Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
07/2008
07/03/2008US20080157198 High-voltage semiconductor device and method of manufacturing thereof
07/03/2008US20080157197 LDPMOS structure with enhanced breakdown voltage
07/03/2008US20080157195 Geometry of mos device with low on-resistance
07/03/2008US20080157194 Transistors with laterally extended active regions and methods of fabricating same
07/03/2008US20080157193 Semiconductor device and method for fabricating the same
07/03/2008US20080157192 Trench gate-type mosfet device and method for manufacturing the same
07/03/2008US20080157191 Semiconductor device having recess channel structure and method for manufacturing the same
07/03/2008US20080157190 Semiconductor Device Having A Modified Recess Channel Gate And A Method For Fabricating The Same
07/03/2008US20080157189 Power Semiconductor Device
07/03/2008US20080157188 Field effect transistor with thin gate electrode and method of fabricating same
07/03/2008US20080157187 Bit lines for semiconductor devices
07/03/2008US20080157186 Non-volatile memory device including metal-insulator transition material
07/03/2008US20080157185 Non-Volatile Memory Device Having Charge Trapping Layer and Method for Fabricating the Same
07/03/2008US20080157184 Methods of operating non-volatile memory cells having an oxide/nitride multilayer insulating structure
07/03/2008US20080157183 Convex shaped thin-film transistor device
07/03/2008US20080157182 Semiconductor device and method of fabricating the same
07/03/2008US20080157181 Non-volatile memory device and fabrication method thereof
07/03/2008US20080157180 Flash memory device and method of forming the device
07/03/2008US20080157179 Method for fabricating nonvolatile memory device
07/03/2008US20080157178 Flash memory device and method for manufacturing thereof
07/03/2008US20080157177 Flash Device and the Manufacturing Method
07/03/2008US20080157175 Flash Memory Device and Method for Manufacturing Thereof
07/03/2008US20080157174 Non-Volatile Memory Device and Method of Fabricating the Same
07/03/2008US20080157173 Flash memory device and method of erasing the same
07/03/2008US20080157172 Saddle Type Flash Memory Device and Fabrication Method Thereof
07/03/2008US20080157171 Dielectric barrier for nanocrystals
07/03/2008US20080157170 Eeprom cell with adjustable barrier in the tunnel window region
07/03/2008US20080157169 Shield plates for reduced field coupling in nonvolatile memory
07/03/2008US20080157168 Semiconductor memory device and method of manufacturing the same
07/03/2008US20080157167 Flash memory device
07/03/2008US20080157166 Method of fabricating flash memory device
07/03/2008US20080157165 Flash Memory Device and Method of Manufacturing the Same
07/03/2008US20080157164 Flash Memory and Method for Fabricating Thereof
07/03/2008US20080157163 EEPROM device and method of forming the same
07/03/2008US20080157162 Method of combining floating body cell and logic transistors
07/03/2008US20080157161 Apparatus, system, and method for multiple-segment floating gate
07/03/2008US20080157160 Local interconnect having increased misalignment tolerance
07/03/2008US20080157159 Highly tunable metal-on-semiconductor varactor
07/03/2008US20080157157 Semiconductor integrated circuit device
07/03/2008US20080157156 Method and structure for improved alignment in mram integration
07/03/2008US20080157155 Semiconductor device and method for manufacturing the same
07/03/2008US20080157132 Method for forming the gate of a transistor
07/03/2008US20080157131 Method of forming a selective spacer in a semiconductor device
07/03/2008US20080157130 Expitaxial fabrication of fins for FinFET devices
07/03/2008US20080157128 Methods for producing multiple distinct transistors from a single semiconductor
07/03/2008US20080157125 Transistor based antifuse with integrated heating element
07/03/2008US20080157123 Epitaxial group III nitride layer on (001)-oriented group IV semiconductor
07/03/2008US20080157121 High speed high power nitride semiconductor device
07/03/2008US20080157119 Stack SiGe for short channel improvement
07/03/2008US20080157117 Insulated gate bipolar transistor with enhanced conductivity modulation
07/03/2008US20080157116 Thin film transistor, method of fabricating the same, and organic light emitting diode display device including the same
07/03/2008US20080157096 monocrystalline diamond, adapted for use as semiconductors or waveguides
07/03/2008US20080157095 Semiconductor Devices Having Single Crystalline Silicon Layers
07/03/2008US20080157094 Thin film transistor, method of fabricating the same, and organic light emitting diode display device including the same
07/03/2008US20080157093 Capacitor having tapered cylindrical storage node and method for manufacturing the same
07/03/2008US20080157091 Methods of fabricating a semiconductor device using a cyclic selective epitaxial growth technique and semiconductor devices formed using the same
07/03/2008US20080157089 Semiconductor device and manufacturing method thereof
07/03/2008US20080157088 Thin film transistor array substrate and method for fabricating same
07/03/2008US20080157085 Thin film transistor substrate and fabricating method thereof
