Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392)
01/2014
01/21/2014US8632693 Wetting agent for semiconductors, and polishing composition and polishing method employing it
01/21/2014US8632692 Compositions for use in semiconductor devices
01/16/2014US20140017892 Compositions and methods for selective polishing of silicon nitride materials
01/16/2014US20140014615 Etching liquid composition for multilayer containing copper and molybdenum and process for etching thereof
01/15/2014EP2683792A1 Novel etching composition
01/15/2014CN103508677A Paste material and application thereof
01/14/2014US8628682 Compositions comprising a fluorosurfactant and a hydrotrope
01/07/2014US8623273 Methods for prevention and reduction of scale formation
01/07/2014US8623236 Titanium nitride-stripping liquid, and method for stripping titanium nitride coating film
01/03/2014WO2014004755A1 A process for reducing the electrostatic potential of perfluoroelastomer articles
01/03/2014WO2013140177A3 Etched silicon structures, method of forming etched silicon structures and uses thereof
01/02/2014US20140004701 Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance
01/02/2014US20140001145 Method of forming a capacitor structure, and a silicon etching liquid used in this method
01/01/2014CN103493146A Printable medium that contains metal particles and effects etching, more particularly for making contact with silicon during the production of a solar cell
12/2013
12/31/2013US8617418 Conductive film removal agent and conductive film removal method
12/31/2013US8617417 Cleaning composition, method for producing semiconductor device, and cleaning method
12/26/2013US20130341558 Etching solution for copper lead of tft array substrate
12/26/2013US20130341557 Method for refreshing an acid bath solution
12/18/2013CN103456626A Etching liquid for conductive polymer and method for patterning conductive polymer
12/12/2013WO2013182265A1 Photoactivated etching paste and its use
12/11/2013CN103436884A Copper-plated indium tin oxide film etching technology
12/05/2013WO2013181123A1 Method for sludge control in wet acid etching
12/05/2013US20130319618 Separating Fluid, Method And System For Separating Multilayer Systems
12/04/2013EP2668248A1 Use of surfactants having at least three short-chain perfluorinated groups for manufacturing integrated circuits having patterns with line-space dimensions below 50nm
12/04/2013CN102559192B Etching liquor used for etching microwave dielectric film and preparation method thereof
12/03/2013US8597540 Compositions for polishing silicon-containing substrates
12/03/2013US8597539 Chemical mechanical polishing (CMP) polishing solution with enhanced performance
11/2013
11/28/2013US20130313226 Polishing composition for nickel-phosphorous-coated memory disks
11/28/2013US20130313225 Cmp composition containing zirconia particles and method of use
11/26/2013US8592317 Polishing solution for CMP and polishing method using the polishing solution
11/26/2013US8591763 Halide anions for metal removal rate control
11/26/2013CA2526230C Compositions and methods for darkening and imparting corrosion-resistant properties to zinc or other active metals
11/21/2013US20130306238 Chemical liquid preparation method of preparing a chemical liquid for substrate processing, chemical liquid preparation unit preparing a chemical liquid for substrate processing, and substrate processing system
11/20/2013CN103403875A Method for the wet-chemical etching back of a solar cell emitter
11/19/2013US8585920 Polishing composition and method using same
11/14/2013WO2013169884A1 Glass etching media and methods
11/14/2013WO2013169208A1 Non-acidic isotropic etch-back for silicon wafer solar cells
11/14/2013US20130299452 Glass Etching Media And Methods
11/12/2013US8580656 Process for inhibiting corrosion and removing contaminant from a surface during wafer dicing and composition useful therefor
10/2013
10/31/2013WO2013163524A1 Strengthened glass article having shaped edge and method of making
10/29/2013US8568610 Stabilized, concentratable chemical mechanical polishing composition and method of polishing a substrate
10/23/2013EP2651841A1 Printable etchant compositions for etching silver nanowire-based transparent, conductive films
10/23/2013CN103361068A Metal foil substrate graphene etching liquid and etching method thereof
10/17/2013US20130273745 Etching paste, production method thereof, and pattern forming method using the same
10/15/2013US8557711 Etching solution composition for metal films
10/15/2013US8557137 Polishing composition for nickel phosphorous memory disks
10/10/2013US20130264515 Polishing slurry composition
10/02/2013DE102011016335B4 Nickelhaltige und ätzende druckbare Paste sowie Verfahren zur Bildung von elektrischen Kontakten beim Herstellen einer Solarzelle Nickel-containing corrosive and printable paste, as well as methods of forming electrical contacts in the manufacture of a solar cell
10/01/2013US8545716 Etching liquid composition
10/01/2013US8545715 Chemical mechanical polishing composition and method
09/2013
