| Patents for C23F 3 - Brightening metals by chemical means (1,427) |
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| 06/14/2006 | CN1786275A Mechanical chemical polishing method |
| 06/13/2006 | USRE39126 Two-step chemical mechanical polishing process for producing flush and protruding tungsten plugs |
| 06/07/2006 | CN2786149Y Strip steel surface treatment device |
| 05/30/2006 | US7052620 Polishing slurry for aluminum-based metal, and method of manufacturing semiconductor device |
| 05/24/2006 | CN1777706A Surface treatment of magnesium and its alloys |
| 05/23/2006 | US7049237 Methods for planarization of Group VIII metal-containing surfaces using oxidizing gases |
| 05/18/2006 | WO2005012451A3 Slurries and methods for chemical-mechanical planarization of copper |
| 05/17/2006 | CN1256765C Method for forming copper interconnection wire |
| 05/11/2006 | US20060099817 Novel slurry for chemical mechanical polishing of metals |
| 05/11/2006 | US20060097347 Novel slurry for chemical mechanical polishing of metals |
| 05/11/2006 | US20060096952 Plasma processing method |
| 05/10/2006 | CN1769523A Silver and silver alloy fastness method |
| 05/09/2006 | US7041231 Method of refurbishing a transition duct for a gas turbine system |
| 05/02/2006 | US7037350 adding polymeric abrasive particles carrying electrostatic charge to the aqueous solution, wherein the polymeric particles in the aqueous solution have an electrical charge sufficient to create an electrostatic repulsive force between proximate particles |
| 04/26/2006 | EP1648974A2 Slurries and methods for chemical-mechanical planarization of copper |
| 04/26/2006 | CN1764739A Solution for etching copper surfaces and method of depositing metal on copper surfaces |
| 04/25/2006 | US7033942 Chemical mechanical polishing composition and process |
| 04/18/2006 | US7029508 Catalyst attached to solid and used to promote free radical formation in CMP formulations |
| 04/13/2006 | US20060076247 Pickling or brightening/passivating solution and process for steel and stainless steel |
| 04/11/2006 | US7025891 Method of polishing C4 molybdenum masks to remove molybdenum peaks |
| 03/30/2006 | DE10313517B4 Lösung zum Ätzen von Kupfer, Verfahren zum Vorbehandeln einer Schicht aus Kupfer sowie Anwendung des Verfahrens Solution for etching copper, method for pretreating a layer of copper as well as application of the method |
| 03/29/2006 | EP1639053A1 Cmp of noble metals |
| 03/29/2006 | CN1753961A Cmp composition comprising a sulfonic acid and a method for polishing noble metals |
| 03/29/2006 | CN1752290A Multifunctional maintaniing agent for defatting, washing and forming oright film on surface of stainless steel products |
| 03/21/2006 | US7014669 Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same |
| 03/16/2006 | US20060057472 Method for making chrome photo mask |
| 03/15/2006 | CN1245466C Polishing composition and its polishing method |
| 03/09/2006 | US20060049382 Metal surface protective film forming agent and use thereof |
| 03/08/2006 | EP1631416A2 Improved chemical mechanical polishing compositions for copper and associated materials and method of using same |
| 03/07/2006 | US7008553 Method for removing aluminide coating from metal substrate and turbine engine part so treated |
| 03/02/2006 | WO2006023105A1 Polishing composition for noble metals |
| 03/01/2006 | CN1742065A Selective barrier metal polishing solution |
| 02/23/2006 | US20060037251 abrasives; for wirings of semiconductor devices |
| 02/22/2006 | CN1739192A Methods for planarization of group VIII metal-containing surfaces using complexing agents |
| 02/22/2006 | CN1739066A Electron beam processing technology for mask repair |
| 02/22/2006 | CN1738928A Compositions for copper, tantalum and tantalum nitride chemical mechanical method complanation |
| 02/22/2006 | CN1243071C Metal grinding liquid material, metal grinding liquid, its producing method and grinding method using it |
| 02/16/2006 | US20060036312 Flexible stent and method of manufacture |
| 02/15/2006 | CN1735671A Passivative chemical mechanical polishing composition for copper film planarization |
| 02/14/2006 | US6998204 patterning the non-transparent film using the etch stop layer to expose areas of the transparent substrate, forming a mask on the non-transparent film to protect selected areas of the transparent substrate and forming a phase shift oxide |
| 02/14/2006 | US6998066 and a chelating agent forming a chemical mechanical polishing emulsion; chemical stability, improved selectivity, corrosion inhibition, broad pH operating range |
| 02/14/2006 | US6998060 Flexible stent and method of manufacture |
| 02/09/2006 | US20060027534 Chemical mechanical machining for polishing surfaces such as semiconductors and oxidizers and/or abrasives |
| 02/08/2006 | CN1240484C Bond enhancement antitarnish coatings |
| 02/02/2006 | US20060024967 Polishing composition for noble metals |
| 02/02/2006 | US20060021971 Method for plasma treatment of a carbon layer |
| 02/01/2006 | CN1727519A Army green passivation technology for weldness steel tube in high precision |
| 01/26/2006 | WO2006009641A1 Method of polishing a tungsten-containing substrate |
| 01/26/2006 | WO2005033234A3 Novel slurry for chemical mechanical polishing of metals |
| 01/25/2006 | EP1570015A4 Passivative chemical mechanical polishing composition for copper film planarization |
| 01/25/2006 | CN1726266A Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor |
