Patents for C25F 3 - Electrolytic etching or polishing (4,256)
10/2010
10/07/2010US20100252446 Method to Electrodeposit Metals Using Ionic Liquids in the Presence of an Additive
10/06/2010CN101851776A Treatment method of silicon chip edge
10/06/2010CN101503817B Photo-assisted electro chemical etching apparatus
10/06/2010CN101250705B Method for manufacturing nickel-cuprum metallic baseband layer of highly oriented double-shaft texture
10/05/2010US7807039 contains sulfuric acid, ammonium bifluoride and hydroxypropionic acid for electropolishing titanium-nickel alloys; nontoxic, odorless
10/05/2010US7807037 Inserting a porous metallic cathode into one of of slots of a metal part; removing a portion of an inner surface of slots by flowing an electric current between the part and porous metallic cathode while introducing an electrolyte;
10/05/2010US7807036 electrochemical mechanical planarization; remove debris by ionization and cleaning the polishing pad; for reuse in making semiconductor wafers
09/2010
09/30/2010WO2010108517A1 Electropolishing method and electromagnetic flowmeter having electropolished electrodes
09/30/2010US20100243472 High-throughput local oxidation nanolithographic process
09/30/2010US20100243471 Composition, method and process for polishing a wafer
09/30/2010US20100243430 Apparatus and method for magnetic field assisted electrochemical discharge machining
09/29/2010CN101845662A Magnesium alloy surface treating method and magnesium alloy polished by same
09/29/2010CN101845661A Monocrystalline silicon slice with ultra-hydrophobicity nano silicone linear arrays on surface and preparation method thereof
09/23/2010US20100236940 X-Ray Assisted Etching of Insulators
09/23/2010US20100236935 Tungsten alloy suture needles with surface coloration
09/23/2010US20100236934 Mould for galvanoplasty and method of fabricating the same
09/22/2010CN101839341A Piston ring and surface spongy chromium plating technique thereof
09/22/2010CN101839340A Piston ring and surface spongy tin plating technique thereof
09/22/2010CN101838839A Electrode foil washing device
09/22/2010CN101275269B Etching process for aluminum foil for electrolytic capacitor
09/21/2010US7799201 Continuously rotating, e.g., a stent, while applying a voltage across an anode and a cathode so that electrical contact between the anode and the cathode continuously changes, leading to a reduction in marks that are traditionally generated around the anode-stent contact and more uniform polishing
09/21/2010US7799200 Attaching an accelerator to a surface with recessed and exposed regions; bringing the surface into close proximity with an electric field-imposing member so that the accelerator is selectively removed from the exposed surface regions; accelerator remaining in recessed regions catalyzes metal deposition
09/21/2010US7799183 Electropolishing apparatus and method for medical implants
09/21/2010US7799138 In-situ method to reduce particle contamination in a vacuum plasma processing tool
09/21/2010CA2423803C Ionic liquids and their use as solvents
09/15/2010CN201581151U Electrochemical polishing treatment device for internal surface and external surface of metal workpiece
09/15/2010CN201581150U Electrolytic polishing device of metallic phase sample used in laboratory
09/15/2010CN101550584B Corrosion technique for anode aluminum foil with branch holes for electrolytic capacitor
09/15/2010CN101147220B Aluminum plate for aluminum electrolytic capacitor electrode, aluminum electrolytic capacitor, and process for producing aluminum electrolytic capacitor
09/14/2010US7794573 Systems and methods for electrochemically processing microfeature workpieces
09/09/2010US20100224504 Electro-thinning apparatus for removing excess metal from surface metal layer of substrate and removing method using the same
09/08/2010CN101532162B Corrosion technology for anode foil for extra-high voltage aluminum electrolytic capacitor
09/07/2010US7790014 Removal of substances from metal and semi-metal compounds
09/07/2010US7790009 electrochemical pattern replication; master electrode is put in close contact with the substrate and the etching/plating pattern is directly transferred onto the substrate by using a contact etching/plating; for micro or nanostructure; sensors, flat panel display and printed circuit boards
09/07/2010US7789978 Alloy for lithographic sheet
09/02/2010US20100220557 Bridge or bottom plate for a timepiece movement
09/02/2010US20100220018 Ice and snow accretion-preventive antenna, electric wire, and insulator having water-repellent, oil-repellent, and antifouling surface and method for manufacturing the same
09/02/2010US20100219080 Electrolytic recovery of metal such as copper, and methods and apparatus for producing cathode plates suitable for such electrolytic recovery
08/2010
08/31/2010US7785452 Apparatus and method for finishing light metal article
08/26/2010US20100217370 Bioerodible Endoprosthesis
08/26/2010US20100213078 Electrolyte composition for electropolishing niobium and tantalum and method for using same
08/25/2010CN101812720A Method for observing real topography of nonmetallic inclusion in steel
08/25/2010CN101812719A Low-alkalinity electrolytic deburring solution, preparation method and use method thereof
08/25/2010CN101619483B Online adjusting device of electronic aluminum foil corrosion primary groove ceramic roller
08/25/2010CN101392403B Method for preparing gold electrode pair
08/25/2010CN101270498B Ultra-supercritical steel organization display method
08/25/2010CN101210340B Electrochemical etching liquid and etching method
08/24/2010US7780868 Alkaline etching solution for semiconductor wafers and alkaline etching method
08/19/2010US20100206217 Method for separating surface layer or growth layer of diamond
08/18/2010CN201553803U Current sharing liquid feedback slot for electronic aluminum foil titanium pole plate
