| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 12/25/2014 | US20140377461 Film forming device and manufacturing method for glass with film |
| 12/25/2014 | US20140374904 Semiconductor device, semiconductor device manufacturing method, and semiconductor manufacturing apparatus |
| 12/25/2014 | US20140374024 Apparatus for removing particles from a twin chamber processing system |
| 12/25/2014 | US20140373867 Cleaning method and substrate processing apparatus |
| 12/25/2014 | US20140373784 Linear evaporation source and deposition apparatus having the same |
| 12/25/2014 | US20140373783 Film forming device |
| 12/24/2014 | CN204039498U 扩散器 Diffuser |
| 12/24/2014 | CN204039497U 一种气相沉积清理行星盘的系统 A gas phase deposition planetary disk cleanup system |
| 12/24/2014 | CN204039496U 用于清理mocvd设备沉积物的清理装置 Mocvd equipment used to clean sediment cleanup device |
| 12/24/2014 | CN204039495U 长晶炉使用之钨坩埚修整装置 Tungsten crystal growth furnace crucible using the trimming device |
| 12/24/2014 | CN204039494U 形成光电器件薄膜的真空设备 Forming a thin film photovoltaic device of a vacuum device |
| 12/24/2014 | CN204034445U 水冷式过滤装置及金属有机化学气相沉积设备 Water-filtration devices and metal organic chemical vapor deposition equipment |
| 12/24/2014 | CN104247002A 具有增强射频及温度均匀性的静电夹盘 Having enhanced temperature uniformity of RF and electrostatic chucks |
| 12/24/2014 | CN104246982A 氮化物半导体生长装置和氮化物半导体功率器件用外延晶片 Nitride semiconductor growth apparatus and the nitride semiconductor epitaxial wafer for a power device |
| 12/24/2014 | CN104246025A 用于生产二维纳米材料的方法 Production method for two-dimensional material |
| 12/24/2014 | CN104246009A 在等离子体沉积期间确定薄膜的厚度的方法 Determining the thickness of thin films during plasma deposition process |
| 12/24/2014 | CN104246008A 在等离子体处理系统中供给处理气体的方法和装置 Method and apparatus for plasma processing system, the process gas is supplied |
| 12/24/2014 | CN104246007A 捕集机构、排气系统和成膜装置 Collecting means, the exhaust system and the film forming apparatus |
| 12/24/2014 | CN104246006A 气相沉积装置以及相关的方法 Vapor deposition apparatus and related method |
| 12/24/2014 | CN104245975A 制造用于生物医学设备的钛合金的方法 A method for producing titanium alloy of biomedical equipment |
| 12/24/2014 | CN104245525A 使用等离子体喷嘴进行容器涂层 Container coatings using plasma nozzle |
| 12/24/2014 | CN104237985A 一种全介质反射膜及其制备方法 An all-dielectric reflective film and method |
| 12/24/2014 | CN104233470A 一种控制氢气流量p型低掺杂碳化硅薄膜外延制备方法 A method of controlling the flow of hydrogen-doped p-type silicon carbide film epitaxial low Preparation |
| 12/24/2014 | CN104233466A 一种控制生长压强p型低掺杂碳化硅薄膜外延制备方法 A method of controlling the growth of low pressure p-type doped silicon carbide epitaxial film preparation |
| 12/24/2014 | CN104233464A 一种控制氢气流量p型重掺杂碳化硅薄膜外延制备方法 A method of controlling the flow of hydrogen p-type silicon carbide epitaxial film preparation method heavily doped |
| 12/24/2014 | CN104233463A 一种p型梯度掺杂碳化硅薄膜外延制备方法 SiC epitaxial film gradient method for preparing a p-type doping |
| 12/24/2014 | CN104233236A 一种具有双高真空泵系统的pecvd炉 Having a double high vacuum furnace systems pecvd |
| 12/24/2014 | CN104233235A 在工件上形成光学膜的方法及其设备 The method of forming an optical film on the workpiece and devices |
| 12/24/2014 | CN104233234A 一种带氟清理装置的pecvd炉及其氟清理方法 Pecvd furnace method fluorine and fluorine cleaning up the belt cleaning device |
| 12/24/2014 | CN104233233A 反应腔室及外延生长设备 The reaction chamber and epitaxial growth apparatus |
| 12/24/2014 | CN104233232A 多段可拆卸喷头式硅烷环及硅烷环防塞多孔喷头 Removable multi-nozzle type silane and silane ring ring anti-porous plug nozzle |
| 12/24/2014 | CN104233231A 气体处理装置 Gas treatment apparatus |
