Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/2013
05/30/2013US20130136851 Method of forming ato with high throughput and ellipsometry diagnostic method for the tco process
05/30/2013US20130136650 Thin film of copper-nickel-molybdenum alloy and method for manufacturing the same
05/30/2013US20130134981 Crystal sensor made by ion implantation
05/30/2013US20130134038 Ferromagnetic Material Sputtering Target
05/30/2013US20130134037 Mixed targets for forming a cadmium doped tin oxide buffer layer in a thin film photovoltaic devices
05/30/2013US20130134036 Equipment for Making IC Shielding Coating Layer and Metal Shielding Layer of IC
05/30/2013US20130134034 Thin film manufacturing method, thin film manufacturing device, and liquid crystal display device manufacturing method
05/30/2013US20130134033 Method and apparatus for forming coating layer with nano multi-layer
05/30/2013US20130133808 Method for manufacturing sputtering target and method for manufacturing semiconductor device
05/30/2013US20130133571 Film forming apparatus
05/30/2013CA2853409A1 Stain-resistant cooking surface and cookware item or electrical household appliance comprising such a cooking surface
05/29/2013EP2597174A1 Vapor deposition of ceramic coatings
05/29/2013EP2597173A2 Fluorine-based polymer thin film and method for preparing same
05/29/2013EP2597172A1 Ion bombardment apparatus and method for cleaning of surface of base material using the same
05/29/2013EP2597171A1 Method for producing cubic zircon oxide layers
05/29/2013EP2596145A1 Device and method for vacuum coating
05/29/2013EP2595804A1 Weather-resistant backing films
05/29/2013EP2595803A1 Transparent, weather-resistant barrier film having an improved barrier effect and scratch resistance properties
05/29/2013DE112011101519T5 Epitaxialfilmbildungsverfahren, Vakuumprozessierungsapparat, Herstellungsverfahren eines halbleitertechnischen Licht emittierenden Elements, halbleitertechnisches Licht emittierendes Element und Beleuchtungsvorrichtung Epitaxialfilmbildungsverfahren, Vakuumprozessierungsapparat, manufacturing method of a semiconductor light emitting element technology, semiconductor light emitting element and technical lighting device
05/29/2013DE102012211698A1 Verfahren zum Erzeugen einer friktionsarmen Beschichtungsschicht A method for generating a low-friction coating layer
05/29/2013DE102012107964B3 Evaporator device for coating substrates in vacuum, has vapor storage canister that is provided with valve element adjusted for performing steam-conducting connection and selection of vapor inlet with vapor passage hole
05/29/2013DE102006010732B4 Verfahren und Vorrichtung zum Aufbringen einer Struktur auf ein Substrat Method and apparatus for applying a pattern on a substrate
05/29/2013CN202956498U Film-plated light guide plate
05/29/2013CN202955903U Carbon-film-supported solar selective absorption film system
05/29/2013CN202954086U Film plating device and target materials
05/29/2013CN202954085U Plated piece clamping device used for vacuum coating equipment
05/29/2013CN103124805A Sputtering target, method for manufacturing sputtering target, and method for forming thin film
05/29/2013CN103124804A Tungsten target and method for producing same
05/29/2013CN103124803A Vapor deposition method, vapor deposition device, and organic El display device
05/29/2013CN103124608A Surface coating cutting tool with excellent defect resistance and abrasion resistance
05/29/2013CN103122452A Surface metallization method for foamed plastic by adopting high-power pulse magnetron sputtering
05/29/2013CN103122451A Shakable L-shaped mesh-covered baffle
05/29/2013CN103122450A Ionization device and coating device applying same
05/29/2013CN103122449A Ionization device and coating device applying same
05/29/2013CN103122448A Vertical heat treating furnace
05/29/2013CN103122447A Nanocrystalline titanium thin film with orientation and preparation method thereof
05/29/2013CN103121799A Sputtering target, transparent conductive film and transparent conductive glass substrate
05/29/2013CN103121313A Metal thermosensitive optical thin film and preparation technology thereof
05/29/2013CN102418069B Epitaxial Ti0.53Cr0.47N film material with low-temperature magneto-resistance effect, and preparation method thereof
05/29/2013CN102392224B Automatic arrangement, turn-over and collection device of vacuum magnetron sputtering workpiece
05/29/2013CN102330060B Composite structural target for arc ion plating deposition magnetic material coating and application of composite structural target
05/29/2013CN102285791B Ito sputtering target and method for manufacturing the same
05/29/2013CN102124136B Film-forming method
05/29/2013CN101716839B Large-area metal nano-structural substrate for surface-enhanced Raman and preparation method thereof
05/29/2013CN101208378B A corrosion resistant object having an outer layer of a ceramic material
05/29/2013CN101092735B Multi-piece ceramic crucible and method for making thereof