08/17/2010US7776755 high k dielectric material layer (HK), solves problem of the prior art etching process that generates heavy polymeric residue, which is difficult to remove; two etching processes; making metal gate stacks of a semiconductor device; NMOSFETs (N-type metal-oxide-semiconductor field-effect-transistor)
08/17/2010US7776227 Process for manufacturing micro- and nano- devices
08/12/2010US20100200424 Plasma-electrolytic polishing of metals products
08/11/2010CN101799443A Method for preparing multiaperture silicon substrate tungsten oxide nanometer thin film gas sensitive transducer
08/11/2010CN101798702A Titanium and titanium alloy electrochemically polish electrolyte and surface polishing method thereof
08/11/2010CN101798701A Method for preparing alumina template by guidance of etching pattern
08/10/2010US7771581 Apparatus and process for electrolytic removal of material from a medical device
08/05/2010WO2010086059A1 Etching system and method for forming multiple porous semiconductor regions with different optical and structural properties on a single semiconductor wafer
08/05/2010US20100193374 Method of rear surface treatment, analysis method of integrated circuit from rear surface side, and rear surface treatment apparatus
08/05/2010US20100193362 Method for processing silicon base material, article processed by the method, and processing apparatus
08/04/2010CN101792106A Etching solution for processing N-type silicon microchannel array by photon-assisted electrochemical etching method
08/04/2010CN101368287B Multi-working procedure combined ultra-fine molybdenum filament continuous processing method and equipment
08/03/2010US7767101 Method for fabricating probe for use in scanning probe microscope
08/03/2010US7767100 Patterning method and field effect transistors
08/03/2010US7767074 Method of etching copper on cards
07/2010
07/29/2010WO2010084213A1 Means, process and device for superficial treatment of surfaces of parts of gold or alloys thereof
07/29/2010US20100190094 Photocatalytic electrode and fuel cell
07/29/2010US20100187126 Etching system and method for forming multiple porous semiconductor regions with different optical and structural properties on a single semiconductor wafer
07/29/2010US20100186768 Foreign matter removing method for lithographic plate and method for manufacturing lithographic plate
07/29/2010DE102007026635B4 Vorrichtung zum nasschemischen Behandeln von Ware, Verwendung eines Strömungsorgans, Verfahren zum Einbauen eines Strömungsorgans in die Vorrichtung sowie Verfahren zur Herstellung einer nasschemisch behandelten Ware An apparatus for wet-chemical treatment of goods, using a flow body, method of installing a flow member into the apparatus and methods of preparing a wet-chemically treated product
07/28/2010CN101457387B Method for removing cross-hole bur
07/28/2010CN101294298B Electrochemical polishing method for high purity aluminum under ultrasonic agitation
07/22/2010WO2010081724A1 Method and solution for electropolishing stents made of high strength medical alloys
07/22/2010WO2010081723A1 Method, apparatus and solution for electropolishing metallic stents
07/22/2010US20100182698 Security Documents with Personalised Images and Methods of Manufacture
07/22/2010US20100181207 Method For Fabricating Embedded Thin Film Resistors Of Printed Circuit Board
07/22/2010US20100181206 Method of electropolishing medical implants
07/21/2010CN101781790A Method and electrolytic bath for reducing thickness of metal layer of base plate
07/21/2010CN101781789A Method and electrolytic bath for polishing metal layer of base plate
07/15/2010WO2009086820A3 Method for producing a photoactive layered composite and use thereof
07/15/2010US20100176088 Apparatus and method for the wet chemical treatment of a product and method for installing a flow member into the apparatus
07/15/2010DE102009000073A1 Verfahren und Vorrichtung zur elektrochemischen Bearbeitung von Substraten Method and apparatus for the electrochemical machining of substrates
07/14/2010CN201525904U Continuous steel cable surface treatment device
07/08/2010WO2009113874A3 Method for texturing silicon surfaces and wafers thereof
07/08/2010US20100170806 Method and device for electrochemical machining of substrates
07/08/2010US20100170530 Method for cleaning semiconductor equipment
07/06/2010US7749663 Subjecting the chrome-containing layer of a photomask to a wet etch process using deionized water and ozone; length of exposure is directly proportional to the degree of adjustment desired
07/01/2010US20100165544 Electrode foil, method of manufacturing electrode foil, and electrolytic capacitor
07/01/2010US20100163426 Electrochemical planarization system comprising enhanced electrolyte flow
06/2010
06/30/2010CN1848322B Method for corroding controllable high-voltage positive electrode aluminium foil tunnel hole length
06/30/2010CN101765682A Electrolyte for electrochemical treatment
06/30/2010CN101765681A Method to electrodeposit metals using ionic liquids in the presence of an additive
06/23/2010CN101752095A Method for etching holes by corroding aluminum foil
06/23/2010CN101748473A Reverse acting rupture disc with laser-defined electropolished line of weakness and method of forming the line of weakness
06/23/2010CN101748472A Method for four-stage formation of anode foil of medium-voltage aluminum electrolytic capacitor
06/16/2010CN1993786B Process for producing aluminum electrode foil for capacitor and aluminum foil for etching
06/16/2010CN101736393A Fixing device of electrolytic polishing sample
06/16/2010CN101736392A Electrolyte and method for electrolyzing and extracting non-metallic inclusions in steel by using same
06/16/2010CN101734036A High sensitivity positive thermosensitive CTP plate adopting active etherate in condensation resin of pyrogallol and divinylbenzene and preparation method thereof
06/16/2010CN101734035A High sensitivity positive thermosensitive CTP plate adopting active ester and etherate in carboxylic phenolic resin and preparation method thereof
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