| Patents for G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor (531) |
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| 02/20/2008 | CN100370360C Silicate-contg. alkaline compositions for cleaning microelectronic substrates |
| 02/12/2008 | US7329483 First phase of carbon dioxide, second phase of polyol and water, optional surfactant in one or both phases; positive tone lithography; preferential removal of light-field regions used to form patterned regions on microelectronic substrates |
| 02/07/2008 | US20080030704 Environmental system including a transport region for an immersion lithography apparatus |
| 01/10/2008 | US20080006305 Resist, Barc and Gap Fill Material Stripping Chemical and Method |
| 01/09/2008 | EP1597627A4 Dissolution rate modifiers for photoresist compositions |
| 01/03/2008 | US20080001162 Process for Structuring at Least One Layer as Well as Electrical Component with Structures From the Layer |
| 12/26/2007 | CN101095082A Dissolution rate modifiers for photoresist compositions |
| 12/19/2007 | CN101091225A Laser-based termination of passive electronic components |
| 12/04/2007 | US7304318 System and method for maskless lithography using an array of sources and an array of focusing elements |
| 12/04/2007 | US7304190 Photoresist compositions comprising diamondoid derivatives |
| 11/27/2007 | US7301607 Wafer table for immersion lithography |
| 11/15/2007 | US20070266364 Method and System for Context-Specific Mask Writing |
| 11/08/2007 | US20070258062 Environmental system including a transport region for an immersion lithography apparatus |
| 11/06/2007 | US7292313 Apparatus and method for providing fluid for immersion lithography |
| 11/01/2007 | US20070252962 Environmental system including a transport region for an immersion lithography apparatus |
| 11/01/2007 | US20070252961 Environmental system including a transport region for an immersion lithography apparatus |
| 10/31/2007 | CN100345677C Methods and systems for providing an image on an organic product |
| 10/17/2007 | CN101055431A Image forming method and apparatus |
| 10/10/2007 | EP1652003A4 Wafer table for immersion lithography |
| 10/04/2007 | US20070233419 Method and System for Context-Specific Mask Inspection |
| 09/18/2007 | US7270533 System for creating a turbulent flow of fluid between a mold and a substrate |
| 09/06/2007 | US20070206264 Image Forming Method and Apparatus |
| 09/05/2007 | EP1695138A4 Liquid crystal cell that resists degradation from exposure to radiation |
| 08/23/2007 | US20070195303 Apparatus and method for providing fluid for immersion lithography |
| 08/22/2007 | EP1532484A4 Lithographic printing with polarized light |
| 08/02/2007 | US20070178014 Device and method for microcontact printing |
| 07/31/2007 | US7251017 Environmental system including a transport region for an immersion lithography apparatus |
| 07/24/2007 | US7249342 Method and system for context-specific mask writing |
| 07/11/2007 | CN1997878A Method for correcting critical dimension variations in photomasks |
| 07/05/2007 | US20070154848 Low pH Development Solutions for Chemically Amplified Photoresists |
| 06/28/2007 | WO2004111726A3 Novel photosensitive resin compositions |
| 06/26/2007 | US7235347 Low pH development solutions for chemically amplified photoresists |
| 06/21/2007 | US20070139631 Environmental system including a transport region for an immersion lithography apparatus |
| 06/20/2007 | EP1664925A4 Imprint lithography templates having alignment marks |
| 06/12/2007 | US7231628 Method and system for context-specific mask inspection |
| 05/31/2007 | US20070123052 Process sequence for photoresist stripping and cleaning of photomasks for integrated circuit manufacturing |
| 05/10/2007 | WO2005045521A3 Laser-based termination of passive electronic components |
| 05/09/2007 | EP1690135A4 Resist, barc and gap fill material stripping chemical and method |
| 05/09/2007 | EP1556896A4 Anti-reflective compositions comprising triazine compounds |
| 05/08/2007 | US7215409 Image forming method and apparatus |
| 04/26/2007 | US20070089993 Electrochemical printer head for use in electrolytically depositing material onto substrate, the printing head comprising a plurality of electrodes, a lead connector, an electric power source, and a high electrical resistance means for controlling distribution of electrolyte to electrode channels |
| 04/19/2007 | WO2005047974A3 Measurement and compensation of errors in interferometers |
| 04/11/2007 | CN1947232A Method for structuring at least one layer and electric component with structures from said layer |
| 04/05/2007 | US20070076182 Wafer table for immersion lithography |
| 03/28/2007 | CN1938412A Resist, BARC and gap fill material stripping chemical and method |
| 03/22/2007 | US20070065729 shading elements attenuate light passing through the regions, so as to compensate for the critical dimensio (CD) variations on the wafer and hence provide and improved CD tolerance wafer; computer program uses a reference calibration list to determine the parameters of the shading elements |
| 03/07/2007 | CN1303474C Optical proximity correction for phase shifting photolithographic masks |
| 02/27/2007 | US7184109 Liquid crystal cell that resists degradation from exposure to radiation |
