G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor

More topics under "G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor" (169,016)
G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
G03F 3 - Colour separation; Correction of tonal value (5,370)
G03F 5 - Screening processes; Screens therefor (818)
G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)

Patents for G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor (531)
06/2006
06/22/2006	US20060134534 Photomask and method for maintaining optical properties of the same
06/21/2006	EP1671184A2 Photoresist compositions comprising diamondoid derivatives
06/15/2006	WO2005038523A3 Imprint lithography templates having alignment marks
06/15/2006	US20060126049 Illumination system for a microlithography projection exposure apparatus
06/14/2006	EP1667778A2 Single phase fluid imprint lithography method
06/13/2006	US7061959 Laser thin film poly-silicon annealing system
06/07/2006	EP1664936A2 Forming partial-depth features in polymer film
06/07/2006	EP1664925A2 Imprint lithography templates having alignment marks
06/07/2006	EP1579274A4 Method and system for context-specific mask inspection
05/2006
05/31/2006	EP1660925A2 Apparatus and method for providing fluid for immersion lithography
05/30/2006	US7053011 Laser-based termination of passive electronic components
05/18/2006	US20060103832 Wafer table for immersion lithography
05/17/2006	EP1656590A2 Novel photosensitive bilayer composition
05/17/2006	CN1774674A Masking arrangement and method for producing integrated circuit arrangements
05/03/2006	EP1652003A2 Wafer table for immersion lithography
05/02/2006	US7038328 Anti-reflective compositions comprising triazine compounds
05/02/2006	US7036389 System for determining characteristics of substrates employing fluid geometries
04/2006
04/27/2006	WO2005076075A3 Adaptive real time control of a reticle/mask system
04/26/2006	EP1649503A2 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing
04/26/2006	EP1649323A2 Method for correcting critical dimension variations in photomasks
04/26/2006	CN1765019A ARC layer for semiconductor device
04/13/2006	WO2005029178A8 A system and method for the direct imaging of color filters
04/11/2006	US7025280 Adaptive real time control of a reticle/mask system
04/06/2006	WO2005083514A3 Method of extending the stability of a photoresist during direct writing of an image
04/06/2006	US20060073397 Masking arrangement and method for producing integrated circuit arrangements
04/05/2006	EP1642170A2 Systems for magnification and distortion correction for imprint lithography processes
04/05/2006	EP1558654A4 Novel copolymer, photoresist compositions thereof and deep uv bilayer system thereof
03/2006
03/23/2006	WO2005029179A3 Combined nanoimprinting and photolithography for micro and nano devices fabrication
03/23/2006	US20060063107 Photoresist compositions comprising diamondoid derivatives
03/23/2006	US20060063095 positive-working, aqueous base developable photosensitive polybenzoxazole (PBO) precursor compositions of polyamides where the hydroxyl groups of the dihydroxydiamine monomer unit may be sulfonated with a quinonediazide, a diazonaphthoquinone photoactive compound, and a solvent; relief images
03/22/2006	EP1636649A2 Novel photosensitive resin compositions
03/22/2006	CN1751273A Pattern generation methods
03/22/2006	CN1751270A Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon
03/21/2006	US7014961 Comprising a photomask substrate, a porous frame, and a pellicle; the porous frame is permeable to oxygen or nitrogen gas, specified pore size and coefficient of thermal expansion; allows the pellicle space to be purged with an inert gas to clean
03/16/2006	US20060057496 Photoresist compositions comprising diamondoid derivatives
03/14/2006	US7011935 Method for the removal of an imaging layer from a semiconductor substrate stack
03/02/2006	WO2005008333A3 Method for correcting critical dimension variations in photomasks
02/2006
02/23/2006	WO2005103818A3 Method for structuring at least one layer and electric component with structures from said layer
02/23/2006	WO2005040917A3 System and method for lithography simulation
02/22/2006	CN1739066A Electron beam processing technology for mask repair
02/22/2006	CN1739015A Method and system for determining characteristics of substrates employing fluid geometries
02/21/2006	US7003758 System and method for lithography simulation
02/16/2006	WO2004088414A3 Positive tone bi-layer imprint lithography method and compositions therefor
02/14/2006	US6998217 Gray scale lithography; accurate, uniform reticle writing smaller features
02/09/2006	US20060027538 Pattern generation methods and apparatuses
02/02/2006	WO2005103819A3 Method of emulation of lithographic projection tools
02/02/2006	WO2005047975A3 Dispense geometry and conductive template to achieve high-speed filling and throughput
02/02/2006	WO2005029180A3 Applications of semiconductor nano-sized particles for photolithography
02/02/2006	US20060023187 Environmental system including an electro-osmotic element for an immersion lithography apparatus
