G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor

More topics under "G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor" (169,016)
G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
G03F 3 - Colour separation; Correction of tonal value (5,370)
G03F 5 - Screening processes; Screens therefor (818)
G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)

Patents for G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor (531)
12/2004
12/30/2004	US20040265706 Method of extending the stability of a photoresist during direct writing of an image
12/29/2004	WO2004114016A2 Imprint lithography with improved monitoring and control and apparatus therefor
12/29/2004	WO2004013692A3 System and method for maskless lithography using an array of sources and an array of focusing elements
12/29/2004	CN1558823A Methods and systems for providing an image on an organic product
12/23/2004	WO2004111726A2 Novel photosensitive resin compositions
12/23/2004	WO2004068240A3 Preparation of novel physical transfer elements such as hot stamping foil and methods for using the same in producing chemically resistant bonds
12/23/2004	WO2004055594A3 Method and system for determining characteristics of substrates employing fluid geometries
12/16/2004	US20040253537 Novel photosensitive resin compositions
12/09/2004	WO2004107045A2 Methods of creating patterns on substrates and articles of manufacture resulting therefrom
12/09/2004	WO2004036311A3 Anti-reflective compositions comprising triazine compounds
12/09/2004	WO2004027518A3 A method for the removal of an imaging layer from a semiconductor substrate stack
12/02/2004	WO2004104698A2 Dielectric materials to prevent photoresist poisoning
12/02/2004	WO2004081662A3 Development enhancement of radiation-sensitive elements
12/02/2004	DE10322393A1 Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage Illumination system for a microlithography projection exposure apparatus
11/2004
11/25/2004	WO2004077154A3 Lithographic printing with polarized light
11/25/2004	US20040233445 Determination of center of focus by parameter variability analysis
11/25/2004	US20040231781 Methods of creating patterns on substrates and articles of manufacture resulting therefrom
11/24/2004	EP1478979A2 An image forming method and apparatus
11/18/2004	WO2004099873A2 Illumination system for a microlithographic projection illumination installation
11/18/2004	US20040226814 Electron beam processing for mask repair
11/11/2004	WO2004097520A2 Fiber laser-based euv-lithography
11/11/2004	US20040223883 System for determining characteristics of substrates employing fluid geometries
11/11/2004	DE10317893A1 Maskierungsanordnung und Verfahren zum Herstellen von integrierten Schaltungsanordnungen Masking arrangement and method for producing integrated circuit arrangements
11/04/2004	WO2004095399A2 Providing cutomized text and imagery on organic products
11/04/2004	US20040219452 Dissolution rate modifiers for photoresist compositions
10/2004
10/28/2004	WO2004092833A2 Environmental system including a transport region for an immersion lithography apparatus
10/28/2004	WO2004092832A2 Determination of center of focus by parameter variability analysis
10/28/2004	WO2004092829A2 Masking arrangement and method for producing integrated circuit arrangements
10/21/2004	WO2004090633A2 An electro-osmotic element for an immersion lithography apparatus
10/14/2004	WO2004088414A2 Positive tone bi-layer imprint lithography method and compositions therefor
10/07/2004	WO2004066026A3 Imageable elements and compositions for imaging by means of uv irradiation
09/2004
09/30/2004	WO2004083960A2 Alternating aperture phase shift photomask having light absorption layer
09/30/2004	US20040190008 Method for process optimization and control by comparison between 2 or more measured scatterometry signals
09/23/2004	WO2004081662A2 Development enhancement of radiation-sensitive elements
09/23/2004	WO2004063814A3 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels
09/23/2004	US20040185348 optical lithography; radiation transparent; semiconductors/integrated circuits
09/16/2004	US20040180294 Lithographic printing with polarized light
09/16/2004	DE10307453A1 Oxazol-Derivate enthaltende strahlungs empfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente Oxazole derivatives containing radiation- sensitive compositions and imageable elements based thereon
09/10/2004	WO2004077154A2 Lithographic printing with polarized light
09/10/2004	WO2004031856A3 Photomask assembly incorporating a porous frame and method for making it
09/02/2004	WO2004074940A1 Pattern generation method
09/02/2004	WO2004074933A2 Dissolution rate modifiers for photoresist compositions
09/02/2004	WO2004074930A2 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon
08/2004
08/19/2004	WO2004070471A2 Arc layer for semiconductor device
08/19/2004	US20040161619 Overcoating substrate with polyamic acid and polylactone; baking while controlling temperature; then coating with photoresist; exposure to radiation; development
08/19/2004	DE10302111A1 Bebilderbare Elemente und Zusammensetzungen für Bebilderung mittels UV-Bestrahlung Imageable elements and compositions for imaging by means of UV irradiation
08/18/2004	EP1446283A2 Providing an image on an organic product
08/12/2004	WO2004068240A2 Preparation of novel physical transfer elements such as hot stamping foil and methods for using the same in producing chemically resistant bonds
08/05/2004	WO2004066028A2 Method for process optimization and control by comparison between 2 or more measured scatterometry signals