09/25/2013CN103328610A Use of surfactants having at least three short-chain perfluorinated groups for manufacturing integrated circuits having patterns with line-space dimensions below 50nm
09/25/2013CN103320136A Grooving corrosion solution for photoconductive indium antimonide wafer
09/25/2013CN102051179B Chemical corrosion liquid for selectively corroding cap layer of gallium arsenide solar cell
09/24/2013US8541257 Aligned polymers for an organic TFT
09/24/2013US8540894 Polishing composition
09/24/2013US8540893 Chemical mechanical polishing composition and methods relating thereto
09/24/2013US8540891 Etching pastes for silicon surfaces and layers
09/19/2013WO2013076587A3 Etching agent for copper or copper alloy
09/19/2013US20130244444 Method of producing a semiconductor substrate product and etching liquid
09/19/2013US20130244443 Method of producing a semiconductor substrate product and etching liquid
09/19/2013US20130244431 Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
09/18/2013CN103314449A Method for the wet-chemical etching back of a solar cell emitter
09/18/2013CN103314448A Method for the wet-chemical etching of a highly doped semiconductor layer
09/12/2013WO2013133668A1 Electrode substrate, input device and display device comprising same, and production method therefor
09/10/2013US8529787 Colloidal silica containing silica secondary particles having bent structure and/or branched structure, and method for producing same
09/04/2013CN102226087B Transparent conductive film wet-process etching solution composition
09/03/2013US8524112 Process for the production of microelectromechanical systems
09/03/2013US8524111 CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method
08/2013
08/29/2013US20130224898 Compositions and methods for texturing polycrystalline silicon wafers
08/27/2013US8518297 Polishing composition and polishing method using the same
08/27/2013US8518296 Liquid comprising peroxide oxidant;citric ammonium chemical etchant; and benzotriazole etch inhibitor; anda solids component including:abrasive particles of about 30 nm size or less; planarizing germanium (Ge)-antimony (Sb)-tellurium (Te) (GST) alloys; random access memory, digital video disks
08/22/2013US20130217231 Chemical mechanical polishing (cmp) composition
08/22/2013US20130217230 Chemical Mechanical Polishing Composition And Methods Relating Thereto
08/20/2013US8512593 Chemical mechanical polishing slurry compositions, methods of preparing the same and methods of using the same
08/20/2013US8512580 Method of fabricating thin liquid crystal display device
08/15/2013US20130207031 Polymer etchant and method of using same
08/14/2013CN101654617B Medicine liquid for dissolving deformation and dissolving deformation processing method
08/13/2013US8506831 Combination, method, and composition for chemical mechanical planarization of a tungsten-containing substrate
08/08/2013US20130200040 Titanium nitride removal
08/08/2013US20130200039 Aqueous polishing compositions containing n-substituted diazenium dioxides and/or n'-hydroxy-diazenium oxide salts
08/08/2013US20130200038 Aqueous polishing composition and process for chemically mechanically polishing substrates for electrical, mechanical and optical devices
08/07/2013CN101684408B Etching agent composite for organic led display device
07/2013
07/31/2013CN103224796A Method for preparing alkaline etching liquid by using constant boiling hydrochloric acid
07/31/2013CN101618648B Method for producing frosted glass
07/30/2013US8497215 Edge deletion of thin-layer solar modules by etching
07/25/2013US20130186850 Slurry for cobalt applications
07/18/2013US20130183826 Composition for polishing and composition for rinsing
07/18/2013US20130181159 Surface treatment composition and surface treatment method using same
07/18/2013US20130180947 Etching composition and method of manufacturing a display substrate using the same
07/17/2013CN103210058A Etching paste, a production method therefor and a pattern forming method using the same
07/17/2013CN103205259A Selective etching method
07/16/2013US8486837 Polishing slurry for metal, and polishing method
07/16/2013US8486739 Etchant for etching double-layered copper structure and method of forming array substrate having double-layered copper structures
07/11/2013US20130178069 Silicon etching fluid and method for producing transistor using same
07/11/2013US20130178064 Polishing slurry and chemical mechanical planarization method using the same
07/11/2013US20130175238 Etching solution and method of manufacturing printed wiring substrate using the same
07/10/2013EP2612365A2 Method for the wet-chemical etching back of a solar cell emitter
07/10/2013EP2611881A1 Aqueous acidic solution and etching solution and method for texturizing surface of single crystal and polycrystal silicon substrates
07/10/2013CN101481616B Metal and metallic oxide etching printing ink, as well as preparation method and use thereof
07/04/2013WO2013100644A1 Etching-solution composition and wet etching method using same
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