| Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143) |
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| 01/11/2005 | US6841851 Semiconductor device having a high density plasma oxide layer |
| 01/11/2005 | US6841850 Semiconductor device having silicon nitride film and silicon oxide film, and method of fabricating the same |
| 01/11/2005 | US6841843 Semiconductor integrated circuit device |
| 01/11/2005 | US6841840 Capacitive dynamic quantity sensor |
| 01/11/2005 | US6841837 Semiconductor device |
| 01/11/2005 | US6841836 Integrated device with Schottky diode and MOS transistor and related manufacturing process |
| 01/11/2005 | US6841835 MOS transistor and switching power supply |
| 01/11/2005 | US6841834 Doubly asymmetric double gate transistor structure |
| 01/11/2005 | US6841832 Array of gate dielectric structures to measure gate dielectric thickness and parasitic capacitance |
| 01/11/2005 | US6841831 Fully-depleted SOI MOSFETs with low source and drain resistance and minimal overlap capacitance using a recessed channel damascene gate process |
| 01/11/2005 | US6841830 Metal oxide semiconductor field effect transistors (MOSFETS) used in ink-jet head chips and method for making the same |
| 01/11/2005 | US6841829 Self protecting bipolar SCR |
| 01/11/2005 | US6841828 Method of manufacturing SOI element having body contact |
| 01/11/2005 | US6841827 Semiconductor memory device |
| 01/11/2005 | US6841826 Low-GIDL MOSFET structure and method for fabrication |
| 01/11/2005 | US6841825 Semiconductor device |
| 01/11/2005 | US6841824 Flash memory cell and the method of making separate sidewall oxidation |
| 01/11/2005 | US6841823 Self-aligned non-volatile memory cell |
| 01/11/2005 | US6841812 Double-gated vertical junction field effect power transistor |
| 01/11/2005 | US6841810 Cell structure for bipolar integrated circuits and method |
| 01/11/2005 | US6841809 Heterostructure semiconductor device |
| 01/11/2005 | US6841806 Heterojunction thyristor-based amplifier |
| 01/11/2005 | US6841804 Device of white light-emitting diode |
| 01/11/2005 | US6841798 Enclosed cavity formed inside a gate line of a thin film transistor and fabrication method thereof |
| 01/11/2005 | US6841797 Semiconductor device formed over a surface with a drepession portion and a projection portion |
| 01/11/2005 | US6841795 Semiconductor devices employing at least one modulation doped quantum well structure and one or more etch stop layers for accurate contact formation |
| 01/11/2005 | US6841677 For use as semiconductors or charge transport materials in optical, electrooptical or electronic devices including field effect transistors, electroluminescent, photovoltaics, sensors and electrophotographic recording devices |
| 01/11/2005 | US6841490 Semiconductor substrate, SOI substrate and manufacturing method therefor |
| 01/11/2005 | US6841487 Method of manufacturing semiconductor device and flash memory |
| 01/11/2005 | US6841475 Method for fabricating thin film transistors |
| 01/11/2005 | US6841472 Semiconductor device and method of fabricating the same |
| 01/11/2005 | US6841461 Method for forming gate electrode of semiconductor device |
| 01/11/2005 | US6841459 Method of manufacturing semiconductor device |
| 01/11/2005 | US6841457 Use of hydrogen implantation to improve material properties of silicon-germanium-on-insulator material made by thermal diffusion |
| 01/11/2005 | US6841452 Method of forming device isolation trench |
| 01/11/2005 | US6841445 Method of making floating gate non-volatile memory cell with low erasing voltage having double layer gate dielectric |
| 01/11/2005 | US6841444 Nonvolatile semiconductor memory device and manufacturing method thereof |
| 01/11/2005 | US6841441 Method to produce dual gates (one metal and one poly or metal silicide) for CMOS devices using sputtered metal deposition, metallic ion implantation, or silicon implantation, and laser annealing |
| 01/11/2005 | US6841440 Semiconductor device including impurity layer having continuous portions formed at different depths and method of manufacturing the same |
| 01/11/2005 | US6841439 High permittivity silicate gate dielectric |
| 01/11/2005 | US6841438 Annular gate and technique for fabricating an annular gate |
| 01/11/2005 | US6841437 Method of forming a vertical power semiconductor device and structure therefor |
| 01/11/2005 | US6841436 Method of fabricating SiC semiconductor device |
| 01/11/2005 | US6841435 Method for fabricating a GaInP epitaxial stacking structure |
| 01/11/2005 | US6841434 Method of fabricating semiconductor device |
| 01/11/2005 | US6841433 Method of fabricating polysilicon thin film transistor |
| 01/11/2005 | US6841432 Semiconductor device and process for fabricating the same |
| 01/11/2005 | US6841431 Method for reducing the contact resistance |
| 01/11/2005 | US6841430 Semiconductor and fabrication method thereof |
| 01/11/2005 | US6841429 Method of manufacturing a semiconductor device having a silicide film |
| 01/11/2005 | US6841428 Method for fabricating thin film transistor liquid crystal display |
