008 | CN100442406C Etching technique of hard foil |
| 12/03/2008 | CN100440489C A porous silicon chip and its preparing method |
| 11/27/2008 | WO2007143476A3 Apparatus and method for single substrate processing |
| 11/27/2008 | US20080289970 Electropolishing process for cobalt and cobalt alloys |
| 11/27/2008 | DE102007051084A1 Device e.g. for recording and adjusting working gap at electrochemical removal, has drive which moves tool towards workpiece to achieve certain gap width |
| 11/26/2008 | EP1993745A2 Plasma processing reactor with multiple capacitive and inductive power sources |
| 11/26/2008 | EP1525609B1 Device for etching semiconductors with a large surface area |
| 11/25/2008 | US7455785 Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus |
| 11/20/2008 | WO2008140058A1 Method for processing silicon base material, article processed by the method, and processing apparatus |
| 11/20/2008 | WO2008002812A3 Electrolyte retaining on a rotating platen by directional air flow |
| 11/20/2008 | US20080283501 Process for Manufacturing Micro-and Nano-Devices |
| 11/20/2008 | US20080283416 Process for Electrochemical Stripping of Components |
| 11/20/2008 | US20080283394 Magnetron sputtering target |
| 11/19/2008 | CN101307453A Technology of silicon nano-wires without electrodeposit nickel and thermoelectric power device based on the technology |
| 11/19/2008 | CN101307452A Method for preparing Ni/Si nano-wire array and micro-nano humidity sensor based on the nano-wire array |
| 11/13/2008 | US20080280159 Copper Foil and Method of Manufacturing the Same |
| 11/13/2008 | US20080280140 Porous particles and methods of making thereof |
| 11/13/2008 | US20080276960 Method and Apparatus for Controlled Transient Cavitation |
| 11/13/2008 | US20080276958 Substrate cleaning chamber and cleaning and conditioning methods |
| 11/12/2008 | CN201148476Y Electric pulp polishing machine with elevating gear |
| 11/11/2008 | US7448395 Process method to facilitate silicidation |
| 11/06/2008 | US20080272087 Method for fabricating probe for use in scanning probe microscope |
| 11/06/2008 | US20080271749 Substrate cleaning technique employing multi-phase solution |
| 11/05/2008 | CN100430529C Insulating paint for processing deep hole electrode through electrolyzation |
| 11/05/2008 | CN100430526C Electropolishing and/or electroplating apparatus and methods |
| 11/04/2008 | CA2333509C System and method for using multiple lead connections in an electropolishing process |
| 10/30/2008 | WO2004010477A3 Adaptive electropolishing using thickness measurements and removal of barrier and sacrificial layers |
| 10/30/2008 | US20080264898 SELECTIVE ETCH OF TiW FOR CAPTURE PAD FORMATION |
| 10/30/2008 | US20080264897 Turbine component pattern forming method |
| 10/29/2008 | CN101294298A Electrochemical polishing method for high purity aluminum under ultrasonic agitation |
| 10/28/2008 | US7442282 Electrolytic processing apparatus and method |
| 10/23/2008 | US20080257380 Process of cleaning a substrate for microelectronic applications including directing mechanical energy through a fluid bath and apparatus of same |
| 10/22/2008 | EP1982007A1 Process for producing a metal body and metal bodies |
| 10/16/2008 | WO2008123147A1 Method for treating surface of weld in metal member |
| 10/16/2008 | WO2008094811A3 Method and system for pad conditioning in an ecmp process |
| 10/16/2008 | US20080254258 Teflon® replacements and related production methods |
| 10/15/2008 | CN201132864Y Electrode of electro-polishing tool |
| 10/15/2008 | CN201132863Y Bearing marking die |
| 10/15/2008 | CN101287849A Functional member from co-based alloy and process for producing the same |
| 10/15/2008 | CN101285209A Photoelectrochemical etching device for n -type silicium |
| 10/15/2008 | CN101285208A Coursing and hole-distributing method at aluminum foil surface for lithium ion secondary battery |
| 10/14/2008 | US7435323 Includes an anode, a mask with openings supported between the anode and the wafer surface defining active regions by which a rate of conductive material deposition onto the surface can be varied, a conductive mesh below the upper mask surface, and an electrolyte |
| 10/08/2008 | EP1978135A2 Electrolysis treatment apparatus, support for planographic printing plate, planographic printing plate, and electrolysis treatment process |
| 10/08/2008 | CN101282091A Power supply for erosion of electric aluminum foil |
| 10/07/2008 | US7433811 Direct patterning of silicon by photoelectrochemical etching |
| 10/07/2008 | US7431854 Method for directly forming a cutter mold with double etching and apparatus thereof |
| 10/02/2008 | WO2007111729A3 An apparatus and a method for electrochemical mechanical processing with fluid flow assist elements |
| 10/02/2008 | WO2007094869A3 Electrochemical method for ecmp polishing pad conditioning |
| 10/02/2008 | US20080237066 Electrolytic processing unit device, and method for electrolytic processing, washing, and drying |
| 10/02/2008 | US20080236614 Plasma processing apparatus and plasma processing method |
| 10/01/2008 | EP1448811A4 Method and device for regenerating ion exchanger, and electrolytic processing apparatus |
| 10/01/2008 | CN101275270A Electrolytic brightening process for martensitic stainless steel holder |
| 10/01/2008 | CN101275269A Etching process for aluminum foil for electrolytic capacitor |
| 10/01/2008 | CN100422392C Electrochemical polish process for nickel-base strip for preparing coating superconductor |
| 09/30/2008 | US7429333 Method for fabricating microneedle array and method for fabricating embossing mold of microneedle array |
| 09/25/2008 | US20080233839 Polisher for chemical mechanical planarization |
| 09/25/2008 | US20080230397 Process for the polishing of metallic dental prostheses |
| 09/24/2008 | CN101270498A Ultra-supercritical steel organization display method |
| 09/23/2008 | US7427345 Cleaning; reducing , disposal of liquid wastes; applying voltage |
| 09/23/2008 | US7427168 Developing method and developing unit |
| 09/18/2008 | US20080227369 Apparatus and Method for Confined Area Planarization |
| 09/17/2008 | EP1970473A2 Electropolishing method for titanium |
| 09/17/2008 | CN101265602A Self-supporting through-hole alumina film preparation method |
| 09/17/2008 | CN100419963C Forming a semiconductor structure using a combination of planarizing methods and electropolishing |
| 09/16/2008 | US7425250 Electrochemical mechanical processing apparatus |
| 09/11/2008 | US20080217186 Electropolishing process for titanium |
| 09/11/2008 | US20080217164 Electrolytic Processing Apparatus |
| 09/11/2008 | US20080216864 Method and system for distributing gas for a bevel edge etcher |
| 09/11/2008 | DE102008010038A1 Verfahren zum Verbessern der Haftung zwischen einer Formgedächtnislegierung und einem Polymer A method for improving the adhesion between a shape memory alloy and a polymer |
| 09/10/2008 | CN101260560A Method for manufacturing pattern and character on stainless steel plate |
| 09/09/2008 | US7422677 Membrane-mediated electropolishing |
| 09/04/2008 | WO2008105305A1 Manufacturing method for eyeless sewing needle |
| 09/04/2008 | US20080210571 Specifically for electrochemically polishing aluminum wheels; current is selectively pulsed to maximize polishing but at the same time to permit the flushing away of residual material and to cool the cathode and the workpiece |