| 12/24/2014 | CN104233230A 用于化学气相沉积的反应装置及反应制作工艺 Chemical vapor deposition apparatus used for the reaction and the reaction of the production process |
| 12/24/2014 | CN104233229A 进气装置及等离子体加工设备 The intake device and a plasma processing apparatus |
| 12/24/2014 | CN104233228A 一种全自动非接触式真空镀膜方法与设备 A fully automated non-contact method of vacuum coating equipment |
| 12/24/2014 | CN104233227A 一种原子层沉积设备及方法 An atomic layer deposition apparatus and method |
| 12/24/2014 | CN104233226A 一种原子层沉积设备 An atomic layer deposition apparatus |
| 12/24/2014 | CN104233225A 反应腔室以及设置有该反应腔室的半导体处理设备 The reaction chamber is provided with a semiconductor processing apparatus and the reaction chamber |
| 12/24/2014 | CN104233224A 喷涂式超声波镀膜系统及镀膜方法 Ultrasonic spray coating systems and coating method |
| 12/24/2014 | CN104233223A 半导体制造工具的强化方法 Strengthening semiconductor manufacturing tools |
| 12/24/2014 | CN104233222A 一种直接在Si衬底上生长六方氮化硼二维薄膜的方法 Directly on a Si substrate, a two-dimensional hexagonal boron nitride film growth method |
| 12/24/2014 | CN104233221A 一种碳化硅化学气相沉积设备及方法 A silicon carbide chemical vapor deposition apparatus and method |
| 12/24/2014 | CN104233220A 一种控制掺杂源流量p型低掺杂碳化硅薄膜外延制备方法 A control flow of p-type doping source of low-doped silicon carbide epitaxial film preparation |
| 12/24/2014 | CN104233219A 一种控制掺杂源流量p型重掺杂碳化硅薄膜外延制备方法 A control-doped p-type epitaxial source flow method for the preparation of heavily doped silicon carbide films |
| 12/24/2014 | CN104233218A 一种控制生长压强n型低掺杂碳化硅薄膜外延制备方法 A growing pressure low doped epitaxial n-type SiC films prepared by a method of controlling |
| 12/24/2014 | CN104233217A 一种制备金刚石涂层刀具的新方法 A new method for the preparation of diamond coated tools |
| 12/24/2014 | CN104233216A 一种表面具有纳米结构阵列钛基掺硼金刚石电极的制备方法 A surface preparation method has a titanium-based nanostructure arrays boron-doped diamond electrodes |
| 12/24/2014 | CN104233188A 沉积掩模组件 Deposition mask assembly |
| 12/24/2014 | CN103225076B 一种耐磨石墨烯表面改性方法 A wear-resistant surface modification method graphene |
| 12/24/2014 | CN103193217B 一种硼掺杂金刚石与碳纳米管复合纳米锥的制备方法 A method of preparing a carbon nanotube composite nano diamond and boron-doped cone |
| 12/24/2014 | CN103114278B 平面磁控ecr-pecvd等离子源装置 Ecr-pecvd planar magnetron plasma source device |
| 12/24/2014 | CN103103494B 利用原子层沉积技术在sers基底上制备氧化物表面的方法 Using the method of preparation of atomic layer deposition on the surface of the oxide substrate sers |
| 12/24/2014 | CN103014668B 化学气相沉积装置 Chemical vapor deposition apparatus |
| 12/24/2014 | CN102677022B 一种原子层沉积装置 An atomic layer deposition apparatus |
| 12/24/2014 | CN102575348B 薄膜沉积装置和用于其的方法 Thin film deposition apparatus and a method for its |
| 12/24/2014 | CN102534562B 基座、化学气相沉积设备和基板加热方法 Base, chemical vapor deposition apparatus and a substrate heating method |
| 12/24/2014 | CN102460635B 对容器进行等离子体处理的装置和方法 The containers are plasma processing apparatus and method |
| 12/24/2014 | CN102312213B 制造半导体器件的方法 The method of manufacturing a semiconductor device |
| 12/24/2014 | CN102272350B 等离子cvd装置 Plasma cvd means |
| 12/23/2014 | US8916940 Method of forming a nanocluster-comprising dielectric layer and device comprising such a layer |
| 12/23/2014 | US8916796 Method for depositing and curing nanoparticle-based ink |
| 12/23/2014 | US8916397 Method for producing an electronic component and electronic component |
| 12/23/2014 | US8916237 Thin film deposition apparatus and method of depositing thin film |
| 12/23/2014 | US8916234 Method of making thin film structures and compositions thereof |