08/05/2004	WO2004066027A2 Electron beam processing for mask repair
08/05/2004	WO2004066026A2 Imageable elements and compositions for imaging by means of uv irradiation
08/05/2004	US20040151990 Photomask assembly incorporating a porous frame and method for making it
08/03/2004	US6772084 Overlay measurements using periodic gratings
07/2004
07/29/2004	WO2004063814A2 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels
07/29/2004	WO2004008244A3 Defect inspection methods that include acquiring aerial images of a reticle for different lithographic process variables
07/29/2004	US20040146751 solid, radiation-curable resin as the adhesive layer; very resistant to chemical attacks such as in laundering and dry-cleaning, mechanical forces, such as stress, wear and tear, and ageing
07/29/2004	US20040145029 A method of forming an arc layer for a semiconductor device
07/29/2004	US20040144479 Preparation of novel physical transfer elements such as hot stamping foil and methods for using the same in producing chemically resistant bonds
07/15/2004	WO2004040371A3 Novel copolymer and photoresist compositions thereof
07/15/2004	WO2004008246A3 Method and system for context-specific mask writing
07/15/2004	US20040137362 interpolymers of cyclic siloxane acrylates, e.g., 3-(3,5,7,9,11,13,15-heptaethylpentacyclo [9.5.1.13.9.15.15.17.13]octa-siloxan-1-yl) propyl methacrylate; high resolution photolithography
07/08/2004	US20040133369 Method and system for context-specific mask inspection
07/08/2004	US20040131977 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels
07/01/2004	WO2004055594A2 Method and system for determining characteristics of substrates employing fluid geometries
07/01/2004	WO2004055593A2 Process for producing a heat resistant relief structure
07/01/2004	US20040124372 System and method for maskless lithography using an array of sources and an array of focusing elements
06/2004
06/24/2004	US20040121069 lithography; accurately matching up the defect location; focused ion beam systems
06/17/2004	US20040116312 Method for the removal of an imaging layer from a semiconductor substrate stack
06/17/2004	US20040112153 Method and system for determining characteristics of substrates employing fluid geometries
06/03/2004	WO2004046826A2 Positive tone lithography in carbon dioxide solvents
06/03/2004	US20040107412 Method and system for context-specific mask writing
05/2004
05/20/2004	US20040096783 Exposing the polymer resist layer to radiant energy to form at least one light field region in the polymer resist layer, and then contacting the polymer resist layer with CO2 solvent system to remove light field region
05/13/2004	WO2004040371A2 Novel copolymer and photoresist compositions thereof
05/13/2004	US20040091142 Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns
05/06/2004	US20040086792 Lithographic mask for semiconductor devices with a polygonal-section etch window, in particular having a section of at least six sides
05/06/2004	EP1415197A2 Optical proximity correction for phase shifting photolithographic masks
04/2004
04/29/2004	WO2004036311A2 Anti-reflective compositions comprising triazine compounds
04/15/2004	WO2004031856A2 Photomask assembly incorporating a porous frame and method for making it
04/15/2004	US20040072420 Anti-reflective compositions comprising triazine compounds
04/13/2004	US6721938 Optical proximity correction for phase shifting photolithographic masks
04/01/2004	WO2004027518A2 A method for the removal of an imaging layer from a semiconductor substrate stack
02/2004
02/19/2004	WO2004015496A2 Using scanning probe microscope topographic data to repair photomask defect using charged particle beams
02/19/2004	US20040031410 Providing customized text and imagery on organic products
02/12/2004	WO2004013693A2 Scatterometry alignment for imprint lithography
02/12/2004	WO2004013692A2 System and method for maskless lithography using an array of sources and an array of focusing elements
02/12/2004	WO2003050615A3 Photomask and method for qualifying the same with a prototype specification
01/2004
01/22/2004	WO2004008246A2 Method and system for context-specific mask writing
01/22/2004	WO2004008245A2 Method and system for context-specific mask inspection
01/22/2004	WO2004008244A2 Defect inspection methods that include acquiring aerial images of a reticle for different lithographic process variables
12/2003
12/11/2003	WO2003071353A3 An image forming method and apparatus
12/11/2003	WO2003065119A3 Overlay measurements using periodic gratings
12/11/2003	WO2002101464A3 Optical proximity correction for phase shifting photolithographic masks
11/2003
11/26/2003	CN1129035C Polymerizable alkylene compounds containing tetrahydrofuran methyloxycarbonyl radical and photoresist containing it
11/13/2003	US20030212525 Overlay measurements using periodic gratings
10/2003
10/23/2003	US20030198873 Photomask and method for qualifying the same with a prototype specification
08/2003
08/28/2003	WO2003071353A2 An image forming method and apparatus
08/21/2003	WO2003027768A3 Providing an image on an organic product
08/07/2003	WO2003065119A2 Overlay measurements using periodic gratings
07/2003
07/01/2003	US6585825 Metal ion free solution containing base, silicate, stabilizer and water; removing photoresist residues and other metallic and organic contaminates from semiconductor wafers without damaging
06/2003
06/19/2003	WO2003050615A2 Photomask and method for qualifying the same with a prototype specification

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