05/28/2013USRE44239 Electrode and its fabrication method for semiconductor devices, and sputtering target for forming electrode film for semiconductor devices
05/28/2013US8450439 Method of forming thin film
05/28/2013US8449952 Method and system for coating vinyl products
05/28/2013US8449943 Composite brake disks and methods for coating
05/28/2013US8449818 Molybdenum containing targets
05/28/2013US8449731 Method and apparatus for increasing local plasma density in magnetically confined plasma
05/28/2013US8449730 Buffer layers for L10 thin film perpendicular media
05/28/2013CA2596622C Method for preparing by thermal spraying a silicon- and zirconium-based target
05/28/2013CA2554516C Coated article with low-e coating including ir reflecting layer(s) and corresponding method
05/28/2013CA2546230C Antimicrobial composite material
05/23/2013WO2013074345A1 Vapor transport deposition method and system for material co-deposition
05/23/2013WO2013074211A1 Method and apparatus for deposition using an atmospheric pressure plasma
05/23/2013WO2013073802A1 Transparent conductive film having superior thermal stability, target for transparent conductive film, and method for manufacturing transparent conductive film
05/23/2013WO2013073443A1 Plasma modification and film formation apparatus
05/23/2013WO2013073323A1 Target for use in magnetron sputtering and manufacturing process therefor
05/23/2013WO2013073280A1 Film member and method for producing same
05/23/2013WO2013073278A1 Sputtering device
05/23/2013WO2013073201A1 Vacuum evaporation apparatus
05/23/2013WO2013073096A1 Vacuum apparatus, method for cooling heat source in vacuum, and thin film thin film manufacturing method
05/23/2013WO2013071484A1 Film deposition device and film deposition method
05/23/2013WO2013045454A3 Coating of substrates using hipims
05/23/2013US20130131784 Metallic implantable grafts and method of making same
05/23/2013US20130130045 Method of producing particles by physical vapor deposition in an ionic liquid
05/23/2013US20130129974 Zinc oxide anti-reflection layer having a syringe-like structure and method for fabricating the same
05/23/2013US20130129945 Glazing panel
05/23/2013US20130129938 Method for the co-evaporation and deposition of materials with differing vapor pressures
05/23/2013US20130126348 Target for spark vaporization with physical limiting of the propagation of the spark
05/23/2013US20130126347 Arc deposition source having a defined electric field
05/23/2013US20130126346 Chalcogenide alloy sputter targets for photovoltaic applications and methods of manufacturing the same
05/23/2013US20130126345 Silicon device structure, and sputtering target used for forming the same
05/23/2013US20130126344 Igzo nanoparticle and manufacturing method and use thereof
05/23/2013US20130126343 Sputter target structure of transparent conductive layer
05/23/2013US20130126342 Ionization device and evaporation deposition device using the ionization device
05/23/2013US20130126333 Magnetic Field Configuration For Energetic Plasma Surface Treatment and Energetic Deposition Conditions
05/23/2013DE102006026317B4 Verfahren und Vorrichtung zur Erhöhung der Produktivität und der Anlagenauslastung von Vakuumbeschichtungsanlagen Method and apparatus for increasing the productivity and capacity utilization of vacuum coating systems
05/23/2013CA2850354A1 Method and apparatus for deposition using an atmospheric pressure plasma
05/22/2013EP2594971A1 Process for producing metamaterial, and metamaterial
05/22/2013EP2593578A2 Rotary target backing tube bonding assembly
05/22/2013EP2593577A2 Process for coating a substrate by means of an arc
05/22/2013EP2593500A1 Method for grafting into a layer located deep inside an organic material by means of an ion beam
05/22/2013CN202945322U Magnetron sputtering coating production line of capacitive touch screens
05/22/2013CN202945321U Planar moving target mechanism
05/22/2013CN202945320U Polytype composite magnetic field selectable compact rotating magnetic field auxiliary ion plating arc source device
05/22/2013CN202945319U Pressing device of strip-shaped appliance
05/22/2013CN202945318U Selenium source ionization device for large-area substrate
05/22/2013CN202945317U Bipolar rotating coupling magnetic field auxiliary quasi diffusion arc cold cathode ion plating device
05/22/2013CN202945316U Simple and adjustable multifunctional multi-structure adaptive ion plating device
05/22/2013CN202945315U Efficient dynamically coupled magnetic control arc source device
05/22/2013CN202945314U Plating material container applied to vacuum evaporation high-melting-point plating material
05/22/2013CN202945313U Metal evaporated film and manufactured intermediate thereof
05/22/2013CN103119745A Monomer deposition apparatus
05/22/2013CN103119195A Unit for the treatment of an object, in particular the surface of a polymer object
05/22/2013CN103119194A A palette system for thin film deposition facilities for collecting and recovering deposited materials
05/22/2013CN103119193A Device and method for vacuum coating
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