07/03/2008US20080157083 Transistor, fabricating method thereof and flat panel display therewith
07/03/2008US20080157082 Organic light emitting display and method of manufacturing the same
07/03/2008US20080157081 Organic light emitting device and method for manufacturing the same
07/03/2008US20080157080 nanostructure-film deposited over active matrix substrate, so pixel electrode makes electrical contact with underlying layer; auxiliary data and gate pads; can be deposited using low-impact methods that do not damage underlying gate insulating layers, do not require intermediate protection layer
07/03/2008US20080157073 Integrated Transistor Devices
07/03/2008US20080157072 Memory device
07/03/2008US20080157069 Thin film transistor for liquid crystal display device
07/03/2008US20080157062 Spin transistor
07/03/2008US20080157061 Field effect transistor array using single wall carbon nano-tubes
07/03/2008US20080157060 Semiconductor Device Having Multiple Lateral Channels and Method of Forming the Same
07/03/2008US20080157058 Dopant confinement in the delta doped layer using a dopant segregation barrier in quantum well structures
07/03/2008US20080157057 Nanostructure Having a Nitride-Based Quantum Well and Light Emitting Diode Employing the Same
07/03/2008US20080157050 Phase-change memory and fabrication method thereof
07/03/2008US20080156095 Sensor Device, Sensor System and Methods for Manufacturing Them
07/03/2008DE19515564B4 Elektrode für ein Halbleiterbauelement und Verfahren zur Herstellung derselben An electrode for a semiconductor device and method of manufacturing the same
07/03/2008DE112006002377T5 Halbleitervorrichtung und Verfahren zum Herstellen einer Halbleitervorrichtung A semiconductor device and method of manufacturing a semiconductor device
07/03/2008DE112006002219T5 Halbleiteranordnung mit einer metallischen Gateelektrode, die auf einer getemperten dielektrischen Gateschicht mit hohem k-Wert gebildet ist A semiconductor device having a metal gate electrode that is formed on an annealed gate dielectric layer having a high k-value
07/03/2008DE102007048982A1 Semiconductor component comprises semiconductor substrate with conductivity, and base region of another conductivity in semiconductor substrate
07/03/2008DE102007045074A1 Semiconductor component, particularly semiconductor component with gate stack structure, comprises two conductive layers and intermediate structure is provided over primary conductive layer
07/03/2008DE102007041191A1 Method for manufacturing metal oxide semiconductor field effect transistor-component of trench type of gate, involves forming trench in semiconductor substrate and gate oxide-coating at inner wall of trench
07/03/2008DE102007030321A1 Semiconductor component, particularly gate structure, has gate isolation layer, electrode on gate isolation layer, intermediate structure on electrode and another electrode on intermediate structure
07/03/2008DE102006062289A1 Verfahren zur Herstellung eindimensionaler koaxialer Ge/SiCxNy-Heterostrukturen, derartige Struktur und Verwendung der Struktur A process for producing one-dimensional coaxial Ge / SiCx Ny heterostructures, such a structure and use of the structure
07/03/2008DE102006062011A1 Field-effect transistor for poly-poly metal oxide semiconductor circuit, particularly for use with ohm source poly contact, has substrate that is formed with surface along trench, which has trench base and trench edge
07/03/2008DE102006049158B4 Transistor, Speicherzellenfeld und Verfahren zur Herstellung eines Transistors Transistor, memory cell array and method of manufacturing a transistor
07/03/2008DE102006033506B4 Schottkykontakt-Bauelement und seine Verwendung Schottky device and its use
07/02/2008EP1939942A2 Semiconductor device and method of fabricating the same
07/02/2008EP1939933A2 Thin film transistor, method of fabricating the same, and organic light emitting diode display device including the same
07/02/2008EP1938387A2 Blanket implant diode
07/02/2008EP1938386A2 Nanorod thin-film transistors
07/02/2008EP1938385A2 Transistors with fluorine treatment
07/02/2008EP1938384A1 Silicon carbide bipolar junction transistors having epitaxial base regions and multilayer emitters and methods of fabricating the same
07/02/2008EP1938383A1 Integrated circuit mounting for thermal stress relief useable in a multi-chip module
07/02/2008EP1938382A2 High current semiconductor device system having low resistance and inductance
07/02/2008EP1938381A2 Methods for nanostructure doping
07/02/2008EP1938359A2 Memory device with improved performance and method of manufacturing such a memory device
07/02/2008EP1771887B1 Bipolar transistor and method of manufacturing the same
07/02/2008EP1709680A4 Vertical gate cmos with lithography-independent gate length
07/02/2008EP1702358A4 A method for forming thick dielectric regions using etched trenches
07/02/2008EP1578599A4 Method for synthesizing nanoscale structures in defined locations
07/02/2008EP1537263A4 Semiconductor nanocrystal heterostructures
07/02/2008EP1459321A4 Reprogrammable non-volatile memory using a breakdown phenomena in an ultra-thin dielectric