Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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08/01/2012 | CN102623355A Method for manufacturing N-trench lateral dual-diffusion metal oxide semiconductor (N-LDMOS) |
08/01/2012 | CN102623354A Manufacturing method of P-LDMOS (P-Laterally Diffused Metal Oxide Semiconductor) |
08/01/2012 | CN102623353A Manufacturing method of N-LDMOS (N-Laterally Diffused Metal Oxide Semiconductor) |
08/01/2012 | CN102623352A P-LDMOS (P-Type Laterally Diffused Metal Oxide Semiconductor) manufacturing method |
08/01/2012 | CN102623351A Transistor capable of improving tunnel penetration field effect |
08/01/2012 | CN102623350A Manufacturing method for semiconductor devices with super junction structures |
08/01/2012 | CN102623349A Semiconductor device having super junction structure and method for manufacturing the same |
08/01/2012 | CN102623348A Semiconductor device and manufacturing method of the same |
08/01/2012 | CN102623347A Manufacturing method of three-dimensional array SiNWFET (Silicon-Nanowire Field Effect Transistor) based on bulk silicon |
08/01/2012 | CN102623346A Transistor manufacturing method |
08/01/2012 | CN102623345A Embedded multi-N-island P-channel hyperconjugation device and preparation method thereof |
08/01/2012 | CN102623344A Bottom gate type thin film transistor, method of manufacturing the same, and display apparatus |
08/01/2012 | CN102623343A Side wall hollow layer structure for semiconductor device and preparation method for side wall hollow layer structure |
08/01/2012 | CN102623342A Semiconductor devices having encapsulated stressor regions and related fabrication methods |
08/01/2012 | CN102623341A Preparation method of MOS transistor |
08/01/2012 | CN102623340A Method for preparing groove-type double-layer grid MOS device |
08/01/2012 | CN102623339A Method for improving thickness uniformity of intermediate oxide layer of double-layer grid MOS structure |
08/01/2012 | CN102623338A Manufacturing method of longitudinal stacking grid-last type silicon-nanowire field effect transistor based on SOI (Silicon On Insulator) |
08/01/2012 | CN102623337A Transistor and making method thereof |
08/01/2012 | CN102623336A Manufacturing method of gallium-arsenide-based microwave monolithic integrated circuit power device |
08/01/2012 | CN102623335A Method for improving power density of electric energy conversion device |
08/01/2012 | CN102623334A Method for forming silicon nitride film with double stress layers |
08/01/2012 | CN102623333A Method for forming silicon nitride film with double stress layers |
08/01/2012 | CN102623332A Device for peeling silica thin films off silicon crystal wafers and method thereof |
08/01/2012 | CN102623331A Method for preparing automatic alignment contact hole in PSG interlayer film |
08/01/2012 | CN102623330A Method for forming front metal dielectric layer |
08/01/2012 | CN102623329A Method for forming front metal dielectric layer |
08/01/2012 | CN102623328A Process for treatment of substrates with water vapor or steam |
08/01/2012 | CN102623327A Chemical mechanical lapping method |
08/01/2012 | CN102623326A Method for fabricating dielectric layer with improved insulating properties |
08/01/2012 | CN102623325A Method for treating high aspect ratio process (HARP) film and method for manufacturing pre-metal dielectric (PMD) layer |
08/01/2012 | CN102623324A Electrochemical etching of semiconductors |
08/01/2012 | CN102623323A Semiconductor wafer liquid-spraying etching system and method |
08/01/2012 | CN102623322A Preparation method of bulk silicon-based longitudinal stack-type silicon nanowire field effect transistor (SiNWFET) |
08/01/2012 | CN102623321A Manufacture method of longitudinal stacking type rear-grid type SiNWFET (Silicon-Nanowire Field Effect Transistor) based on bulk silicon |
08/01/2012 | CN102623320A Method for characterizing polycrystalline silicon resistor in multilayer grid electrode |
08/01/2012 | CN102623319A Floating gate preparation method |
08/01/2012 | CN102623318A Semiconductor device and manufacturing method thereof |
08/01/2012 | CN102623317A Semiconductor device including an epitaxy region |
08/01/2012 | CN102623316A Methods for preparing groove bottom auxiliary gate dielectric layer and groove DMOS pipe |
08/01/2012 | CN102623315A Doping oxide for forming shallow trench isolation |
08/01/2012 | CN102623314A Source-drain lightly-doping method, semiconductor device and manufacturing method thereof |
08/01/2012 | CN102623313A Ring ion injection method, semiconductor device and manufacture method thereof |
08/01/2012 | CN102623312A Method and structure for increasing solar battery pn junction depletion region |
08/01/2012 | CN102623311A Apparatus for preparing metal nitride barrier layer and application method thereof |
08/01/2012 | CN102623310A Preparation method of ohmic contact of metal with graphene |
08/01/2012 | CN102623309A Manufacturing method of end terminal of high voltage power semiconductor device and special cutting tool for the same |