| 01/25/2006 | CN1726265A Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor |
| 01/25/2006 | CN1724707A Fast chemical grinding polishing bath liquid for stainless steel surface and its method |
| 01/25/2006 | CN1238560C Solution used for platinum chemical mechanical polishing |
| 01/18/2006 | CN1721574A Aqueous solution composition for treating metal surface |
| 01/11/2006 | CN1718859A Acidic chemical nickel plating composite brightening agent and its use method |
| 01/03/2006 | US6982241 Cleaning composition comprising an inorganic acid mixture and a cationic surfactant |
| 12/22/2005 | US20050282473 Surface treatment method for vacuum member |
| 12/22/2005 | US20050282391 Method of polishing a tungsten-containing substrate |
| 12/22/2005 | US20050282387 Metal polish composition, polishing method using the composition and method for producing wafer using the polishing method |
| 12/22/2005 | US20050279964 Chemical mechanical polishing slurry for polishing copper layer on a wafer |
| 12/21/2005 | EP1606431A1 Solution for etching copper surfaces and method of depositing metal on copper surfaces |
| 12/14/2005 | EP0852615B1 Chemical mechanical polishing composition and process |
| 12/07/2005 | CN1705733A Slurry for chemical-mechanical polishing copper damascene structures |
| 12/01/2005 | US20050266689 Chemical mechanical polishing composition and process |
| 12/01/2005 | US20050263490 Method of passivating chemical mechanical polishing compositions for copper film planarization processes |
| 11/30/2005 | EP1599555A2 Cmp composition comprising a sulfonic acid and a method for polishing noble metals |
| 11/24/2005 | WO2005110286A1 Method for reducing stent weld profiles and a stent having reduced weld profiles and a closed-end wire configuration |
| 11/24/2005 | DE102004020213A1 Zusammensetzung für das Chemisch-Mechanische Polieren (CMP) Composition for chemical-mechanical polishing (CMP) |
| 11/24/2005 | CA2565877A1 Method for reducing stent weld profiles and a stent having reduced weld profiles and a closed-end wire configuration |
| 11/23/2005 | EP1597066A2 Heat treatable coated article with chromium nitride ir reflecting layer and method of making same |
| 11/17/2005 | WO2004101221A3 Improved chemical mechanical polishing compositions for copper and associated materials and method of using same |
| 11/17/2005 | US20050256563 Method for reducing stent weld profiles and a stent having reduced weld profiles and a closed-end wire configuration |
| 11/17/2005 | US20050256025 Includes alkali metal hydroxide; a mono-, di- or trinitrilo polycarboxylic acid; sodium gluconate or sodium glucoheptonate; a first amphoteric surfactant; a second betaine surfactant; and a third nonionic surfactant; provides etching of aluminum without adversely effecting other non-metallic surfaces |
| 11/17/2005 | US20050255693 Passivative chemical mechanical polishing composition for copper film planarization |
| 11/09/2005 | EP1485440A4 Free radical-forming activator attached to solid and used to enhance cmp formulations |
| 11/03/2005 | WO2005102932A1 Composition for chemo-mechanical polishing (cmp) |
| 11/02/2005 | EP1590413A1 Selective barrier metal polishing solution |
| 10/27/2005 | DE10393234T5 Oberflächenbehandlung von Magnesium und seinen Legierungen Surface treatment of magnesium and its alloys |
| 10/19/2005 | EP1586007A2 Electron beam processing for mask repair |
| 10/12/2005 | EP1485439A4 Improved chemical-mechanical polishing slurry for polishing of copper or silver films |
| 10/12/2005 | CN1680511A Abrasive liquid for metal and method for polishing |
| 10/11/2005 | US6953531 Methods of etching silicon-oxide-containing materials |
| 10/06/2005 | US20050218117 Chemically assisted surface finishing process |
| 10/05/2005 | CN1676563A Compositions and methods for chemical mechanical planarization of tungsten and titanium |
| 09/29/2005 | US20050211953 Polishing slurries and methods for chemical mechanical polishing |
| 09/29/2005 | US20050211952 Compositions and methods for chemical mechanical planarization of tungsten and titanium |
| 09/29/2005 | US20050211951 Compositions and methods for polishing copper |
| 09/28/2005 | EP1580247A1 Polishing composition and polishing method |
| 09/22/2005 | US20050208761 Polishing composition and polishing method |
| 09/22/2005 | US20050205522 Chemical mechanical polishing; carbonyl derivative of benzotriazole forms a protective film on the surface of the metal layer; hydrogen peroxide, buffer, amine; etching agent includes hydrofluoric acid; micro processing step for semiconductor device |
| 09/15/2005 | US20050199589 Aminoacetic acid, oxidizer, and water |
| 09/14/2005 | EP1572821A1 Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor |
| 09/14/2005 | EP1572820A1 Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor |
| 09/14/2005 | EP1337601A4 Slurry for chemical-mechanical polishing copper damascene structures |
| 09/07/2005 | EP1570015A2 Passivative chemical mechanical polishing composition for copper film planarization |
| 09/01/2005 | US20050189319 One step copper damascene CMP process and slurry |
| 08/31/2005 | CN1217032C Machine for localised cleaning with electrolytic and/or ultrasound cell, for pickling and/or polishin |
| 08/31/2005 | CN1216953C Polishing composition for metal CMP and method of polishing susbstroote |
| 08/24/2005 | CN1216112C Polishing composition and polishing method for its use |