Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2013
07/25/2013WO2013109783A1 Amalgam method for forming a sputter target useful in the manufacture of thin-film solar photovoltaic cells
07/25/2013WO2013109333A2 Linear scanning sputtering system and method
07/25/2013WO2013108823A1 Masked film-formation device and masked film-formation method
07/25/2013WO2013108751A1 Film-forming apparatus
07/25/2013WO2013108715A1 Ceramic cylindrical sputtering target and method for producing same
07/25/2013WO2013108520A1 Co-Cr-Pt-BASED SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
07/25/2013WO2013108508A1 Manganese oxide thin film and oxide laminate
07/25/2013WO2013108507A1 Manganese oxide thin film and oxide laminate
07/25/2013WO2013107712A1 Method for producing a ceramic layer on a surface formed from an ni base alloy
07/25/2013WO2013057452A3 Process for manufacturing, by mechanosynthesis, a powder of czts, the use thereof for forming a thin layer
07/25/2013WO2013057065A3 Ceramic product for use as a target
07/25/2013US20130189145 Method for producing molybdenum target
07/25/2013US20130186753 Titanium Target for Sputtering
07/25/2013US20130186752 Target device, sputtering apparatus and method for manufacturing a target device
07/25/2013US20130186751 Pinned target design for rf capacitive coupled plasma
07/25/2013US20130186746 Method and Apparatus for Producing Controlled Stresses and Stress Gradients in Sputtered Films
07/25/2013US20130186745 Amalgam method for forming a sputter target useful in the manufacture of thin-film solar photovoltaic cells
07/25/2013US20130186744 Method of switching magnetic flux distribution
07/25/2013US20130186743 Magnetron sputtering apparatus and film forming method
07/25/2013US20130186742 Method for manufacturing magnetic recording medium
07/25/2013US20130186524 Al PLATING LAYER/Al-Mg PLATING LAYER MULTI-LAYERED STRUCTURE ALLOY PLATED STEEL SHEET HAVING EXCELLENT PLATING ADHESIVENESS AND CORROSION RESISTANCE, AND METHOD OF MANUFACTURING THE SAME
07/25/2013US20130185930 Nanopatterned substrate serving as both a current collector and template for nanostructured electrode growth
07/25/2013DE102012221945A1 Abscheidungsmaske und Abscheidungsvorrichtung, die diese aufweist Deposition mask and deposition apparatus having this
07/25/2013DE102011108634B4 Substrat-Bearbeitungs-Vorrichtung Substrate processing apparatus
07/25/2013DE102008017492B4 Verfahren zum Transport eines bandförmigen Substrats und Vakuumbeschichtungsanlage A method of transporting a strip-shaped substrate and vacuum coating system
07/24/2013EP2617864A2 Method for improving hydrophilicity of a coating film through treatment on a surface morphology and super hydrophilic glass coating layer produced by the method
07/24/2013EP2617863A1 Magnetic field generator, magnetron cathode, and sputtering device
07/24/2013EP2617862A1 Oxidation resistant coating with substrate compatibility
07/24/2013EP2617861A1 Turbine airfoil mask
07/24/2013EP2617387A1 Medical devices including metallic films and methods for making same
07/24/2013EP2617050A2 Method for extending lifetime of an ion source
07/24/2013EP2616566A1 Improved method of co-sputtering alloys and compounds using a dual c-mag cathode arrangement and corresponding apparatus
07/24/2013EP2616403A1 Coated article having boron doped zinc oxide based seed layer with enhanced durability under functional layer and method of making the same
07/24/2013CN203085631U Non-polar doped GaN film growing on LiGaO2 substrate
07/24/2013CN203080060U Adjustable substrate frame
07/24/2013CN203080059U Vacuum coating workpiece rotary table
07/24/2013CN203080058U Sealing structure of magnetron sputtering cathode target material
07/24/2013CN203080057U Film forming device
07/24/2013CN203080056U Fixing device for vacuum coating transmission mechanism
07/24/2013CN203080055U Device for fixing mask version on substrate
07/24/2013CN103221573A Methods for in situ deposition of coatings and articles produced using same
07/24/2013CN103221572A Manufacture of high density indium tin oxide (ITO) sputtering target
07/24/2013CN103221568A Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
07/24/2013CN103221560A Production method for high-purity lanthanum, high-purity lanthanum, sputtering target composed of high-purity lanthanum, and metal gate film containing high-purity lanthanum as main component
07/24/2013CN103219393A Amorphous oxide thin film for thin film transistor channel layer and manufacturing method thereof
07/24/2013CN103215603A Application of electrolytic corrosion in improving bonding strength between hard coating and metal or alloy matrix
07/24/2013CN103215559A Apparatus and method for depositing thin film
07/24/2013CN103215558A Method for improving edge gradient of optical spectrum rejection zone of long-wave infrared optical filter
07/24/2013CN103215557A Clamp for reversely fixing a plurality of substrates of magnetic-control sputtering equipment and clamping method thereof
07/24/2013CN103215556A Rapid deposition process for combined-type spectrally selective absorption film layer
07/24/2013CN103215555A Method for preparing noncrystalline-nanocrystalline composite membrane by adopting co-sputtering method