02/02/2006	US20060023182 Environmental system including a transport region for an immersion lithography apparatus
01/2006
01/31/2006	US6990870 System for determining characteristics of substrates employing fluid geometries
01/25/2006	EP1618436A2 Determination of center of focus by parameter variability analysis
01/19/2006	WO2004013693A3 Scatterometry alignment for imprint lithography
01/12/2006	WO2005036265A3 Photoresist compositions comprising diamondoid derivatives
01/11/2006	EP1614009A2 Masking arrangement and method for producing integrated circuit arrangements
01/11/2006	EP1614004A2 Positive tone bi-layer imprint lithography method and compositions therefor
01/04/2006	EP1611486A2 Environmental system including a transport region for an immersion lithography apparatus
12/2005
12/29/2005	WO2005076076A3 Directly photodefinable polymer compositions and methods thereof
12/28/2005	EP1609026A2 Process for producing a heat resistant relief structure
12/22/2005	WO2005059650A3 Device and method for microcontact printing
12/21/2005	EP1606670A2 Applications of semiconductor nano-sized particles for photolithography
12/15/2005	WO2005054949A3 Laser thin film poly-silicon annealing system
12/15/2005	WO2005040918A3 Low-activation energy silicon-containing resist system
12/01/2005	WO2005022257A3 Novel photosensitive bilayer composition
12/01/2005	WO2004092833A3 Environmental system including a transport region for an immersion lithography apparatus
11/2005
11/29/2005	US6969569 Method of extending the stability of a photoresist during direct writing of an image
11/23/2005	EP1597627A2 Dissolution rate modifiers for photoresist compositions
11/17/2005	DE102004019588A1 Verfahren zur Strukturierung von zumindest einer Schicht sowie elektrisches Bauelement mit Strukturen aus der Schicht Method for structuring at least one layer and electrical component with structures from the layer
11/16/2005	EP1595184A1 Pattern generation method
11/16/2005	EP1595183A2 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon
11/16/2005	CN1698011A Lithographic printing with polarized light
11/10/2005	WO2004097520A3 Fiber laser-based euv-lithography
11/03/2005	WO2005103819A2 Method of emulation of lithographic projection tools
11/03/2005	WO2005103818A2 Method for structuring at least one layer and electric component with structures from said layer
11/03/2005	WO2004070471A3 Arc layer for semiconductor device
10/2005
10/27/2005	WO2005059649A3 Liquid crystal cell that resists degradation from exposure to radiation
10/27/2005	US20050240895 Method of emulation of lithographic projection tools
10/19/2005	EP1586007A2 Electron beam processing for mask repair
10/06/2005	WO2005033797A3 Single phase fluid imprint lithography method
09/2005
09/29/2005	WO2005024517A3 Apparatus and method for providing fluid for immersion lithography
09/28/2005	EP1579274A2 Method and system for context-specific mask inspection
09/22/2005	WO2005088395A2 Systems and methods for sub-wavelength imaging
09/22/2005	US20050208429 Exposing the polymer resist layer to radiant energy to form at least one light field region in the polymer resist layer, and then contacting the polymer resist layer with CO2 solvent system to remove light field region
09/15/2005	WO2005010611A3 Wafer table for immersion lithography
09/15/2005	US20050202352 Systems and methods for sub-wavelength imaging
09/14/2005	EP1573395A2 Scatterometry alignment for imprint lithography
09/09/2005	WO2005083514A2 Method of extending the stability of a photoresist during direct writing of an image
09/07/2005	EP1570249A2 Method and system for determining characteristics of substrates employing fluid geometries
09/06/2005	US6939664 improved silsesquioxane polymers structures useful in resist compositions, resist compositions that have improved transparency at wavelengths at or below 193 nm with minimized image blurring, and photolithographic processes using such resists
08/2005
08/25/2005	WO2004008245A3 Method and system for context-specific mask inspection
08/25/2005	US20050186502 Directly photodefinable polymer compositions and methods thereof
08/23/2005	US6933084 Alternating aperture phase shift photomask having light absorption layer
08/18/2005	WO2005076076A2 Directly photodefinable polymer compositions and methods thereof
08/18/2005	WO2005076075A2 Adaptive real time control of a reticle/mask system
08/18/2005	US20050181314 Light emitting diodes; semiconductor lasers
08/18/2005	US20050181297 Novel photosensitive resin compositions
08/16/2005	US6929897 Photolithographic addition homopolymer or addition-condensation copolymers, comprising monomer with 1,3-disila-2-oxacyclohexane ring functional group, acid sensitive, photoacid generator, bilayer photoresist stack for forming semiconductos
08/04/2005	WO2005036264A8 Photomask having an internal substantially transparent etch stop layer
08/04/2005	US20050170288 Optical lithography; radiation transparent phase shifting masks used in manufacture of semiconductors/integrated circuits
08/04/2005	US20050168851 Image forming method and apparatus

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