Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2014
11/04/2014US8877004 Plasma processing apparatus and plasma processing method
11/04/2014US8877002 Internal member of a plasma processing vessel
11/04/2014US8877001 Shuttered gate valve
11/04/2014US8877000 Shower head gas injection apparatus with secondary high pressure pulsed gas injection
11/04/2014US8876976 Chemical vapor deposition apparatus for equalizing heating temperature
11/04/2014US8876975 Thin film deposition apparatus
11/04/2014US8876974 Chemical vapor deposition apparatus capable of controlling discharging fluid flow path in reaction chamber
11/04/2014US8876024 Heated showerhead assembly
11/04/2014US8875657 Balancing RF bridge assembly
11/04/2014US8875656 Substrate processing apparatus
11/04/2014US8875652 Liquid adhesive boundary control
10/2014
10/30/2014US20140322900 Low-pressure chemical vapor deposition apparatus and thin-film deposition method thereof
10/30/2014US20140322527 Multilayer encapsulation thin-film
10/30/2014US20140322455 Method of fabricating surface body having superhydrophobicity and hydrophilicity and apparatus of preparing the same
10/30/2014US20140322445 Defined dosing atmospheric temperature and pressure vapor deposition system
10/30/2014US20140318457 Method of cleaning film forming apparatus and film forming apparatus
10/30/2014US20140318456 Horizontal-type atomic layer deposition apparatus for large-area substrates
10/30/2014US20140318454 Plasma cvd apparatus
10/30/2014US20140318453 Chemical vapor deposition with energy input
10/30/2014US20140318450 Method and System for Isolated and Discretized Process Sequence Integration
10/30/2014US20140318449 Defined dosing atmospheric temperature and pressure vapor deposition system
10/28/2014US8872427 Plasma generating apparatus
10/28/2014US8871655 Method of forming silicon oxycarbonitride film
10/28/2014US8871654 Film deposition apparatus, and method of depositing a film
10/28/2014US8871617 Deposition and reduction of mixed metal oxide thin films
10/28/2014US8871350 Gas barrier film, electronic device including the same, gas barrier bag, and method for producing gas barrier film
10/28/2014US8871306 Structural components for oil, gas, exploration, refining and petrochemical applications
10/28/2014US8871303 Method for producing titanium metal
10/28/2014US8871302 Chemical vapor deposition of graphene on dielectrics
10/28/2014US8871296 Method for producing conducting and transparent films from combined graphene and conductive nano filaments
10/28/2014US8871174 Method for the supply of fluorine
10/28/2014US8871064 Electromagnet array in a sputter reactor
10/28/2014US8871027 Electrical contacts for use with vacuum deposition sources
10/28/2014US8869742 Plasma processing chamber with dual axial gas injection and exhaust
10/28/2014US8869741 Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber
10/28/2014US8869593 Condensation apparatus
10/28/2014US8869376 Substrate mounting table and method for manufacturing same, substrate processing apparatus, and fluid supply mechanism
10/23/2014US20140314965 Apparatus and method for dielectric deposition
10/23/2014US20140312766 Symmetrical plural-coil plasma source with side rf feeds and rf distribution plates
10/23/2014US20140311756 Pipe Centralizer Having Low-Friction Coating
10/23/2014US20140311411 Showerhead having cooling system and substrate processing apparatus including the showerhead
10/23/2014US20140311410 Film-forming apparatus
10/23/2014US20140311409 Vapor deposition apparatus having pretreatment device that uses plasma
10/23/2014US20140311408 Multi-Region Processing System and Heads
10/21/2014US8866271 Semiconductor device manufacturing method, substrate processing apparatus and semiconductor device
10/21/2014US8865594 Formation of liner and barrier for tungsten as gate electrode and as contact plug to reduce resistance and enhance device performance
10/21/2014US8865590 Film forming method, pretreatment device, and processing system
10/21/2014US8865559 Capacitors and methods with praseodymium oxide insulators
10/21/2014US8865271 High rate deposition for the formation of high quality optical coatings
10/21/2014US8865269 Method of forming a protective film for a magnetic recording medium, a protective film formed by the method and a magnetic recording medium having the protective film