08/01/2012 | CN102623308A Post chemical-mechanical polishing (CMP) cleaning method and CMP method |
08/01/2012 | CN102623307A Universal self-aligned preparation method for full-limited quantum dots between varieties of materials |
08/01/2012 | CN102623306A Metal-multilayer insulator-metal capacitor, manufacture method for same and integrated circuit thereof |
08/01/2012 | CN102623305A Metal-multilayer insulator-metal capacitor as well as preparation method and integrated circuit thereof |
08/01/2012 | CN102623304A Wafer suitable for nanometer technology and method for manufacturing the same |
08/01/2012 | CN102623303A SOI wafer and preparation method thereof |
08/01/2012 | CN102623302A Reworking control method and control system thereof |
08/01/2012 | CN102623301A Silicon chip bench particle removing apparatus and particle removing method thereof |
08/01/2012 | CN102623300A Apparatus for forming protection film on chip-scale package and formation method thereof |
08/01/2012 | CN102623299A Grain process method of wafer bonding |
08/01/2012 | CN102623298A Cleaning method of reaction chamber |
08/01/2012 | CN102622960A Brightness adjustment device for light emitting diode (LED) display device, LED display system and manufacturing method for LED display system |
08/01/2012 | CN102621752A 像素结构及其制作方法 Pixel structure and manufacturing method thereof |
08/01/2012 | CN102621732A System for treating web |
08/01/2012 | CN102621188A Electromagnetic biosensor device and manufacturing method thereof |
08/01/2012 | CN102620624A Semiconductor wire-bonding machine-table adjustment measuring tool and adjusting method therefor |
08/01/2012 | CN102618843A Method for producing amorphous indium gallium zinc oxide thin film by atomic layer deposition |
08/01/2012 | CN102618213A Resin composition and semiconductor devices made by using the same |
08/01/2012 | CN102618178A Adhesive compositions for a semiconductor, an adhesive sheet for a semiconductor and a production method of a semiconductor device |
08/01/2012 | CN102618172A Slurry and method for chemical mechanical polishing |
08/01/2012 | CN102615585A Grinding apparatus |
08/01/2012 | CN102615584A Chemical mechanical grinding method |
08/01/2012 | CN102615571A Polishing device and polishing method |
08/01/2012 | CN102614977A Automatic separation method for solar silicon wafers or other flaky objects in water |
08/01/2012 | CN102136438B Method for quickly detecting segment difference height between stacked frames of chip |
08/01/2012 | CN102130122B Domain structure of silicon germanium heterojunction triode |
08/01/2012 | CN102129998B Method for forming polysilicon P type column in N type super-junction VDMOS (Vertical Double Diffused Metal Oxide Semiconductor) |
08/01/2012 | CN102129961B Manufacturing method of chip label |
08/01/2012 | CN102110709B Parasitic vertical PNP triode in bipolar complementary metal oxide semiconductor (BiCMOS) process and manufacturing method thereof |
08/01/2012 | CN102110621B Insulated pull rod and pressing device for power semiconductor, and assembly method of pressing device |
08/01/2012 | CN102110588B Semiconductor wafer transfer and process pretreatment equipment |
08/01/2012 | CN102104062B Bipolar transistor |
08/01/2012 | CN102087970B Process for etching polycrystalline silicon layer and method for forming metal oxide semiconductor (MOS) transistor |
08/01/2012 | CN102046840B Processing apparatus and processing method |
08/01/2012 | CN102044462B Method for testing wafer |
08/01/2012 | CN102034685B Method for using post-epitaxial photoetching to align zero-level marks |
08/01/2012 | CN102030308B Method for assembling particle ordered array in polarized way based on ferroelectric film electric domain |
08/01/2012 | CN101995713B TFT-LCD array substrate and manufacturing method thereof |
08/01/2012 | CN101964309B Manufacturing method of thin film transistor |
08/01/2012 | CN101952950B Transfer apparatus, vacuum processing apparatus and transfer method |
08/01/2012 | CN101924121B Manufacturing method of active matrix/organic light emitting display |
08/01/2012 | CN101924093B Semiconductor device and method of manufacturing semiconductor device |
08/01/2012 | CN101916739B Wafer carrying device |
08/01/2012 | CN101908512B Twist-secured assembly of a power semiconductor module mountable on a heat sink |
08/01/2012 | CN101901813B Semiconductor memory with vertical structure and manufacturing method thereof |
08/01/2012 | CN101887852B Method for filling deep trench |
08/01/2012 | CN101872529B Wafer bumping alarm system for wafer processing equipment |
08/01/2012 | CN101866873B Slot filling method in multilayer integrated circuit |
08/01/2012 | CN101740549B Test structure and test method for precisely evaluating reliability performance of gate oxide |
08/01/2012 | CN101740494B Transfer method of functional region, led array, led printer head, and led printer |
08/01/2012 | CN101673668B Method for polishing gallium nitride crystals |
08/01/2012 | CN101645396B Film automatic stripper |
08/01/2012 | CN101568998B Ashing system |