| 12/23/2014 | US8916056 Biasing system for a plasma processing apparatus |
| 12/23/2014 | US8916022 Plasma generator systems and methods of forming plasma |
| 12/23/2014 | US8916005 Slurry diffusion aluminide coating composition and process |
| 12/23/2014 | US8916001 Coated molds and related methods and components |
| 12/23/2014 | US8916000 System and method for producing carbon nanotubes |
| 12/23/2014 | US8915999 Shower plate sintered integrally with gas release hole member and method for manufacturing the same |
| 12/23/2014 | US8915775 Exhaust system |
| 12/23/2014 | US8915213 Division mask and method of assembling mask frame assembly by using the same |
| 12/23/2014 | US8915212 Mask frame assembly for thin film deposition |
| 12/18/2014 | US20140370689 Reaction device and manufacture method for chemical vapor deposition |
| 12/18/2014 | US20140370628 Substrate processing apparatus, semiconductor device manufacturing method, substrate processing method, and recording medium |
| 12/18/2014 | US20140370309 Hard-material-coated bodies composed of metal, cemented hard material, cermet or ceramic and processes for producing such bodies |
| 12/18/2014 | US20140370300 Coated article and chemical vapor deposition process |
| 12/18/2014 | US20140370205 Film deposition method |
| 12/18/2014 | US20140370204 Vapor Deposition Reactor Using Plasma and Method for Forming Thin Film Using the Same |
| 12/18/2014 | US20140370192 Molybdenum allyl complexes and use thereof in thin film deposition |
| 12/18/2014 | US20140370189 Method for synthesis of Graphene Films With Large Area and High Throughput |
| 12/18/2014 | US20140369005 Passive thermal management device |
| 12/18/2014 | US20140367696 Formation of group iii-v material layers on patterned substrates |
| 12/18/2014 | US20140367359 Method For Controlling In-Plane Uniformity Of Substrate Processed By Plasma-Assisted Process |
| 12/18/2014 | US20140366808 Gas processing apparatus |
| 12/18/2014 | US20140366806 Apparatus for forming thin film |
| 12/18/2014 | US20140366804 Performing Atomic Layer Deposition on Large Substrate Using Scanning Reactors |
| 12/18/2014 | US20140366803 Vapor phase growth apparatus |
| 12/17/2014 | CN204022937U 一种m0cvd反应室的水冷电极 Water-cooled reaction chamber an electrode m0cvd |
| 12/17/2014 | CN204022936U 一种金属有机化合物容器 Metal organic container |
| 12/17/2014 | CN104220651A 具有偏角的硅单晶和iii族氮化物单晶的层叠基板 Laminated substrate having a silicon single crystal and iii declination nitride single crystal of |
| 12/17/2014 | CN104220637A 用于半导体器件应用的氮化硅膜 Application of the silicon nitride film for a semiconductor device |
| 12/17/2014 | CN104220636A 用于控制等离子体处理室中的等离子体的方法和装置 Method and apparatus for controlling a plasma in a plasma processing chamber for |
| 12/17/2014 | CN104220635A 大面积的光学性能合成多晶金刚石窗口 Synthesis of large-area optical properties of polycrystalline diamond window |
| 12/17/2014 | CN104220634A 有色硬质装饰构件 Hard colored decorative elements |
| 12/17/2014 | CN104220632A 成膜装置内的金属膜的干洗方法 Dry cleaning method of the metal film deposition apparatus of |
| 12/17/2014 | CN104220249A 层叠膜、有机电致发光装置、光电转换装置及液晶显示器 Laminate film, an organic electroluminescent device, a photoelectric conversion device and a liquid crystal display |
| 12/17/2014 | CN104213104A 化学气相沉积中衬底温度的控制方法 Chemical vapor deposition method for controlling the substrate temperature |
| 12/17/2014 | CN104213103A 一种m0cvd反应室保温隔热装置 One kind of reaction chamber insulation device m0cvd |
| 12/17/2014 | CN104213102A 腔体气流方向可变结构 Cavity variable airflow direction |