| 02/08/2007 | US20070031585 Providing an image on an organic product |
| 02/07/2007 | CN1910517A Adaptive real time control of a reticle/mask system |
| 01/30/2007 | US7169253 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 01/25/2007 | US20070022402 High transport rates of hormones delivered across cell membranes, facilitating more efficient delivery of drugs and diagnostic agents by using a viscous fluid comprising a polysaccharide a form of hydrogel, lipogel or sols; drug delivery to mucous membranes; gastrointesinal systems |
| 01/11/2007 | WO2005043241A3 Method for simultaneous patterning of features with nanometer scale gaps |
| 01/10/2007 | CN1894621A Liquid crystal cell that resists degradation from exposure to radiation |
| 01/03/2007 | EP1738404A2 Method for structuring at least one layer and electric component with structures from said layer |
| 01/03/2007 | EP1671184A4 Photoresist compositions comprising diamondoid derivatives |
| 12/19/2006 | US7150622 Systems for magnification and distortion correction for imprint lithography processes |
| 12/13/2006 | EP1730595A2 Method involving a mask or a reticle |
| 12/07/2006 | US20060275708 Custom polarization, such as a combination of radial and tangential polarization; Forbidden pitch is avoided; patterning the polarized beam of radiation; projecting the patterned beam of radiation onto a target portion of the wafer |
| 11/29/2006 | CN1871556A Imprint lithography templates having alignment marks |
| 11/29/2006 | CN1871555A Forming partial-depth features in polymer film |
| 11/29/2006 | CN1871550A Low-activation energy silicon-containing resist system |
| 11/29/2006 | CN1871103A Systems for magnification and distortion correction for imprint lithography processes |
| 11/09/2006 | WO2004074933A3 Dissolution rate modifiers for photoresist compositions |
| 11/08/2006 | CN1859959A Single phase fluid imprint lithography method |
| 10/31/2006 | US7129011 polybenzoxazoles; latent crosslinker; relief images |
| 10/26/2006 | US20060237881 imprinting a mold having a protrusion against a substrate having a resist layer such that the protrusion engages the resist layer |
| 10/19/2006 | WO2005057281A3 Resist, barc and gap fill material stripping chemical and method |
| 10/19/2006 | US20060234155 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
| 10/18/2006 | EP1711542A2 Directly photodefinable polymer compositions and methods thereof |
| 10/11/2006 | CN1846174A Photomask and method for maintaining optical properties of the same |
| 10/10/2006 | US7120895 Evaluating design pattern on photolithographicmask; generating simulated image on wafer using a pixel-based bitmap; computers, data processing |
| 10/10/2006 | US7119893 Determination of center of focus by parameter variability analysis |
| 10/10/2006 | US7118833 Forming partial-depth features in polymer film |
| 10/05/2006 | DE112004002064T5 Abschluss von passiven elektronischen Bauteilen auf Laserbasis Degree of passive electronic components, laser-based |
| 10/04/2006 | EP1446283A4 Providing an image on an organic product |
| 10/03/2006 | US7117478 System and method for lithography simulation |
| 10/03/2006 | US7117477 System and method for lithography simulation |
| 09/26/2006 | US7114145 System and method for lithography simulation |
| 09/19/2006 | US7111277 System and method for lithography simulation |
| 09/14/2006 | WO2005029178A3 A system and method for the direct imaging of color filters |
| 09/13/2006 | CN1832846A Imprint lithography with improved monitoring and control and apparatus therefor |
| 08/30/2006 | EP1695138A2 Liquid crystal cell that resists degradation from exposure to radiation |
| 08/16/2006 | EP1690135A2 Resist, barc and gap fill material stripping chemical and method |
| 08/15/2006 | US7090964 custom polarization, such as a combination of radial and tangential polarization; Forbidden pitch is avoided |
| 08/15/2006 | US7090716 Single phase fluid imprint lithography method |
| 08/15/2006 | US7089860 Providing customized text and imagery on organic products |
| 08/09/2006 | EP1687877A2 Laser thin film poly-silicon annealing system |
| 08/02/2006 | EP1614009B1 Masking arrangement and method for producing integrated circuit arrangements |
| 08/01/2006 | US7084984 Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology |
| 07/26/2006 | EP1682340A2 Dispense geometry and conductive template to achieve high-speed filling and throughput |
| 07/19/2006 | EP1680711A2 Novel photosensitive resin compositions |
| 07/13/2006 | WO2005033798A3 Electrochemical micromanufacturing system and method |
| 07/13/2006 | US20060152697 Apparatus and method for providing fluid for immersion lithography |
| 07/12/2006 | EP1678556A2 Low-activation energy silicon-containing resist system |
| 07/12/2006 | EP1550002B1 Photomask assembly incorporating a porous frame and method for making it |
| 07/06/2006 | WO2005006076A3 Systems for magnification and distortion correction for imprint lithography processes |
| 07/05/2006 | CN1799004A Applications of semiconductor nano-sized particles for photolithography |
| 06/29/2006 | US20060141371 Method for making a photomask assembly incorporating a porous frame |
| 06/22/2006 | WO2005038524A3 Novel photosensitive resin compositions |