10/21/2014US8865260 Method of making a coated ceramic cutting insert
10/21/2014US8865259 Method and system for inline chemical vapor deposition
10/21/2014US8865255 Method for assessing the coolant consumption within actively cooled components
10/21/2014US8865252 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
10/21/2014US8864959 Method for manufacturing workpieces with ion-etched surface
10/21/2014US8864956 Multi-component deposition
10/21/2014US8864936 Apparatus and method for processing substrate
10/21/2014US8864935 Plasma generator apparatus
10/21/2014US8864932 Plasma processing apparatus, electrode temperature adjustment device and electrode temperature adjustment method
10/21/2014US8864927 Method for making carbon nanotube film
10/16/2014US20140308461 Microwave plasma reactor for manufacturing synthetic diamond material
10/16/2014US20140308445 Canister for deposition apparatus, and deposition apparatus and method using the same
10/16/2014US20140308439 Method of protecting patierned magnetic materials of a stack
10/16/2014US20140308083 Coated cutting tool and method of manufacturing the same
10/16/2014US20140306027 Showerhead of a mocvd reactor with large diameter
10/14/2014US8861908 Optical imaging probe
10/14/2014US8861170 Electrostatic chuck with photo-patternable soft protrusion contact surface
10/14/2014US8859421 Manganese oxide film forming method, semiconductor device manufacturing method and semiconductor device
10/14/2014US8859404 Method for forming microcrystalline semiconductor film and method for manufacturing semiconductor device
10/14/2014US8859116 Multi-layer coating
10/14/2014US8859114 Coating for improved wear resistance
10/14/2014US8859058 Microwave plasma reactors and substrates for synthetic diamond manufacture
10/14/2014US8859047 Use of ruthenium tetroxide as a precursor and reactant for thin film depositions
10/14/2014US8859045 Method for producing nickel-containing films
10/14/2014US8859044 Method of preparing graphene layer
10/14/2014US8859043 Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the same
10/14/2014US8859042 Methods for heating with lamps
10/14/2014US8859040 Method of applying atomic layer deposition coatings onto porous non-ceramic substrates
10/14/2014US8858816 Enhanced etch and deposition profile control using plasma sheath engineering
10/14/2014US8858754 Plasma processing apparatus
10/14/2014US8858716 Vacuum processing apparatus
10/14/2014US8858715 Device for layered deposition of various materials on a semiconductor substrate, as well as a lift pin for use in such a device
10/14/2014US8858714 Injector for a vacuum evaporation source
10/14/2014US8858713 Apparatus for depositing a thin film of material on a substrate and regeneration process for such an apparatus
10/14/2014US8858712 Electrode for use in plasma processing apparatus and plasma processing apparatus
10/14/2014US8858710 Chemical solution vaporizing tank and chemical solution treating system
10/14/2014US8858694 Zinc oxide precursor containing alkyl zinc halide and method of depositing zinc oxide-based thin film using the same
10/14/2014US8857371 Apparatus for generating dielectric barrier discharge gas
10/09/2014WO2014164996A1 Improved low-e glazing performance by seed-structure optimization
10/09/2014WO2014164928A1 Coated packaging
10/09/2014WO2014164743A1 High temperature process chamber lid
10/09/2014WO2014164742A1 Atomic layer deposition of hfaic as a metal gate workfunction material in mos devices
10/09/2014WO2014164434A1 Solar cell with selectively doped conductive oxide layer and method of making the same
10/09/2014WO2014163081A1 Surface-coated cutting tool
10/09/2014WO2014163062A1 Method for manufacturing gas barrier film, gas barrier film, and electronic device
10/09/2014WO2014162700A1 Method for manufacturing heat exchange, and heat exchanger
10/09/2014WO2014162665A1 Processing device and method for measuring workpiece temperature in processing device
10/09/2014WO2014162125A1 Bio control activity surface
10/09/2014WO2014162120A1 Vacuum pumping and abatement system
10/09/2014WO2014161199A1 Plasma enhanced atomic layer deposition device
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