| Patents for G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor (531) |
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| 08/04/2005 | US20050167514 Adaptive real time control of a reticle/mask system |
| 08/03/2005 | EP1558654A2 Novel copolymer, photoresist compositions thereof and deep uv bilayer system thereof |
| 07/28/2005 | WO2005050316A3 Method involving a mask or a reticle |
| 07/28/2005 | US20050166174 System and method for lithography simulation |
| 07/27/2005 | EP1556896A2 Anti-reflective compositions comprising triazine compounds |
| 07/21/2005 | DE10307453B4 Oxazol-Derivate enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente Oxazole derivatives containing radiation-sensitive compositions and imageable elements based thereon |
| 07/19/2005 | US6919167 Exposing the polymer resist layer to radiant energy to form at least one light field region in the polymer resist layer, and then contacting the polymer resist layer with CO2 solvent system to remove light field region |
| 07/14/2005 | WO2005031458A3 Forming partial-depth features in polymer film |
| 07/14/2005 | WO2005022258A3 Photomask and method for maintaining optical properties of the same |
| 07/14/2005 | WO2005008334A3 Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology |
| 07/13/2005 | EP1552344A2 A method for the removal of an imaging layer from a semiconductor substrate stack |
| 07/13/2005 | CN1639642A An image forming method and apparatus |
| 07/12/2005 | US6916543 Chemical amplification; organosilicon moieties; binder resins; etching resistant; photolithography |
| 07/06/2005 | EP1550002A2 Photomask assembly incorporating a porous frame and method for making it |
| 06/30/2005 | WO2005059650A2 Device and method for microcontact printing |
| 06/30/2005 | WO2005059649A2 Liquid crystal cell that resists degradation from exposure to radiation |
| 06/30/2005 | WO2004066027A3 Electron beam processing for mask repair |
| 06/30/2005 | US20050141580 Laser thin film poly-silicon annealing system |
| 06/30/2005 | US20050139112 Providing customized text and imagery on organic products |
| 06/23/2005 | WO2005057281A2 Resist, barc and gap fill material stripping chemical and method |
| 06/23/2005 | WO2005013002A3 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 06/23/2005 | CA2590325A1 Resist, barc and gap fill material stripping chemical and method |
| 06/22/2005 | EP1543451A2 Method and system for context-specific mask writing |
| 06/21/2005 | US6910203 Photomask and method for qualifying the same with a prototype specification |
| 06/21/2005 | US6908852 Method of forming an arc layer for a semiconductor device |
| 06/16/2005 | WO2005054949A2 Laser thin film poly-silicon annealing system |
| 06/16/2005 | US20050128367 Liquid crystal cell that resists degradation from exposure to radiation |
| 06/09/2005 | WO2004099873A3 Illumination system for a microlithographic projection illumination installation |
| 06/09/2005 | US20050122500 System and method for lithography simulation |
| 06/02/2005 | WO2005050316A2 Method involving a mask or a reticle |
| 06/02/2005 | US20050120327 System and method for lithography simulation |
| 06/01/2005 | EP1534873A2 Repairing defects on photomasks using a charged particle beam and topographical data from a scanning probe microscope |
| 05/26/2005 | WO2005047975A2 Dispense geometry and conductive template to achieve high-speed filling and throughput |
| 05/26/2005 | WO2005047974A2 Measurement and compensation of errors in interferometers |
| 05/26/2005 | WO2004114016A3 Imprint lithography with improved monitoring and control and apparatus therefor |
| 05/26/2005 | US20050112474 Method involving a mask or a reticle |
| 05/25/2005 | EP1532484A2 Lithographic printing with polarized light |
| 05/25/2005 | CN1620632A Optical proximity correction for phase shifting photolithographic masks |
| 05/19/2005 | WO2005045521A2 Laser-based termination of passive electronic components |
| 05/19/2005 | WO2004066028A3 Method for process optimization and control by comparison between 2 or more measured scatterometry signals |
| 05/19/2005 | US20050106383 Method for simultaneous patterning of features with nanometer scale gaps |
| 05/19/2005 | CA2544854A1 Laser-based termination of passive electronic components |
| 05/18/2005 | CN1618069A Photomask and method for qualifying the same with a prototype specification |
| 05/17/2005 | US6894292 System and method for maskless lithography using an array of sources and an array of focusing elements |
| 05/12/2005 | WO2005043241A2 Method for simultaneous patterning of features with nanometer scale gaps |
| 05/12/2005 | WO2004090633A3 An electro-osmotic element for an immersion lithography apparatus |
| 05/12/2005 | US20050099835 Laser-based termination of passive electronic components |
| 05/06/2005 | WO2005040918A2 Low-activation energy silicon-containing resist system |
| 05/06/2005 | WO2005040917A2 System and method for lithography simulation |
| 05/06/2005 | WO2005029179A9 Combined nanoimprinting and photolithography for micro and nano devices fabrication |