| 01/11/2005 | US6841420 Semiconductor device and method of manufacturing the same |
| 01/11/2005 | US6841419 Method of fabricating a COF utilizing a tapered IC chip and chip mounting hole |
| 01/11/2005 | US6841417 Semiconductor device and semiconductor assembly apparatus for semiconductor device |
| 01/11/2005 | US6841410 Method for forming group-III nitride semiconductor layer and group-III nitride semiconductor device |
| 01/11/2005 | US6841409 Group III-V compound semiconductor and group III-V compound semiconductor device using the same |
| 01/11/2005 | US6841400 Method of manufacturing semiconductor device having trench isolation |
| 01/11/2005 | US6841001 Strain compensated semiconductor structures and methods of fabricating strain compensated semiconductor structures |
| 01/11/2005 | US6840999 In situ regrowth and purification of crystalline thin films |
| 01/11/2005 | US6840997 Vacancy, dominsated, defect-free silicon |
| 01/11/2005 | US6840593 Wire basket |
| 01/11/2005 | US6840111 Micromechanical component and pressure sensor having a component of this type |
| 01/11/2005 | US6839962 Method of producing micromechanical structures |
| 01/11/2005 | CA2249062C Electronic device and method for fabricating the same |
| 01/06/2005 | WO2005001940A1 Field effect transistor |
| 01/06/2005 | WO2005001922A1 Floating gate structures with vertical projections |
| 01/06/2005 | WO2005001921A1 Thin film transistor, thin film transistor substrate, electronic apparatus and process for producing polycrystalline semiconductor thin film |
| 01/06/2005 | WO2005001908A2 Strained semiconductor device and method of manufacture |
| 01/06/2005 | WO2005001905A2 High-density finfet integration scheme |
| 01/06/2005 | WO2005001904A2 Method of forming freestanding semiconductor layer |
| 01/06/2005 | WO2005001899A2 Non-volatile electromechanical field effect devices and circuits using same and methods of forming same |
| 01/06/2005 | WO2005001895A2 Patterned thin film graphite devices and method for making same |
| 01/06/2005 | WO2005001840A2 Mirror image non-volatile memory cell transistor pairs with single poly layer |
| 01/06/2005 | WO2005001800A2 Alternative thin film transistors for liquid crystal displays |
| 01/06/2005 | WO2005001519A2 Embedded waveguide detectors |
| 01/06/2005 | WO2005000735A2 Method for creating a functional interface between a nanoparticle, nanotube or nanowire, and a biological molecule or system |
| 01/06/2005 | WO2004095577A3 Semiconductor device comprising a field-effect transistor and method of operating the same |
| 01/06/2005 | WO2004095530A3 Adjoining adjacent coatings on an element |
| 01/06/2005 | WO2004085200A3 Mirror assembly with multi-color illumination |
| 01/06/2005 | WO2004025696A3 Active matrix backplane for controlling controlled elements and method of manufacture thereof |
| 01/06/2005 | WO2004000003A3 Controlled alignment of catalytically grown nanostructures in a large-scale synthesis process |
| 01/06/2005 | US20050003680 Methods of forming deuterated silicon nitride-containing materials |
| 01/06/2005 | US20050003640 Method for fabricating thin film pattern, device and fabricating method therefor, method for fabricating liquid crystal display, liquid crystal display, method for fabricating active matrix substrate, electro-optical apparatus, and electrical apparatus |
| 01/06/2005 | US20050003639 Method of forming a polysilicon layer |
| 01/06/2005 | US20050003638 Method of manufacturing a semiconductor device |
| 01/06/2005 | US20050003631 Method and apparatus for assembling an array of micro-devices |
| 01/06/2005 | US20050003629 Method for processing semiconductor substrate |
| 01/06/2005 | US20050003627 Method of forming a field effect transistor |
| 01/06/2005 | US20050003624 Capacitor layout technique for reduction of fixed pattern noise in a CMOS sensor |
| 01/06/2005 | US20050003623 Arrangement for preventing short-circuiting in a bipolar double-poly transistor and a method of fabricating such an arrangement |
| 01/06/2005 | US20050003622 Structure and fabricating method with self-aligned bit line contact to word line in split gate flash |
| 01/06/2005 | US20050003621 Semiconductor device and method for fabricating the same |
| 01/06/2005 | US20050003620 Methods of forming quantum dots in semiconductor devices |
| 01/06/2005 | US20050003619 Nonvolatile semiconductor memory and manufacturing method for the same |
| 01/06/2005 | US20050003616 Self aligned non-volatile memory cell and process for fabrication |
| 01/06/2005 | US20050003615 Semiconductor devices, methods of manufacturing semiconductor devices, circuit substrates and electronic devices |
| 01/06/2005 | US20050003614 Semiconductor memory device including a flash memory cell array and a mask read-only memory cell array |
| 01/06/2005 | US20050003612 Sram cell |
| 01/06/2005 | US20050003608 Method for eliminating inverse narrow width effects in the fabrication of DRAM device |
| 01/06/2005 | US20050003599 Mosfet device with a strained channel |