07/24/2013CN103215554A Preparation method of BiFeO3 sodium-ion battery anode material
07/24/2013CN103215553A Method for preparing high-purity titanium plate for use as target
07/24/2013CN103215552A Film deposition device cavity cooling water heating device
07/24/2013CN103215551A Plating method for improving damage threshold of 355nm high-reflective film
07/24/2013CN103215550A Plating method for improving laser damage threshold of near-infrared high-reflective film
07/24/2013CN103215549A Shielding design for metal gap filling
07/24/2013CN103215548A Preparation method of metal nanoparticles doped graphene
07/24/2013CN103215547A Method for preparing the polysilicon film
07/24/2013CN103215546A Simplified isolating layer based on IBAD (Ion Beam Assisted Deposition)-MgO (Magnesium oxide) metal base band and preparation method thereof
07/24/2013CN103215545A Manufacturing process of screw rod of ceramic-phase nanocrystalline composite coating injection molding machine
07/24/2013CN103215544A Coating applied to thread forming tap
07/24/2013CN103215543A Method for preparing film system with secondary electron emission function
07/24/2013CN103215542A Nanometer multilayer coating and preparation method thereof
07/24/2013CN103215541A Preparation method of planar copper-indium-gallium-selenium sputtering target material
07/24/2013CN103215540A Preparation method for improving laser damage threshold value of polarizing film
07/24/2013CN103215528A Mg based metallic glass film, its preparation method and application
07/24/2013CN103213921A Metal bar rotary jacking device of vacuum metal coating equipment
07/24/2013CN103212729A Numerical control cutting tool with CrAlTiN superlattice coating and manufacturing method thereof
07/24/2013CN102492945B Preparation method of ice coating prevention surface of bionic micro-nano composite structure
07/24/2013CN102492930B Equipment and method for preparing single or shell-core structure nanoparticle and film thereof
07/24/2013CN102265354B Transparent conductive laminate and transparent touch panel comprising same
07/24/2013CN102245800B Method for forming thin film
07/24/2013CN101980935B Method and device for fixing and transporting impact-sensitive sheets in sputter feed systems
07/24/2013CN101855724B Chalcogenide film and method for producing the same
07/24/2013CN101641458B Rotating magnetron sputtering apparatus
07/24/2013CN101636521B Magnetron sputtering apparatus
07/24/2013CN101164966B Oxide sintering body, its manufacturing method, transparent conductive film, and solar energy cell obtained by using the same
07/23/2013US8492182 Method for the producing of a light-emitting semiconductor chip, method for the production of a conversion die and light-emitting semiconductor chip
07/23/2013US8491996 Coated tool
07/23/2013US8491972 Method of producing encapsulated nanopowders and installation for its realization
07/23/2013US8491760 Coated article with high visible transmission and low emissivity
07/23/2013US8491759 RF impedance matching network with secondary frequency and sub-harmonic variant
07/18/2013WO2013105654A1 Transparent electrically conductive film, substrate having transparent electrically conductive film attached thereto, ips liquid crystal cell, capacitive touch panel, and method for producing substrate having transparent electrically conductive film attached thereto
07/18/2013WO2013105648A1 FePt SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
07/18/2013WO2013105647A1 FePt SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
07/18/2013WO2013105645A1 Method for producing step-and-repeat vapor deposition mask, step-and-repeat vapor deposition mask obtained therefrom, and method for producing organic semiconductor element
07/18/2013WO2013105643A1 Vapor deposition mask manufacturing method and organic semiconductor element manufacturing method
07/18/2013WO2013105642A1 Vapor deposition mask, method for producing vapor deposition mask device, and method for producing organic semiconductor element
07/18/2013WO2013105424A1 High-purity copper sputtering target
07/18/2013WO2013105285A1 Silver-alloy sputtering target for conductive-film formation, and method for producing same
07/18/2013WO2013105284A1 Silver-alloy sputtering target for conductive-film formation, and method for producing same
07/18/2013WO2013105283A1 Titanium target for sputtering
07/18/2013WO2013105243A1 Method for forming antifouling film
07/18/2013WO2013105242A1 Method for forming antifouling film
07/18/2013WO2013104784A2 Piston ring
07/18/2013WO2013104571A1 Method for producing optoelectronic organic components, device therefor and optoelectronic organic component
07/18/2013WO2013104295A1 Molybdenum-niobium alloy plate target material processing technique
07/18/2013WO2012043885A9 Method for producing substrate for group iii nitride semiconductor element fabrication, method for producing group iii nitride semiconductor free-standing substrate or group iii nitride semiconductor element, and group iii nitride growth substrate
07/18/2013US20130183581 Substrate for electrode of electrochemical cell
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