| 05/05/2005 | US20050097500 System and method for lithography simulation |
| 04/28/2005 | WO2005038524A2 Novel photosensitive resin compositions |
| 04/28/2005 | WO2005038523A2 Imprint lithography templates having alignment marks |
| 04/28/2005 | US20050091633 System and method for lithography simulation |
| 04/28/2005 | US20050089792 Low-activation energy silicon-containing resist system |
| 04/21/2005 | WO2005036265A2 Photoresist compositions comprising diamondoid derivatives |
| 04/21/2005 | WO2005036264A2 Photomask having an internal substantially transparent etch stop layer |
| 04/21/2005 | CA2540570A1 Photoresist compositions comprising diamondoid derivatives |
| 04/20/2005 | EP1523696A2 Defect inspection methods that include acquiring aerial images of a reticle for different lithographic process variables |
| 04/14/2005 | WO2005033798A2 Electrochemical micromanufacturing system and method |
| 04/14/2005 | WO2005033797A2 Single phase fluid imprint lithography method |
| 04/14/2005 | WO2004104698A3 Dielectric materials to prevent photoresist poisoning |
| 04/07/2005 | WO2005031458A2 Forming partial-depth features in polymer film |
| 04/07/2005 | WO2004095399A3 Providing cutomized text and imagery on organic products |
| 04/07/2005 | WO2004015496A3 Using scanning probe microscope topographic data to repair photomask defect using charged particle beams |
| 04/07/2005 | US20050076322 System and method for lithography simulation |
| 04/07/2005 | US20050074690 Monomers and polymers based on acrylated diamondoids (adamantane, diamantane, triamantane) having optional hydrophilic-moieties and the synthesis thereof; enhanced resolution, sensitivity, and adhesion to the substrate |
| 04/07/2005 | US20050074512 System for creating a turbulent flow of fluid between a mold and a substrate |
| 04/07/2005 | US20050072757 Method of creating a turbulent flow of fluid between a mold and a substrate |
| 04/07/2005 | US20050072755 Single phase fluid imprint lithography method |
| 04/05/2005 | US6874419 Providing customized text and imagery on organic products |
| 03/31/2005 | WO2005029180A2 Applications of semiconductor nano-sized particles for photolithography |
| 03/31/2005 | WO2005029179A2 Combined nanoimprinting and photolithography for micro and nano devices fabrication |
| 03/31/2005 | WO2005029178A2 A system and method for the direct imaging of color filters |
| 03/31/2005 | US20050069782 Each full-depth producing pattern includes an area of UV light-blocking material on a transparent plate that has a smaller dimension equal to or greater than minimum resolvable size; partial-depth producing pattern has an area of UV light-blocking material with smaller dimension less than minimum size |
| 03/29/2005 | US6871558 Method for determining characteristics of substrate employing fluid geometries |
| 03/24/2005 | US20050064344 Imprint lithography templates having alignment marks |
| 03/17/2005 | WO2005024517A2 Apparatus and method for providing fluid for immersion lithography |
| 03/17/2005 | WO2004055593A3 Process for producing a heat resistant relief structure |
| 03/10/2005 | WO2005022258A2 Photomask and method for maintaining optical properties of the same |
| 03/10/2005 | WO2005022257A2 Novel photosensitive bilayer composition |
| 03/10/2005 | WO2004046826A3 Positive tone lithography in carbon dioxide solvents |
| 03/01/2005 | US6860956 Methods of creating patterns on substrates and articles of manufacture resulting therefrom |
| 02/24/2005 | US20050042542 Novel photosensitive bilayer composition |
| 02/17/2005 | US20050036149 Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology |
| 02/10/2005 | WO2005013002A2 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 02/10/2005 | WO2004092829A3 Masking arrangement and method for producing integrated circuit arrangements |
| 02/10/2005 | US20050028618 System for determining characteristics of substrates employing fluid geometries |
| 02/03/2005 | WO2005010611A2 Wafer table for immersion lithography |
| 02/03/2005 | WO2004083960A3 Alternating aperture phase shift photomask having light absorption layer |
| 02/03/2005 | WO2004074930A3 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
| 02/03/2005 | US20050026435 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 02/03/2005 | US20050026053 Photolithography; semiconductors, integrated circuits; detecting defects |
| 01/27/2005 | WO2005008334A2 Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology |
| 01/27/2005 | WO2005008333A2 Method for correcting critical dimension variations in photomasks |
| 01/20/2005 | WO2005006076A2 Systems for magnification and distortion correction for imprint lithography processes |
| 01/20/2005 | WO2004107045A3 Methods of creating patterns on substrates and articles of manufacture resulting therefrom |
| 01/20/2005 | US20050011377 Methods and systems for providing an image on an organic product |
| 01/13/2005 | WO2004092832A3 Determination of center of focus by parameter variability analysis |
| 01/13/2005 | US20050006343 Systems for magnification and distortion correction for imprint lithography processes |